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You searched for subject:(etching). Showing records 1 – 30 of 805 total matches.

[1] [2] [3] [4] [5] … [27]

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Rochester Institute of Technology

1. Bennett, Sulyn. Conflict within the continuum.

Degree: School of Art (CIAS), 1997, Rochester Institute of Technology

None provided. Advisors/Committee Members: Williams, Judd.

Subjects/Keywords: Etching

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APA (6th Edition):

Bennett, S. (1997). Conflict within the continuum. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/3611

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Bennett, Sulyn. “Conflict within the continuum.” 1997. Thesis, Rochester Institute of Technology. Accessed October 28, 2020. https://scholarworks.rit.edu/theses/3611.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Bennett, Sulyn. “Conflict within the continuum.” 1997. Web. 28 Oct 2020.

Vancouver:

Bennett S. Conflict within the continuum. [Internet] [Thesis]. Rochester Institute of Technology; 1997. [cited 2020 Oct 28]. Available from: https://scholarworks.rit.edu/theses/3611.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Bennett S. Conflict within the continuum. [Thesis]. Rochester Institute of Technology; 1997. Available from: https://scholarworks.rit.edu/theses/3611

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Urbana-Champaign

2. Udupa, Aditi. Development of photochemical etching and its application in fabrication of integrated reflector metal semiconductor metal photodetectors.

Degree: MS, Electrical & Computer Engr, 2017, University of Illinois – Urbana-Champaign

 Photolithography and etching form the basis of any microfabrication process. Consequently, there is a lot of interest in the research community to improve and innovate… (more)

Subjects/Keywords: Photochemical; Etching

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APA (6th Edition):

Udupa, A. (2017). Development of photochemical etching and its application in fabrication of integrated reflector metal semiconductor metal photodetectors. (Thesis). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/97782

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Udupa, Aditi. “Development of photochemical etching and its application in fabrication of integrated reflector metal semiconductor metal photodetectors.” 2017. Thesis, University of Illinois – Urbana-Champaign. Accessed October 28, 2020. http://hdl.handle.net/2142/97782.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Udupa, Aditi. “Development of photochemical etching and its application in fabrication of integrated reflector metal semiconductor metal photodetectors.” 2017. Web. 28 Oct 2020.

Vancouver:

Udupa A. Development of photochemical etching and its application in fabrication of integrated reflector metal semiconductor metal photodetectors. [Internet] [Thesis]. University of Illinois – Urbana-Champaign; 2017. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/2142/97782.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Udupa A. Development of photochemical etching and its application in fabrication of integrated reflector metal semiconductor metal photodetectors. [Thesis]. University of Illinois – Urbana-Champaign; 2017. Available from: http://hdl.handle.net/2142/97782

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Houston

3. Zhu, Weiye 1987-. Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching.

Degree: PhD, Chemical Engineering, 2014, University of Houston

 Precise control of ion energy distribution (IED) is critical to achieve highly selective, low damage etching. A novel approach to control IED using pulsed plasma… (more)

Subjects/Keywords: Plasma etching; IED; Photo-assisted etching; EEDF

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APA (6th Edition):

Zhu, W. 1. (2014). Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching. (Doctoral Dissertation). University of Houston. Retrieved from http://hdl.handle.net/10657/1385

Chicago Manual of Style (16th Edition):

Zhu, Weiye 1987-. “Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching.” 2014. Doctoral Dissertation, University of Houston. Accessed October 28, 2020. http://hdl.handle.net/10657/1385.

MLA Handbook (7th Edition):

Zhu, Weiye 1987-. “Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching.” 2014. Web. 28 Oct 2020.

Vancouver:

Zhu W1. Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching. [Internet] [Doctoral dissertation]. University of Houston; 2014. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/10657/1385.

Council of Science Editors:

Zhu W1. Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching. [Doctoral Dissertation]. University of Houston; 2014. Available from: http://hdl.handle.net/10657/1385


UCLA

4. Altieri, Nicholas Dominic. Atomic Layer Etching of Magnetic and Noble Metals.

Degree: Chemical Engineering, 2018, UCLA

 This work has focused on the study and development of atomic layer etching for metallic and intermetallic thin films commonly used in front and back… (more)

Subjects/Keywords: Chemical engineering; atomic layer etching; interconnect; magnetic metal; noble metal; plasma etching; reactive ion etching

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APA (6th Edition):

Altieri, N. D. (2018). Atomic Layer Etching of Magnetic and Noble Metals. (Thesis). UCLA. Retrieved from http://www.escholarship.org/uc/item/28m072gc

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Altieri, Nicholas Dominic. “Atomic Layer Etching of Magnetic and Noble Metals.” 2018. Thesis, UCLA. Accessed October 28, 2020. http://www.escholarship.org/uc/item/28m072gc.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Altieri, Nicholas Dominic. “Atomic Layer Etching of Magnetic and Noble Metals.” 2018. Web. 28 Oct 2020.

