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You searched for subject:(atomic layer deposition). Showing records 1 – 30 of 252 total matches.

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Oregon State University

1. Austin, Dustin Z. Atomic Layer Deposition of Multi-Insulator Metal-Insulator-Metal Capacitors.

Degree: PhD, 2017, Oregon State University

 Back end of line (BEOL) metal-insulator-metal capacitors (MIMCAPs) have become a core passive component in modern integrated circuits. International Technology Roadmap for Semiconductors (ITRS) projections… (more)

Subjects/Keywords: Atomic Layer Deposition

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APA (6th Edition):

Austin, D. Z. (2017). Atomic Layer Deposition of Multi-Insulator Metal-Insulator-Metal Capacitors. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/61522

Chicago Manual of Style (16th Edition):

Austin, Dustin Z. “Atomic Layer Deposition of Multi-Insulator Metal-Insulator-Metal Capacitors.” 2017. Doctoral Dissertation, Oregon State University. Accessed January 29, 2020. http://hdl.handle.net/1957/61522.

MLA Handbook (7th Edition):

Austin, Dustin Z. “Atomic Layer Deposition of Multi-Insulator Metal-Insulator-Metal Capacitors.” 2017. Web. 29 Jan 2020.

Vancouver:

Austin DZ. Atomic Layer Deposition of Multi-Insulator Metal-Insulator-Metal Capacitors. [Internet] [Doctoral dissertation]. Oregon State University; 2017. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/1957/61522.

Council of Science Editors:

Austin DZ. Atomic Layer Deposition of Multi-Insulator Metal-Insulator-Metal Capacitors. [Doctoral Dissertation]. Oregon State University; 2017. Available from: http://hdl.handle.net/1957/61522


University of Georgia

2. Kim, Jay Yu. Ultrahigh vacuum surface analysis studies of electrochemical atomic layer deposition of metals and compound semiconductors.

Degree: PhD, Chemistry, 2008, University of Georgia

 The main topic of this dissertation is electrochemical atomic layer deposition (ALD) by ultrahigh vacuum (UHV) surface analysis. The purpose of electrochemical ALD is to… (more)

Subjects/Keywords: Electrochemical atomic layer deposition

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APA (6th Edition):

Kim, J. Y. (2008). Ultrahigh vacuum surface analysis studies of electrochemical atomic layer deposition of metals and compound semiconductors. (Doctoral Dissertation). University of Georgia. Retrieved from http://purl.galileo.usg.edu/uga_etd/kim_jay_y_200808_phd

Chicago Manual of Style (16th Edition):

Kim, Jay Yu. “Ultrahigh vacuum surface analysis studies of electrochemical atomic layer deposition of metals and compound semiconductors.” 2008. Doctoral Dissertation, University of Georgia. Accessed January 29, 2020. http://purl.galileo.usg.edu/uga_etd/kim_jay_y_200808_phd.

MLA Handbook (7th Edition):

Kim, Jay Yu. “Ultrahigh vacuum surface analysis studies of electrochemical atomic layer deposition of metals and compound semiconductors.” 2008. Web. 29 Jan 2020.

Vancouver:

Kim JY. Ultrahigh vacuum surface analysis studies of electrochemical atomic layer deposition of metals and compound semiconductors. [Internet] [Doctoral dissertation]. University of Georgia; 2008. [cited 2020 Jan 29]. Available from: http://purl.galileo.usg.edu/uga_etd/kim_jay_y_200808_phd.

Council of Science Editors:

Kim JY. Ultrahigh vacuum surface analysis studies of electrochemical atomic layer deposition of metals and compound semiconductors. [Doctoral Dissertation]. University of Georgia; 2008. Available from: http://purl.galileo.usg.edu/uga_etd/kim_jay_y_200808_phd


Oregon State University

3. Valdivia, Arturo Herrera. Atomic Layer Deposition of Two Dimensional MoS2 on 150 mm Substrates.

Degree: MS, Material Science, 2016, Oregon State University

 Two-dimensional transition metal dichalcogenides (TMDs) have recently come under intense investigation as building blocks for van der Waals heterostructure electronics. One of the most promising… (more)

Subjects/Keywords: ALD; Atomic layer deposition

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APA (6th Edition):

Valdivia, A. H. (2016). Atomic Layer Deposition of Two Dimensional MoS2 on 150 mm Substrates. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/59551

Chicago Manual of Style (16th Edition):

Valdivia, Arturo Herrera. “Atomic Layer Deposition of Two Dimensional MoS2 on 150 mm Substrates.” 2016. Masters Thesis, Oregon State University. Accessed January 29, 2020. http://hdl.handle.net/1957/59551.

MLA Handbook (7th Edition):

Valdivia, Arturo Herrera. “Atomic Layer Deposition of Two Dimensional MoS2 on 150 mm Substrates.” 2016. Web. 29 Jan 2020.

Vancouver:

Valdivia AH. Atomic Layer Deposition of Two Dimensional MoS2 on 150 mm Substrates. [Internet] [Masters thesis]. Oregon State University; 2016. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/1957/59551.

Council of Science Editors:

Valdivia AH. Atomic Layer Deposition of Two Dimensional MoS2 on 150 mm Substrates. [Masters Thesis]. Oregon State University; 2016. Available from: http://hdl.handle.net/1957/59551


Cornell University

4. Sohn, Hae Won. Investigations of Area Selective Atomic Layer Deposition .

Degree: 2018, Cornell University

 The demand for semiconductor devices has grown over the past decades as the volume of data stored or processed have exponentially increased. To accommodate the… (more)

Subjects/Keywords: Atomic Layer Deposition; Materials Science

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APA (6th Edition):

Sohn, H. W. (2018). Investigations of Area Selective Atomic Layer Deposition . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/59555

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Sohn, Hae Won. “Investigations of Area Selective Atomic Layer Deposition .” 2018. Thesis, Cornell University. Accessed January 29, 2020. http://hdl.handle.net/1813/59555.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Sohn, Hae Won. “Investigations of Area Selective Atomic Layer Deposition .” 2018. Web. 29 Jan 2020.

Vancouver:

Sohn HW. Investigations of Area Selective Atomic Layer Deposition . [Internet] [Thesis]. Cornell University; 2018. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/1813/59555.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Sohn HW. Investigations of Area Selective Atomic Layer Deposition . [Thesis]. Cornell University; 2018. Available from: http://hdl.handle.net/1813/59555

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Texas – Austin

5. -5717-0719. Atomic layer deposition of functional materials.

