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You searched for subject:(dc magnetron sputtering). Showing records 1 – 15 of 15 total matches.

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NSYSU

1. Yeh, Hsiao-chun. Target Erosion Pattern Control and Performance Enhancement of DC Magnetron Sputtering Systems by Structural Adjustment.

Degree: Master, Electrical Engineering, 2011, NSYSU

 In the process of sputtering, what a system operator concerns are the sputtering rate, target utilization, and substrates uniformity. All of them are influenced by… (more)

Subjects/Keywords: target erosion patterns.; DC Magnetron Sputtering System; Sputtering; substrates; target

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Yeh, H. (2011). Target Erosion Pattern Control and Performance Enhancement of DC Magnetron Sputtering Systems by Structural Adjustment. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802111-163350

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Yeh, Hsiao-chun. “Target Erosion Pattern Control and Performance Enhancement of DC Magnetron Sputtering Systems by Structural Adjustment.” 2011. Thesis, NSYSU. Accessed August 05, 2020. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802111-163350.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Yeh, Hsiao-chun. “Target Erosion Pattern Control and Performance Enhancement of DC Magnetron Sputtering Systems by Structural Adjustment.” 2011. Web. 05 Aug 2020.

Vancouver:

Yeh H. Target Erosion Pattern Control and Performance Enhancement of DC Magnetron Sputtering Systems by Structural Adjustment. [Internet] [Thesis]. NSYSU; 2011. [cited 2020 Aug 05]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802111-163350.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Yeh H. Target Erosion Pattern Control and Performance Enhancement of DC Magnetron Sputtering Systems by Structural Adjustment. [Thesis]. NSYSU; 2011. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802111-163350

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

2. Luo, You-Cheng. Study on Comparing WO3 & W18O49 Gas Sensing Abilities under NO2 Environment.

Degree: Master, Mechanical and Electro-Mechanical Engineering, 2015, NSYSU

 In this study, tungsten films (150 and 300 nm thick) by DC magnetron sputtering were made, and annealing treatment at 700°C environment was used to… (more)

Subjects/Keywords: DC magnetron sputtering; annealing treatment; W18O49; NO2 sensing; WO3

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APA (6th Edition):

Luo, Y. (2015). Study on Comparing WO3 & W18O49 Gas Sensing Abilities under NO2 Environment. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0628115-103551

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Luo, You-Cheng. “Study on Comparing WO3 & W18O49 Gas Sensing Abilities under NO2 Environment.” 2015. Thesis, NSYSU. Accessed August 05, 2020. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0628115-103551.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Luo, You-Cheng. “Study on Comparing WO3 & W18O49 Gas Sensing Abilities under NO2 Environment.” 2015. Web. 05 Aug 2020.

Vancouver:

Luo Y. Study on Comparing WO3 & W18O49 Gas Sensing Abilities under NO2 Environment. [Internet] [Thesis]. NSYSU; 2015. [cited 2020 Aug 05]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0628115-103551.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Luo Y. Study on Comparing WO3 & W18O49 Gas Sensing Abilities under NO2 Environment. [Thesis]. NSYSU; 2015. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0628115-103551

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

3. Aouadi, Khalil. Développement d’une nouvelle génération de revêtements ultra-durs. Etude de leur comportement tribologique et anticorrosif. : Development of a new generation of ultra-hard coatings. Study of their tribological and corrosion behavior.

Degree: Docteur es, Mécanique-matériaux, 2017, Paris, ENSAM; École polytechnique de Tunisie (La Marsa)

Le but de ce travail est de développer et de caractériser une nouvelle génération de revêtements multicouches anti-usure et anticorrosif à base de nitrure de… (more)

Subjects/Keywords: Pulvérisation magnétron réactive; Usure; Corrosion; Cr; CrlN; CrAIN; DC magnetron sputtering; Wear; Corrosion; Cr; CrN; CeAIN

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APA (6th Edition):

Aouadi, K. (2017). Développement d’une nouvelle génération de revêtements ultra-durs. Etude de leur comportement tribologique et anticorrosif. : Development of a new generation of ultra-hard coatings. Study of their tribological and corrosion behavior. (Doctoral Dissertation). Paris, ENSAM; École polytechnique de Tunisie (La Marsa). Retrieved from http://www.theses.fr/2017ENAM0041

