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You searched for subject:(silicides). Showing records 1 – 30 of 75 total matches.

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1. LI RUIQIONG. Study on the formation of silicide phase by deposition erbium on (001)Si.

Degree: 2006, National University of Singapore

Subjects/Keywords: erbium silicides

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

RUIQIONG, L. (2006). Study on the formation of silicide phase by deposition erbium on (001)Si. (Thesis). National University of Singapore. Retrieved from http://scholarbank.nus.edu.sg/handle/10635/15436

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

RUIQIONG, LI. “Study on the formation of silicide phase by deposition erbium on (001)Si.” 2006. Thesis, National University of Singapore. Accessed January 21, 2020. http://scholarbank.nus.edu.sg/handle/10635/15436.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

RUIQIONG, LI. “Study on the formation of silicide phase by deposition erbium on (001)Si.” 2006. Web. 21 Jan 2020.

Vancouver:

RUIQIONG L. Study on the formation of silicide phase by deposition erbium on (001)Si. [Internet] [Thesis]. National University of Singapore; 2006. [cited 2020 Jan 21]. Available from: http://scholarbank.nus.edu.sg/handle/10635/15436.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

RUIQIONG L. Study on the formation of silicide phase by deposition erbium on (001)Si. [Thesis]. National University of Singapore; 2006. Available from: http://scholarbank.nus.edu.sg/handle/10635/15436

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

2. Roy, Soumitra. Interdiffusion Study in Group IVB, VB and VIB Refractory Metal-Silicon Systems.

Degree: 2013, Indian Institute of Science

 The knowledge of diffusion parameters provides important understanding of many physical and mechanical properties of materials. In most of the applications silicides are grown by… (more)

Subjects/Keywords: Metal Silicides; Metal Silicon Systems - Interdiffusion; Hafnium Silicides; Zirconium Silicides; Tantalum Silicides; Tungsten Silicides; Titanium Silicides; Metal Silicides - Diffusion; Fick’s Law; Ti-Si System; Co-Ta System; M5Si3 Silicides; W-Si Systems; Re-Si System; Materials Science

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APA (6th Edition):

Roy, S. (2013). Interdiffusion Study in Group IVB, VB and VIB Refractory Metal-Silicon Systems. (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/2005/3404 ; http://etd.iisc.ernet.in/abstracts/4270/G25870-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Roy, Soumitra. “Interdiffusion Study in Group IVB, VB and VIB Refractory Metal-Silicon Systems.” 2013. Thesis, Indian Institute of Science. Accessed January 21, 2020. http://etd.iisc.ernet.in/2005/3404 ; http://etd.iisc.ernet.in/abstracts/4270/G25870-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Roy, Soumitra. “Interdiffusion Study in Group IVB, VB and VIB Refractory Metal-Silicon Systems.” 2013. Web. 21 Jan 2020.

Vancouver:

Roy S. Interdiffusion Study in Group IVB, VB and VIB Refractory Metal-Silicon Systems. [Internet] [Thesis]. Indian Institute of Science; 2013. [cited 2020 Jan 21]. Available from: http://etd.iisc.ernet.in/2005/3404 ; http://etd.iisc.ernet.in/abstracts/4270/G25870-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Roy S. Interdiffusion Study in Group IVB, VB and VIB Refractory Metal-Silicon Systems. [Thesis]. Indian Institute of Science; 2013. Available from: http://etd.iisc.ernet.in/2005/3404 ; http://etd.iisc.ernet.in/abstracts/4270/G25870-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Zululand

3. Nkosi, M.M. The effect of capping layers, diffusion barriers on TiSi2 phase formation .

Degree: 2002, University of Zululand

 Metal silicides continue to be an important part of the design philosophy in semiconductor technology due to their application as contacts or interconnect. Among these… (more)

Subjects/Keywords: Silicides ; Electronics ; Semiconductors

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APA (6th Edition):

Nkosi, M. M. (2002). The effect of capping layers, diffusion barriers on TiSi2 phase formation . (Thesis). University of Zululand. Retrieved from http://hdl.handle.net/10530/819

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Nkosi, M M. “The effect of capping layers, diffusion barriers on TiSi2 phase formation .” 2002. Thesis, University of Zululand. Accessed January 21, 2020. http://hdl.handle.net/10530/819.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Nkosi, M M. “The effect of capping layers, diffusion barriers on TiSi2 phase formation .” 2002. Web. 21 Jan 2020.

Vancouver:

Nkosi MM. The effect of capping layers, diffusion barriers on TiSi2 phase formation . [Internet] [Thesis]. University of Zululand; 2002. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/10530/819.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Nkosi MM. The effect of capping layers, diffusion barriers on TiSi2 phase formation . [Thesis]. University of Zululand; 2002. Available from: http://hdl.handle.net/10530/819

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

4. Sun, Shuo-yang. Effect of additive Ag in TiSi2 thin films for phase transformation and mechanical behavior under nanoindentation.

Degree: Master, Materials and Optoelectronic Science, 2010, NSYSU

 The C54 TiSi2 thin films are widely applied in semiconductor devices due to the low electric resistance and high thermal stability. Through the annealing processing… (more)

Subjects/Keywords: electrical resistivity; Ag; phase transformation; Titanium silicides

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APA (6th Edition):

Sun, S. (2010). Effect of additive Ag in TiSi2 thin films for phase transformation and mechanical behavior under nanoindentation. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0723110-144658

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Sun, Shuo-yang. “Effect of additive Ag in TiSi2 thin films for phase transformation and mechanical behavior under nanoindentation.” 2010. Thesis, NSYSU. Accessed January 21, 2020. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0723110-144658.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Sun, Shuo-yang. “Effect of additive Ag in TiSi2 thin films for phase transformation and mechanical behavior under nanoindentation.” 2010. Web. 21 Jan 2020.

Vancouver:

Sun S. Effect of additive Ag in TiSi2 thin films for phase transformation and mechanical behavior under nanoindentation. [Internet] [Thesis]. NSYSU; 2010. [cited 2020 Jan 21]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0723110-144658.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Sun S. Effect of additive Ag in TiSi2 thin films for phase transformation and mechanical behavior under nanoindentation. [Thesis]. NSYSU; 2010. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0723110-144658

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Surrey

5. Pitman, Stephen Howard. Development of NbSi2 based alloys.

Degree: PhD, 1996, University of Surrey

 Literature on the processing, microstructure and properties of NbSi2 and other disilicides have been briefly reviewed, along with earlier work on the alloying behaviour of… (more)

Subjects/Keywords: 669; Niobium silicides

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APA (6th Edition):

Pitman, S. H. (1996). Development of NbSi2 based alloys. (Doctoral Dissertation). University of Surrey. Retrieved from http://epubs.surrey.ac.uk/844609/ ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.320903

Chicago Manual of Style (16th Edition):

Pitman, Stephen Howard. “Development of NbSi2 based alloys.” 1996. Doctoral Dissertation, University of Surrey. Accessed January 21, 2020. http://epubs.surrey.ac.uk/844609/ ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.320903.