Degree: PhD, Chemical Engineering, 2015, University of Texas – Austin

Atomic layer deposition (ALD) has emerged as an important technique for depositing thin films in both scientific research and industrial applications. The goal of this… (more)

Subjects/Keywords: Atomic layer deposition; Thin films

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APA (6th Edition):

-5717-0719. (2015). Atomic layer deposition of functional materials. (Doctoral Dissertation). University of Texas – Austin. Retrieved from http://hdl.handle.net/2152/30485

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Chicago Manual of Style (16th Edition):

-5717-0719. “Atomic layer deposition of functional materials.” 2015. Doctoral Dissertation, University of Texas – Austin. Accessed January 29, 2020. http://hdl.handle.net/2152/30485.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

MLA Handbook (7th Edition):

-5717-0719. “Atomic layer deposition of functional materials.” 2015. Web. 29 Jan 2020.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Vancouver:

-5717-0719. Atomic layer deposition of functional materials. [Internet] [Doctoral dissertation]. University of Texas – Austin; 2015. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/2152/30485.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Council of Science Editors:

-5717-0719. Atomic layer deposition of functional materials. [Doctoral Dissertation]. University of Texas – Austin; 2015. Available from: http://hdl.handle.net/2152/30485

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete


University College Cork

6. Manley, Harry. An evaluation of some commercially-available thin TiO2 films and TiO2 films grown by atomic layer deposition for potential photocatalytic applications.

Degree: 2018, University College Cork

Atomic Layer Deposition (ALD) was utilized to synthesize nominally undoped titanium dioxide (TiO2) and a range of doped TiO2 films (Ti1-xO2:Mx) on quartz substrates, separately… (more)

Subjects/Keywords: TiO2; Photocatalysis; Atomic layer deposition

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APA (6th Edition):

Manley, H. (2018). An evaluation of some commercially-available thin TiO2 films and TiO2 films grown by atomic layer deposition for potential photocatalytic applications. (Thesis). University College Cork. Retrieved from http://hdl.handle.net/10468/6825

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Manley, Harry. “An evaluation of some commercially-available thin TiO2 films and TiO2 films grown by atomic layer deposition for potential photocatalytic applications.” 2018. Thesis, University College Cork. Accessed January 29, 2020. http://hdl.handle.net/10468/6825.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Manley, Harry. “An evaluation of some commercially-available thin TiO2 films and TiO2 films grown by atomic layer deposition for potential photocatalytic applications.” 2018. Web. 29 Jan 2020.

Vancouver:

Manley H. An evaluation of some commercially-available thin TiO2 films and TiO2 films grown by atomic layer deposition for potential photocatalytic applications. [Internet] [Thesis]. University College Cork; 2018. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10468/6825.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Manley H. An evaluation of some commercially-available thin TiO2 films and TiO2 films grown by atomic layer deposition for potential photocatalytic applications. [Thesis]. University College Cork; 2018. Available from: http://hdl.handle.net/10468/6825

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Alberta

7. Foroughi Abari, Ali. Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates.

Degree: PhD, Department of Chemical and Materials Engineering, 2012, University of Alberta

Atomic layer deposition (ALD) is a powerful ultra-thin film deposition technique that uses sequential self-limiting surface reactions to provide conformal atomic scale film growth. Deposition(more)

Subjects/Keywords: Ellipsometry; Atomic Layer Deposition; Thin Film

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APA (6th Edition):

Foroughi Abari, A. (2012). Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates. (Doctoral Dissertation). University of Alberta. Retrieved from https://era.library.ualberta.ca/files/zw12z615t

Chicago Manual of Style (16th Edition):

Foroughi Abari, Ali. “Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates.” 2012. Doctoral Dissertation, University of Alberta. Accessed January 29, 2020. https://era.library.ualberta.ca/files/zw12z615t.

MLA Handbook (7th Edition):

Foroughi Abari, Ali. “Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates.” 2012. Web. 29 Jan 2020.

Vancouver:

Foroughi Abari A. Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates. [Internet] [Doctoral dissertation]. University of Alberta; 2012. [cited 2020 Jan 29]. Available from: https://era.library.ualberta.ca/files/zw12z615t.

Council of Science Editors:

Foroughi Abari A. Atomic Layer Deposition of Metal Oxide Thin Films on Metallic Substrates. [Doctoral Dissertation]. University of Alberta; 2012. Available from: https://era.library.ualberta.ca/files/zw12z615t


University of Minnesota

8. Moersch, Tyler Leighton. Understanding cominatorial atomic layer deposition and chemical vapor deposition.

Degree: PhD, Chemistry, 2009, University of Minnesota

 The transformation of molecular precursor to solid film begins with an understanding of molecular structure, proceeds through delivery of the molecule to the surface and… (more)

Subjects/Keywords: ALD; Atomic; Combinatorial; CVD; Deposition; Layer; Chemistry

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APA (6th Edition):

Moersch, T. L. (2009). Understanding cominatorial atomic layer deposition and chemical vapor deposition. (Doctoral Dissertation). University of Minnesota. Retrieved from http://purl.umn.edu/48025

Chicago Manual of Style (16th Edition):

Moersch, Tyler Leighton. “Understanding cominatorial atomic layer deposition and chemical vapor deposition.” 2009. Doctoral Dissertation, University of Minnesota. Accessed January 29, 2020. http://purl.umn.edu/48025.

MLA Handbook (7th Edition):

Moersch, Tyler Leighton. “Understanding cominatorial atomic layer deposition and chemical vapor deposition.” 2009. Web. 29 Jan 2020.

Vancouver:

Moersch TL. Understanding cominatorial atomic layer deposition and chemical vapor deposition. [Internet] [Doctoral dissertation]. University of Minnesota; 2009. [cited 2020 Jan 29]. Available from: http://purl.umn.edu/48025.

