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You searched for subject:(wet etch). Showing records 1 – 5 of 5 total matches.

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University of New Mexico

1. Narayanan Kutty, Maya. Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors.

Degree: Electrical and Computer Engineering, 2013, University of New Mexico

 Infrared (IR) detectors today are being utilized for a variety of imaging applications such as medical diagnostics, navigation instruments of automobiles and aircrafts, meteorological imaging,… (more)

Subjects/Keywords: Infrared Detectors; Type II SLS; Stained Layer Superlattice; InAs/GaSb superlattice; passivation; mesa etch; wet etch; dry etch; electro-chemical passivation; chalcogenide passivation; ZnTe; ECP

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APA (6th Edition):

Narayanan Kutty, M. (2013). Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors. (Doctoral Dissertation). University of New Mexico. Retrieved from http://hdl.handle.net/1928/23355

Chicago Manual of Style (16th Edition):

Narayanan Kutty, Maya. “Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors.” 2013. Doctoral Dissertation, University of New Mexico. Accessed July 19, 2019. http://hdl.handle.net/1928/23355.

MLA Handbook (7th Edition):

Narayanan Kutty, Maya. “Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors.” 2013. Web. 19 Jul 2019.

Vancouver:

Narayanan Kutty M. Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors. [Internet] [Doctoral dissertation]. University of New Mexico; 2013. [cited 2019 Jul 19]. Available from: http://hdl.handle.net/1928/23355.

Council of Science Editors:

Narayanan Kutty M. Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors. [Doctoral Dissertation]. University of New Mexico; 2013. Available from: http://hdl.handle.net/1928/23355


University of North Texas

2. Barclay, Joshua David. High Temperature Water as an Etch and Clean for SiO2 and Si3N4.

Degree: 2018, University of North Texas

 An environmentally friendly, and contamination free process for etching and cleaning semiconductors is critical to future of the IC industry. Under the right conditions, water… (more)

Subjects/Keywords: Etching; Semiconductor; Silicon Dioxide; Silicon Nitride; Water, High Temperature water; Deuterium Oxide; wet etching; Etch

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APA (6th Edition):

Barclay, J. D. (2018). High Temperature Water as an Etch and Clean for SiO2 and Si3N4. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc1404614/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Barclay, Joshua David. “High Temperature Water as an Etch and Clean for SiO2 and Si3N4.” 2018. Thesis, University of North Texas. Accessed July 19, 2019. https://digital.library.unt.edu/ark:/67531/metadc1404614/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Barclay, Joshua David. “High Temperature Water as an Etch and Clean for SiO2 and Si3N4.” 2018. Web. 19 Jul 2019.

Vancouver:

Barclay JD. High Temperature Water as an Etch and Clean for SiO2 and Si3N4. [Internet] [Thesis]. University of North Texas; 2018. [cited 2019 Jul 19]. Available from: https://digital.library.unt.edu/ark:/67531/metadc1404614/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Barclay JD. High Temperature Water as an Etch and Clean for SiO2 and Si3N4. [Thesis]. University of North Texas; 2018. Available from: https://digital.library.unt.edu/ark:/67531/metadc1404614/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of California – Irvine

3. Yildirim, Dogukan. An Investigation of Anodic Aluminum Oxide for Electronic and MEMS Applications.

Degree: Electrical and Computer Engineering, 2016, University of California – Irvine

 In this dissertation, we have explored the use of a highly anisotropic film, porous anodic aluminum oxide (AAO) for electronic and MEMS applications. In the… (more)

Subjects/Keywords: Electrical engineering; deep wet chemical etch; hybrid integration; MEMS; nanowires; porous anodic aluminum oxide; spiral inductors

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APA (6th Edition):

Yildirim, D. (2016). An Investigation of Anodic Aluminum Oxide for Electronic and MEMS Applications. (Thesis). University of California – Irvine. Retrieved from http://www.escholarship.org/uc/item/2g88g4cw

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Yildirim, Dogukan. “An Investigation of Anodic Aluminum Oxide for Electronic and MEMS Applications.” 2016. Thesis, University of California – Irvine. Accessed July 19, 2019. http://www.escholarship.org/uc/item/2g88g4cw.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Yildirim, Dogukan. “An Investigation of Anodic Aluminum Oxide for Electronic and MEMS Applications.” 2016. Web. 19 Jul 2019.