Chicago Manual of Style (16th Edition):

Aouadi, Khalil. “Développement d’une nouvelle génération de revêtements ultra-durs. Etude de leur comportement tribologique et anticorrosif. : Development of a new generation of ultra-hard coatings. Study of their tribological and corrosion behavior.” 2017. Doctoral Dissertation, Paris, ENSAM; École polytechnique de Tunisie (La Marsa). Accessed August 05, 2020. http://www.theses.fr/2017ENAM0041.

MLA Handbook (7th Edition):

Aouadi, Khalil. “Développement d’une nouvelle génération de revêtements ultra-durs. Etude de leur comportement tribologique et anticorrosif. : Development of a new generation of ultra-hard coatings. Study of their tribological and corrosion behavior.” 2017. Web. 05 Aug 2020.

Vancouver:

Aouadi K. Développement d’une nouvelle génération de revêtements ultra-durs. Etude de leur comportement tribologique et anticorrosif. : Development of a new generation of ultra-hard coatings. Study of their tribological and corrosion behavior. [Internet] [Doctoral dissertation]. Paris, ENSAM; École polytechnique de Tunisie (La Marsa); 2017. [cited 2020 Aug 05]. Available from: http://www.theses.fr/2017ENAM0041.

Council of Science Editors:

Aouadi K. Développement d’une nouvelle génération de revêtements ultra-durs. Etude de leur comportement tribologique et anticorrosif. : Development of a new generation of ultra-hard coatings. Study of their tribological and corrosion behavior. [Doctoral Dissertation]. Paris, ENSAM; École polytechnique de Tunisie (La Marsa); 2017. Available from: http://www.theses.fr/2017ENAM0041


Loughborough University

4. Yilmaz, Sibel. Thin film CDTE solar cells deposited by pulsed DC magnetron sputtering.

Degree: PhD, 2017, Loughborough University

 Thin film cadmium telluride (CdTe) technology is the most important competitor for silicon (Si) based solar cells. Pulsed direct current (DC) magnetron sputtering is a… (more)

Subjects/Keywords: 621.31; CdTe; Thin film; Solar cells; Pulsed DC magnetron sputtering; CdCl2 activation process; Bubble formation; Blistering; Working gas

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Yilmaz, S. (2017). Thin film CDTE solar cells deposited by pulsed DC magnetron sputtering. (Doctoral Dissertation). Loughborough University. Retrieved from http://hdl.handle.net/2134/31838

Chicago Manual of Style (16th Edition):

Yilmaz, Sibel. “Thin film CDTE solar cells deposited by pulsed DC magnetron sputtering.” 2017. Doctoral Dissertation, Loughborough University. Accessed August 05, 2020. http://hdl.handle.net/2134/31838.

MLA Handbook (7th Edition):

Yilmaz, Sibel. “Thin film CDTE solar cells deposited by pulsed DC magnetron sputtering.” 2017. Web. 05 Aug 2020.

Vancouver:

Yilmaz S. Thin film CDTE solar cells deposited by pulsed DC magnetron sputtering. [Internet] [Doctoral dissertation]. Loughborough University; 2017. [cited 2020 Aug 05]. Available from: http://hdl.handle.net/2134/31838.

Council of Science Editors:

Yilmaz S. Thin film CDTE solar cells deposited by pulsed DC magnetron sputtering. [Doctoral Dissertation]. Loughborough University; 2017. Available from: http://hdl.handle.net/2134/31838

5. Ashok, K. Studies on metal nitride thin films prepared by DC reactive magnetron sputtering technique;.

Degree: 2015, Alagappa University

None

Advisors/Committee Members: Sanjeeviraja, C.