Council of Science Editors:

Moersch TL. Understanding cominatorial atomic layer deposition and chemical vapor deposition. [Doctoral Dissertation]. University of Minnesota; 2009. Available from: http://purl.umn.edu/48025


University of Notre Dame

9. Louisa Catharina Schneider. Fabrication of Single Electron Transistors using Atomic Layer Deposition</h1>.

Degree: MSin Electrical Engineering, Electrical Engineering, 2014, University of Notre Dame

  The main focus in our work is the integration of atomic layer deposited oxide for metallic Single Electron Transistors (SET’s). Currently, the choice of… (more)

Subjects/Keywords: Atomic Layer Deposition; Single Electron Transistor

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APA (6th Edition):

Schneider, L. C. (2014). Fabrication of Single Electron Transistors using Atomic Layer Deposition</h1>. (Masters Thesis). University of Notre Dame. Retrieved from https://curate.nd.edu/show/xp68kd19z6x

Chicago Manual of Style (16th Edition):

Schneider, Louisa Catharina. “Fabrication of Single Electron Transistors using Atomic Layer Deposition</h1>.” 2014. Masters Thesis, University of Notre Dame. Accessed January 29, 2020. https://curate.nd.edu/show/xp68kd19z6x.

MLA Handbook (7th Edition):

Schneider, Louisa Catharina. “Fabrication of Single Electron Transistors using Atomic Layer Deposition</h1>.” 2014. Web. 29 Jan 2020.

Vancouver:

Schneider LC. Fabrication of Single Electron Transistors using Atomic Layer Deposition</h1>. [Internet] [Masters thesis]. University of Notre Dame; 2014. [cited 2020 Jan 29]. Available from: https://curate.nd.edu/show/xp68kd19z6x.

Council of Science Editors:

Schneider LC. Fabrication of Single Electron Transistors using Atomic Layer Deposition</h1>. [Masters Thesis]. University of Notre Dame; 2014. Available from: https://curate.nd.edu/show/xp68kd19z6x


University of Illinois – Chicago

10. Cui, Xiaodan. Nanostructured Thin Film Materials for Solid Oxide Fuel Cells by Atomic Layer Deposition.

Degree: 2015, University of Illinois – Chicago

 Nickel yttria-stabilized zirconia (Ni-YSZ) is the most commonly used anode material for solid oxide fuel cells (SOFCs). The electrochemical performance of Ni-YSZ anodes can be… (more)

Subjects/Keywords: Atomic Layer Deposition Solid Oxide Fuel Cells

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APA (6th Edition):

Cui, X. (2015). Nanostructured Thin Film Materials for Solid Oxide Fuel Cells by Atomic Layer Deposition. (Thesis). University of Illinois – Chicago. Retrieved from http://hdl.handle.net/10027/19468

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Cui, Xiaodan. “Nanostructured Thin Film Materials for Solid Oxide Fuel Cells by Atomic Layer Deposition.” 2015. Thesis, University of Illinois – Chicago. Accessed January 29, 2020. http://hdl.handle.net/10027/19468.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Cui, Xiaodan. “Nanostructured Thin Film Materials for Solid Oxide Fuel Cells by Atomic Layer Deposition.” 2015. Web. 29 Jan 2020.

Vancouver:

Cui X. Nanostructured Thin Film Materials for Solid Oxide Fuel Cells by Atomic Layer Deposition. [Internet] [Thesis]. University of Illinois – Chicago; 2015. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10027/19468.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Cui X. Nanostructured Thin Film Materials for Solid Oxide Fuel Cells by Atomic Layer Deposition. [Thesis]. University of Illinois – Chicago; 2015. Available from: http://hdl.handle.net/10027/19468

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Colorado School of Mines

11. Kelkar, Sanket S. Design and fabrication of asymmetric nanopores using pulsed PECVD.

Degree: PhD, Chemical and Biological Engineering, 2015, Colorado School of Mines

 Manipulating matter at nanometric length scales is important for many electronic, chemical and biological applications. Structures such as nanopores demonstrate a phenomenon known as hindered… (more)

Subjects/Keywords: Membranes; Pulsed PECVD; Nanopores; Atomic layer deposition

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APA (6th Edition):

Kelkar, S. S. (2015). Design and fabrication of asymmetric nanopores using pulsed PECVD. (Doctoral Dissertation). Colorado School of Mines. Retrieved from http://hdl.handle.net/11124/20173

Chicago Manual of Style (16th Edition):

Kelkar, Sanket S. “Design and fabrication of asymmetric nanopores using pulsed PECVD.” 2015. Doctoral Dissertation, Colorado School of Mines. Accessed January 29, 2020. http://hdl.handle.net/11124/20173.

MLA Handbook (7th Edition):

Kelkar, Sanket S. “Design and fabrication of asymmetric nanopores using pulsed PECVD.” 2015. Web. 29 Jan 2020.

Vancouver:

Kelkar SS. Design and fabrication of asymmetric nanopores using pulsed PECVD. [Internet] [Doctoral dissertation]. Colorado School of Mines; 2015. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/11124/20173.

Council of Science Editors:

Kelkar SS. Design and fabrication of asymmetric nanopores using pulsed PECVD. [Doctoral Dissertation]. Colorado School of Mines; 2015. Available from: http://hdl.handle.net/11124/20173


University of North Texas

12. Zhou, Mi. Boron Nitride by Atomic Layer Deposition: A Template for Graphene Growth.

Degree: 2011, University of North Texas

 The growth of single and multilayer BN films on several substrates was investigated. A typical atomic layer deposition (ALD) process was demonstrated on Si(111) substrate… (more)

Subjects/Keywords: Atomic layer deposition; boron nitride; grapheme; ALD

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APA (6th Edition):

Zhou, M. (2011). Boron Nitride by Atomic Layer Deposition: A Template for Graphene Growth. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc84305/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Zhou, Mi. “Boron Nitride by Atomic Layer Deposition: A Template for Graphene Growth.” 2011. Thesis, University of North Texas. Accessed January 29, 2020. https://digital.library.unt.edu/ark:/67531/metadc84305/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Zhou, Mi. “Boron Nitride by Atomic Layer Deposition: A Template for Graphene Growth.” 2011. Web. 29 Jan 2020.