Vancouver:

Altieri ND. Atomic Layer Etching of Magnetic and Noble Metals. [Internet] [Thesis]. UCLA; 2018. [cited 2020 Oct 28]. Available from: http://www.escholarship.org/uc/item/28m072gc.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Altieri ND. Atomic Layer Etching of Magnetic and Noble Metals. [Thesis]. UCLA; 2018. Available from: http://www.escholarship.org/uc/item/28m072gc

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Colorado

5. Johnson, Nicholas Ray. Atomic Layer Etching of Metal Films, Metal Nitrides, and Metal Oxides with Bcl3 and Xef2.

Degree: PhD, 2019, University of Colorado

 The continued miniaturization and increase in architectural complexity of transistor-based devices require new process methods. One such method is called atomic layer etching (ALE). ALE… (more)

Subjects/Keywords: atomic layer etching; thermal atomic layer etching; crystalline atomic etching; Chemistry; Materials Chemistry

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APA (6th Edition):

Johnson, N. R. (2019). Atomic Layer Etching of Metal Films, Metal Nitrides, and Metal Oxides with Bcl3 and Xef2. (Doctoral Dissertation). University of Colorado. Retrieved from https://scholar.colorado.edu/chemistry_gradetds/7

Chicago Manual of Style (16th Edition):

Johnson, Nicholas Ray. “Atomic Layer Etching of Metal Films, Metal Nitrides, and Metal Oxides with Bcl3 and Xef2.” 2019. Doctoral Dissertation, University of Colorado. Accessed October 28, 2020. https://scholar.colorado.edu/chemistry_gradetds/7.

MLA Handbook (7th Edition):

Johnson, Nicholas Ray. “Atomic Layer Etching of Metal Films, Metal Nitrides, and Metal Oxides with Bcl3 and Xef2.” 2019. Web. 28 Oct 2020.

Vancouver:

Johnson NR. Atomic Layer Etching of Metal Films, Metal Nitrides, and Metal Oxides with Bcl3 and Xef2. [Internet] [Doctoral dissertation]. University of Colorado; 2019. [cited 2020 Oct 28]. Available from: https://scholar.colorado.edu/chemistry_gradetds/7.

Council of Science Editors:

Johnson NR. Atomic Layer Etching of Metal Films, Metal Nitrides, and Metal Oxides with Bcl3 and Xef2. [Doctoral Dissertation]. University of Colorado; 2019. Available from: https://scholar.colorado.edu/chemistry_gradetds/7


Oregon State University

6. Venkataraman, Arjun. Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures.

Degree: MS, Chemical Engineering, 2004, Oregon State University

Subjects/Keywords: Plasma etching

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APA (6th Edition):

Venkataraman, A. (2004). Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/29838

Chicago Manual of Style (16th Edition):

Venkataraman, Arjun. “Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures.” 2004. Masters Thesis, Oregon State University. Accessed October 28, 2020. http://hdl.handle.net/1957/29838.

MLA Handbook (7th Edition):

Venkataraman, Arjun. “Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures.” 2004. Web. 28 Oct 2020.

Vancouver:

Venkataraman A. Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures. [Internet] [Masters thesis]. Oregon State University; 2004. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/1957/29838.

Council of Science Editors:

Venkataraman A. Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures. [Masters Thesis]. Oregon State University; 2004. Available from: http://hdl.handle.net/1957/29838


Stellenbosch University

7. Buttner, Ulrich. The development of equipment for the fabrication of thin film superconductor and nano structures.

Degree: Electrical and Electronic Engineering, 2011, Stellenbosch University

Thesis (MScEng (Electrical and Electronic Engineering)) – University of Stellenbosch, 2011.

ENGLISH ABSTRACT: The nano-age is more about the mesoscopic phenomena, than those occurring at molecular… (more)

Subjects/Keywords: Electronic engineering; Nanotechnology; Dry etching

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APA (6th Edition):

Buttner, U. (2011). The development of equipment for the fabrication of thin film superconductor and nano structures. (Thesis). Stellenbosch University. Retrieved from http://hdl.handle.net/10019.1/6595

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Buttner, Ulrich. “The development of equipment for the fabrication of thin film superconductor and nano structures.” 2011. Thesis, Stellenbosch University. Accessed October 28, 2020. http://hdl.handle.net/10019.1/6595.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Buttner, Ulrich. “The development of equipment for the fabrication of thin film superconductor and nano structures.” 2011. Web. 28 Oct 2020.

Vancouver:

Buttner U. The development of equipment for the fabrication of thin film superconductor and nano structures. [Internet] [Thesis]. Stellenbosch University; 2011. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/10019.1/6595.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Buttner U. The development of equipment for the fabrication of thin film superconductor and nano structures. [Thesis]. Stellenbosch University; 2011. Available from: http://hdl.handle.net/10019.1/6595

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Tasmania

8. Rees-Pagh, YD. Printmaking and the language of violence.

Degree: 2013, University of Tasmania

 The aim of the project is to demonstrate that the traditional processes of printmaking, in particular etching, are relevant as a medium for artistic engagement… (more)

Subjects/Keywords: Printmaking; etching; violence; racism; Cronulla

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APA (6th Edition):

Rees-Pagh, Y. (2013). Printmaking and the language of violence. (Thesis). University of Tasmania. Retrieved from https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Rees-Pagh, YD. “Printmaking and the language of violence.” 2013. Thesis, University of Tasmania. Accessed October 28, 2020. https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Rees-Pagh, YD. “Printmaking and the language of violence.” 2013. Web. 28 Oct 2020.

