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You searched for subject:(dry reactive ion etching). Showing records 1 – 30 of 11405 total matches.

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University of Waterloo

1. Tazrin, Fahima. Fabrication of Silicon In-plane and Out-ofplane Microneedle Arrays for Transdermal Biological Fluid Extraction.

Degree: 2019, University of Waterloo

 This thesis presents research in the field of microelectromechanical systems and specifically in the area of microneedle-based transdermal skin fluid extraction and drug delivery. The… (more)

Subjects/Keywords: Deep reactive ion etching; Microneedles; Lithography; Wet etching; Dry etching; Out-of-plane microneedle; In-plane microneedle

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Tazrin, F. (2019). Fabrication of Silicon In-plane and Out-ofplane Microneedle Arrays for Transdermal Biological Fluid Extraction. (Thesis). University of Waterloo. Retrieved from http://hdl.handle.net/10012/14557

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Tazrin, Fahima. “Fabrication of Silicon In-plane and Out-ofplane Microneedle Arrays for Transdermal Biological Fluid Extraction.” 2019. Thesis, University of Waterloo. Accessed October 22, 2019. http://hdl.handle.net/10012/14557.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Tazrin, Fahima. “Fabrication of Silicon In-plane and Out-ofplane Microneedle Arrays for Transdermal Biological Fluid Extraction.” 2019. Web. 22 Oct 2019.

Vancouver:

Tazrin F. Fabrication of Silicon In-plane and Out-ofplane Microneedle Arrays for Transdermal Biological Fluid Extraction. [Internet] [Thesis]. University of Waterloo; 2019. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/10012/14557.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Tazrin F. Fabrication of Silicon In-plane and Out-ofplane Microneedle Arrays for Transdermal Biological Fluid Extraction. [Thesis]. University of Waterloo; 2019. Available from: http://hdl.handle.net/10012/14557

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


UCLA

2. Altieri, Nicholas Dominic. Atomic Layer Etching of Magnetic and Noble Metals.

Degree: Chemical Engineering, 2018, UCLA

 This work has focused on the study and development of atomic layer etching for metallic and intermetallic thin films commonly used in front and back… (more)

Subjects/Keywords: Chemical engineering; atomic layer etching; interconnect; magnetic metal; noble metal; plasma etching; reactive ion etching

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APA (6th Edition):

Altieri, N. D. (2018). Atomic Layer Etching of Magnetic and Noble Metals. (Thesis). UCLA. Retrieved from http://www.escholarship.org/uc/item/28m072gc

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Altieri, Nicholas Dominic. “Atomic Layer Etching of Magnetic and Noble Metals.” 2018. Thesis, UCLA. Accessed October 22, 2019. http://www.escholarship.org/uc/item/28m072gc.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Altieri, Nicholas Dominic. “Atomic Layer Etching of Magnetic and Noble Metals.” 2018. Web. 22 Oct 2019.

Vancouver:

Altieri ND. Atomic Layer Etching of Magnetic and Noble Metals. [Internet] [Thesis]. UCLA; 2018. [cited 2019 Oct 22]. Available from: http://www.escholarship.org/uc/item/28m072gc.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Altieri ND. Atomic Layer Etching of Magnetic and Noble Metals. [Thesis]. UCLA; 2018. Available from: http://www.escholarship.org/uc/item/28m072gc

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Alberta

3. Zheng, Ai Zhi. A Developer-free Approach to Conventional Electron Beam Lithography.

Degree: MS, Department of Electrical and Computer Engineering, 2011, University of Alberta

 In order to achieve the best results possible by electron beam lithography (EBL), many aspects of the different stages of EBL have to be carefully… (more)

Subjects/Keywords: Electron Beam Lithography, Developer Free, Heating, Reactive Ion Etching

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APA (6th Edition):

Zheng, A. Z. (2011). A Developer-free Approach to Conventional Electron Beam Lithography. (Masters Thesis). University of Alberta. Retrieved from https://era.library.ualberta.ca/files/vh53ww25j

Chicago Manual of Style (16th Edition):

Zheng, Ai Zhi. “A Developer-free Approach to Conventional Electron Beam Lithography.” 2011. Masters Thesis, University of Alberta. Accessed October 22, 2019. https://era.library.ualberta.ca/files/vh53ww25j.

MLA Handbook (7th Edition):

Zheng, Ai Zhi. “A Developer-free Approach to Conventional Electron Beam Lithography.” 2011. Web. 22 Oct 2019.

Vancouver:

Zheng AZ. A Developer-free Approach to Conventional Electron Beam Lithography. [Internet] [Masters thesis]. University of Alberta; 2011. [cited 2019 Oct 22]. Available from: https://era.library.ualberta.ca/files/vh53ww25j.

Council of Science Editors:

Zheng AZ. A Developer-free Approach to Conventional Electron Beam Lithography. [Masters Thesis]. University of Alberta; 2011. Available from: https://era.library.ualberta.ca/files/vh53ww25j


University of Western Australia

4. Lai, Meifang. Porous silicon and its application for micromachining technologies.

Degree: PhD, 2012, University of Western Australia

[Truncated abstract] Porous silicon (PS), which exhibits valuable characteristics including photoluminescence, easily tunable refractive index, and large surface area, has gained enormous attention worldwide for… (more)

Subjects/Keywords: Porous silicon; Passivation; Photolithography; Alkaline developer; Reactive ion etching; Micromachining

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APA (6th Edition):

Lai, M. (2012). Porous silicon and its application for micromachining technologies. (Doctoral Dissertation). University of Western Australia. Retrieved from http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01

Chicago Manual of Style (16th Edition):

Lai, Meifang. “Porous silicon and its application for micromachining technologies.” 2012. Doctoral Dissertation, University of Western Australia. Accessed October 22, 2019. http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01.

MLA Handbook (7th Edition):

Lai, Meifang. “Porous silicon and its application for micromachining technologies.” 2012. Web. 22 Oct 2019.

Vancouver:

Lai M. Porous silicon and its application for micromachining technologies. [Internet] [Doctoral dissertation]. University of Western Australia; 2012. [cited 2019 Oct 22]. Available from: http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01.