Vancouver:

Zhou M. Boron Nitride by Atomic Layer Deposition: A Template for Graphene Growth. [Internet] [Thesis]. University of North Texas; 2011. [cited 2020 Jan 29]. Available from: https://digital.library.unt.edu/ark:/67531/metadc84305/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Zhou M. Boron Nitride by Atomic Layer Deposition: A Template for Graphene Growth. [Thesis]. University of North Texas; 2011. Available from: https://digital.library.unt.edu/ark:/67531/metadc84305/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Chicago

13. Selvaraj, Sathees Kannan. Atomic Layer Deposition of Metal Oxides for Emerging Applications.

Degree: 2015, University of Illinois – Chicago

Atomic layer deposition (ALD) is a vapor phase thin film deposition technique that offers excellent control on film thickness and composition and superior conformality. This… (more)

Subjects/Keywords: Atomic layer deposition; Metal oxides; Selective atomic layer deposition; Reactor design; Titanium oxide; LabVIEW

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APA (6th Edition):

Selvaraj, S. K. (2015). Atomic Layer Deposition of Metal Oxides for Emerging Applications. (Thesis). University of Illinois – Chicago. Retrieved from http://hdl.handle.net/10027/19847

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Selvaraj, Sathees Kannan. “Atomic Layer Deposition of Metal Oxides for Emerging Applications.” 2015. Thesis, University of Illinois – Chicago. Accessed January 29, 2020. http://hdl.handle.net/10027/19847.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Selvaraj, Sathees Kannan. “Atomic Layer Deposition of Metal Oxides for Emerging Applications.” 2015. Web. 29 Jan 2020.

Vancouver:

Selvaraj SK. Atomic Layer Deposition of Metal Oxides for Emerging Applications. [Internet] [Thesis]. University of Illinois – Chicago; 2015. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10027/19847.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Selvaraj SK. Atomic Layer Deposition of Metal Oxides for Emerging Applications. [Thesis]. University of Illinois – Chicago; 2015. Available from: http://hdl.handle.net/10027/19847

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Tartu University

14. Kozlova, Jekaterina. Complex characterization of graphene structures on nanometer level .

Degree: 2019, Tartu University

 Antud töö raames valmistati ja karakteriseeriti puhtal ja funktsionaliseeritud kujul mõne- ja mitmekihilisel grafeenil põhinevaid struktuure, kasutades erinevaid spektroskoopia ja kõrglahutusmikroskoopia meetodeid. Selleks juurutati mõnekihilise… (more)

Subjects/Keywords: nanoscopy; graphene; precipitation (chemistry; nickel; chemical vapour deposition; atomic layer deposition

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APA (6th Edition):

Kozlova, J. (2019). Complex characterization of graphene structures on nanometer level . (Thesis). Tartu University. Retrieved from http://hdl.handle.net/10062/66628

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kozlova, Jekaterina. “Complex characterization of graphene structures on nanometer level .” 2019. Thesis, Tartu University. Accessed January 29, 2020. http://hdl.handle.net/10062/66628.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kozlova, Jekaterina. “Complex characterization of graphene structures on nanometer level .” 2019. Web. 29 Jan 2020.

Vancouver:

Kozlova J. Complex characterization of graphene structures on nanometer level . [Internet] [Thesis]. Tartu University; 2019. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10062/66628.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kozlova J. Complex characterization of graphene structures on nanometer level . [Thesis]. Tartu University; 2019. Available from: http://hdl.handle.net/10062/66628

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


North Carolina State University

15. Peng, Qing. Nanoscale Engineering Materials with Supercritical Fluid and Atomic Layer Deposition.

Degree: PhD, Chemical Engineering, 2009, North Carolina State University

 With the development of material science and technology, modification of substrates, which have random geometry and high aspect ratio three dimensional (3D) complex structures, with… (more)

Subjects/Keywords: supercritical carbon dioxide; thin film; atomic layer deposition; molecular layer deposition; three dimensional; complex structure

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APA (6th Edition):

Peng, Q. (2009). Nanoscale Engineering Materials with Supercritical Fluid and Atomic Layer Deposition. (Doctoral Dissertation). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/3550

Chicago Manual of Style (16th Edition):

Peng, Qing. “Nanoscale Engineering Materials with Supercritical Fluid and Atomic Layer Deposition.” 2009. Doctoral Dissertation, North Carolina State University. Accessed January 29, 2020. http://www.lib.ncsu.edu/resolver/1840.16/3550.

MLA Handbook (7th Edition):

Peng, Qing. “Nanoscale Engineering Materials with Supercritical Fluid and Atomic Layer Deposition.” 2009. Web. 29 Jan 2020.

Vancouver:

Peng Q. Nanoscale Engineering Materials with Supercritical Fluid and Atomic Layer Deposition. [Internet] [Doctoral dissertation]. North Carolina State University; 2009. [cited 2020 Jan 29]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/3550.

Council of Science Editors:

Peng Q. Nanoscale Engineering Materials with Supercritical Fluid and Atomic Layer Deposition. [Doctoral Dissertation]. North Carolina State University; 2009. Available from: http://www.lib.ncsu.edu/resolver/1840.16/3550


University of Colorado

16. Wallas, Jasmine Melissa. Atomic and Molecular Layer Deposition for Efficient Capacitive Deionization, Plasma Corrosion Protection and Stable High-Energy Lithium Ion Batteries.

Degree: PhD, 2019, University of Colorado

Atomic layer deposition (ALD) is a technique to deposit thin films with great precision. Molecular layer deposition (MLD), developed as an analog of ALD, is… (more)

Subjects/Keywords: atomic layer deposition; energy storage; moleculary layer deposition; thin films; Chemistry; Materials Chemistry

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APA (6th Edition):

Wallas, J. M. (2019). Atomic and Molecular Layer Deposition for Efficient Capacitive Deionization, Plasma Corrosion Protection and Stable High-Energy Lithium Ion Batteries. (Doctoral Dissertation). University of Colorado. Retrieved from https://scholar.colorado.edu/chemistry_gradetds/4

Chicago Manual of Style (16th Edition):

Wallas, Jasmine Melissa. “Atomic and Molecular Layer Deposition for Efficient Capacitive Deionization, Plasma Corrosion Protection and Stable High-Energy Lithium Ion Batteries.” 2019. Doctoral Dissertation, University of Colorado. Accessed January 29, 2020. https://scholar.colorado.edu/chemistry_gradetds/4.

MLA Handbook (7th Edition):

Wallas, Jasmine Melissa. “Atomic and Molecular Layer Deposition for Efficient Capacitive Deionization, Plasma Corrosion Protection and Stable High-Energy Lithium Ion Batteries.” 2019. Web. 29 Jan 2020.

Vancouver:

Wallas JM. Atomic and Molecular Layer Deposition for Efficient Capacitive Deionization, Plasma Corrosion Protection and Stable High-Energy Lithium Ion Batteries. [Internet] [Doctoral dissertation]. University of Colorado; 2019. [cited 2020 Jan 29]. Available from: https://scholar.colorado.edu/chemistry_gradetds/4.