Vancouver:

Rees-Pagh Y. Printmaking and the language of violence. [Internet] [Thesis]. University of Tasmania; 2013. [cited 2020 Oct 28]. Available from: https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Rees-Pagh Y. Printmaking and the language of violence. [Thesis]. University of Tasmania; 2013. Available from: https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Oregon State University

9. Hsu, Chia-Chang. Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma.

Degree: PhD, Chemical Engineering, 1999, Oregon State University

Subjects/Keywords: Plasma etching

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APA (6th Edition):

Hsu, C. (1999). Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/33505

Chicago Manual of Style (16th Edition):

Hsu, Chia-Chang. “Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma.” 1999. Doctoral Dissertation, Oregon State University. Accessed October 28, 2020. http://hdl.handle.net/1957/33505.

MLA Handbook (7th Edition):

Hsu, Chia-Chang. “Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma.” 1999. Web. 28 Oct 2020.

Vancouver:

Hsu C. Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma. [Internet] [Doctoral dissertation]. Oregon State University; 1999. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/1957/33505.

Council of Science Editors:

Hsu C. Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma. [Doctoral Dissertation]. Oregon State University; 1999. Available from: http://hdl.handle.net/1957/33505


Texas A&M University

10. Li, Mingqian. Geometry and Capping Layer Effect on Copper Lines Electromigration Test.

Degree: MS, Electrical Engineering, 2019, Texas A&M University

 Copper (Cu) interconnect lines are widely used in advanced, high-density integrated circuits (ICs), large-area flat panel displays, and many nano and microelectronic and optoelectronic products.… (more)

Subjects/Keywords: Plasma based Cu etching; Electromigration

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APA (6th Edition):

Li, M. (2019). Geometry and Capping Layer Effect on Copper Lines Electromigration Test. (Masters Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/188761

Chicago Manual of Style (16th Edition):

Li, Mingqian. “Geometry and Capping Layer Effect on Copper Lines Electromigration Test.” 2019. Masters Thesis, Texas A&M University. Accessed October 28, 2020. http://hdl.handle.net/1969.1/188761.

MLA Handbook (7th Edition):

Li, Mingqian. “Geometry and Capping Layer Effect on Copper Lines Electromigration Test.” 2019. Web. 28 Oct 2020.

Vancouver:

Li M. Geometry and Capping Layer Effect on Copper Lines Electromigration Test. [Internet] [Masters thesis]. Texas A&M University; 2019. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/1969.1/188761.

Council of Science Editors:

Li M. Geometry and Capping Layer Effect on Copper Lines Electromigration Test. [Masters Thesis]. Texas A&M University; 2019. Available from: http://hdl.handle.net/1969.1/188761


Colorado State University

11. Conley, Allison. Psychosomatic condition: prints as symptoms, A.

Degree: Master of Fine Arts (M.F.A.), Art and Art History, 2015, Colorado State University

 To transcend my standard way of art making, I have revoked all intent or previous purpose. I work intuitively, reacting to each mark as it… (more)

Subjects/Keywords: intaglio; printmaking; lithography; etching

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APA (6th Edition):

Conley, A. (2015). Psychosomatic condition: prints as symptoms, A. (Masters Thesis). Colorado State University. Retrieved from http://hdl.handle.net/10217/167033

Chicago Manual of Style (16th Edition):

Conley, Allison. “Psychosomatic condition: prints as symptoms, A.” 2015. Masters Thesis, Colorado State University. Accessed October 28, 2020. http://hdl.handle.net/10217/167033.

MLA Handbook (7th Edition):

Conley, Allison. “Psychosomatic condition: prints as symptoms, A.” 2015. Web. 28 Oct 2020.

Vancouver:

Conley A. Psychosomatic condition: prints as symptoms, A. [Internet] [Masters thesis]. Colorado State University; 2015. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/10217/167033.

Council of Science Editors:

Conley A. Psychosomatic condition: prints as symptoms, A. [Masters Thesis]. Colorado State University; 2015. Available from: http://hdl.handle.net/10217/167033


Hong Kong University of Science and Technology

12. Zhang, Jingcheng. Processing of hierarchical topography on titanium substrate.

Degree: 2014, Hong Kong University of Science and Technology

 Biomaterial implants have attracted increasing attention in the past few decades in the healthcare field, for the increasing demands for regenerative medicine and the serious… (more)

Subjects/Keywords: Biomedical materials ; Surfaces ; Etching ; Titanium

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APA (6th Edition):

Zhang, J. (2014). Processing of hierarchical topography on titanium substrate. (Thesis). Hong Kong University of Science and Technology. Retrieved from http://repository.ust.hk/ir/Record/1783.1-70860 ; https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Zhang, Jingcheng. “Processing of hierarchical topography on titanium substrate.” 2014. Thesis, Hong Kong University of Science and Technology. Accessed October 28, 2020. http://repository.ust.hk/ir/Record/1783.1-70860 ; https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Zhang, Jingcheng. “Processing of hierarchical topography on titanium substrate.” 2014. Web. 28 Oct 2020.