MLA Handbook (7th Edition):

Pitman, Stephen Howard. “Development of NbSi2 based alloys.” 1996. Web. 21 Jan 2020.

Vancouver:

Pitman SH. Development of NbSi2 based alloys. [Internet] [Doctoral dissertation]. University of Surrey; 1996. [cited 2020 Jan 21]. Available from: http://epubs.surrey.ac.uk/844609/ ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.320903.

Council of Science Editors:

Pitman SH. Development of NbSi2 based alloys. [Doctoral Dissertation]. University of Surrey; 1996. Available from: http://epubs.surrey.ac.uk/844609/ ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.320903


University of North Texas

6. Elmarhoumi, Nader M. Novel Semi-Conductor Material Systems: Molecular Beam Epitaxial Growth and Characterization.

Degree: 2013, University of North Texas

 Semi-conductor industry relies heavily on silicon (Si). However, Si is not a direct-band gap semi-conductor. Consequently, Si does not possess great versatility for multi-functional applications… (more)

Subjects/Keywords: Semi-conductor; silicides; molecular beam epitaxy

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APA (6th Edition):

Elmarhoumi, N. M. (2013). Novel Semi-Conductor Material Systems: Molecular Beam Epitaxial Growth and Characterization. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc490047/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Elmarhoumi, Nader M. “Novel Semi-Conductor Material Systems: Molecular Beam Epitaxial Growth and Characterization.” 2013. Thesis, University of North Texas. Accessed January 21, 2020. https://digital.library.unt.edu/ark:/67531/metadc490047/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Elmarhoumi, Nader M. “Novel Semi-Conductor Material Systems: Molecular Beam Epitaxial Growth and Characterization.” 2013. Web. 21 Jan 2020.

Vancouver:

Elmarhoumi NM. Novel Semi-Conductor Material Systems: Molecular Beam Epitaxial Growth and Characterization. [Internet] [Thesis]. University of North Texas; 2013. [cited 2020 Jan 21]. Available from: https://digital.library.unt.edu/ark:/67531/metadc490047/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Elmarhoumi NM. Novel Semi-Conductor Material Systems: Molecular Beam Epitaxial Growth and Characterization. [Thesis]. University of North Texas; 2013. Available from: https://digital.library.unt.edu/ark:/67531/metadc490047/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Guelph

7. Arthur, Zachary. X-ray Absorption Spectroscopy of Ultrathin Nickel Silicide Films: A Theoretical and Experimental Investigation .

Degree: 2013, University of Guelph

 Previous studies have attempted to probe the structure of ultra-thin Nickel silicide films as they evolve in the manufacturing process with limited success. These studies… (more)

Subjects/Keywords: Nickel; Silicides; Thin Film; X-ray; Absorption

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APA (6th Edition):

Arthur, Z. (2013). X-ray Absorption Spectroscopy of Ultrathin Nickel Silicide Films: A Theoretical and Experimental Investigation . (Thesis). University of Guelph. Retrieved from https://atrium.lib.uoguelph.ca/xmlui/handle/10214/6380

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Arthur, Zachary. “X-ray Absorption Spectroscopy of Ultrathin Nickel Silicide Films: A Theoretical and Experimental Investigation .” 2013. Thesis, University of Guelph. Accessed January 21, 2020. https://atrium.lib.uoguelph.ca/xmlui/handle/10214/6380.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Arthur, Zachary. “X-ray Absorption Spectroscopy of Ultrathin Nickel Silicide Films: A Theoretical and Experimental Investigation .” 2013. Web. 21 Jan 2020.

Vancouver:

Arthur Z. X-ray Absorption Spectroscopy of Ultrathin Nickel Silicide Films: A Theoretical and Experimental Investigation . [Internet] [Thesis]. University of Guelph; 2013. [cited 2020 Jan 21]. Available from: https://atrium.lib.uoguelph.ca/xmlui/handle/10214/6380.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Arthur Z. X-ray Absorption Spectroscopy of Ultrathin Nickel Silicide Films: A Theoretical and Experimental Investigation . [Thesis]. University of Guelph; 2013. Available from: https://atrium.lib.uoguelph.ca/xmlui/handle/10214/6380

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

8. Perumal, Suresh. Nanostructurization of Transition Metal Silicides for High Temperature Thermoelectric Materials.

Degree: 2012, Indian Institute of Science

 Transition Metal Silicides (TMS) are well known refractory materials because of their high thermal and structural stability at elevated temperature. In addition TMS materials are… (more)

Subjects/Keywords: Transition Metal Silicides (TMS); Thermoelectric Materials; Thermoelectricity; Chromium Disilicide; Transition Metal Silicides - Nanostructurization; Manganese Silicide; Transition Metal Silicides - Thermoelectric Applications; Transition Metal Silicides - Thermal Conductivity; Iron Silicides; Silicides; Polycrystalline CrSi2; Manganese Silicide; Materials Science

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APA (6th Edition):

Perumal, S. (2012). Nanostructurization of Transition Metal Silicides for High Temperature Thermoelectric Materials. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/3236

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Perumal, Suresh. “Nanostructurization of Transition Metal Silicides for High Temperature Thermoelectric Materials.” 2012. Thesis, Indian Institute of Science. Accessed January 21, 2020. http://hdl.handle.net/2005/3236.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Perumal, Suresh. “Nanostructurization of Transition Metal Silicides for High Temperature Thermoelectric Materials.” 2012. Web. 21 Jan 2020.

Vancouver:

Perumal S. Nanostructurization of Transition Metal Silicides for High Temperature Thermoelectric Materials. [Internet] [Thesis]. Indian Institute of Science; 2012. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/2005/3236.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Perumal S. Nanostructurization of Transition Metal Silicides for High Temperature Thermoelectric Materials. [Thesis]. Indian Institute of Science; 2012. Available from: http://hdl.handle.net/2005/3236

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

9. Dasgupta, Titas. Investigations Of Mechanical And Thermoelectric Properties Of Group (VIB) Transition Metal Disilicides.

Degree: 2007, Indian Institute of Science

 Transition Metal (TM) silicides are potential materials for different high temperature applications due to their high melting points and chemical stability at elevated temperatures. In… (more)

Subjects/Keywords: Transition Metal Compounds; Silicides - Thermoelectric Properties; Molybdenum Silicides; Chromium Silicides; Thermal Conductivity; Materials - Ductility; Transition Metal Silicides; MoSi2; CrSi2; Body Centred Cubic (BCC); Face Centred Cubic (FCC); Bader's Atoms in Molecule (AIM); Materials Science

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APA (6th Edition):

Dasgupta, T. (2007). Investigations Of Mechanical And Thermoelectric Properties Of Group (VIB) Transition Metal Disilicides. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/611

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Dasgupta, Titas. “Investigations Of Mechanical And Thermoelectric Properties Of Group (VIB) Transition Metal Disilicides.” 2007. Thesis, Indian Institute of Science. Accessed January 21, 2020. http://hdl.handle.net/2005/611.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Dasgupta, Titas. “Investigations Of Mechanical And Thermoelectric Properties Of Group (VIB) Transition Metal Disilicides.” 2007. Web. 21 Jan 2020.