Council of Science Editors:

Wallas JM. Atomic and Molecular Layer Deposition for Efficient Capacitive Deionization, Plasma Corrosion Protection and Stable High-Energy Lithium Ion Batteries. [Doctoral Dissertation]. University of Colorado; 2019. Available from: https://scholar.colorado.edu/chemistry_gradetds/4


University of Colorado

17. DuMont, Jaime Willadean. In Situ Infrared Spectroscopic Studies of Molecular Layer Deposition and Atomic Layer Etching Processes.

Degree: PhD, Chemistry & Biochemistry, 2016, University of Colorado

  In this thesis, in situ Fourier transform infrared (FTIR) spectroscopy was used to study: i) the growth and pyrolysis of molecular layer deposition (MLD)… (more)

Subjects/Keywords: Atomic Layer Deposition; Infrared Spectroscopy; Molecular Layer Deposition; alucone; tincone; composites; Chemistry; Materials Chemistry

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APA (6th Edition):

DuMont, J. W. (2016). In Situ Infrared Spectroscopic Studies of Molecular Layer Deposition and Atomic Layer Etching Processes. (Doctoral Dissertation). University of Colorado. Retrieved from https://scholar.colorado.edu/chem_gradetds/202

Chicago Manual of Style (16th Edition):

DuMont, Jaime Willadean. “In Situ Infrared Spectroscopic Studies of Molecular Layer Deposition and Atomic Layer Etching Processes.” 2016. Doctoral Dissertation, University of Colorado. Accessed January 29, 2020. https://scholar.colorado.edu/chem_gradetds/202.

MLA Handbook (7th Edition):

DuMont, Jaime Willadean. “In Situ Infrared Spectroscopic Studies of Molecular Layer Deposition and Atomic Layer Etching Processes.” 2016. Web. 29 Jan 2020.

Vancouver:

DuMont JW. In Situ Infrared Spectroscopic Studies of Molecular Layer Deposition and Atomic Layer Etching Processes. [Internet] [Doctoral dissertation]. University of Colorado; 2016. [cited 2020 Jan 29]. Available from: https://scholar.colorado.edu/chem_gradetds/202.

Council of Science Editors:

DuMont JW. In Situ Infrared Spectroscopic Studies of Molecular Layer Deposition and Atomic Layer Etching Processes. [Doctoral Dissertation]. University of Colorado; 2016. Available from: https://scholar.colorado.edu/chem_gradetds/202

18. Anu, Philip. Preparation and Characterization ofHigh-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications.

Degree: Instrumentation, 2011, Cochin University of Science and Technology

Present work deals with the Preparation and characterization of high-k aluminum oxide thin films by atomic layer deposition for gate dielectric applications.The ever-increasing demand for… (more)

Subjects/Keywords: Thin Films; Atomic Layer Deposition; High-k Aluminum Oxide; Gate Dielectric Applications; Plasma Enhanced Atomic Layer Deposition

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APA (6th Edition):

Anu, P. (2011). Preparation and Characterization ofHigh-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications. (Thesis). Cochin University of Science and Technology. Retrieved from http://dyuthi.cusat.ac.in/purl/3034

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Anu, Philip. “Preparation and Characterization ofHigh-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications.” 2011. Thesis, Cochin University of Science and Technology. Accessed January 29, 2020. http://dyuthi.cusat.ac.in/purl/3034.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Anu, Philip. “Preparation and Characterization ofHigh-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications.” 2011. Web. 29 Jan 2020.

Vancouver:

Anu P. Preparation and Characterization ofHigh-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications. [Internet] [Thesis]. Cochin University of Science and Technology; 2011. [cited 2020 Jan 29]. Available from: http://dyuthi.cusat.ac.in/purl/3034.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Anu P. Preparation and Characterization ofHigh-k Aluminum Oxide Thin Films by Atomic Layer Deposition for Gate Dielectric Applications. [Thesis]. Cochin University of Science and Technology; 2011. Available from: http://dyuthi.cusat.ac.in/purl/3034

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Université de Grenoble

19. Prieur, Thomas. Sélection d'un précurseur pour l'élaboration de couches atomiques de cuivre : application à l'intégration 3D : Selection of a precursor for the atomic layer deposition of copper : application to the 3D integration.

Degree: Docteur es, Génie civil, 2012, Université de Grenoble

Avec l’augmentation de la densité de fonctionnalités dans les différents circuits intégrés nous entourant, l’intégration 3D (empilement des puces) devient incontournable. L’un des point-clés d’une… (more)

Subjects/Keywords: Atomic Layer Deposition; Cuivre; TSV; Intégration 3D; Tantale; Précurseurs; Atomic Layer Deposition; Copper; TSV; Tantalum; 3D integration; Précursors

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APA (6th Edition):

Prieur, T. (2012). Sélection d'un précurseur pour l'élaboration de couches atomiques de cuivre : application à l'intégration 3D : Selection of a precursor for the atomic layer deposition of copper : application to the 3D integration. (Doctoral Dissertation). Université de Grenoble. Retrieved from http://www.theses.fr/2012GRENI097

Chicago Manual of Style (16th Edition):

Prieur, Thomas. “Sélection d'un précurseur pour l'élaboration de couches atomiques de cuivre : application à l'intégration 3D : Selection of a precursor for the atomic layer deposition of copper : application to the 3D integration.” 2012. Doctoral Dissertation, Université de Grenoble. Accessed January 29, 2020. http://www.theses.fr/2012GRENI097.

MLA Handbook (7th Edition):

Prieur, Thomas. “Sélection d'un précurseur pour l'élaboration de couches atomiques de cuivre : application à l'intégration 3D : Selection of a precursor for the atomic layer deposition of copper : application to the 3D integration.” 2012. Web. 29 Jan 2020.

Vancouver:

Prieur T. Sélection d'un précurseur pour l'élaboration de couches atomiques de cuivre : application à l'intégration 3D : Selection of a precursor for the atomic layer deposition of copper : application to the 3D integration. [Internet] [Doctoral dissertation]. Université de Grenoble; 2012. [cited 2020 Jan 29]. Available from: http://www.theses.fr/2012GRENI097.