Subjects/Keywords: DC reactive magnetron sputtering technique; metal nitride thin films; preparation

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APA (6th Edition):

Ashok, K. (2015). Studies on metal nitride thin films prepared by DC reactive magnetron sputtering technique;. (Thesis). Alagappa University. Retrieved from http://shodhganga.inflibnet.ac.in/handle/10603/54332

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Ashok, K. “Studies on metal nitride thin films prepared by DC reactive magnetron sputtering technique;.” 2015. Thesis, Alagappa University. Accessed August 05, 2020. http://shodhganga.inflibnet.ac.in/handle/10603/54332.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Ashok, K. “Studies on metal nitride thin films prepared by DC reactive magnetron sputtering technique;.” 2015. Web. 05 Aug 2020.

Vancouver:

Ashok K. Studies on metal nitride thin films prepared by DC reactive magnetron sputtering technique;. [Internet] [Thesis]. Alagappa University; 2015. [cited 2020 Aug 05]. Available from: http://shodhganga.inflibnet.ac.in/handle/10603/54332.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Ashok K. Studies on metal nitride thin films prepared by DC reactive magnetron sputtering technique;. [Thesis]. Alagappa University; 2015. Available from: http://shodhganga.inflibnet.ac.in/handle/10603/54332

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


New Jersey Institute of Technology

6. Joshi, Chirag. Characterization and corrosion of BCC-tantalum coating deposited on aluminum and steel substrate by DC magnetron sputtering.

Degree: MSin Materials Science and Engineering - (M.S.), Committee for the Interdisciplinary Program in Materials Science and Engineering, 2003, New Jersey Institute of Technology

  Tantalum is one of the most versatile highly refractory corrosion-resistant metals. Tantalum coating can be used as an effective corrosion barrier if it is… (more)

Subjects/Keywords: Tantalum; Corrosion barrier; DC magnetron sputtering; Materials Science and Engineering

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APA (6th Edition):

Joshi, C. (2003). Characterization and corrosion of BCC-tantalum coating deposited on aluminum and steel substrate by DC magnetron sputtering. (Thesis). New Jersey Institute of Technology. Retrieved from https://digitalcommons.njit.edu/theses/596

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Joshi, Chirag. “Characterization and corrosion of BCC-tantalum coating deposited on aluminum and steel substrate by DC magnetron sputtering.” 2003. Thesis, New Jersey Institute of Technology. Accessed August 05, 2020. https://digitalcommons.njit.edu/theses/596.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Joshi, Chirag. “Characterization and corrosion of BCC-tantalum coating deposited on aluminum and steel substrate by DC magnetron sputtering.” 2003. Web. 05 Aug 2020.

Vancouver:

Joshi C. Characterization and corrosion of BCC-tantalum coating deposited on aluminum and steel substrate by DC magnetron sputtering. [Internet] [Thesis]. New Jersey Institute of Technology; 2003. [cited 2020 Aug 05]. Available from: https://digitalcommons.njit.edu/theses/596.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Joshi C. Characterization and corrosion of BCC-tantalum coating deposited on aluminum and steel substrate by DC magnetron sputtering. [Thesis]. New Jersey Institute of Technology; 2003. Available from: https://digitalcommons.njit.edu/theses/596

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Loughborough University

7. Lisco, Fabiana. High rate deposition processes for thin film CdTe solar cells.

Degree: PhD, 2015, Loughborough University

 This thesis describes the development of a fast rate method for the deposition of high quality CdS and CdTe thin films. The technique uses Pulsed… (more)

Subjects/Keywords: 621.31; CdS and CdTe thin films; Chemical Bath Deposition (CBD); Sonochemical bath deposition (sono-CBD); Pulsed DC magnetron sputtering (PDCMS); Electrodeposition (ED)

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APA (6th Edition):

Lisco, F. (2015). High rate deposition processes for thin film CdTe solar cells. (Doctoral Dissertation). Loughborough University. Retrieved from http://hdl.handle.net/2134/17965

Chicago Manual of Style (16th Edition):

Lisco, Fabiana. “High rate deposition processes for thin film CdTe solar cells.” 2015. Doctoral Dissertation, Loughborough University. Accessed August 05, 2020. http://hdl.handle.net/2134/17965.

MLA Handbook (7th Edition):

Lisco, Fabiana. “High rate deposition processes for thin film CdTe solar cells.” 2015. Web. 05 Aug 2020.