Vancouver:

Dasgupta T. Investigations Of Mechanical And Thermoelectric Properties Of Group (VIB) Transition Metal Disilicides. [Internet] [Thesis]. Indian Institute of Science; 2007. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/2005/611.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Dasgupta T. Investigations Of Mechanical And Thermoelectric Properties Of Group (VIB) Transition Metal Disilicides. [Thesis]. Indian Institute of Science; 2007. Available from: http://hdl.handle.net/2005/611

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Brno University of Technology

10. Petr, Jiří. Příprava Ni-Si směsných vrstev a charakteristika reakcí a mikrostruktur vzniklých při jejich tepelném zpracování .

Degree: 2016, Brno University of Technology

 Tato bakalářská práce sleduje vznik a následný popis nikl-křemíkových fází. Teoretická část se věnuje rozdělení a popisu silicidů, mechanismům difuze a základnímu přehledu galvanického pokovení.… (more)

Subjects/Keywords: nikl; křemík; difuze; galvanické pokovení; silicidy; nickel; silicon; diffusion; electroplating; silicides

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APA (6th Edition):

Petr, J. (2016). Příprava Ni-Si směsných vrstev a charakteristika reakcí a mikrostruktur vzniklých při jejich tepelném zpracování . (Thesis). Brno University of Technology. Retrieved from http://hdl.handle.net/11012/60953

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Petr, Jiří. “Příprava Ni-Si směsných vrstev a charakteristika reakcí a mikrostruktur vzniklých při jejich tepelném zpracování .” 2016. Thesis, Brno University of Technology. Accessed January 21, 2020. http://hdl.handle.net/11012/60953.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Petr, Jiří. “Příprava Ni-Si směsných vrstev a charakteristika reakcí a mikrostruktur vzniklých při jejich tepelném zpracování .” 2016. Web. 21 Jan 2020.

Vancouver:

Petr J. Příprava Ni-Si směsných vrstev a charakteristika reakcí a mikrostruktur vzniklých při jejich tepelném zpracování . [Internet] [Thesis]. Brno University of Technology; 2016. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/11012/60953.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Petr J. Příprava Ni-Si směsných vrstev a charakteristika reakcí a mikrostruktur vzniklých při jejich tepelném zpracování . [Thesis]. Brno University of Technology; 2016. Available from: http://hdl.handle.net/11012/60953

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Michigan State University

11. Liu, Bangzhi. Scanning tunneling microscopy study of Dy, Gd disilicide nanostructures on Si (001).

Degree: PhD, Department of Chemical Engineering and Materials Science, 2002, Michigan State University

Subjects/Keywords: Silicides; Nanostructures; Scanning tunneling microscopy

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Liu, B. (2002). Scanning tunneling microscopy study of Dy, Gd disilicide nanostructures on Si (001). (Doctoral Dissertation). Michigan State University. Retrieved from http://etd.lib.msu.edu/islandora/object/etd:31369

Chicago Manual of Style (16th Edition):

Liu, Bangzhi. “Scanning tunneling microscopy study of Dy, Gd disilicide nanostructures on Si (001).” 2002. Doctoral Dissertation, Michigan State University. Accessed January 21, 2020. http://etd.lib.msu.edu/islandora/object/etd:31369.

MLA Handbook (7th Edition):

Liu, Bangzhi. “Scanning tunneling microscopy study of Dy, Gd disilicide nanostructures on Si (001).” 2002. Web. 21 Jan 2020.

Vancouver:

Liu B. Scanning tunneling microscopy study of Dy, Gd disilicide nanostructures on Si (001). [Internet] [Doctoral dissertation]. Michigan State University; 2002. [cited 2020 Jan 21]. Available from: http://etd.lib.msu.edu/islandora/object/etd:31369.

Council of Science Editors:

Liu B. Scanning tunneling microscopy study of Dy, Gd disilicide nanostructures on Si (001). [Doctoral Dissertation]. Michigan State University; 2002. Available from: http://etd.lib.msu.edu/islandora/object/etd:31369


Michigan State University

12. Ohbuchi, Chigusa. Structural and electronic properties of rare earth silicides on Si(001) : nanowires and 3D islands.

Degree: PhD, Department of Physics and Astronomy, 2004, Michigan State University

Subjects/Keywords: Rare earth metals; Silicides; Nanowires

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APA (6th Edition):

Ohbuchi, C. (2004). Structural and electronic properties of rare earth silicides on Si(001) : nanowires and 3D islands. (Doctoral Dissertation). Michigan State University. Retrieved from http://etd.lib.msu.edu/islandora/object/etd:32610

Chicago Manual of Style (16th Edition):

Ohbuchi, Chigusa. “Structural and electronic properties of rare earth silicides on Si(001) : nanowires and 3D islands.” 2004. Doctoral Dissertation, Michigan State University. Accessed January 21, 2020. http://etd.lib.msu.edu/islandora/object/etd:32610.

MLA Handbook (7th Edition):

Ohbuchi, Chigusa. “Structural and electronic properties of rare earth silicides on Si(001) : nanowires and 3D islands.” 2004. Web. 21 Jan 2020.

Vancouver:

Ohbuchi C. Structural and electronic properties of rare earth silicides on Si(001) : nanowires and 3D islands. [Internet] [Doctoral dissertation]. Michigan State University; 2004. [cited 2020 Jan 21]. Available from: http://etd.lib.msu.edu/islandora/object/etd:32610.

Council of Science Editors:

Ohbuchi C. Structural and electronic properties of rare earth silicides on Si(001) : nanowires and 3D islands. [Doctoral Dissertation]. Michigan State University; 2004. Available from: http://etd.lib.msu.edu/islandora/object/etd:32610


University of Florida

13. Kumar, Ashish. Nickel Silicide Growth Modeling Using Level Set Methods.

Degree: PhD, Electrical and Computer Engineering, 2013, University of Florida

 Nickel silicide is being used as a Local-Interconnect (LI) and source-drain contact material in current CMOS technology. For scaling technologies it has become extremely important… (more)

Subjects/Keywords: Arsenic; Chemicals; Compressive stress; Modeling; Nickel; Oxides; Silicides; Silicon; Simulations; Thermal stress; diffusion  – silicide  – simulations

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APA (6th Edition):

Kumar, A. (2013). Nickel Silicide Growth Modeling Using Level Set Methods. (Doctoral Dissertation). University of Florida. Retrieved from http://ufdc.ufl.edu/UFE0045954

Chicago Manual of Style (16th Edition):

Kumar, Ashish. “Nickel Silicide Growth Modeling Using Level Set Methods.” 2013. Doctoral Dissertation, University of Florida. Accessed January 21, 2020. http://ufdc.ufl.edu/UFE0045954.

