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Brno University of Technology

1. Lysáček, David. Tenké vrstvy polykrystalického křemíku: Thin Films of Polycrystalline Silicon.

Degree: 2018, Brno University of Technology

The doctoral thesis deals with the structure and properties of the polycrystalline silicon layers deposited on the silicon wafers backside. The wafers are further used for production of semiconductor devices. This work is focused on detailed description of the layers structure and study of the gettering properties and residual stress of the layers. The main goal of this work is to develop two novel technologies. The first one leads to improvement of the temperature stability of the gettering properties of the layers, and the second one solves the deposition of the layers with pre-determined residual stress. This doctoral thesis was created with the support of the company ON Semiconductor Czech Republic, Rožnov pod Radhoštěm. Advisors/Committee Members: Spousta, Jiří (advisor), Schmidt, Eduard (referee), Fejfar, Antonín (referee).

Subjects/Keywords: polykrystalický křemík; getrace; multivrstevnaté struktury; chemická depozice z plynné fáze; polycrystalline silicon; gettering; multilayer structure; chemical vapor deposition

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Lysáček, D. (2018). Tenké vrstvy polykrystalického křemíku: Thin Films of Polycrystalline Silicon. (Thesis). Brno University of Technology. Retrieved from http://hdl.handle.net/11012/7145

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lysáček, David. “Tenké vrstvy polykrystalického křemíku: Thin Films of Polycrystalline Silicon.” 2018. Thesis, Brno University of Technology. Accessed April 14, 2021. http://hdl.handle.net/11012/7145.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lysáček, David. “Tenké vrstvy polykrystalického křemíku: Thin Films of Polycrystalline Silicon.” 2018. Web. 14 Apr 2021.

Vancouver:

Lysáček D. Tenké vrstvy polykrystalického křemíku: Thin Films of Polycrystalline Silicon. [Internet] [Thesis]. Brno University of Technology; 2018. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/11012/7145.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lysáček D. Tenké vrstvy polykrystalického křemíku: Thin Films of Polycrystalline Silicon. [Thesis]. Brno University of Technology; 2018. Available from: http://hdl.handle.net/11012/7145

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

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