Vancouver:

Lisco F. High rate deposition processes for thin film CdTe solar cells. [Internet] [Doctoral dissertation]. Loughborough University; 2015. [cited 2020 Aug 05]. Available from: http://hdl.handle.net/2134/17965.

Council of Science Editors:

Lisco F. High rate deposition processes for thin film CdTe solar cells. [Doctoral Dissertation]. Loughborough University; 2015. Available from: http://hdl.handle.net/2134/17965

8. Cacucci, Arnaud. Croissance de multicouches périodiques métal/oxyde : relation structure / comportement électrique dans les systèmes à base de titane et de tungstène : Growth of metal/oxide periodic multilayer : relation between structure and electrical behaviour in systems based on titanium and tungsten.

Degree: Docteur es, Chimie - physique, 2014, Université de Bourgogne

Les multicouches périodiques ont trouvé de nombreuses applications dans les domaines de l’optique, de la mécanique ou encore de l’électronique. Néanmoins, peu d’études se concentrent… (more)

Subjects/Keywords: Multicouches métal/oxyde; Pulvérisation cathodique à courant continue; Microscopie électronique en Transmission; Résistivité électrique; Titane; Tungstène; Metal/oxide multilayers; DC magnetron sputtering; Transmission Electron Microscopy; Electrical resistivity; Titanium; Tungsten; 541.37; 541.36

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APA (6th Edition):

Cacucci, A. (2014). Croissance de multicouches périodiques métal/oxyde : relation structure / comportement électrique dans les systèmes à base de titane et de tungstène : Growth of metal/oxide periodic multilayer : relation between structure and electrical behaviour in systems based on titanium and tungsten. (Doctoral Dissertation). Université de Bourgogne. Retrieved from http://www.theses.fr/2014DIJOS003

Chicago Manual of Style (16th Edition):

Cacucci, Arnaud. “Croissance de multicouches périodiques métal/oxyde : relation structure / comportement électrique dans les systèmes à base de titane et de tungstène : Growth of metal/oxide periodic multilayer : relation between structure and electrical behaviour in systems based on titanium and tungsten.” 2014. Doctoral Dissertation, Université de Bourgogne. Accessed August 05, 2020. http://www.theses.fr/2014DIJOS003.

MLA Handbook (7th Edition):

Cacucci, Arnaud. “Croissance de multicouches périodiques métal/oxyde : relation structure / comportement électrique dans les systèmes à base de titane et de tungstène : Growth of metal/oxide periodic multilayer : relation between structure and electrical behaviour in systems based on titanium and tungsten.” 2014. Web. 05 Aug 2020.

Vancouver:

Cacucci A. Croissance de multicouches périodiques métal/oxyde : relation structure / comportement électrique dans les systèmes à base de titane et de tungstène : Growth of metal/oxide periodic multilayer : relation between structure and electrical behaviour in systems based on titanium and tungsten. [Internet] [Doctoral dissertation]. Université de Bourgogne; 2014. [cited 2020 Aug 05]. Available from: http://www.theses.fr/2014DIJOS003.

Council of Science Editors:

Cacucci A. Croissance de multicouches périodiques métal/oxyde : relation structure / comportement électrique dans les systèmes à base de titane et de tungstène : Growth of metal/oxide periodic multilayer : relation between structure and electrical behaviour in systems based on titanium and tungsten. [Doctoral Dissertation]. Université de Bourgogne; 2014. Available from: http://www.theses.fr/2014DIJOS003

9. Kozlowski, Scott M. The effect of substrate bias on the growth of vanadium oxide thin films.

Degree: MS, Engineering Science and Mechanics, 2014, Penn State University

 Current portable high performance thermal imaging devices are possible as a result of uncooled focal plane arrays of microbolometers. In order to increase efficiency, portability… (more)

Subjects/Keywords: sputtering; magnetron; reactive; vanadium oxide; vanadium; VOx; pulsed DC; bias; microbolometer; thermal imaging