MLA Handbook (7th Edition):

Kumar, Ashish. “Nickel Silicide Growth Modeling Using Level Set Methods.” 2013. Web. 21 Jan 2020.

Vancouver:

Kumar A. Nickel Silicide Growth Modeling Using Level Set Methods. [Internet] [Doctoral dissertation]. University of Florida; 2013. [cited 2020 Jan 21]. Available from: http://ufdc.ufl.edu/UFE0045954.

Council of Science Editors:

Kumar A. Nickel Silicide Growth Modeling Using Level Set Methods. [Doctoral Dissertation]. University of Florida; 2013. Available from: http://ufdc.ufl.edu/UFE0045954


Cape Peninsula University of Technology

14. Mars, Johan Andre. Marker studies of the solid state formation of CrSi2 on Pd2Si .

Degree: 1998, Cape Peninsula University of Technology

 The chemical system, Si < >1 Pd 1Cr, was investigated to study the formation of CrSil on polycrystalline PdlSi, formed on Si<IOO> and epitaxial PdlSi… (more)

Subjects/Keywords: Silicides; Solid state chemistry; Thin films

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Mars, J. A. (1998). Marker studies of the solid state formation of CrSi2 on Pd2Si . (Thesis). Cape Peninsula University of Technology. Retrieved from http://etd.cput.ac.za/handle/20.500.11838/1501

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Mars, Johan Andre. “Marker studies of the solid state formation of CrSi2 on Pd2Si .” 1998. Thesis, Cape Peninsula University of Technology. Accessed January 21, 2020. http://etd.cput.ac.za/handle/20.500.11838/1501.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Mars, Johan Andre. “Marker studies of the solid state formation of CrSi2 on Pd2Si .” 1998. Web. 21 Jan 2020.

Vancouver:

Mars JA. Marker studies of the solid state formation of CrSi2 on Pd2Si . [Internet] [Thesis]. Cape Peninsula University of Technology; 1998. [cited 2020 Jan 21]. Available from: http://etd.cput.ac.za/handle/20.500.11838/1501.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Mars JA. Marker studies of the solid state formation of CrSi2 on Pd2Si . [Thesis]. Cape Peninsula University of Technology; 1998. Available from: http://etd.cput.ac.za/handle/20.500.11838/1501

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Univerzitet u Beogradu

15. Novaković, Mirjana, 1977-. Nanostrukturna karakterizacija tankih slojeva CrN i Co na podlozi od silicijuma, modifikovanih bombardovanjem jonima.

Degree: Fakultet za fizičku hemiju, 2013, Univerzitet u Beogradu

Prirodno-matematička - Fizika / Natural sciences - Physics

Zbog cinjenice da posjeduju svojstva koja se znatno razlikuju od komadnog materijala, tankoslojne strukture su našle primjenu… (more)

Subjects/Keywords: ion implantation; CrN thin films; silicides; IBM technique; TEM analysis; IR spectroscopy; XRD; RBS

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APA (6th Edition):

Novaković, Mirjana, 1. (2013). Nanostrukturna karakterizacija tankih slojeva CrN i Co na podlozi od silicijuma, modifikovanih bombardovanjem jonima. (Thesis). Univerzitet u Beogradu. Retrieved from https://fedorabg.bg.ac.rs/fedora/get/o:5541/bdef:Content/get

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Novaković, Mirjana, 1977-. “Nanostrukturna karakterizacija tankih slojeva CrN i Co na podlozi od silicijuma, modifikovanih bombardovanjem jonima.” 2013. Thesis, Univerzitet u Beogradu. Accessed January 21, 2020. https://fedorabg.bg.ac.rs/fedora/get/o:5541/bdef:Content/get.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Novaković, Mirjana, 1977-. “Nanostrukturna karakterizacija tankih slojeva CrN i Co na podlozi od silicijuma, modifikovanih bombardovanjem jonima.” 2013. Web. 21 Jan 2020.

Vancouver:

Novaković, Mirjana 1. Nanostrukturna karakterizacija tankih slojeva CrN i Co na podlozi od silicijuma, modifikovanih bombardovanjem jonima. [Internet] [Thesis]. Univerzitet u Beogradu; 2013. [cited 2020 Jan 21]. Available from: https://fedorabg.bg.ac.rs/fedora/get/o:5541/bdef:Content/get.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Novaković, Mirjana 1. Nanostrukturna karakterizacija tankih slojeva CrN i Co na podlozi od silicijuma, modifikovanih bombardovanjem jonima. [Thesis]. Univerzitet u Beogradu; 2013. Available from: https://fedorabg.bg.ac.rs/fedora/get/o:5541/bdef:Content/get

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Brno University of Technology

16. Petr, Jiří. Studium nikl-silicidové vrstvy vytvořené přetavením Ni Si vrstvy nanesené elektrochemicky .

Degree: 2018, Brno University of Technology

 Tato diplomová práce se zabývá možností vytvoření kompaktní nikl-silicidové vrstvy na austenitických substrátech. Teoretická část obsahuje popis různých povrchových úprav, dělení silicidů, a základní principy… (more)

Subjects/Keywords: nikl; křemík; difuze; galvanické pokovení; silicidy; elektronový paprsek; Nickel; silicon; diffusion; electroplating; silicides; electron beam

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APA (6th Edition):

Petr, J. (2018). Studium nikl-silicidové vrstvy vytvořené přetavením Ni Si vrstvy nanesené elektrochemicky . (Thesis). Brno University of Technology. Retrieved from http://hdl.handle.net/11012/82314

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Petr, Jiří. “Studium nikl-silicidové vrstvy vytvořené přetavením Ni Si vrstvy nanesené elektrochemicky .” 2018. Thesis, Brno University of Technology. Accessed January 21, 2020. http://hdl.handle.net/11012/82314.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Petr, Jiří. “Studium nikl-silicidové vrstvy vytvořené přetavením Ni Si vrstvy nanesené elektrochemicky .” 2018. Web. 21 Jan 2020.

Vancouver:

Petr J. Studium nikl-silicidové vrstvy vytvořené přetavením Ni Si vrstvy nanesené elektrochemicky . [Internet] [Thesis]. Brno University of Technology; 2018. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/11012/82314.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Petr J. Studium nikl-silicidové vrstvy vytvořené přetavením Ni Si vrstvy nanesené elektrochemicky . [Thesis]. Brno University of Technology; 2018. Available from: http://hdl.handle.net/11012/82314

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Clemson University

17. Srinadhu, Endu Sekhar. Defect Assisted Growth of Copper-Silicide Nanostructures on Si(100) and Si(111).

Degree: PhD, Physics and Astronomy, 2016, Clemson University

  As the dimensions of the smallest feature on the integrated circuit has minia-turized into the range of tens of nanometers, patterning of highly ordered… (more)

Subjects/Keywords: copper silicides; highly charged ions; nanopatterning; nanowires; polycarbonate; strain induced shape transition; Astrophysics and Astronomy

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APA (6th Edition):

Srinadhu, E. S. (2016). Defect Assisted Growth of Copper-Silicide Nanostructures on Si(100) and Si(111). (Doctoral Dissertation). Clemson University. Retrieved from https://tigerprints.clemson.edu/all_dissertations/2305

Chicago Manual of Style (16th Edition):

Srinadhu, Endu Sekhar. “Defect Assisted Growth of Copper-Silicide Nanostructures on Si(100) and Si(111).” 2016. Doctoral Dissertation, Clemson University. Accessed January 21, 2020. https://tigerprints.clemson.edu/all_dissertations/2305.