Vancouver:

Zhang J. Processing of hierarchical topography on titanium substrate. [Internet] [Thesis]. Hong Kong University of Science and Technology; 2014. [cited 2020 Oct 28]. Available from: http://repository.ust.hk/ir/Record/1783.1-70860 ; https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Zhang J. Processing of hierarchical topography on titanium substrate. [Thesis]. Hong Kong University of Science and Technology; 2014. Available from: http://repository.ust.hk/ir/Record/1783.1-70860 ; https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rice University

13. Abramova, Vera. Meniscus-Mask Lithography.

Degree: PhD, Chemistry, 2015, Rice University

 This dissertation describes meniscus-mask lithography (MML): a planar top-down method for the fabrication of precisely positioned narrow graphene nanoribbons (GNRs) and metallic and semiconducting nanowires.… (more)

Subjects/Keywords: lithography; nanofabrication; dry etching; nanowires

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APA (6th Edition):

Abramova, V. (2015). Meniscus-Mask Lithography. (Doctoral Dissertation). Rice University. Retrieved from http://hdl.handle.net/1911/87691

Chicago Manual of Style (16th Edition):

Abramova, Vera. “Meniscus-Mask Lithography.” 2015. Doctoral Dissertation, Rice University. Accessed October 28, 2020. http://hdl.handle.net/1911/87691.

MLA Handbook (7th Edition):

Abramova, Vera. “Meniscus-Mask Lithography.” 2015. Web. 28 Oct 2020.

Vancouver:

Abramova V. Meniscus-Mask Lithography. [Internet] [Doctoral dissertation]. Rice University; 2015. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/1911/87691.

Council of Science Editors:

Abramova V. Meniscus-Mask Lithography. [Doctoral Dissertation]. Rice University; 2015. Available from: http://hdl.handle.net/1911/87691


University of Arizona

14. Hendricks, Douglas Ray, 1958-. REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE .

Degree: 1987, University of Arizona

Subjects/Keywords: Semiconductors  – Etching.

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APA (6th Edition):

Hendricks, Douglas Ray, 1. (1987). REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/276394

Chicago Manual of Style (16th Edition):

Hendricks, Douglas Ray, 1958-. “REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE .” 1987. Masters Thesis, University of Arizona. Accessed October 28, 2020. http://hdl.handle.net/10150/276394.

MLA Handbook (7th Edition):

Hendricks, Douglas Ray, 1958-. “REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE .” 1987. Web. 28 Oct 2020.

Vancouver:

Hendricks, Douglas Ray 1. REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE . [Internet] [Masters thesis]. University of Arizona; 1987. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/10150/276394.

Council of Science Editors:

Hendricks, Douglas Ray 1. REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE . [Masters Thesis]. University of Arizona; 1987. Available from: http://hdl.handle.net/10150/276394


University of Arizona

15. O'Connell, Ryan. COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge .

Degree: 2018, University of Arizona

 In semiconductor manufacturing, the miniaturization of devices has always been a strong driving force in the industry. Making the individual transistors smaller makes it possible… (more)

Subjects/Keywords: Chemistry; COMSOL; Etching; Materials; Modeling

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APA (6th Edition):

O'Connell, R. (2018). COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/630136

Chicago Manual of Style (16th Edition):

O'Connell, Ryan. “COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge .” 2018. Masters Thesis, University of Arizona. Accessed October 28, 2020. http://hdl.handle.net/10150/630136.

MLA Handbook (7th Edition):

O'Connell, Ryan. “COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge .” 2018. Web. 28 Oct 2020.

Vancouver:

O'Connell R. COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge . [Internet] [Masters thesis]. University of Arizona; 2018. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/10150/630136.

Council of Science Editors:

O'Connell R. COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge . [Masters Thesis]. University of Arizona; 2018. Available from: http://hdl.handle.net/10150/630136


University of Arizona

16. Souden, James Gabriel, 1917-. A search for more brilliant color in the etching print .

Degree: 1953, University of Arizona

Subjects/Keywords: Etching.; Color.

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APA (6th Edition):

Souden, James Gabriel, 1. (1953). A search for more brilliant color in the etching print . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/319110

Chicago Manual of Style (16th Edition):

Souden, James Gabriel, 1917-. “A search for more brilliant color in the etching print .” 1953. Masters Thesis, University of Arizona. Accessed October 28, 2020. http://hdl.handle.net/10150/319110.