…Petrilli started to investigate VO x deposited by pulsed DC magnetron sputtering as the topic for… …fabricated by the pulsed DC reactive magnetron sputtering of a V2O3 target [8]. The main… …pulsed DC magnetron sputtering of a metallic vanadium target in an oxidizing environment. By… …oxide thin films using pulsed DC reactive magnetron sputtering. Hitesh focused on improving… …vanadium oxide in situ. 2.2 Pulsed DC Reactive Magnetron Sputtering Sputtering is a thin film… 

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APA (6th Edition):

Kozlowski, S. M. (2014). The effect of substrate bias on the growth of vanadium oxide thin films. (Masters Thesis). Penn State University. Retrieved from https://etda.libraries.psu.edu/catalog/21853

Chicago Manual of Style (16th Edition):

Kozlowski, Scott M. “The effect of substrate bias on the growth of vanadium oxide thin films.” 2014. Masters Thesis, Penn State University. Accessed August 05, 2020. https://etda.libraries.psu.edu/catalog/21853.

MLA Handbook (7th Edition):

Kozlowski, Scott M. “The effect of substrate bias on the growth of vanadium oxide thin films.” 2014. Web. 05 Aug 2020.

Vancouver:

Kozlowski SM. The effect of substrate bias on the growth of vanadium oxide thin films. [Internet] [Masters thesis]. Penn State University; 2014. [cited 2020 Aug 05]. Available from: https://etda.libraries.psu.edu/catalog/21853.

Council of Science Editors:

Kozlowski SM. The effect of substrate bias on the growth of vanadium oxide thin films. [Masters Thesis]. Penn State University; 2014. Available from: https://etda.libraries.psu.edu/catalog/21853


New Jersey Institute of Technology

10. Jin, Lei. Preparation and properties of tantalum silicide films on silicon substrates.

Degree: MSin Materials Science and Engineering - (M.S.), Committee for the Interdisciplinary Program in Materials Science and Engineering, 2000, New Jersey Institute of Technology

  Tantalum silicide (TaSi2) thin films were sputter deposited on p- type and n- type silicon substrates using VARIAN 3125 magnetron DC sputtering system with… (more)

Subjects/Keywords: Tantalum silicide (TaSi2) thin films; silicon substrate VARIAN 3125 magnetron DC sputtering system; Materials Science and Engineering

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APA (6th Edition):

Jin, L. (2000). Preparation and properties of tantalum silicide films on silicon substrates. (Thesis). New Jersey Institute of Technology. Retrieved from https://digitalcommons.njit.edu/theses/763

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Jin, Lei. “Preparation and properties of tantalum silicide films on silicon substrates.” 2000. Thesis, New Jersey Institute of Technology. Accessed August 05, 2020. https://digitalcommons.njit.edu/theses/763.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Jin, Lei. “Preparation and properties of tantalum silicide films on silicon substrates.” 2000. Web. 05 Aug 2020.

Vancouver:

Jin L. Preparation and properties of tantalum silicide films on silicon substrates. [Internet] [Thesis]. New Jersey Institute of Technology; 2000. [cited 2020 Aug 05]. Available from: https://digitalcommons.njit.edu/theses/763.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Jin L. Preparation and properties of tantalum silicide films on silicon substrates. [Thesis]. New Jersey Institute of Technology; 2000. Available from: https://digitalcommons.njit.edu/theses/763

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

11. Lin, Keng-Yu. Thin films for thermoeletric applications.

Degree: The Institute of Technology, 2014, Linköping UniversityLinköping University

  Global warming and developments of alternative energy technologies have become important issues nowadays. Subsequently, the concept of energy harvesting is rising because of its… (more)

Subjects/Keywords: Thermoelectric; Thermoelectric figure of merit (ZT); Seebeck effect; Ca3Co4O9; ScN; CrN; ScxCr1-xN; reactive magnetron sputtering; post-annealing; DC magnetron sputtering

…16 5.1.2 DC magnetron sputtering… …Al2O3) (0001) substrates by DC magnetron sputtering Ca3Co4O9 has a high… …28]) 5.1.2 DC magnetron sputtering DC magnetron sputtering utilizes the Lorentz… …occurring which leads to higher sputtering and deposition rates. Therefore, the DC magnetron… …Sometimes it is hard to sputter insulating targets by DC magnetron sputtering since no DC current… 

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APA (6th Edition):

Lin, K. (2014). Thin films for thermoeletric applications. (Thesis). Linköping UniversityLinköping University. Retrieved from http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-109106

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lin, Keng-Yu. “Thin films for thermoeletric applications.” 2014. Thesis, Linköping UniversityLinköping University. Accessed August 05, 2020. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-109106.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lin, Keng-Yu. “Thin films for thermoeletric applications.” 2014. Web. 05 Aug 2020.