MLA Handbook (7th Edition):

Srinadhu, Endu Sekhar. “Defect Assisted Growth of Copper-Silicide Nanostructures on Si(100) and Si(111).” 2016. Web. 21 Jan 2020.

Vancouver:

Srinadhu ES. Defect Assisted Growth of Copper-Silicide Nanostructures on Si(100) and Si(111). [Internet] [Doctoral dissertation]. Clemson University; 2016. [cited 2020 Jan 21]. Available from: https://tigerprints.clemson.edu/all_dissertations/2305.

Council of Science Editors:

Srinadhu ES. Defect Assisted Growth of Copper-Silicide Nanostructures on Si(100) and Si(111). [Doctoral Dissertation]. Clemson University; 2016. Available from: https://tigerprints.clemson.edu/all_dissertations/2305


University of North Texas

18. Manandhar, Sudha. Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces.

Degree: 2010, University of North Texas

 NiSi and Ni(Pt)Si, and of the effects of dissociated ammonia on oxide reduction was carried out under controlled ultrahigh vacuum (UHV) conditions. X-ray photoelectron spectroscopy… (more)

Subjects/Keywords: NiSi; radicals; Oxidation.; reduction; Ni(Pt)Si; Nickel.; Silicides.; Free radicals (Chemistry); Reduction (Chemistry); Metallizing.

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APA (6th Edition):

Manandhar, S. (2010). Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc31542/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Manandhar, Sudha. “Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces.” 2010. Thesis, University of North Texas. Accessed January 21, 2020. https://digital.library.unt.edu/ark:/67531/metadc31542/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Manandhar, Sudha. “Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces.” 2010. Web. 21 Jan 2020.

Vancouver:

Manandhar S. Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces. [Internet] [Thesis]. University of North Texas; 2010. [cited 2020 Jan 21]. Available from: https://digital.library.unt.edu/ark:/67531/metadc31542/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Manandhar S. Free Radical Induced Oxidation, Reduction and Metallization of NiSi and Ni(Pt)Si Surfaces. [Thesis]. University of North Texas; 2010. Available from: https://digital.library.unt.edu/ark:/67531/metadc31542/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Chicago

19. Cheng, Jian-Yih. Fundamental Research On Direct Fabrication Of Low Dimensional Nanomaterials On Si Substrates.

Degree: 2017, University of Illinois – Chicago

 Continuous demand for improvements to reduced electronic sizes, increased processor density, and faster performance of electronics have led researchers to study low dimensional nanomaterials for… (more)

Subjects/Keywords: Graphene; silicides; low-dimension nanostructures; quantum dots; charge density; silicene; band gap; charge ordering

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APA (6th Edition):

Cheng, J. (2017). Fundamental Research On Direct Fabrication Of Low Dimensional Nanomaterials On Si Substrates. (Thesis). University of Illinois – Chicago. Retrieved from http://hdl.handle.net/10027/21945

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Cheng, Jian-Yih. “Fundamental Research On Direct Fabrication Of Low Dimensional Nanomaterials On Si Substrates.” 2017. Thesis, University of Illinois – Chicago. Accessed January 21, 2020. http://hdl.handle.net/10027/21945.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Cheng, Jian-Yih. “Fundamental Research On Direct Fabrication Of Low Dimensional Nanomaterials On Si Substrates.” 2017. Web. 21 Jan 2020.

Vancouver:

Cheng J. Fundamental Research On Direct Fabrication Of Low Dimensional Nanomaterials On Si Substrates. [Internet] [Thesis]. University of Illinois – Chicago; 2017. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/10027/21945.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Cheng J. Fundamental Research On Direct Fabrication Of Low Dimensional Nanomaterials On Si Substrates. [Thesis]. University of Illinois – Chicago; 2017. Available from: http://hdl.handle.net/10027/21945

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


New Jersey Institute of Technology

20. Song, Young Joo. Residual stress analysis of sputtered Tantalum Silicide thin film.

Degree: MSin Electrical Engineering - (M.S.), Electrical Engineering, 1996, New Jersey Institute of Technology

  The influence of different argon pressures on the residual stress, microstructure, and resisitivity of sputtered tantalum silicide thin films has been investigated. TaSi2 films… (more)

Subjects/Keywords: Silicides.; Tantalum films.; Electrical and Electronics

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APA (6th Edition):

Song, Y. J. (1996). Residual stress analysis of sputtered Tantalum Silicide thin film. (Thesis). New Jersey Institute of Technology. Retrieved from https://digitalcommons.njit.edu/theses/1124

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Song, Young Joo. “Residual stress analysis of sputtered Tantalum Silicide thin film.” 1996. Thesis, New Jersey Institute of Technology. Accessed January 21, 2020. https://digitalcommons.njit.edu/theses/1124.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Song, Young Joo. “Residual stress analysis of sputtered Tantalum Silicide thin film.” 1996. Web. 21 Jan 2020.

Vancouver:

Song YJ. Residual stress analysis of sputtered Tantalum Silicide thin film. [Internet] [Thesis]. New Jersey Institute of Technology; 1996. [cited 2020 Jan 21]. Available from: https://digitalcommons.njit.edu/theses/1124.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Song YJ. Residual stress analysis of sputtered Tantalum Silicide thin film. [Thesis]. New Jersey Institute of Technology; 1996. Available from: https://digitalcommons.njit.edu/theses/1124

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Texas – Austin

21. Chen, Xi, active 21st century. Synthesis and thermoelectric properties of higher manganese silicides for waste heat recovery.

Degree: PhD, Materials Science and Enigneering, 2014, University of Texas – Austin

 Thermoelectric (TE) materials, which can convert temperature gradients directly into electricity and vice versa, have received renewed interest for waste heat recovery and refrigeration applications.… (more)

Subjects/Keywords: Thermoelectric; Higher manganese silicides; Phonon dispersion; (Al,Ge) doping; Re doping; Nanostructures

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APA (6th Edition):

Chen, Xi, a. 2. c. (2014). Synthesis and thermoelectric properties of higher manganese silicides for waste heat recovery. (Doctoral Dissertation). University of Texas – Austin. Retrieved from http://hdl.handle.net/2152/28047

Chicago Manual of Style (16th Edition):

Chen, Xi, active 21st century. “Synthesis and thermoelectric properties of higher manganese silicides for waste heat recovery.” 2014. Doctoral Dissertation, University of Texas – Austin. Accessed January 21, 2020. http://hdl.handle.net/2152/28047.