Council of Science Editors:

Lai M. Porous silicon and its application for micromachining technologies. [Doctoral Dissertation]. University of Western Australia; 2012. Available from: http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01


University of Surrey

5. Robertson, C. J. Factors controlling etch anisotropy in plasmas.

Degree: PhD, 1990, University of Surrey

 The use of radio frequency (rf) plasma techniques to produce fine structures of precise geometry is widespread in the microelectronics industry. An important factor influencing… (more)

Subjects/Keywords: 530.41; Reactive ion etching

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APA (6th Edition):

Robertson, C. J. (1990). Factors controlling etch anisotropy in plasmas. (Doctoral Dissertation). University of Surrey. Retrieved from http://epubs.surrey.ac.uk/843224/ ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.253281

Chicago Manual of Style (16th Edition):

Robertson, C J. “Factors controlling etch anisotropy in plasmas.” 1990. Doctoral Dissertation, University of Surrey. Accessed October 22, 2019. http://epubs.surrey.ac.uk/843224/ ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.253281.

MLA Handbook (7th Edition):

Robertson, C J. “Factors controlling etch anisotropy in plasmas.” 1990. Web. 22 Oct 2019.

Vancouver:

Robertson CJ. Factors controlling etch anisotropy in plasmas. [Internet] [Doctoral dissertation]. University of Surrey; 1990. [cited 2019 Oct 22]. Available from: http://epubs.surrey.ac.uk/843224/ ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.253281.

Council of Science Editors:

Robertson CJ. Factors controlling etch anisotropy in plasmas. [Doctoral Dissertation]. University of Surrey; 1990. Available from: http://epubs.surrey.ac.uk/843224/ ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.253281

6. Chatfield, Robert J. Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys.

Degree: PhD, 1993, University of Bristol

Subjects/Keywords: 670; Reactive ion etching

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APA (6th Edition):

Chatfield, R. J. (1993). Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys. (Doctoral Dissertation). University of Bristol. Retrieved from http://hdl.handle.net/1983/821a17c4-1dad-442b-9179-1f521e571c0f

Chicago Manual of Style (16th Edition):

Chatfield, Robert J. “Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys.” 1993. Doctoral Dissertation, University of Bristol. Accessed October 22, 2019. http://hdl.handle.net/1983/821a17c4-1dad-442b-9179-1f521e571c0f.

MLA Handbook (7th Edition):

Chatfield, Robert J. “Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys.” 1993. Web. 22 Oct 2019.

Vancouver:

Chatfield RJ. Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys. [Internet] [Doctoral dissertation]. University of Bristol; 1993. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/1983/821a17c4-1dad-442b-9179-1f521e571c0f.

Council of Science Editors:

Chatfield RJ. Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys. [Doctoral Dissertation]. University of Bristol; 1993. Available from: http://hdl.handle.net/1983/821a17c4-1dad-442b-9179-1f521e571c0f


University of Waterloo

7. Zhang, Hang. Fabrication of Hollow Silicon Microneedle Arrays for Transdermal Biological Fluid Extraction.

Degree: 2018, University of Waterloo

 This thesis presents the research in the field of microelectromechanical systems with the specific aim of investigating a microneedle based transdermal skin fluid extraction concept.… (more)

Subjects/Keywords: microneedle; deep reactive ion etching; biological fluid extraction; MEMS

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APA (6th Edition):

Zhang, H. (2018). Fabrication of Hollow Silicon Microneedle Arrays for Transdermal Biological Fluid Extraction. (Thesis). University of Waterloo. Retrieved from http://hdl.handle.net/10012/13544

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Zhang, Hang. “Fabrication of Hollow Silicon Microneedle Arrays for Transdermal Biological Fluid Extraction.” 2018. Thesis, University of Waterloo. Accessed October 22, 2019. http://hdl.handle.net/10012/13544.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Zhang, Hang. “Fabrication of Hollow Silicon Microneedle Arrays for Transdermal Biological Fluid Extraction.” 2018. Web. 22 Oct 2019.

Vancouver:

Zhang H. Fabrication of Hollow Silicon Microneedle Arrays for Transdermal Biological Fluid Extraction. [Internet] [Thesis]. University of Waterloo; 2018. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/10012/13544.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Zhang H. Fabrication of Hollow Silicon Microneedle Arrays for Transdermal Biological Fluid Extraction. [Thesis]. University of Waterloo; 2018. Available from: http://hdl.handle.net/10012/13544

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Waterloo

8. Liu, Yaoze. Broadband Antireflection Coverglass for CubeSats.

Degree: 2018, University of Waterloo

 A CubeSat is a type of miniaturized and modular satellite designed for space research or technology demonstration. By filling the unused capacity of major launch… (more)

Subjects/Keywords: Moth-eye Antireflection; Nanosphere lithography; Reactive-ion etching; Oxidation

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APA (6th Edition):

Liu, Y. (2018). Broadband Antireflection Coverglass for CubeSats. (Thesis). University of Waterloo. Retrieved from http://hdl.handle.net/10012/13702

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Liu, Yaoze. “Broadband Antireflection Coverglass for CubeSats.” 2018. Thesis, University of Waterloo. Accessed October 22, 2019. http://hdl.handle.net/10012/13702.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Liu, Yaoze. “Broadband Antireflection Coverglass for CubeSats.” 2018. Web. 22 Oct 2019.

Vancouver:

Liu Y. Broadband Antireflection Coverglass for CubeSats. [Internet] [Thesis]. University of Waterloo; 2018. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/10012/13702.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Liu Y. Broadband Antireflection Coverglass for CubeSats. [Thesis]. University of Waterloo; 2018. Available from: http://hdl.handle.net/10012/13702

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Houston

9. Basu, Prithvi. Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma.

Degree: Electrical and Computer Engineering, Department of, 2013, University of Houston

 Stencil masks are used to print ultra-high resolution patterns using helium ion/atom beam lithography and are often manufactured from thin, free-standing silicon nitride membranes. The… (more)

Subjects/Keywords: Optimization; Ion Beam Lithography; Stencil Masks; Reactive Ion Etching; Sulfur hexafluoride; Electrical engineering

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APA (6th Edition):

Basu, P. (2013). Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma. (Thesis). University of Houston. Retrieved from http://hdl.handle.net/10657/1083

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Basu, Prithvi. “Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma.” 2013. Thesis, University of Houston. Accessed October 22, 2019. http://hdl.handle.net/10657/1083.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Basu, Prithvi. “Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma.” 2013. Web. 22 Oct 2019.