Council of Science Editors:

Prieur T. Sélection d'un précurseur pour l'élaboration de couches atomiques de cuivre : application à l'intégration 3D : Selection of a precursor for the atomic layer deposition of copper : application to the 3D integration. [Doctoral Dissertation]. Université de Grenoble; 2012. Available from: http://www.theses.fr/2012GRENI097

20. Niinistö, Jaakko. Atomic Layer Deposition of High-k Dielectrics from Novel Cyclopentadienyl-Type Precursors.

Degree: 2006, Helsinki University of Technology

The atomic layer deposition (ALD) method was applied for fabricating high permittivity (high-k) dielectrics, viz. HfO2, ZrO2 and rare earth oxides, which can be used… (more)

Subjects/Keywords: atomic layer deposition; ALD; high-k dielectrics; oxide thin films; cyclopentadienyl

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APA (6th Edition):

Niinistö, J. (2006). Atomic Layer Deposition of High-k Dielectrics from Novel Cyclopentadienyl-Type Precursors. (Thesis). Helsinki University of Technology. Retrieved from http://lib.tkk.fi/Diss/2006/isbn9512281708/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Niinistö, Jaakko. “Atomic Layer Deposition of High-k Dielectrics from Novel Cyclopentadienyl-Type Precursors.” 2006. Thesis, Helsinki University of Technology. Accessed January 29, 2020. http://lib.tkk.fi/Diss/2006/isbn9512281708/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Niinistö, Jaakko. “Atomic Layer Deposition of High-k Dielectrics from Novel Cyclopentadienyl-Type Precursors.” 2006. Web. 29 Jan 2020.

Vancouver:

Niinistö J. Atomic Layer Deposition of High-k Dielectrics from Novel Cyclopentadienyl-Type Precursors. [Internet] [Thesis]. Helsinki University of Technology; 2006. [cited 2020 Jan 29]. Available from: http://lib.tkk.fi/Diss/2006/isbn9512281708/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Niinistö J. Atomic Layer Deposition of High-k Dielectrics from Novel Cyclopentadienyl-Type Precursors. [Thesis]. Helsinki University of Technology; 2006. Available from: http://lib.tkk.fi/Diss/2006/isbn9512281708/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

21. Harjuoja, Jenni. Atomic Layer Deposition of Binary and Ternary Lead and Bismuth Oxide Thin Films.

Degree: 2007, Helsinki University of Technology

This thesis describes the deposition of binary lead oxide and ternary lead titanate, lead zirconate, bismuth silicate, and bismuth titanate films by atomic layer deposition(more)

Subjects/Keywords: ALD; atomic layer deposition; oxides; thin films; lead oxides; bismuth oxides

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APA (6th Edition):

Harjuoja, J. (2007). Atomic Layer Deposition of Binary and Ternary Lead and Bismuth Oxide Thin Films. (Thesis). Helsinki University of Technology. Retrieved from http://lib.tkk.fi/Diss/2007/isbn9789512287031/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Harjuoja, Jenni. “Atomic Layer Deposition of Binary and Ternary Lead and Bismuth Oxide Thin Films.” 2007. Thesis, Helsinki University of Technology. Accessed January 29, 2020. http://lib.tkk.fi/Diss/2007/isbn9789512287031/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Harjuoja, Jenni. “Atomic Layer Deposition of Binary and Ternary Lead and Bismuth Oxide Thin Films.” 2007. Web. 29 Jan 2020.

Vancouver:

Harjuoja J. Atomic Layer Deposition of Binary and Ternary Lead and Bismuth Oxide Thin Films. [Internet] [Thesis]. Helsinki University of Technology; 2007. [cited 2020 Jan 29]. Available from: http://lib.tkk.fi/Diss/2007/isbn9789512287031/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Harjuoja J. Atomic Layer Deposition of Binary and Ternary Lead and Bismuth Oxide Thin Films. [Thesis]. Helsinki University of Technology; 2007. Available from: http://lib.tkk.fi/Diss/2007/isbn9789512287031/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Minnesota

22. Gabriel, Nicholas Theodore. High-power and high-aspect-ratio optical coatings by atomic layer deposition.

Degree: PhD, Electrical Engineering, 2011, University of Minnesota

 In high-power applications, optical coatings must meet rigorous thermomechanical and damage threshold standards in addition to performing the desired optical function, which includes filters, beam… (more)

Subjects/Keywords: Atomic layer deposition; Nanolaminate; Optical coatings; Thermal conductivity; Thermal expansion

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APA (6th Edition):

Gabriel, N. T. (2011). High-power and high-aspect-ratio optical coatings by atomic layer deposition. (Doctoral Dissertation). University of Minnesota. Retrieved from http://purl.umn.edu/131713

Chicago Manual of Style (16th Edition):

Gabriel, Nicholas Theodore. “High-power and high-aspect-ratio optical coatings by atomic layer deposition.” 2011. Doctoral Dissertation, University of Minnesota. Accessed January 29, 2020. http://purl.umn.edu/131713.

MLA Handbook (7th Edition):

Gabriel, Nicholas Theodore. “High-power and high-aspect-ratio optical coatings by atomic layer deposition.” 2011. Web. 29 Jan 2020.

Vancouver:

Gabriel NT. High-power and high-aspect-ratio optical coatings by atomic layer deposition. [Internet] [Doctoral dissertation]. University of Minnesota; 2011. [cited 2020 Jan 29]. Available from: http://purl.umn.edu/131713.

Council of Science Editors:

Gabriel NT. High-power and high-aspect-ratio optical coatings by atomic layer deposition. [Doctoral Dissertation]. University of Minnesota; 2011. Available from: http://purl.umn.edu/131713


University of Minnesota

23. Chen, Xiaoshu. Atomic layer lithography of plasmonic nanogaps for enhanced light-matter interactions: fabrication and applications.

Degree: PhD, Electrical Engineering, 2016, University of Minnesota

 Enhanced light-matter interactions at the nanometer scale have many potential applications, such as thin film sensing, enhanced Raman scattering, enhanced infrared absorption, particle manipulation, among… (more)

Subjects/Keywords: Atomic layer deposition; Infrared spectroscopy; Nanogap; Plasmonics; Raman spectroscopy; Sensing

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APA (6th Edition):

Chen, X. (2016). Atomic layer lithography of plasmonic nanogaps for enhanced light-matter interactions: fabrication and applications. (Doctoral Dissertation). University of Minnesota. Retrieved from http://hdl.handle.net/11299/194628

Chicago Manual of Style (16th Edition):

Chen, Xiaoshu. “Atomic layer lithography of plasmonic nanogaps for enhanced light-matter interactions: fabrication and applications.” 2016. Doctoral Dissertation, University of Minnesota. Accessed January 29, 2020. http://hdl.handle.net/11299/194628.