MLA Handbook (7th Edition):

Chen, Xi, active 21st century. “Synthesis and thermoelectric properties of higher manganese silicides for waste heat recovery.” 2014. Web. 21 Jan 2020.

Vancouver:

Chen, Xi a2c. Synthesis and thermoelectric properties of higher manganese silicides for waste heat recovery. [Internet] [Doctoral dissertation]. University of Texas – Austin; 2014. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/2152/28047.

Council of Science Editors:

Chen, Xi a2c. Synthesis and thermoelectric properties of higher manganese silicides for waste heat recovery. [Doctoral Dissertation]. University of Texas – Austin; 2014. Available from: http://hdl.handle.net/2152/28047


Iowa State University

22. Clyde, Dale Dean. Hydrolysis products of rare earth silicides.

Degree: 1966, Iowa State University

Subjects/Keywords: Rare earth silicides; Hydrolysis; Physical Chemistry

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APA (6th Edition):

Clyde, D. D. (1966). Hydrolysis products of rare earth silicides. (Thesis). Iowa State University. Retrieved from https://lib.dr.iastate.edu/rtd/5352

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Clyde, Dale Dean. “Hydrolysis products of rare earth silicides.” 1966. Thesis, Iowa State University. Accessed January 21, 2020. https://lib.dr.iastate.edu/rtd/5352.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Clyde, Dale Dean. “Hydrolysis products of rare earth silicides.” 1966. Web. 21 Jan 2020.

Vancouver:

Clyde DD. Hydrolysis products of rare earth silicides. [Internet] [Thesis]. Iowa State University; 1966. [cited 2020 Jan 21]. Available from: https://lib.dr.iastate.edu/rtd/5352.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Clyde DD. Hydrolysis products of rare earth silicides. [Thesis]. Iowa State University; 1966. Available from: https://lib.dr.iastate.edu/rtd/5352

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

23. Ribeiro, Lívia de Souza. Determinação dos coeficientes de expansão térmica das fases Ta5Si3 e Cr5Si3 e a investigação da formação da fase (Hf,Ti)5Si3 por difratometria de raios X de alta resolução.

Degree: Mestrado, Materiais Metálicos, Cerâmicos e Poliméricos, 2009, University of São Paulo

Os silicetos de metais de transição têm sido investigados para possíveis aplicações em altas temperaturas. A expansão térmica é uma das principais propriedades a serem… (more)

Subjects/Keywords: Difratometria de raios X; Expansão térmica; Intermetálicos; Intermetallics; Radiação Sincrotron; Silicetos; silicides; syncrotron radiation; Thermal expansion; X-ray diffraction

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APA (6th Edition):

Ribeiro, L. d. S. (2009). Determinação dos coeficientes de expansão térmica das fases Ta5Si3 e Cr5Si3 e a investigação da formação da fase (Hf,Ti)5Si3 por difratometria de raios X de alta resolução. (Masters Thesis). University of São Paulo. Retrieved from http://www.teses.usp.br/teses/disponiveis/97/97134/tde-03102012-122054/ ;

Chicago Manual of Style (16th Edition):

Ribeiro, Lívia de Souza. “Determinação dos coeficientes de expansão térmica das fases Ta5Si3 e Cr5Si3 e a investigação da formação da fase (Hf,Ti)5Si3 por difratometria de raios X de alta resolução.” 2009. Masters Thesis, University of São Paulo. Accessed January 21, 2020. http://www.teses.usp.br/teses/disponiveis/97/97134/tde-03102012-122054/ ;.

MLA Handbook (7th Edition):

Ribeiro, Lívia de Souza. “Determinação dos coeficientes de expansão térmica das fases Ta5Si3 e Cr5Si3 e a investigação da formação da fase (Hf,Ti)5Si3 por difratometria de raios X de alta resolução.” 2009. Web. 21 Jan 2020.

Vancouver:

Ribeiro LdS. Determinação dos coeficientes de expansão térmica das fases Ta5Si3 e Cr5Si3 e a investigação da formação da fase (Hf,Ti)5Si3 por difratometria de raios X de alta resolução. [Internet] [Masters thesis]. University of São Paulo; 2009. [cited 2020 Jan 21]. Available from: http://www.teses.usp.br/teses/disponiveis/97/97134/tde-03102012-122054/ ;.

Council of Science Editors:

Ribeiro LdS. Determinação dos coeficientes de expansão térmica das fases Ta5Si3 e Cr5Si3 e a investigação da formação da fase (Hf,Ti)5Si3 por difratometria de raios X de alta resolução. [Masters Thesis]. University of São Paulo; 2009. Available from: http://www.teses.usp.br/teses/disponiveis/97/97134/tde-03102012-122054/ ;

24. Gigolotti, João Carlos Jânio. Avaliação experimental das relações de fases da seção isotérmica a 1600°C e da projeção liquidus na região rica em háfnio do sistema háfnio-silicio-boro\".

Degree: PhD, Materiais Metálicos, Cerâmicos e Poliméricos, 2012, University of São Paulo

 Atualmente, existe uma grande demanda por materiais caracterizados por um balanço adequado de propriedades, para aplicações estruturais em altas temperaturas. Superligas de última geração a… (more)

Subjects/Keywords: Boretos; borides; Diagrama de fases; Hf-Si-B system; phase diagram; Silicetos; silicides; Sistema Hf-Si-B

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APA (6th Edition):

Gigolotti, J. C. J. (2012). Avaliação experimental das relações de fases da seção isotérmica a 1600°C e da projeção liquidus na região rica em háfnio do sistema háfnio-silicio-boro\". (Doctoral Dissertation). University of São Paulo. Retrieved from http://www.teses.usp.br/teses/disponiveis/97/97134/tde-27082013-100310/ ;

Chicago Manual of Style (16th Edition):

Gigolotti, João Carlos Jânio. “Avaliação experimental das relações de fases da seção isotérmica a 1600°C e da projeção liquidus na região rica em háfnio do sistema háfnio-silicio-boro\".” 2012. Doctoral Dissertation, University of São Paulo. Accessed January 21, 2020. http://www.teses.usp.br/teses/disponiveis/97/97134/tde-27082013-100310/ ;.

MLA Handbook (7th Edition):

Gigolotti, João Carlos Jânio. “Avaliação experimental das relações de fases da seção isotérmica a 1600°C e da projeção liquidus na região rica em háfnio do sistema háfnio-silicio-boro\".” 2012. Web. 21 Jan 2020.

Vancouver:

Gigolotti JCJ. Avaliação experimental das relações de fases da seção isotérmica a 1600°C e da projeção liquidus na região rica em háfnio do sistema háfnio-silicio-boro\". [Internet] [Doctoral dissertation]. University of São Paulo; 2012. [cited 2020 Jan 21]. Available from: http://www.teses.usp.br/teses/disponiveis/97/97134/tde-27082013-100310/ ;.