Vancouver:

Basu P. Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma. [Internet] [Thesis]. University of Houston; 2013. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/10657/1083.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Basu P. Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma. [Thesis]. University of Houston; 2013. Available from: http://hdl.handle.net/10657/1083

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Georgia Tech

10. Joshi, Salil Mohan. Effect of heat and plasma treatments on the electrical and optical properties of colloidal indium tin oxide films.

Degree: PhD, Materials Science and Engineering, 2013, Georgia Tech

 The research presented in this dissertation explores the possibility of using colloidal indium tin oxide (ITO) nanoparticle solutions to direct write transparent conducting coatings (TCCs),… (more)

Subjects/Keywords: ITO; RIE; Indium tin oxide; Colloidal films; Annealing; Plasma treatment; Reactive ion etching; Impedance spectroscopy

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APA (6th Edition):

Joshi, S. M. (2013). Effect of heat and plasma treatments on the electrical and optical properties of colloidal indium tin oxide films. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/52170

Chicago Manual of Style (16th Edition):

Joshi, Salil Mohan. “Effect of heat and plasma treatments on the electrical and optical properties of colloidal indium tin oxide films.” 2013. Doctoral Dissertation, Georgia Tech. Accessed October 22, 2019. http://hdl.handle.net/1853/52170.

MLA Handbook (7th Edition):

Joshi, Salil Mohan. “Effect of heat and plasma treatments on the electrical and optical properties of colloidal indium tin oxide films.” 2013. Web. 22 Oct 2019.

Vancouver:

Joshi SM. Effect of heat and plasma treatments on the electrical and optical properties of colloidal indium tin oxide films. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/1853/52170.

Council of Science Editors:

Joshi SM. Effect of heat and plasma treatments on the electrical and optical properties of colloidal indium tin oxide films. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/52170

11. Khaldi, Alexandre. Intégration d'actionneurs à base de polymères conducteurs électroniques pour des applications aux microsystèmes : Etude de la permeabilisation d’une membrane cellulaire par un champ électrique pulsé développement d’une modélisation électrique – caractérisation sur biopuces à cellules.

Degree: Docteur es, Electronique. Micro et nano technologie, 2012, Valenciennes

L’objectif de ce travail est la réalisation de nouveaux microactionneurs à base depolymère conducteur électronique pouvant être envisagés pour une application denanodrone à ailes battantes.Deux… (more)

Subjects/Keywords: Nanodrones; Photolithographie; Gravure ionique réactive; Nano-aerial vehicle; Photolithography; Reactive Ion Etching

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APA (6th Edition):

Khaldi, A. (2012). Intégration d'actionneurs à base de polymères conducteurs électroniques pour des applications aux microsystèmes : Etude de la permeabilisation d’une membrane cellulaire par un champ électrique pulsé développement d’une modélisation électrique – caractérisation sur biopuces à cellules. (Doctoral Dissertation). Valenciennes. Retrieved from http://www.theses.fr/2012VALE0007

Chicago Manual of Style (16th Edition):

Khaldi, Alexandre. “Intégration d'actionneurs à base de polymères conducteurs électroniques pour des applications aux microsystèmes : Etude de la permeabilisation d’une membrane cellulaire par un champ électrique pulsé développement d’une modélisation électrique – caractérisation sur biopuces à cellules.” 2012. Doctoral Dissertation, Valenciennes. Accessed October 22, 2019. http://www.theses.fr/2012VALE0007.

MLA Handbook (7th Edition):

Khaldi, Alexandre. “Intégration d'actionneurs à base de polymères conducteurs électroniques pour des applications aux microsystèmes : Etude de la permeabilisation d’une membrane cellulaire par un champ électrique pulsé développement d’une modélisation électrique – caractérisation sur biopuces à cellules.” 2012. Web. 22 Oct 2019.

Vancouver:

Khaldi A. Intégration d'actionneurs à base de polymères conducteurs électroniques pour des applications aux microsystèmes : Etude de la permeabilisation d’une membrane cellulaire par un champ électrique pulsé développement d’une modélisation électrique – caractérisation sur biopuces à cellules. [Internet] [Doctoral dissertation]. Valenciennes; 2012. [cited 2019 Oct 22]. Available from: http://www.theses.fr/2012VALE0007.

Council of Science Editors:

Khaldi A. Intégration d'actionneurs à base de polymères conducteurs électroniques pour des applications aux microsystèmes : Etude de la permeabilisation d’une membrane cellulaire par un champ électrique pulsé développement d’une modélisation électrique – caractérisation sur biopuces à cellules. [Doctoral Dissertation]. Valenciennes; 2012. Available from: http://www.theses.fr/2012VALE0007


Stellenbosch University

12. Buttner, Ulrich. The development of equipment for the fabrication of thin film superconductor and nano structures.

Degree: Electrical and Electronic Engineering, 2011, Stellenbosch University

Thesis (MScEng (Electrical and Electronic Engineering)) – University of Stellenbosch, 2011.

ENGLISH ABSTRACT: The nano-age is more about the mesoscopic phenomena, than those occurring at molecular… (more)

Subjects/Keywords: Electronic engineering; Nanotechnology; Dry etching

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APA (6th Edition):

Buttner, U. (2011). The development of equipment for the fabrication of thin film superconductor and nano structures. (Thesis). Stellenbosch University. Retrieved from http://hdl.handle.net/10019.1/6595

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Buttner, Ulrich. “The development of equipment for the fabrication of thin film superconductor and nano structures.” 2011. Thesis, Stellenbosch University. Accessed October 22, 2019. http://hdl.handle.net/10019.1/6595.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Buttner, Ulrich. “The development of equipment for the fabrication of thin film superconductor and nano structures.” 2011. Web. 22 Oct 2019.