MLA Handbook (7th Edition):

Chen, Xiaoshu. “Atomic layer lithography of plasmonic nanogaps for enhanced light-matter interactions: fabrication and applications.” 2016. Web. 29 Jan 2020.

Vancouver:

Chen X. Atomic layer lithography of plasmonic nanogaps for enhanced light-matter interactions: fabrication and applications. [Internet] [Doctoral dissertation]. University of Minnesota; 2016. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/11299/194628.

Council of Science Editors:

Chen X. Atomic layer lithography of plasmonic nanogaps for enhanced light-matter interactions: fabrication and applications. [Doctoral Dissertation]. University of Minnesota; 2016. Available from: http://hdl.handle.net/11299/194628


University of Illinois – Urbana-Champaign

24. Brzezinski, Andrew. Engineering and characterizing light-matter interactions in photonic crystals.

Degree: PhD, 0130, 2010, University of Illinois – Urbana-Champaign

 Photonic crystals can affect the behavior of visible light, and other electromagnetic waves, in ways that are not possible by other means. The propagation of… (more)

Subjects/Keywords: Fluorescent photonic crystals; Angle-resolved optical spectroscopy; Atomic layer deposition

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APA (6th Edition):

Brzezinski, A. (2010). Engineering and characterizing light-matter interactions in photonic crystals. (Doctoral Dissertation). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/16050

Chicago Manual of Style (16th Edition):

Brzezinski, Andrew. “Engineering and characterizing light-matter interactions in photonic crystals.” 2010. Doctoral Dissertation, University of Illinois – Urbana-Champaign. Accessed January 29, 2020. http://hdl.handle.net/2142/16050.

MLA Handbook (7th Edition):

Brzezinski, Andrew. “Engineering and characterizing light-matter interactions in photonic crystals.” 2010. Web. 29 Jan 2020.

Vancouver:

Brzezinski A. Engineering and characterizing light-matter interactions in photonic crystals. [Internet] [Doctoral dissertation]. University of Illinois – Urbana-Champaign; 2010. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/2142/16050.

Council of Science Editors:

Brzezinski A. Engineering and characterizing light-matter interactions in photonic crystals. [Doctoral Dissertation]. University of Illinois – Urbana-Champaign; 2010. Available from: http://hdl.handle.net/2142/16050


University of Notre Dame

25. Michael S. McConnell. Effect of Platinum Oxidation and Reduction on Single Electron Transistors Fabricated by Atomic Layer Deposition</h1>.

Degree: MSin Electrical Engineering, Electrical Engineering, 2016, University of Notre Dame

  This work describes the fabrication of single electron transistors using electron beam lithography and atomic layer deposition to form nanoscale tunnel transparent junctions of… (more)

Subjects/Keywords: single electronics; single electron transistor; atomic layer deposition

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APA (6th Edition):

McConnell, M. S. (2016). Effect of Platinum Oxidation and Reduction on Single Electron Transistors Fabricated by Atomic Layer Deposition</h1>. (Masters Thesis). University of Notre Dame. Retrieved from https://curate.nd.edu/show/vx021c2104k

Chicago Manual of Style (16th Edition):

McConnell, Michael S.. “Effect of Platinum Oxidation and Reduction on Single Electron Transistors Fabricated by Atomic Layer Deposition</h1>.” 2016. Masters Thesis, University of Notre Dame. Accessed January 29, 2020. https://curate.nd.edu/show/vx021c2104k.

MLA Handbook (7th Edition):

McConnell, Michael S.. “Effect of Platinum Oxidation and Reduction on Single Electron Transistors Fabricated by Atomic Layer Deposition</h1>.” 2016. Web. 29 Jan 2020.

Vancouver:

McConnell MS. Effect of Platinum Oxidation and Reduction on Single Electron Transistors Fabricated by Atomic Layer Deposition</h1>. [Internet] [Masters thesis]. University of Notre Dame; 2016. [cited 2020 Jan 29]. Available from: https://curate.nd.edu/show/vx021c2104k.

Council of Science Editors:

McConnell MS. Effect of Platinum Oxidation and Reduction on Single Electron Transistors Fabricated by Atomic Layer Deposition</h1>. [Masters Thesis]. University of Notre Dame; 2016. Available from: https://curate.nd.edu/show/vx021c2104k


NSYSU

26. Kung, Po-Cheng. ZnO/Ga2O3 Superlattice Thin Films: Growth by Atomic Layer Deposition and Characterizations of Physical Properties.

Degree: Master, Physics, 2017, NSYSU

 The effects of cooldown Ga oxidation are reported on the structural, optical, and temperature vapor pressure properties of c-plane ZnO thin films grown on c-plane… (more)

Subjects/Keywords: ZnO; GaO; Superlattice; Photoluminescence; X-ray Reflectivity; Atomic Layer Deposition

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APA (6th Edition):

Kung, P. (2017). ZnO/Ga2O3 Superlattice Thin Films: Growth by Atomic Layer Deposition and Characterizations of Physical Properties. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0814117-045903

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kung, Po-Cheng. “ZnO/Ga2O3 Superlattice Thin Films: Growth by Atomic Layer Deposition and Characterizations of Physical Properties.” 2017. Thesis, NSYSU. Accessed January 29, 2020. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0814117-045903.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kung, Po-Cheng. “ZnO/Ga2O3 Superlattice Thin Films: Growth by Atomic Layer Deposition and Characterizations of Physical Properties.” 2017. Web. 29 Jan 2020.