Vancouver:

Yildirim D. An Investigation of Anodic Aluminum Oxide for Electronic and MEMS Applications. [Internet] [Thesis]. University of California – Irvine; 2016. [cited 2019 Jul 19]. Available from: http://www.escholarship.org/uc/item/2g88g4cw.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Yildirim D. An Investigation of Anodic Aluminum Oxide for Electronic and MEMS Applications. [Thesis]. University of California – Irvine; 2016. Available from: http://www.escholarship.org/uc/item/2g88g4cw

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Virginia Tech

4. Chen, Xiaopei. Fiber Optic Pressure Sensor Fabrication Using MEMS Technology.

Degree: MS, Electrical and Computer Engineering, 2003, Virginia Tech

 (Abstract) A technology for fabricating fiber optic pressure sensors is described. This technology is based on intermediate-layer bonding of a fused silica ferrule to a… (more)

Subjects/Keywords: wet etch; sol-gel; Fabry-Perot interferometry; fiber optic pressure sensor

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APA (6th Edition):

Chen, X. (2003). Fiber Optic Pressure Sensor Fabrication Using MEMS Technology. (Masters Thesis). Virginia Tech. Retrieved from http://hdl.handle.net/10919/32744

Chicago Manual of Style (16th Edition):

Chen, Xiaopei. “Fiber Optic Pressure Sensor Fabrication Using MEMS Technology.” 2003. Masters Thesis, Virginia Tech. Accessed July 19, 2019. http://hdl.handle.net/10919/32744.

MLA Handbook (7th Edition):

Chen, Xiaopei. “Fiber Optic Pressure Sensor Fabrication Using MEMS Technology.” 2003. Web. 19 Jul 2019.

Vancouver:

Chen X. Fiber Optic Pressure Sensor Fabrication Using MEMS Technology. [Internet] [Masters thesis]. Virginia Tech; 2003. [cited 2019 Jul 19]. Available from: http://hdl.handle.net/10919/32744.

Council of Science Editors:

Chen X. Fiber Optic Pressure Sensor Fabrication Using MEMS Technology. [Masters Thesis]. Virginia Tech; 2003. Available from: http://hdl.handle.net/10919/32744

5. Cao, Siwei. THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE.

Degree: MS, Physics, 2008, Miami University

 We introduce a model of a high efficiency photonic lattice based 3-channel wavelength division demultiplexer (WDDM). A 2-D photonic crystal structure is within Si3N4 layer… (more)

Subjects/Keywords: Electrical Engineering; Physics; WDDM; photonic crystal; E-beam lithography; Cr wet etch; plasma etch

…between Cr wet etch and dry etch...…..….. …36 Table 4. 2 Comparisons between contact mode… …62 Table 5. 7 A series lattice design with large enough pitches to test lateral wet etch… …small feature wet etch test …...53 Figure 5.11 AFM of a wafer wet etched for 70 seconds. In… …of biggest air pores 1000nm under the SEM and AFM before wet etch… …wet etch .59 Figure 5.19 the single air pores in the corner… 

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Cao, S. (2008). THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE. (Masters Thesis). Miami University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=miami1219330454

Chicago Manual of Style (16th Edition):

Cao, Siwei. “THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE.” 2008. Masters Thesis, Miami University. Accessed July 19, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=miami1219330454.

MLA Handbook (7th Edition):

Cao, Siwei. “THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE.” 2008. Web. 19 Jul 2019.

Vancouver:

Cao S. THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE. [Internet] [Masters thesis]. Miami University; 2008. [cited 2019 Jul 19]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=miami1219330454.

Council of Science Editors:

Cao S. THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE. [Masters Thesis]. Miami University; 2008. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=miami1219330454

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