Vancouver:

Buttner U. The development of equipment for the fabrication of thin film superconductor and nano structures. [Internet] [Thesis]. Stellenbosch University; 2011. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/10019.1/6595.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Buttner U. The development of equipment for the fabrication of thin film superconductor and nano structures. [Thesis]. Stellenbosch University; 2011. Available from: http://hdl.handle.net/10019.1/6595

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rice University

13. Abramova, Vera. Meniscus-Mask Lithography.

Degree: PhD, Chemistry, 2015, Rice University

 This dissertation describes meniscus-mask lithography (MML): a planar top-down method for the fabrication of precisely positioned narrow graphene nanoribbons (GNRs) and metallic and semiconducting nanowires.… (more)

Subjects/Keywords: lithography; nanofabrication; dry etching; nanowires

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APA (6th Edition):

Abramova, V. (2015). Meniscus-Mask Lithography. (Doctoral Dissertation). Rice University. Retrieved from http://hdl.handle.net/1911/87691

Chicago Manual of Style (16th Edition):

Abramova, Vera. “Meniscus-Mask Lithography.” 2015. Doctoral Dissertation, Rice University. Accessed October 22, 2019. http://hdl.handle.net/1911/87691.

MLA Handbook (7th Edition):

Abramova, Vera. “Meniscus-Mask Lithography.” 2015. Web. 22 Oct 2019.

Vancouver:

Abramova V. Meniscus-Mask Lithography. [Internet] [Doctoral dissertation]. Rice University; 2015. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/1911/87691.

Council of Science Editors:

Abramova V. Meniscus-Mask Lithography. [Doctoral Dissertation]. Rice University; 2015. Available from: http://hdl.handle.net/1911/87691


Rochester Institute of Technology

14. O'Connell, Christopher. An Etching Study for Self-Aligned Double Patterning.

Degree: MS, Microelectronic Engineering, 2018, Rochester Institute of Technology

  A proposed process flow for a complete FinFET etch module is presented as well as experiments to ensure that the target films are etched… (more)

Subjects/Keywords: Dry etching; MERIE; RIE; SADP

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APA (6th Edition):

O'Connell, C. (2018). An Etching Study for Self-Aligned Double Patterning. (Masters Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/9906

Chicago Manual of Style (16th Edition):

O'Connell, Christopher. “An Etching Study for Self-Aligned Double Patterning.” 2018. Masters Thesis, Rochester Institute of Technology. Accessed October 22, 2019. https://scholarworks.rit.edu/theses/9906.

MLA Handbook (7th Edition):

O'Connell, Christopher. “An Etching Study for Self-Aligned Double Patterning.” 2018. Web. 22 Oct 2019.

Vancouver:

O'Connell C. An Etching Study for Self-Aligned Double Patterning. [Internet] [Masters thesis]. Rochester Institute of Technology; 2018. [cited 2019 Oct 22]. Available from: https://scholarworks.rit.edu/theses/9906.

Council of Science Editors:

O'Connell C. An Etching Study for Self-Aligned Double Patterning. [Masters Thesis]. Rochester Institute of Technology; 2018. Available from: https://scholarworks.rit.edu/theses/9906


University of Oxford

15. Malik, Adnan Muhammad. Development of High Aspect Ratio Nano-Focusing Si and Diamond Refractive X-ray optics using deep reactive ion etching.

Degree: PhD, 2013, University of Oxford

 This thesis is devoted to the development of nano-focusing refractive optics for high energy X-rays using planar microelectronic technology. The availability of such optics is… (more)

Subjects/Keywords: 621.36; Nanomaterials; Processing of advanced materials; Silicon; Materials engineering; X-ray lens; Nano-focusing; CVD diamond; Deep Reactive Ion Etching

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Malik, A. M. (2013). Development of High Aspect Ratio Nano-Focusing Si and Diamond Refractive X-ray optics using deep reactive ion etching. (Doctoral Dissertation). University of Oxford. Retrieved from http://ora.ox.ac.uk/objects/uuid:588ca438-e4c6-4d51-8f13-30bcb3c437a3 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.581334

Chicago Manual of Style (16th Edition):

Malik, Adnan Muhammad. “Development of High Aspect Ratio Nano-Focusing Si and Diamond Refractive X-ray optics using deep reactive ion etching.” 2013. Doctoral Dissertation, University of Oxford. Accessed October 22, 2019. http://ora.ox.ac.uk/objects/uuid:588ca438-e4c6-4d51-8f13-30bcb3c437a3 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.581334.

MLA Handbook (7th Edition):

Malik, Adnan Muhammad. “Development of High Aspect Ratio Nano-Focusing Si and Diamond Refractive X-ray optics using deep reactive ion etching.” 2013. Web. 22 Oct 2019.

Vancouver:

Malik AM. Development of High Aspect Ratio Nano-Focusing Si and Diamond Refractive X-ray optics using deep reactive ion etching. [Internet] [Doctoral dissertation]. University of Oxford; 2013. [cited 2019 Oct 22]. Available from: http://ora.ox.ac.uk/objects/uuid:588ca438-e4c6-4d51-8f13-30bcb3c437a3 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.581334.

Council of Science Editors:

Malik AM. Development of High Aspect Ratio Nano-Focusing Si and Diamond Refractive X-ray optics using deep reactive ion etching. [Doctoral Dissertation]. University of Oxford; 2013. Available from: http://ora.ox.ac.uk/objects/uuid:588ca438-e4c6-4d51-8f13-30bcb3c437a3 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.581334


EPFL

16. Prater, Karin. On the Limits of Precision Glass Molding for Diffractive Optical Elements.

Degree: 2017, EPFL

 Diffractive optical elements (DOEs) consist of surface reliefs with dimensions in the micrometer range and nanometer precision. Two technologies dominate: Elements replicated in plastic and… (more)

Subjects/Keywords: diffractive optical element; glassy carbon; reactive ion etching; multilevelfabrication; electron-beam lithography; precision glass molding; fused silica molding; RCWA simulations

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APA (6th Edition):

Prater, K. (2017). On the Limits of Precision Glass Molding for Diffractive Optical Elements. (Thesis). EPFL. Retrieved from http://infoscience.epfl.ch/record/231815

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Prater, Karin. “On the Limits of Precision Glass Molding for Diffractive Optical Elements.” 2017. Thesis, EPFL. Accessed October 22, 2019. http://infoscience.epfl.ch/record/231815.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Prater, Karin. “On the Limits of Precision Glass Molding for Diffractive Optical Elements.” 2017. Web. 22 Oct 2019.