MLA Handbook (7th Edition):

Souden, James Gabriel, 1917-. “A search for more brilliant color in the etching print .” 1953. Web. 28 Oct 2020.

Vancouver:

Souden, James Gabriel 1. A search for more brilliant color in the etching print . [Internet] [Masters thesis]. University of Arizona; 1953. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/10150/319110.

Council of Science Editors:

Souden, James Gabriel 1. A search for more brilliant color in the etching print . [Masters Thesis]. University of Arizona; 1953. Available from: http://hdl.handle.net/10150/319110


University of North Texas

17. Lambert, Alexander S. Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths.

Degree: 2017, University of North Texas

 The continuously increasing demand for innovation in the miniaturization of microelectronics has driven the need for ever more precise fabrication strategies for device packaging, especially… (more)

Subjects/Keywords: Cu Etching; UV-Vis Spectroscopy

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APA (6th Edition):

Lambert, A. S. (2017). Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc1011880/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lambert, Alexander S. “Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths.” 2017. Thesis, University of North Texas. Accessed October 28, 2020. https://digital.library.unt.edu/ark:/67531/metadc1011880/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lambert, Alexander S. “Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths.” 2017. Web. 28 Oct 2020.

Vancouver:

Lambert AS. Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths. [Internet] [Thesis]. University of North Texas; 2017. [cited 2020 Oct 28]. Available from: https://digital.library.unt.edu/ark:/67531/metadc1011880/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lambert AS. Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths. [Thesis]. University of North Texas; 2017. Available from: https://digital.library.unt.edu/ark:/67531/metadc1011880/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of North Texas

18. Jones, Jason David. Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning.

Degree: 2012, University of North Texas

 In this dissertation, I present the mechanism of graphene hydrogenation via three different electron sources: scanning electron microscopy, e-beam irradiation and H2 and He plasma… (more)

Subjects/Keywords: Thinning,etching; grapheme; graphane; hydrogenation

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APA (6th Edition):

Jones, J. D. (2012). Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc115101/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Jones, Jason David. “Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning.” 2012. Thesis, University of North Texas. Accessed October 28, 2020. https://digital.library.unt.edu/ark:/67531/metadc115101/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Jones, Jason David. “Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning.” 2012. Web. 28 Oct 2020.

Vancouver:

Jones JD. Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning. [Internet] [Thesis]. University of North Texas; 2012. [cited 2020 Oct 28]. Available from: https://digital.library.unt.edu/ark:/67531/metadc115101/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Jones JD. Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning. [Thesis]. University of North Texas; 2012. Available from: https://digital.library.unt.edu/ark:/67531/metadc115101/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Louisiana State University

19. Narayanan, Purnima. Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100).

Degree: MSChE, Chemical Engineering, 2011, Louisiana State University

 Three-dimensional integration techniques have become increasingly popular to meet the ever rising demand of high capacity and reduced package size in microelectronics devices. Through Silicon… (more)

Subjects/Keywords: PHOTOELECTROCHEMICAL ETCHING; MICROSTRUCTURES; SILICON

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APA (6th Edition):

Narayanan, P. (2011). Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100). (Masters Thesis). Louisiana State University. Retrieved from etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273

Chicago Manual of Style (16th Edition):

Narayanan, Purnima. “Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100).” 2011. Masters Thesis, Louisiana State University. Accessed October 28, 2020. etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273.

MLA Handbook (7th Edition):

Narayanan, Purnima. “Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100).” 2011. Web. 28 Oct 2020.

Vancouver:

Narayanan P. Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100). [Internet] [Masters thesis]. Louisiana State University; 2011. [cited 2020 Oct 28]. Available from: etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273.

Council of Science Editors:

Narayanan P. Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100). [Masters Thesis]. Louisiana State University; 2011. Available from: etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273

20. Panduranga, Parashara. Nanofabrication approaches for Group IV photonic MEMS devices.

Degree: PhD, 2020, Bangor University

 Photonics has attracted a great deal of interest due to the rapid growth of the telecommunications industry. As silicon has been studied for decades in… (more)

Subjects/Keywords: Nanofabrication; Integrated Photonics; Etching; MEMS

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APA (6th Edition):

Panduranga, P. (2020). Nanofabrication approaches for Group IV photonic MEMS devices. (Doctoral Dissertation). Bangor University. Retrieved from https://research.bangor.ac.uk/portal/en/theses/nanofabrication-approaches-for-group-iv-photonic-mems-devices(a3529ee4-3a6a-4690-9381-15c1c0dfbc97).html ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.801319

Chicago Manual of Style (16th Edition):

Panduranga, Parashara. “Nanofabrication approaches for Group IV photonic MEMS devices.” 2020. Doctoral Dissertation, Bangor University. Accessed October 28, 2020. https://research.bangor.ac.uk/portal/en/theses/nanofabrication-approaches-for-group-iv-photonic-mems-devices(a3529ee4-3a6a-4690-9381-15c1c0dfbc97).html ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.801319.