Vancouver:

Kung P. ZnO/Ga2O3 Superlattice Thin Films: Growth by Atomic Layer Deposition and Characterizations of Physical Properties. [Internet] [Thesis]. NSYSU; 2017. [cited 2020 Jan 29]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0814117-045903.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kung P. ZnO/Ga2O3 Superlattice Thin Films: Growth by Atomic Layer Deposition and Characterizations of Physical Properties. [Thesis]. NSYSU; 2017. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0814117-045903

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Brigham Young University

27. Kane, David Alan. Penetration Depth Variation in Atomic Layer Deposition on Multiwalled Carbon Nanotube Forests.

Degree: MS, 2018, Brigham Young University

Atomic Layer Deposition (ALD) of Al2O3 on tall multiwalled carbon nanotube forests shows concentration variation with the depth in the form of discrete steps. While… (more)

Subjects/Keywords: carbon nanotubes; Knudsen diffusion; atomic layer deposition; sticking coefficient

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APA (6th Edition):

Kane, D. A. (2018). Penetration Depth Variation in Atomic Layer Deposition on Multiwalled Carbon Nanotube Forests. (Masters Thesis). Brigham Young University. Retrieved from https://scholarsarchive.byu.edu/cgi/viewcontent.cgi?article=8124&context=etd

Chicago Manual of Style (16th Edition):

Kane, David Alan. “Penetration Depth Variation in Atomic Layer Deposition on Multiwalled Carbon Nanotube Forests.” 2018. Masters Thesis, Brigham Young University. Accessed January 29, 2020. https://scholarsarchive.byu.edu/cgi/viewcontent.cgi?article=8124&context=etd.

MLA Handbook (7th Edition):

Kane, David Alan. “Penetration Depth Variation in Atomic Layer Deposition on Multiwalled Carbon Nanotube Forests.” 2018. Web. 29 Jan 2020.

Vancouver:

Kane DA. Penetration Depth Variation in Atomic Layer Deposition on Multiwalled Carbon Nanotube Forests. [Internet] [Masters thesis]. Brigham Young University; 2018. [cited 2020 Jan 29]. Available from: https://scholarsarchive.byu.edu/cgi/viewcontent.cgi?article=8124&context=etd.

Council of Science Editors:

Kane DA. Penetration Depth Variation in Atomic Layer Deposition on Multiwalled Carbon Nanotube Forests. [Masters Thesis]. Brigham Young University; 2018. Available from: https://scholarsarchive.byu.edu/cgi/viewcontent.cgi?article=8124&context=etd


NSYSU

28. Cheng, Yi-Fen. Study of Magneto-Transport and Hall Effect of P-type ZnO Film.

Degree: Master, Physics, 2013, NSYSU

 Wurtzite ZnO exhibits along its c-axis a spontaneous polarization that leads to Quantum-Confined Stark Effect (QCSE) and reduces its luminous efficiency. Use of ZnO crystals… (more)

Subjects/Keywords: Hall effect; magnetoresistance; ZnO; Al2O3; atomic layer deposition

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APA (6th Edition):

Cheng, Y. (2013). Study of Magneto-Transport and Hall Effect of P-type ZnO Film. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802113-164123

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Cheng, Yi-Fen. “Study of Magneto-Transport and Hall Effect of P-type ZnO Film.” 2013. Thesis, NSYSU. Accessed January 29, 2020. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802113-164123.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Cheng, Yi-Fen. “Study of Magneto-Transport and Hall Effect of P-type ZnO Film.” 2013. Web. 29 Jan 2020.

Vancouver:

Cheng Y. Study of Magneto-Transport and Hall Effect of P-type ZnO Film. [Internet] [Thesis]. NSYSU; 2013. [cited 2020 Jan 29]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802113-164123.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Cheng Y. Study of Magneto-Transport and Hall Effect of P-type ZnO Film. [Thesis]. NSYSU; 2013. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0802113-164123

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Louisiana State University

29. Zhao, Jianqing. Novel Syntheses and Surface Modifications of Electrode Materials for Superior Lithium-Ion Batteries.

Degree: PhD, Mechanical Engineering, 2014, Louisiana State University

 Rechargeable lithium-ion battery is one of the most promising energy conversion and storage systems that offers high energy and powder densities, long service life and… (more)

Subjects/Keywords: atomic layer deposition; phase transition; full lithium-ion batteries; solvothermal method

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Zhao, J. (2014). Novel Syntheses and Surface Modifications of Electrode Materials for Superior Lithium-Ion Batteries. (Doctoral Dissertation). Louisiana State University. Retrieved from etd-10272014-111941 ; https://digitalcommons.lsu.edu/gradschool_dissertations/841

Chicago Manual of Style (16th Edition):

Zhao, Jianqing. “Novel Syntheses and Surface Modifications of Electrode Materials for Superior Lithium-Ion Batteries.” 2014. Doctoral Dissertation, Louisiana State University. Accessed January 29, 2020. etd-10272014-111941 ; https://digitalcommons.lsu.edu/gradschool_dissertations/841.

MLA Handbook (7th Edition):

Zhao, Jianqing. “Novel Syntheses and Surface Modifications of Electrode Materials for Superior Lithium-Ion Batteries.” 2014. Web. 29 Jan 2020.

Vancouver:

Zhao J. Novel Syntheses and Surface Modifications of Electrode Materials for Superior Lithium-Ion Batteries. [Internet] [Doctoral dissertation]. Louisiana State University; 2014. [cited 2020 Jan 29]. Available from: etd-10272014-111941 ; https://digitalcommons.lsu.edu/gradschool_dissertations/841.

Council of Science Editors:

Zhao J. Novel Syntheses and Surface Modifications of Electrode Materials for Superior Lithium-Ion Batteries. [Doctoral Dissertation]. Louisiana State University; 2014. Available from: etd-10272014-111941 ; https://digitalcommons.lsu.edu/gradschool_dissertations/841


UCLA

30. Pham, Calvin Dinh-Tu. Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures.

Degree: Chemical Engineering, 2015, UCLA

 Complex metal oxides exhibit remarkable tunability in their ferromagnetic, ferroelectric, and multiferroic properties that enable future applications such as non-volatile memory, miniaturized antenna, sensors and… (more)

Subjects/Keywords: Chemical engineering; ALD; Atomic Layer Deposition; BiFeO3; CoFe2O4; Multiferroic; YMnO3

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Pham, C. D. (2015). Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures. (Thesis). UCLA. Retrieved from http://www.escholarship.org/uc/item/4qk4w945

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Pham, Calvin Dinh-Tu. “Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures.” 2015. Thesis, UCLA. Accessed January 29, 2020. http://www.escholarship.org/uc/item/4qk4w945.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Pham, Calvin Dinh-Tu. “Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures.” 2015. Web. 29 Jan 2020.

Vancouver:

Pham CD. Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures. [Internet] [Thesis]. UCLA; 2015. [cited 2020 Jan 29]. Available from: http://www.escholarship.org/uc/item/4qk4w945.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Pham CD. Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures. [Thesis]. UCLA; 2015. Available from: http://www.escholarship.org/uc/item/4qk4w945

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

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