Vancouver:

Prater K. On the Limits of Precision Glass Molding for Diffractive Optical Elements. [Internet] [Thesis]. EPFL; 2017. [cited 2019 Oct 22]. Available from: http://infoscience.epfl.ch/record/231815.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Prater K. On the Limits of Precision Glass Molding for Diffractive Optical Elements. [Thesis]. EPFL; 2017. Available from: http://infoscience.epfl.ch/record/231815

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Cranfield University

17. Wallis, Kirsty. Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control.

Degree: PhD, 2013, Cranfield University

 This thesis focuses on the use of a design of experiment approach to examine the significance of process factors and interactions on the fabrication of… (more)

Subjects/Keywords: Design of experiment; deep reactive ion etching; polymer micro-injection moulding; metal powder injection moulding; droplet behaviour; contact angles; evaporation

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APA (6th Edition):

Wallis, K. (2013). Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control. (Doctoral Dissertation). Cranfield University. Retrieved from http://dspace.lib.cranfield.ac.uk/handle/1826/8456

Chicago Manual of Style (16th Edition):

Wallis, Kirsty. “Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control.” 2013. Doctoral Dissertation, Cranfield University. Accessed October 22, 2019. http://dspace.lib.cranfield.ac.uk/handle/1826/8456.

MLA Handbook (7th Edition):

Wallis, Kirsty. “Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control.” 2013. Web. 22 Oct 2019.

Vancouver:

Wallis K. Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control. [Internet] [Doctoral dissertation]. Cranfield University; 2013. [cited 2019 Oct 22]. Available from: http://dspace.lib.cranfield.ac.uk/handle/1826/8456.

Council of Science Editors:

Wallis K. Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control. [Doctoral Dissertation]. Cranfield University; 2013. Available from: http://dspace.lib.cranfield.ac.uk/handle/1826/8456


Georgia Tech

18. Chung, Charles Choi. Thermomigrated Junction Isolation of Deep Reactive Ion Etched, Single Crystal Silicon Devices, and its Application to Inertial Navigation Systems.

Degree: PhD, Electrical and Computer Engineering, 2004, Georgia Tech

 The introduction of deep reactive ion etching (DRIE) technology has greatly expanded the accessible design space for microscopic systems. Structures that are hundreds of micrometers… (more)

Subjects/Keywords: Deep reactive ion etching (DRIE); Inductively coupled

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APA (6th Edition):

Chung, C. C. (2004). Thermomigrated Junction Isolation of Deep Reactive Ion Etched, Single Crystal Silicon Devices, and its Application to Inertial Navigation Systems. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/5120

Chicago Manual of Style (16th Edition):

Chung, Charles Choi. “Thermomigrated Junction Isolation of Deep Reactive Ion Etched, Single Crystal Silicon Devices, and its Application to Inertial Navigation Systems.” 2004. Doctoral Dissertation, Georgia Tech. Accessed October 22, 2019. http://hdl.handle.net/1853/5120.

MLA Handbook (7th Edition):

Chung, Charles Choi. “Thermomigrated Junction Isolation of Deep Reactive Ion Etched, Single Crystal Silicon Devices, and its Application to Inertial Navigation Systems.” 2004. Web. 22 Oct 2019.

Vancouver:

Chung CC. Thermomigrated Junction Isolation of Deep Reactive Ion Etched, Single Crystal Silicon Devices, and its Application to Inertial Navigation Systems. [Internet] [Doctoral dissertation]. Georgia Tech; 2004. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/1853/5120.

Council of Science Editors:

Chung CC. Thermomigrated Junction Isolation of Deep Reactive Ion Etched, Single Crystal Silicon Devices, and its Application to Inertial Navigation Systems. [Doctoral Dissertation]. Georgia Tech; 2004. Available from: http://hdl.handle.net/1853/5120


Cranfield University

19. Wallis, Kirsty. Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control.

Degree: PhD, 2013, Cranfield University

 This thesis focuses on the use of a design of experiment approach to examine the significance of process factors and interactions on the fabrication of… (more)

Subjects/Keywords: 620.1; Design of experiment; deep reactive ion etching; polymer micro-injection moulding; metal powder injection moulding; droplet behaviour; contact angles; evaporation

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Wallis, K. (2013). Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control. (Doctoral Dissertation). Cranfield University. Retrieved from http://dspace.lib.cranfield.ac.uk/handle/1826/8456 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613497

Chicago Manual of Style (16th Edition):

Wallis, Kirsty. “Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control.” 2013. Doctoral Dissertation, Cranfield University. Accessed October 22, 2019. http://dspace.lib.cranfield.ac.uk/handle/1826/8456 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613497.

MLA Handbook (7th Edition):

Wallis, Kirsty. “Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control.” 2013. Web. 22 Oct 2019.

Vancouver:

Wallis K. Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control. [Internet] [Doctoral dissertation]. Cranfield University; 2013. [cited 2019 Oct 22]. Available from: http://dspace.lib.cranfield.ac.uk/handle/1826/8456 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613497.

Council of Science Editors:

Wallis K. Design of experiment studies for the fabrication processes involved in the micro-texturing of surfaces for fluid control. [Doctoral Dissertation]. Cranfield University; 2013. Available from: http://dspace.lib.cranfield.ac.uk/handle/1826/8456 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613497


Université Montpellier II

20. Barthélémy, Eléonore. Développement de guides d'onde IR à base de couches épaisses de verres tellurures pour l'interférométrie spatiale. : Development of IR waveguides based on telluride thick films for spatial interferometry.

Degree: Docteur es, Chimie des matériaux, 2010, Université Montpellier II

La mission Darwin, un projet d'interférométrie spatiale initié par l'ESA, nécessite l'utilisation de filtres modaux fonctionnant dans la gamme spectrale [6-20 µm]. Dans le cadre… (more)

Subjects/Keywords: Verres tellurures; Guides d'onde IR; Co-évaporation thermique; Gravure RIE; Telluride glasses; IR waveguides; Thermal co-evaporation; Reactive Ion Etching

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APA (6th Edition):

Barthélémy, E. (2010). Développement de guides d'onde IR à base de couches épaisses de verres tellurures pour l'interférométrie spatiale. : Development of IR waveguides based on telluride thick films for spatial interferometry. (Doctoral Dissertation). Université Montpellier II. Retrieved from http://www.theses.fr/2010MON20184

Chicago Manual of Style (16th Edition):

Barthélémy, Eléonore. “Développement de guides d'onde IR à base de couches épaisses de verres tellurures pour l'interférométrie spatiale. : Development of IR waveguides based on telluride thick films for spatial interferometry.” 2010. Doctoral Dissertation, Université Montpellier II. Accessed October 22, 2019. http://www.theses.fr/2010MON20184.