MLA Handbook (7th Edition):

Panduranga, Parashara. “Nanofabrication approaches for Group IV photonic MEMS devices.” 2020. Web. 28 Oct 2020.

Vancouver:

Panduranga P. Nanofabrication approaches for Group IV photonic MEMS devices. [Internet] [Doctoral dissertation]. Bangor University; 2020. [cited 2020 Oct 28]. Available from: https://research.bangor.ac.uk/portal/en/theses/nanofabrication-approaches-for-group-iv-photonic-mems-devices(a3529ee4-3a6a-4690-9381-15c1c0dfbc97).html ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.801319.

Council of Science Editors:

Panduranga P. Nanofabrication approaches for Group IV photonic MEMS devices. [Doctoral Dissertation]. Bangor University; 2020. Available from: https://research.bangor.ac.uk/portal/en/theses/nanofabrication-approaches-for-group-iv-photonic-mems-devices(a3529ee4-3a6a-4690-9381-15c1c0dfbc97).html ; https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.801319


Kansas State University

21. Lawyer, Fredrick C. Prints.

Degree: 1982, Kansas State University

Subjects/Keywords: Prints; Etching

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APA (6th Edition):

Lawyer, F. C. (1982). Prints. (Thesis). Kansas State University. Retrieved from http://hdl.handle.net/2097/9594

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lawyer, Fredrick C. “Prints.” 1982. Thesis, Kansas State University. Accessed October 28, 2020. http://hdl.handle.net/2097/9594.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lawyer, Fredrick C. “Prints.” 1982. Web. 28 Oct 2020.

Vancouver:

Lawyer FC. Prints. [Internet] [Thesis]. Kansas State University; 1982. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/2097/9594.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lawyer FC. Prints. [Thesis]. Kansas State University; 1982. Available from: http://hdl.handle.net/2097/9594

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

22. 井上, ちひろ. Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性.

Degree: 博士(歯学), 2016, Osaka Dental University / 大阪歯科大学

We evaluated the mechanical properties and bond strength of commercially available adhesives used with orthodontic brackets on enamel. Debonding of the brackets must be done… (more)

Subjects/Keywords: Enamel; Direct bonding; Etching; Enamel; Direct bonding; Etching

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APA (6th Edition):

井上, . (2016). Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性. (Thesis). Osaka Dental University / 大阪歯科大学. Retrieved from http://id.nii.ac.jp/1392/00000016/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

井上, ちひろ. “Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性.” 2016. Thesis, Osaka Dental University / 大阪歯科大学. Accessed October 28, 2020. http://id.nii.ac.jp/1392/00000016/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

井上, ちひろ. “Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性.” 2016. Web. 28 Oct 2020.

Vancouver:

井上 . Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性. [Internet] [Thesis]. Osaka Dental University / 大阪歯科大学; 2016. [cited 2020 Oct 28]. Available from: http://id.nii.ac.jp/1392/00000016/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

井上 . Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性. [Thesis]. Osaka Dental University / 大阪歯科大学; 2016. Available from: http://id.nii.ac.jp/1392/00000016/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of KwaZulu-Natal

23. Pretorius, Casparus Eloff. Introducing advances in non-toxic intaglio printmaking at the Centre for Visual Arts UKZN through practice based research.

Degree: 2018, University of KwaZulu-Natal

 This study investigated the reduction of hazards in intaglio printmaking through practicebased research of non-toxic etching and intaglio materials. Traditional etching techniques involve health, safety,… (more)

Subjects/Keywords: Intaglio printmaking.; Non-toxic etching.; Traditional etching techniques.; Intaglio materials.

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APA (6th Edition):

Pretorius, C. E. (2018). Introducing advances in non-toxic intaglio printmaking at the Centre for Visual Arts UKZN through practice based research. (Thesis). University of KwaZulu-Natal. Retrieved from https://researchspace.ukzn.ac.za/handle/10413/16810

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Pretorius, Casparus Eloff. “Introducing advances in non-toxic intaglio printmaking at the Centre for Visual Arts UKZN through practice based research.” 2018. Thesis, University of KwaZulu-Natal. Accessed October 28, 2020. https://researchspace.ukzn.ac.za/handle/10413/16810.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Pretorius, Casparus Eloff. “Introducing advances in non-toxic intaglio printmaking at the Centre for Visual Arts UKZN through practice based research.” 2018. Web. 28 Oct 2020.