Council of Science Editors:

Gigolotti JCJ. Avaliação experimental das relações de fases da seção isotérmica a 1600°C e da projeção liquidus na região rica em háfnio do sistema háfnio-silicio-boro\". [Doctoral Dissertation]. University of São Paulo; 2012. Available from: http://www.teses.usp.br/teses/disponiveis/97/97134/tde-27082013-100310/ ;


University of Florida

25. Kim,Dukjin. Parallel Simulation of Nickel Silicide Silicon and Nickel Silicide Gallium Arsenide Contact Resistance in a Wide Doping Range.

Degree: MS, Electrical and Computer Engineering, 2011, University of Florida

 Scaling of solid-state devices has been successful during the past 40 years. As device feature size reduced, the density of transistors in a single chip… (more)

Subjects/Keywords: Algorithms; Atoms; Conduction bands; Contact resistance; Doping; Experimental data; Potential energy; Silicides; Silicon; Simulations; contact  – negf  – parallel  – silicide  – silicon

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APA (6th Edition):

Kim,Dukjin. (2011). Parallel Simulation of Nickel Silicide Silicon and Nickel Silicide Gallium Arsenide Contact Resistance in a Wide Doping Range. (Masters Thesis). University of Florida. Retrieved from http://ufdc.ufl.edu/UFE0043426

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Chicago Manual of Style (16th Edition):

Kim,Dukjin. “Parallel Simulation of Nickel Silicide Silicon and Nickel Silicide Gallium Arsenide Contact Resistance in a Wide Doping Range.” 2011. Masters Thesis, University of Florida. Accessed January 21, 2020. http://ufdc.ufl.edu/UFE0043426.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

MLA Handbook (7th Edition):

Kim,Dukjin. “Parallel Simulation of Nickel Silicide Silicon and Nickel Silicide Gallium Arsenide Contact Resistance in a Wide Doping Range.” 2011. Web. 21 Jan 2020.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Vancouver:

Kim,Dukjin. Parallel Simulation of Nickel Silicide Silicon and Nickel Silicide Gallium Arsenide Contact Resistance in a Wide Doping Range. [Internet] [Masters thesis]. University of Florida; 2011. [cited 2020 Jan 21]. Available from: http://ufdc.ufl.edu/UFE0043426.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Council of Science Editors:

Kim,Dukjin. Parallel Simulation of Nickel Silicide Silicon and Nickel Silicide Gallium Arsenide Contact Resistance in a Wide Doping Range. [Masters Thesis]. University of Florida; 2011. Available from: http://ufdc.ufl.edu/UFE0043426

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete


University of Florida

26. Gao, Qun. Contact Resistance in Semiconductor Devices Physics and Modeling.

Degree: PhD, Electrical and Computer Engineering, 2014, University of Florida

 As the channel length of modern MOSFETs shrinks into nanoscale regime, the parasitic resistance severely limits the device performance. Among all the components of parasitic… (more)

Subjects/Keywords: Atomic structure; Atoms; Contact resistance; Doping; Electrons; Graphene; Semiconductors; Silicides; Silicon; Simulations; ab-initio  – contact-resistance  – modeling

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APA (6th Edition):

Gao, Q. (2014). Contact Resistance in Semiconductor Devices Physics and Modeling. (Doctoral Dissertation). University of Florida. Retrieved from http://ufdc.ufl.edu/UFE0047086

Chicago Manual of Style (16th Edition):

Gao, Qun. “Contact Resistance in Semiconductor Devices Physics and Modeling.” 2014. Doctoral Dissertation, University of Florida. Accessed January 21, 2020. http://ufdc.ufl.edu/UFE0047086.

MLA Handbook (7th Edition):

Gao, Qun. “Contact Resistance in Semiconductor Devices Physics and Modeling.” 2014. Web. 21 Jan 2020.

Vancouver:

Gao Q. Contact Resistance in Semiconductor Devices Physics and Modeling. [Internet] [Doctoral dissertation]. University of Florida; 2014. [cited 2020 Jan 21]. Available from: http://ufdc.ufl.edu/UFE0047086.

Council of Science Editors:

Gao Q. Contact Resistance in Semiconductor Devices Physics and Modeling. [Doctoral Dissertation]. University of Florida; 2014. Available from: http://ufdc.ufl.edu/UFE0047086


University of Florida

27. Mohan, Rohit. Effects of Annealing on the Performance of Silicon Thin Film Anodes.

Degree: MS, Materials Science and Engineering, 2014, University of Florida

 Lithium ion batteries are used to power portable electronic devices and hybrid electric vehicles, and hold great potential for future energy storage. The current technology… (more)

Subjects/Keywords: Annealing; Anodes; Electrodes; Electrons; Ions; Lithium; Pouches; Silicides; Silicon; Specimens; annealing  – anode  – native-oxide  – silicon  – stainless-steel  – thin-films

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APA (6th Edition):

Mohan, R. (2014). Effects of Annealing on the Performance of Silicon Thin Film Anodes. (Masters Thesis). University of Florida. Retrieved from http://ufdc.ufl.edu/UFE0046757

Chicago Manual of Style (16th Edition):

Mohan, Rohit. “Effects of Annealing on the Performance of Silicon Thin Film Anodes.” 2014. Masters Thesis, University of Florida. Accessed January 21, 2020. http://ufdc.ufl.edu/UFE0046757.

MLA Handbook (7th Edition):

Mohan, Rohit. “Effects of Annealing on the Performance of Silicon Thin Film Anodes.” 2014. Web. 21 Jan 2020.

Vancouver:

Mohan R. Effects of Annealing on the Performance of Silicon Thin Film Anodes. [Internet] [Masters thesis]. University of Florida; 2014. [cited 2020 Jan 21]. Available from: http://ufdc.ufl.edu/UFE0046757.

Council of Science Editors:

Mohan R. Effects of Annealing on the Performance of Silicon Thin Film Anodes. [Masters Thesis]. University of Florida; 2014. Available from: http://ufdc.ufl.edu/UFE0046757


Université de Montréal

28. Guihard, Matthieu. Effets des recuits ultra-rapides (10^5 K/s) sur la formation des siliciures métalliques en phase solide .

Degree: 2016, Université de Montréal

 La synthèse de siliciures métalliques sous la forme de films ultra-minces demeure un enjeu majeur en technologie CMOS. Le contrôle du budget thermique, afin de… (more)

Subjects/Keywords: Siliciures métalliques; Nanocalorimétrie; Recuit ultra-rapide; Films minces; Nickel; Metal silicides; Nanocalorimetry; Ultra-fast annealing; Thin films

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APA (6th Edition):

Guihard, M. (2016). Effets des recuits ultra-rapides (10^5 K/s) sur la formation des siliciures métalliques en phase solide . (Thesis). Université de Montréal. Retrieved from http://hdl.handle.net/1866/13708

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Guihard, Matthieu. “Effets des recuits ultra-rapides (10^5 K/s) sur la formation des siliciures métalliques en phase solide .” 2016. Thesis, Université de Montréal. Accessed January 21, 2020. http://hdl.handle.net/1866/13708.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Guihard, Matthieu. “Effets des recuits ultra-rapides (10^5 K/s) sur la formation des siliciures métalliques en phase solide .” 2016. Web. 21 Jan 2020.