MLA Handbook (7th Edition):

Barthélémy, Eléonore. “Développement de guides d'onde IR à base de couches épaisses de verres tellurures pour l'interférométrie spatiale. : Development of IR waveguides based on telluride thick films for spatial interferometry.” 2010. Web. 22 Oct 2019.

Vancouver:

Barthélémy E. Développement de guides d'onde IR à base de couches épaisses de verres tellurures pour l'interférométrie spatiale. : Development of IR waveguides based on telluride thick films for spatial interferometry. [Internet] [Doctoral dissertation]. Université Montpellier II; 2010. [cited 2019 Oct 22]. Available from: http://www.theses.fr/2010MON20184.

Council of Science Editors:

Barthélémy E. Développement de guides d'onde IR à base de couches épaisses de verres tellurures pour l'interférométrie spatiale. : Development of IR waveguides based on telluride thick films for spatial interferometry. [Doctoral Dissertation]. Université Montpellier II; 2010. Available from: http://www.theses.fr/2010MON20184


Missouri University of Science and Technology

21. Kanikella, Phaninder R. Process development and applications of a dry film photoresist.

Degree: M.S. in Materials Science and Engineering, Materials Science and Engineering, Missouri University of Science and Technology

"In this study, dry film photoresist was patterned using UV lithography and the sidewall profile was optimized to achieve vertical sidewalls. Sidewall verticality of dry film is very important for better pattern transfer" – Abstract, page iv.

Subjects/Keywords: Reactive ion etching; Materials Science and Engineering

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APA (6th Edition):

Kanikella, P. R. (n.d.). Process development and applications of a dry film photoresist. (Masters Thesis). Missouri University of Science and Technology. Retrieved from http://scholarsmine.mst.edu/masters_theses/6821

Note: this citation may be lacking information needed for this citation format:
No year of publication.

Chicago Manual of Style (16th Edition):

Kanikella, Phaninder R. “Process development and applications of a dry film photoresist.” Masters Thesis, Missouri University of Science and Technology. Accessed October 22, 2019. http://scholarsmine.mst.edu/masters_theses/6821.

Note: this citation may be lacking information needed for this citation format:
No year of publication.

MLA Handbook (7th Edition):

Kanikella, Phaninder R. “Process development and applications of a dry film photoresist.” Web. 22 Oct 2019.

Note: this citation may be lacking information needed for this citation format:
No year of publication.

Vancouver:

Kanikella PR. Process development and applications of a dry film photoresist. [Internet] [Masters thesis]. Missouri University of Science and Technology; [cited 2019 Oct 22]. Available from: http://scholarsmine.mst.edu/masters_theses/6821.

Note: this citation may be lacking information needed for this citation format:
No year of publication.

Council of Science Editors:

Kanikella PR. Process development and applications of a dry film photoresist. [Masters Thesis]. Missouri University of Science and Technology; Available from: http://scholarsmine.mst.edu/masters_theses/6821

Note: this citation may be lacking information needed for this citation format:
No year of publication.


Iowa State University

22. Mohapatra, Pratyasha. Building carbon-free colloidal nanocrystal assemblies with plasma processing.

Degree: 2017, Iowa State University

 Removing the organic fraction from hybrid nanostructures is a crucial step in most bottom-up materials fabrication approaches. It is usually assumed that calcination is an… (more)

Subjects/Keywords: Calcination; Colloidal Nanocrystal Assembly; Plasma Processing; Reactive Ion Etching; Silicon nanoparticle; Thin film; Materials Science and Engineering; Mechanics of Materials

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APA (6th Edition):

Mohapatra, P. (2017). Building carbon-free colloidal nanocrystal assemblies with plasma processing. (Thesis). Iowa State University. Retrieved from https://lib.dr.iastate.edu/etd/16736

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Mohapatra, Pratyasha. “Building carbon-free colloidal nanocrystal assemblies with plasma processing.” 2017. Thesis, Iowa State University. Accessed October 22, 2019. https://lib.dr.iastate.edu/etd/16736.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Mohapatra, Pratyasha. “Building carbon-free colloidal nanocrystal assemblies with plasma processing.” 2017. Web. 22 Oct 2019.

Vancouver:

Mohapatra P. Building carbon-free colloidal nanocrystal assemblies with plasma processing. [Internet] [Thesis]. Iowa State University; 2017. [cited 2019 Oct 22]. Available from: https://lib.dr.iastate.edu/etd/16736.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Mohapatra P. Building carbon-free colloidal nanocrystal assemblies with plasma processing. [Thesis]. Iowa State University; 2017. Available from: https://lib.dr.iastate.edu/etd/16736

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

23. Lee, Chiao-wen. The study of FBAR filters using various electrode materials and optimization of the frequency response.

Degree: Master, Electrical Engineering, 2018, NSYSU

 In the piezoelectric acoustic devices, the bulk acoustic wave filter (BAW filter) has smaller loss than surface acoustic wave filter (SAW filter). Besides, BAW filter… (more)

Subjects/Keywords: Frequency response; Rapid thermal annealing (RTA); Reactive ion etching (RIE); Bulk acoustic wave filter (BAW filter); Zinc oxide (ZnO); Piezoelectric

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APA (6th Edition):

Lee, C. (2018). The study of FBAR filters using various electrode materials and optimization of the frequency response. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0727118-224657

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lee, Chiao-wen. “The study of FBAR filters using various electrode materials and optimization of the frequency response.” 2018. Thesis, NSYSU. Accessed October 22, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0727118-224657.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lee, Chiao-wen. “The study of FBAR filters using various electrode materials and optimization of the frequency response.” 2018. Web. 22 Oct 2019.