Vancouver:

Pretorius CE. Introducing advances in non-toxic intaglio printmaking at the Centre for Visual Arts UKZN through practice based research. [Internet] [Thesis]. University of KwaZulu-Natal; 2018. [cited 2020 Oct 28]. Available from: https://researchspace.ukzn.ac.za/handle/10413/16810.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Pretorius CE. Introducing advances in non-toxic intaglio printmaking at the Centre for Visual Arts UKZN through practice based research. [Thesis]. University of KwaZulu-Natal; 2018. Available from: https://researchspace.ukzn.ac.za/handle/10413/16810

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Universitat Politècnica de València

24. Montoliu Álvaro, Carles. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .

Degree: 2015, Universitat Politècnica de València

 [EN] The main topic of the present thesis is the improvement of fabrication processes simulation by means of the Level Set (LS) method. The LS… (more)

Subjects/Keywords: Level Set; Wet Etching; Dry Etching; Parallel Computing; CUDA; GPGPU

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APA (6th Edition):

Montoliu Álvaro, C. (2015). Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . (Doctoral Dissertation). Universitat Politècnica de València. Retrieved from http://hdl.handle.net/10251/58609

Chicago Manual of Style (16th Edition):

Montoliu Álvaro, Carles. “Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .” 2015. Doctoral Dissertation, Universitat Politècnica de València. Accessed October 28, 2020. http://hdl.handle.net/10251/58609.

MLA Handbook (7th Edition):

Montoliu Álvaro, Carles. “Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .” 2015. Web. 28 Oct 2020.

Vancouver:

Montoliu Álvaro C. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . [Internet] [Doctoral dissertation]. Universitat Politècnica de València; 2015. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/10251/58609.

Council of Science Editors:

Montoliu Álvaro C. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . [Doctoral Dissertation]. Universitat Politècnica de València; 2015. Available from: http://hdl.handle.net/10251/58609


University of Oxford

25. Astell-Burt, P. J. Studies on etching and polymer deposition in halocarbon plasmas.

Degree: PhD, 1987, University of Oxford

 Plasma etching, the selective removal of materials by reaction with chemically active species formed in a glow-discharge, is widely used by the electronics industry because… (more)

Subjects/Keywords: 530.44; Halocarbons : Etching : Plasma etching

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APA (6th Edition):

Astell-Burt, P. J. (1987). Studies on etching and polymer deposition in halocarbon plasmas. (Doctoral Dissertation). University of Oxford. Retrieved from http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440

Chicago Manual of Style (16th Edition):

Astell-Burt, P J. “Studies on etching and polymer deposition in halocarbon plasmas.” 1987. Doctoral Dissertation, University of Oxford. Accessed October 28, 2020. http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440.

MLA Handbook (7th Edition):

Astell-Burt, P J. “Studies on etching and polymer deposition in halocarbon plasmas.” 1987. Web. 28 Oct 2020.

Vancouver:

Astell-Burt PJ. Studies on etching and polymer deposition in halocarbon plasmas. [Internet] [Doctoral dissertation]. University of Oxford; 1987. [cited 2020 Oct 28]. Available from: http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440.

Council of Science Editors:

Astell-Burt PJ. Studies on etching and polymer deposition in halocarbon plasmas. [Doctoral Dissertation]. University of Oxford; 1987. Available from: http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440


University of Oxford

26. Toogood, Matthew John. Studies of the chemistry of plasmas used for semiconductor etching.

Degree: PhD, 1991, University of Oxford

 Optical diagnostic techniques have been developed and then used to investigate the chemistry of reactive species formed in CF4 / O2 rf parallel plate discharges,… (more)

Subjects/Keywords: 530.44; Semiconductors : Etching : Plasma etching

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APA (6th Edition):

Toogood, M. J. (1991). Studies of the chemistry of plasmas used for semiconductor etching. (Doctoral Dissertation). University of Oxford. Retrieved from http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549

Chicago Manual of Style (16th Edition):

Toogood, Matthew John. “Studies of the chemistry of plasmas used for semiconductor etching.” 1991. Doctoral Dissertation, University of Oxford. Accessed October 28, 2020. http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549.

MLA Handbook (7th Edition):

Toogood, Matthew John. “Studies of the chemistry of plasmas used for semiconductor etching.” 1991. Web. 28 Oct 2020.

Vancouver:

Toogood MJ. Studies of the chemistry of plasmas used for semiconductor etching. [Internet] [Doctoral dissertation]. University of Oxford; 1991. [cited 2020 Oct 28]. Available from: http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549.

Council of Science Editors:

Toogood MJ. Studies of the chemistry of plasmas used for semiconductor etching. [Doctoral Dissertation]. University of Oxford; 1991. Available from: http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549


IUPUI

27. Al-Johani, Hanan. Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic.

Degree: 2017, IUPUI

 EFFECTS OF ETCHING DURATION ON THE SURFACE ROUGHNESS, SURFACE LOSS, FLEXURAL STRENGTH OF E.MAX CAD GLASS CERAMIC AND SHEAR BOND STRENGTH TO A RESIN CEMENT… (more)

Subjects/Keywords: Lithium dislicate; Glass; Ceramics; Etching; Protocol; Dental Etching; Resin Cements

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APA (6th Edition):

Al-Johani, H. (2017). Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic. (Thesis). IUPUI. Retrieved from http://hdl.handle.net/1805/13751

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Al-Johani, Hanan. “Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic.” 2017. Thesis, IUPUI. Accessed October 28, 2020. http://hdl.handle.net/1805/13751.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Al-Johani, Hanan. “Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic.” 2017. Web. 28 Oct 2020.