Vancouver:

Lin K. Thin films for thermoeletric applications. [Internet] [Thesis]. Linköping UniversityLinköping University; 2014. [cited 2020 Aug 05]. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-109106.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lin K. Thin films for thermoeletric applications. [Thesis]. Linköping UniversityLinköping University; 2014. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-109106

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

12. ZOU TING. TITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING.

Degree: 2006, National University of Singapore

Subjects/Keywords: Titanium nitride (TiN); thin film; reactive dc magnetron sputtering; deposition temperature; nitrogen flow rate; crystal structure; surface morphology; roughness; hardness and adhesion

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APA (6th Edition):

TING, Z. (2006). TITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING. (Thesis). National University of Singapore. Retrieved from https://scholarbank.nus.edu.sg/handle/10635/153882

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

TING, ZOU. “TITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING.” 2006. Thesis, National University of Singapore. Accessed August 05, 2020. https://scholarbank.nus.edu.sg/handle/10635/153882.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

TING, ZOU. “TITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING.” 2006. Web. 05 Aug 2020.

Vancouver:

TING Z. TITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING. [Internet] [Thesis]. National University of Singapore; 2006. [cited 2020 Aug 05]. Available from: https://scholarbank.nus.edu.sg/handle/10635/153882.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

TING Z. TITANIUM NITRIDE FILM DEPOSITED REACTIVE DC MAGNETRON SPUTTERING. [Thesis]. National University of Singapore; 2006. Available from: https://scholarbank.nus.edu.sg/handle/10635/153882

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

13. Roos, Andreas. Growth and characterization of advanced layered thin film structures : Amorphous SmCo thin film alloys.

Degree: Physics and Astronomy, 2012, Uppsala University

  This report describes the growth and characterization of thin amorphous samarium-cobalt alloy films. The samarium-cobalt alloy was grown by DC magnetron sputtering in the… (more)

Subjects/Keywords: uniaxial magnetic anisotropy; samarium Cobalt alloy; amorphous thin film; DC magnetron sputtering; magneto optic Kerr effect; x-ray scattering

…calibration samples were prepared by dc magnetron sputtering on Si(100) substrates, which… …Sm-Co composition was prepared by dc magnetron sputtering, on Si(100) substrate… …dc magnetron sputtering. The structure characterization of the thin SmCo films was done by… …filter before it hits the detector. 9 2 Experiments 2.1 Magnetron Sputtering Six growth rate… …sputtering chamber was 10-10 Torr, and the operating pressure of the Ar gas with purity of 99.999… 

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Roos, A. (2012). Growth and characterization of advanced layered thin film structures : Amorphous SmCo thin film alloys. (Thesis). Uppsala University. Retrieved from http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-177674

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Roos, Andreas. “Growth and characterization of advanced layered thin film structures : Amorphous SmCo thin film alloys.” 2012. Thesis, Uppsala University. Accessed August 05, 2020. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-177674.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Roos, Andreas. “Growth and characterization of advanced layered thin film structures : Amorphous SmCo thin film alloys.” 2012. Web. 05 Aug 2020.