Vancouver:

Lee C. The study of FBAR filters using various electrode materials and optimization of the frequency response. [Internet] [Thesis]. NSYSU; 2018. [cited 2019 Oct 22]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0727118-224657.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lee C. The study of FBAR filters using various electrode materials and optimization of the frequency response. [Thesis]. NSYSU; 2018. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0727118-224657

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Georgia Tech

24. Morris, Bryan George Oneal. In situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor.

Degree: PhD, Electrical and Computer Engineering, 2009, Georgia Tech

 This research explores a novel in-situ technique for monitoring film thickness in the reactive etching process that incorporates a micromachined sensor. The sensor correlates film… (more)

Subjects/Keywords: Capacitive interface circuit; Sacrificial layer technique; Integrated MEMS sensor; RIE process control; Etch rate monitoring; Resonant MEMS sensor; RIE; Reactive ion etching; Plasma etching; Semiconductor industry

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APA (6th Edition):

Morris, B. G. O. (2009). In situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/31688

Chicago Manual of Style (16th Edition):

Morris, Bryan George Oneal. “In situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor.” 2009. Doctoral Dissertation, Georgia Tech. Accessed October 22, 2019. http://hdl.handle.net/1853/31688.

MLA Handbook (7th Edition):

Morris, Bryan George Oneal. “In situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor.” 2009. Web. 22 Oct 2019.

Vancouver:

Morris BGO. In situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor. [Internet] [Doctoral dissertation]. Georgia Tech; 2009. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/1853/31688.

Council of Science Editors:

Morris BGO. In situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor. [Doctoral Dissertation]. Georgia Tech; 2009. Available from: http://hdl.handle.net/1853/31688

25. Elg, Daniel Tyler. Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma.

Degree: PhD, Nuclear, Plasma, Radiolgc Engr, 2016, University of Illinois – Urbana-Champaign

 Throughout the 1980s and 1990s, as the semiconductor industry upheld Moore’s Law and continuously shrank device feature sizes, the wavelength of the lithography source remained… (more)

Subjects/Keywords: EUV; collector optics; Sn; etching; reactive ion etching; hydrogen plasma

…161 7.3 Ion Energy Flux-Driven Etching in XCEED… …172 7.3.3 Parameter Variation and Ion Energy Flux-driven Etching… …42 3.1 Etching Chambers… …89 4.4 High-Pressure Etching… …143 CHAPTER 7: ETCHING… 

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APA (6th Edition):

Elg, D. T. (2016). Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma. (Doctoral Dissertation). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/95271

Chicago Manual of Style (16th Edition):

Elg, Daniel Tyler. “Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma.” 2016. Doctoral Dissertation, University of Illinois – Urbana-Champaign. Accessed October 22, 2019. http://hdl.handle.net/2142/95271.

MLA Handbook (7th Edition):

Elg, Daniel Tyler. “Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma.” 2016. Web. 22 Oct 2019.

Vancouver:

Elg DT. Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma. [Internet] [Doctoral dissertation]. University of Illinois – Urbana-Champaign; 2016. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/2142/95271.

Council of Science Editors:

Elg DT. Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma. [Doctoral Dissertation]. University of Illinois – Urbana-Champaign; 2016. Available from: http://hdl.handle.net/2142/95271

26. ONG KNG YIH. CHARACTERISATION AND DETERMINATION OF THE ETCHING PROFILE OF VIA/TRENCH OF SI-BASED PHOTONIC CRYSTAL.

Degree: 2004, National University of Singapore

Subjects/Keywords: Trench etching; photonic crystal; Reactive ion etching; vertical profile; etch rate; passivation

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APA (6th Edition):

YIH, O. K. (2004). CHARACTERISATION AND DETERMINATION OF THE ETCHING PROFILE OF VIA/TRENCH OF SI-BASED PHOTONIC CRYSTAL. (Thesis). National University of Singapore. Retrieved from https://scholarbank.nus.edu.sg/handle/10635/154137

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

YIH, ONG KNG. “CHARACTERISATION AND DETERMINATION OF THE ETCHING PROFILE OF VIA/TRENCH OF SI-BASED PHOTONIC CRYSTAL.” 2004. Thesis, National University of Singapore. Accessed October 22, 2019. https://scholarbank.nus.edu.sg/handle/10635/154137.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

YIH, ONG KNG. “CHARACTERISATION AND DETERMINATION OF THE ETCHING PROFILE OF VIA/TRENCH OF SI-BASED PHOTONIC CRYSTAL.” 2004. Web. 22 Oct 2019.

Vancouver:

YIH OK. CHARACTERISATION AND DETERMINATION OF THE ETCHING PROFILE OF VIA/TRENCH OF SI-BASED PHOTONIC CRYSTAL. [Internet] [Thesis]. National University of Singapore; 2004. [cited 2019 Oct 22]. Available from: https://scholarbank.nus.edu.sg/handle/10635/154137.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

YIH OK. CHARACTERISATION AND DETERMINATION OF THE ETCHING PROFILE OF VIA/TRENCH OF SI-BASED PHOTONIC CRYSTAL. [Thesis]. National University of Singapore; 2004. Available from: https://scholarbank.nus.edu.sg/handle/10635/154137

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Universitat Politècnica de València

27. Montoliu Álvaro, Carles. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .

Degree: 2015, Universitat Politècnica de València

 [EN] The main topic of the present thesis is the improvement of fabrication processes simulation by means of the Level Set (LS) method. The LS… (more)

Subjects/Keywords: Level Set; Wet Etching; Dry Etching; Parallel Computing; CUDA; GPGPU

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APA (6th Edition):

Montoliu Álvaro, C. (2015). Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . (Doctoral Dissertation). Universitat Politècnica de València. Retrieved from http://hdl.handle.net/10251/58609

Chicago Manual of Style (16th Edition):

Montoliu Álvaro, Carles. “Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .” 2015. Doctoral Dissertation, Universitat Politècnica de València. Accessed October 22, 2019. http://hdl.handle.net/10251/58609.

MLA Handbook (7th Edition):

Montoliu Álvaro, Carles. “Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .” 2015. Web. 22 Oct 2019.

Vancouver:

Montoliu Álvaro C. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . [Internet] [Doctoral dissertation]. Universitat Politècnica de València; 2015. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/10251/58609.