Vancouver:

Al-Johani H. Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic. [Internet] [Thesis]. IUPUI; 2017. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/1805/13751.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Al-Johani H. Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic. [Thesis]. IUPUI; 2017. Available from: http://hdl.handle.net/1805/13751

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Urbana-Champaign

28. Edwards, Lonna D. Characterization of the photochemical etching process: an alternative microfluidic device fabrication method.

Degree: MS, Electrical & Computer Engr, 2016, University of Illinois – Urbana-Champaign

 A newly developed process known as photochemical etching (PC etching), which combines optical imaging and wet chemical etching, can be utilized as an alternative to… (more)

Subjects/Keywords: photochemical etching; microfluidic device; wet chemical etching; gallium arsenide; semiconductor

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Edwards, L. D. (2016). Characterization of the photochemical etching process: an alternative microfluidic device fabrication method. (Thesis). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/95516

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Edwards, Lonna D. “Characterization of the photochemical etching process: an alternative microfluidic device fabrication method.” 2016. Thesis, University of Illinois – Urbana-Champaign. Accessed October 28, 2020. http://hdl.handle.net/2142/95516.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Edwards, Lonna D. “Characterization of the photochemical etching process: an alternative microfluidic device fabrication method.” 2016. Web. 28 Oct 2020.

Vancouver:

Edwards LD. Characterization of the photochemical etching process: an alternative microfluidic device fabrication method. [Internet] [Thesis]. University of Illinois – Urbana-Champaign; 2016. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/2142/95516.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Edwards LD. Characterization of the photochemical etching process: an alternative microfluidic device fabrication method. [Thesis]. University of Illinois – Urbana-Champaign; 2016. Available from: http://hdl.handle.net/2142/95516

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Maryland

29. Metzler, Dominik. High Precision Plasma Etch for Pattern Transfer: Towards Fluorocarbon Based Atomic Layer Etching.

Degree: Material Science and Engineering, 2016, University of Maryland

 A basic requirement of a plasma etching process is fidelity of the patterned organic materials. In photolithography, a He plasma pretreatment (PPT) based on high… (more)

Subjects/Keywords: Plasma physics; Engineering; Atomic Layer Etching; Fluorocarbon; Plasma Etching; Semiconductor

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Metzler, D. (2016). High Precision Plasma Etch for Pattern Transfer: Towards Fluorocarbon Based Atomic Layer Etching. (Thesis). University of Maryland. Retrieved from http://hdl.handle.net/1903/18633

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Metzler, Dominik. “High Precision Plasma Etch for Pattern Transfer: Towards Fluorocarbon Based Atomic Layer Etching.” 2016. Thesis, University of Maryland. Accessed October 28, 2020. http://hdl.handle.net/1903/18633.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Metzler, Dominik. “High Precision Plasma Etch for Pattern Transfer: Towards Fluorocarbon Based Atomic Layer Etching.” 2016. Web. 28 Oct 2020.

Vancouver:

Metzler D. High Precision Plasma Etch for Pattern Transfer: Towards Fluorocarbon Based Atomic Layer Etching. [Internet] [Thesis]. University of Maryland; 2016. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/1903/18633.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Metzler D. High Precision Plasma Etch for Pattern Transfer: Towards Fluorocarbon Based Atomic Layer Etching. [Thesis]. University of Maryland; 2016. Available from: http://hdl.handle.net/1903/18633

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Texas – Austin

30. Tamer, Murat Taner. On step-etching and ambient temperature annealing of apatite fission tracks.

Degree: PhD, Geological Sciences, 2020, University of Texas – Austin

 Apatite fission track dating and thermal history inverse modeling is a useful method to reveal and understand the thermal evolution of rocks over geological time… (more)

Subjects/Keywords: Fission track; Dating; Modeling; Length measurements; Etching; Step-etching

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Tamer, M. T. (2020). On step-etching and ambient temperature annealing of apatite fission tracks. (Doctoral Dissertation). University of Texas – Austin. Retrieved from http://hdl.handle.net/2152/81986

Chicago Manual of Style (16th Edition):

Tamer, Murat Taner. “On step-etching and ambient temperature annealing of apatite fission tracks.” 2020. Doctoral Dissertation, University of Texas – Austin. Accessed October 28, 2020. http://hdl.handle.net/2152/81986.

MLA Handbook (7th Edition):

Tamer, Murat Taner. “On step-etching and ambient temperature annealing of apatite fission tracks.” 2020. Web. 28 Oct 2020.

Vancouver:

Tamer MT. On step-etching and ambient temperature annealing of apatite fission tracks. [Internet] [Doctoral dissertation]. University of Texas – Austin; 2020. [cited 2020 Oct 28]. Available from: http://hdl.handle.net/2152/81986.

Council of Science Editors:

Tamer MT. On step-etching and ambient temperature annealing of apatite fission tracks. [Doctoral Dissertation]. University of Texas – Austin; 2020. Available from: http://hdl.handle.net/2152/81986

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