Vancouver:

Guihard M. Effets des recuits ultra-rapides (10^5 K/s) sur la formation des siliciures métalliques en phase solide . [Internet] [Thesis]. Université de Montréal; 2016. [cited 2020 Jan 21]. Available from: http://hdl.handle.net/1866/13708.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Guihard M. Effets des recuits ultra-rapides (10^5 K/s) sur la formation des siliciures métalliques en phase solide . [Thesis]. Université de Montréal; 2016. Available from: http://hdl.handle.net/1866/13708

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

29. Allam, Ali. Stability of manganese silicides of the HMS type. Alloying effect on their electronic properties : Investigation on laser-matter interaction in the nanosecond regime under multi-pulse irradiation : application to optical components for the UV.

Degree: Docteur es, Matière condensée et Nanosciences, 2013, Aix Marseille Université

Les matériaux thermoélectriques en tant que générateurs d’électricité peuvent être utilisés dans de nombreux domaines tels que la conversion de la chaleur perdue des automobiles… (more)

Subjects/Keywords: Matériaux; Thermoélectriques; Manganèse; Siliciures; Stabilité; Phase; Mn4Si7; Substitution; DFT; Boltzmann; Materials; Thermoelectrics; Manganese; Silicides; Stability; Phase; Mn4Si7; Substitution; DFT; Boltzmann

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APA (6th Edition):

Allam, A. (2013). Stability of manganese silicides of the HMS type. Alloying effect on their electronic properties : Investigation on laser-matter interaction in the nanosecond regime under multi-pulse irradiation : application to optical components for the UV. (Doctoral Dissertation). Aix Marseille Université. Retrieved from http://www.theses.fr/2013AIXM4327

Chicago Manual of Style (16th Edition):

Allam, Ali. “Stability of manganese silicides of the HMS type. Alloying effect on their electronic properties : Investigation on laser-matter interaction in the nanosecond regime under multi-pulse irradiation : application to optical components for the UV.” 2013. Doctoral Dissertation, Aix Marseille Université. Accessed January 21, 2020. http://www.theses.fr/2013AIXM4327.

MLA Handbook (7th Edition):

Allam, Ali. “Stability of manganese silicides of the HMS type. Alloying effect on their electronic properties : Investigation on laser-matter interaction in the nanosecond regime under multi-pulse irradiation : application to optical components for the UV.” 2013. Web. 21 Jan 2020.

Vancouver:

Allam A. Stability of manganese silicides of the HMS type. Alloying effect on their electronic properties : Investigation on laser-matter interaction in the nanosecond regime under multi-pulse irradiation : application to optical components for the UV. [Internet] [Doctoral dissertation]. Aix Marseille Université 2013. [cited 2020 Jan 21]. Available from: http://www.theses.fr/2013AIXM4327.

Council of Science Editors:

Allam A. Stability of manganese silicides of the HMS type. Alloying effect on their electronic properties : Investigation on laser-matter interaction in the nanosecond regime under multi-pulse irradiation : application to optical components for the UV. [Doctoral Dissertation]. Aix Marseille Université 2013. Available from: http://www.theses.fr/2013AIXM4327

30. Knittel, Stéphane. Elaboration et caractérisation du comportement en oxydation d'alliages composites à base de niobium et de siliciures de type M7Si6 et M8Si7 envisagés comme revêtements protecteurs : Elaboration and characterisation of the oxidation behaviour of new niobium-silicidebased in situ composites and M7Si6 and M8Si7-type silicides considered as protective coatings.

Degree: Docteur es, Sciences des matériaux, 2011, Université Henri Poincaré – Nancy I

L'amélioration du rendement des turboréacteurs requiert un accroissement de leur température de service. Le développement de nouveaux alliages, issus du système Nb-Si, permet d'envisager des… (more)

Subjects/Keywords: Oxydation; Haute température; Alliages réfractaires; Niobium; Siliciures; Pack cémentation; Oxidation; High temperature; Refractory alloys; Niobium; Silicides; Pack cementation; 620.16

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APA (6th Edition):

Knittel, S. (2011). Elaboration et caractérisation du comportement en oxydation d'alliages composites à base de niobium et de siliciures de type M7Si6 et M8Si7 envisagés comme revêtements protecteurs : Elaboration and characterisation of the oxidation behaviour of new niobium-silicidebased in situ composites and M7Si6 and M8Si7-type silicides considered as protective coatings. (Doctoral Dissertation). Université Henri Poincaré – Nancy I. Retrieved from http://www.theses.fr/2011NAN10127

Chicago Manual of Style (16th Edition):

Knittel, Stéphane. “Elaboration et caractérisation du comportement en oxydation d'alliages composites à base de niobium et de siliciures de type M7Si6 et M8Si7 envisagés comme revêtements protecteurs : Elaboration and characterisation of the oxidation behaviour of new niobium-silicidebased in situ composites and M7Si6 and M8Si7-type silicides considered as protective coatings.” 2011. Doctoral Dissertation, Université Henri Poincaré – Nancy I. Accessed January 21, 2020. http://www.theses.fr/2011NAN10127.

MLA Handbook (7th Edition):

Knittel, Stéphane. “Elaboration et caractérisation du comportement en oxydation d'alliages composites à base de niobium et de siliciures de type M7Si6 et M8Si7 envisagés comme revêtements protecteurs : Elaboration and characterisation of the oxidation behaviour of new niobium-silicidebased in situ composites and M7Si6 and M8Si7-type silicides considered as protective coatings.” 2011. Web. 21 Jan 2020.

Vancouver:

Knittel S. Elaboration et caractérisation du comportement en oxydation d'alliages composites à base de niobium et de siliciures de type M7Si6 et M8Si7 envisagés comme revêtements protecteurs : Elaboration and characterisation of the oxidation behaviour of new niobium-silicidebased in situ composites and M7Si6 and M8Si7-type silicides considered as protective coatings. [Internet] [Doctoral dissertation]. Université Henri Poincaré – Nancy I; 2011. [cited 2020 Jan 21]. Available from: http://www.theses.fr/2011NAN10127.

Council of Science Editors:

Knittel S. Elaboration et caractérisation du comportement en oxydation d'alliages composites à base de niobium et de siliciures de type M7Si6 et M8Si7 envisagés comme revêtements protecteurs : Elaboration and characterisation of the oxidation behaviour of new niobium-silicidebased in situ composites and M7Si6 and M8Si7-type silicides considered as protective coatings. [Doctoral Dissertation]. Université Henri Poincaré – Nancy I; 2011. Available from: http://www.theses.fr/2011NAN10127

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