Vancouver:

Roos A. Growth and characterization of advanced layered thin film structures : Amorphous SmCo thin film alloys. [Internet] [Thesis]. Uppsala University; 2012. [cited 2020 Aug 05]. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-177674.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Roos A. Growth and characterization of advanced layered thin film structures : Amorphous SmCo thin film alloys. [Thesis]. Uppsala University; 2012. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-177674

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Linköping University

14. Sohail, Hafiz Muhammad. Growth of Pt/Mg Multilayer X-ray Mirrors : Effects of Sputter Yield Amplification.

Degree: Chemistry and Biology, 2009, Linköping University

  This thesis report is focused on the growth of Pt/Mg multilayers and the studies of the sputter yield amplification effect in these. The main… (more)

Subjects/Keywords: Multilayer; X-ray mirror; Pt/Mg; DC magnetron sputtering; sputter yield amplification; backscattered neutrals; X-ray reflectivity; XRD; TRIM; IMD.; Physics; Fysik

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Sohail, H. M. (2009). Growth of Pt/Mg Multilayer X-ray Mirrors : Effects of Sputter Yield Amplification. (Thesis). Linköping University. Retrieved from http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17392

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Sohail, Hafiz Muhammad. “Growth of Pt/Mg Multilayer X-ray Mirrors : Effects of Sputter Yield Amplification.” 2009. Thesis, Linköping University. Accessed August 05, 2020. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17392.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Sohail, Hafiz Muhammad. “Growth of Pt/Mg Multilayer X-ray Mirrors : Effects of Sputter Yield Amplification.” 2009. Web. 05 Aug 2020.

Vancouver:

Sohail HM. Growth of Pt/Mg Multilayer X-ray Mirrors : Effects of Sputter Yield Amplification. [Internet] [Thesis]. Linköping University; 2009. [cited 2020 Aug 05]. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17392.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Sohail HM. Growth of Pt/Mg Multilayer X-ray Mirrors : Effects of Sputter Yield Amplification. [Thesis]. Linköping University; 2009. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-17392

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


North Carolina State University

15. Jur, Jesse Stephen. Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications.

Degree: PhD, Materials Science and Engineering, 2007, North Carolina State University

 The ability to improve performance of the high-end metal oxide semiconductor field effect transistor (MOSFET) is highly reliant on the dimensional scaling of such a… (more)

Subjects/Keywords: dc magnetron sputtering; physical vapor deposition; tungsten oxide; tungsten; W; tantalum nitride; TaN; lanthanum; lanthanum oxide; La; La2O3; La2SiO5; lanthanum silicate; La2Si2O7; Ho; holmium; holmium oxide; cation diffusion; back-side SIMS; secondary ion mass spectroscopy; SIMS; XRD; x-ray diffraction; molecular beam deposition; PMA; XPS; x-ray photoemission spectroscopy; post metallization anneal; RCA; chemical oxide; metal oxide semiconductor field effect transistor; MBE; silica; SiO2; interfacial layer; gate dielectric; dielectric; silicate; oxide; high-kappa; EOT; equivalent oxide thickness; high-k; band diagram; valance band offset; conduction band offset; band gap energy; effective work function; work function; voltage shift; threshold voltage; flat band voltage; leakage current; capacitance; mobility; electronic materials; scaling; Moore?s Law; MIS; MOS; MOSFET; high resolution transmission electron microscopy; HRTEM; RTA; rapid thermal anneal; PVD; tantalum; Ta; gate electrode; metal electrode; hafnium silicate; hafnium oxide; hafnium; ytterbium; ytterbium oxide; Yb; dysprosium oxide; dysprosium; Dy; E-beam evaporation; thermal evaporation; forming gas anneal; ozone; ammonia anneal; FGA

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Jur, J. S. (2007). Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications. (Doctoral Dissertation). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/5447

Chicago Manual of Style (16th Edition):

Jur, Jesse Stephen. “Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications.” 2007. Doctoral Dissertation, North Carolina State University. Accessed August 05, 2020. http://www.lib.ncsu.edu/resolver/1840.16/5447.

MLA Handbook (7th Edition):

Jur, Jesse Stephen. “Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications.” 2007. Web. 05 Aug 2020.

Vancouver:

Jur JS. Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications. [Internet] [Doctoral dissertation]. North Carolina State University; 2007. [cited 2020 Aug 05]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/5447.

Council of Science Editors:

Jur JS. Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications. [Doctoral Dissertation]. North Carolina State University; 2007. Available from: http://www.lib.ncsu.edu/resolver/1840.16/5447

.