Council of Science Editors:

Montoliu Álvaro C. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . [Doctoral Dissertation]. Universitat Politècnica de València; 2015. Available from: http://hdl.handle.net/10251/58609


University of Alberta

28. Kupsta, Martin. Advanced methods for GLAD thin films.

Degree: MS, Department of Electrical and Computer Engineering, 2010, University of Alberta

 Thin films are produced from layers of materials ranging from nanometres to micrometres in height. They are increasingly common and are being used in integrated… (more)

Subjects/Keywords: substrate cooling; nanotechnology; microelectrical mechanical systems (MEMS); substrate heating; thin films; glancing angle deposition (GLAD); humidity sensing; reactive ion etching (RIE); physical vapour deposition (PVD); adatom mobility; titanium dioxide (TiO2)

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APA (6th Edition):

Kupsta, M. (2010). Advanced methods for GLAD thin films. (Masters Thesis). University of Alberta. Retrieved from https://era.library.ualberta.ca/files/ch128nd76s

Chicago Manual of Style (16th Edition):

Kupsta, Martin. “Advanced methods for GLAD thin films.” 2010. Masters Thesis, University of Alberta. Accessed October 22, 2019. https://era.library.ualberta.ca/files/ch128nd76s.

MLA Handbook (7th Edition):

Kupsta, Martin. “Advanced methods for GLAD thin films.” 2010. Web. 22 Oct 2019.

Vancouver:

Kupsta M. Advanced methods for GLAD thin films. [Internet] [Masters thesis]. University of Alberta; 2010. [cited 2019 Oct 22]. Available from: https://era.library.ualberta.ca/files/ch128nd76s.

Council of Science Editors:

Kupsta M. Advanced methods for GLAD thin films. [Masters Thesis]. University of Alberta; 2010. Available from: https://era.library.ualberta.ca/files/ch128nd76s

29. Γεωργοπάνος, Προκόπιος. Σύνθεση, χαρακτηρισμός, ιδιότητες και εφαρμογές πολύπλοκης αρχιτεκτονικής πολυμερικών υλικών όπου η μία συστάδα είναι η πολυ(διμεθυλοσιλοξάνη).

Degree: 2011, University of Ioannina; Πανεπιστήμιο Ιωαννίνων

The synthesis of linear block copolymers of polystyrene (PS) and poly(dimethylsiloxane) (PDMS) of the PS-b-PDMS type, via anionic polymerization, under high vacuum techniques were already… (more)

Subjects/Keywords: Πολυμερή; Αστεροειδή συμπολυμερή; Πολυ(διμεθυλοσιλοξάνη); Πολυστυρένιο; Νανοτεχνολογία; Νανολιθογραφία; Δραστική ιοντική εγχάραξη; Αυτοοργάνωση; Polymers; Star block copolymers; Poly(dimethylsiloxane); Polystyrene; Nanotechnology; Nanolithography; Reactive ion etching; Self-assembly

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Γεωργοπάνος, . . (2011). Σύνθεση, χαρακτηρισμός, ιδιότητες και εφαρμογές πολύπλοκης αρχιτεκτονικής πολυμερικών υλικών όπου η μία συστάδα είναι η πολυ(διμεθυλοσιλοξάνη). (Thesis). University of Ioannina; Πανεπιστήμιο Ιωαννίνων. Retrieved from http://hdl.handle.net/10442/hedi/30303

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Γεωργοπάνος, Προκόπιος. “Σύνθεση, χαρακτηρισμός, ιδιότητες και εφαρμογές πολύπλοκης αρχιτεκτονικής πολυμερικών υλικών όπου η μία συστάδα είναι η πολυ(διμεθυλοσιλοξάνη).” 2011. Thesis, University of Ioannina; Πανεπιστήμιο Ιωαννίνων. Accessed October 22, 2019. http://hdl.handle.net/10442/hedi/30303.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Γεωργοπάνος, Προκόπιος. “Σύνθεση, χαρακτηρισμός, ιδιότητες και εφαρμογές πολύπλοκης αρχιτεκτονικής πολυμερικών υλικών όπου η μία συστάδα είναι η πολυ(διμεθυλοσιλοξάνη).” 2011. Web. 22 Oct 2019.

Vancouver:

Γεωργοπάνος . Σύνθεση, χαρακτηρισμός, ιδιότητες και εφαρμογές πολύπλοκης αρχιτεκτονικής πολυμερικών υλικών όπου η μία συστάδα είναι η πολυ(διμεθυλοσιλοξάνη). [Internet] [Thesis]. University of Ioannina; Πανεπιστήμιο Ιωαννίνων; 2011. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/10442/hedi/30303.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Γεωργοπάνος . Σύνθεση, χαρακτηρισμός, ιδιότητες και εφαρμογές πολύπλοκης αρχιτεκτονικής πολυμερικών υλικών όπου η μία συστάδα είναι η πολυ(διμεθυλοσιλοξάνη). [Thesis]. University of Ioannina; Πανεπιστήμιο Ιωαννίνων; 2011. Available from: http://hdl.handle.net/10442/hedi/30303

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Georgia Tech

30. Alabi, Taiwo Raphael. Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales.

Degree: PhD, Polymer, Textile and Fiber Engineering, 2013, Georgia Tech

 Silicon and silicon-based materials have been investigated for the fabrication of electronic, optoelectronic, solar, and structural/mechanical devices. To enable the continuous use of silicon-based materials… (more)

Subjects/Keywords: Reactive ion etching; Positive tone resist; Silicon nanowires; Block copolymers; Laser interference ablation; Negative tone resist; Silicon compounds; Photoresists; Masks (Electronics); Photopolymerization

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Alabi, T. R. (2013). Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/51709

Chicago Manual of Style (16th Edition):

Alabi, Taiwo Raphael. “Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales.” 2013. Doctoral Dissertation, Georgia Tech. Accessed October 22, 2019. http://hdl.handle.net/1853/51709.

MLA Handbook (7th Edition):

Alabi, Taiwo Raphael. “Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales.” 2013. Web. 22 Oct 2019.

Vancouver:

Alabi TR. Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Oct 22]. Available from: http://hdl.handle.net/1853/51709.

Council of Science Editors:

Alabi TR. Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/51709

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