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You searched for subject:(Vapor plating). Showing records 1 – 30 of 42 total matches.

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Rutgers University

1. Wong, Sun. Computational and experimental study of GaN chemical vapor deposition reactor.

Degree: PhD, Mechanical and Aerospace Engineering, 2017, Rutgers University

Gallium Nitride is an important semiconductor that many industries use for consumer products such as RF application for celltowers, LED lighting, and HEMTs for power… (more)

Subjects/Keywords: Vapor-plating

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APA (6th Edition):

Wong, S. (2017). Computational and experimental study of GaN chemical vapor deposition reactor. (Doctoral Dissertation). Rutgers University. Retrieved from https://rucore.libraries.rutgers.edu/rutgers-lib/55774/

Chicago Manual of Style (16th Edition):

Wong, Sun. “Computational and experimental study of GaN chemical vapor deposition reactor.” 2017. Doctoral Dissertation, Rutgers University. Accessed January 29, 2020. https://rucore.libraries.rutgers.edu/rutgers-lib/55774/.

MLA Handbook (7th Edition):

Wong, Sun. “Computational and experimental study of GaN chemical vapor deposition reactor.” 2017. Web. 29 Jan 2020.

Vancouver:

Wong S. Computational and experimental study of GaN chemical vapor deposition reactor. [Internet] [Doctoral dissertation]. Rutgers University; 2017. [cited 2020 Jan 29]. Available from: https://rucore.libraries.rutgers.edu/rutgers-lib/55774/.

Council of Science Editors:

Wong S. Computational and experimental study of GaN chemical vapor deposition reactor. [Doctoral Dissertation]. Rutgers University; 2017. Available from: https://rucore.libraries.rutgers.edu/rutgers-lib/55774/


Hong Kong University of Science and Technology

2. Han, Chunrui. Chiral metamaterials by shadowing vapor deposition.

Degree: 2013, Hong Kong University of Science and Technology

 Chiral metamaterials have attracted much attention ever since it was predicted that negative refraction can be achieved by large chirality. In fact, chiral metamaterials also… (more)

Subjects/Keywords: Metamaterials ; Chirality ; Vapor-plating

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APA (6th Edition):

Han, C. (2013). Chiral metamaterials by shadowing vapor deposition. (Thesis). Hong Kong University of Science and Technology. Retrieved from http://repository.ust.hk/ir/Record/1783.1-62309 ; https://doi.org/10.14711/thesis-b1266316 ; http://repository.ust.hk/ir/bitstream/1783.1-62309/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Han, Chunrui. “Chiral metamaterials by shadowing vapor deposition.” 2013. Thesis, Hong Kong University of Science and Technology. Accessed January 29, 2020. http://repository.ust.hk/ir/Record/1783.1-62309 ; https://doi.org/10.14711/thesis-b1266316 ; http://repository.ust.hk/ir/bitstream/1783.1-62309/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Han, Chunrui. “Chiral metamaterials by shadowing vapor deposition.” 2013. Web. 29 Jan 2020.

Vancouver:

Han C. Chiral metamaterials by shadowing vapor deposition. [Internet] [Thesis]. Hong Kong University of Science and Technology; 2013. [cited 2020 Jan 29]. Available from: http://repository.ust.hk/ir/Record/1783.1-62309 ; https://doi.org/10.14711/thesis-b1266316 ; http://repository.ust.hk/ir/bitstream/1783.1-62309/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Han C. Chiral metamaterials by shadowing vapor deposition. [Thesis]. Hong Kong University of Science and Technology; 2013. Available from: http://repository.ust.hk/ir/Record/1783.1-62309 ; https://doi.org/10.14711/thesis-b1266316 ; http://repository.ust.hk/ir/bitstream/1783.1-62309/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Hong Kong University of Science and Technology

3. Cao, Xin PHYS. Vapour-deposited colloidal glass and the microscopic friction.

Degree: 2017, Hong Kong University of Science and Technology

 Vapour deposition can directly form ultra-stable glasses which are similar to conventional glasses aged over thousands years after quenching from the liquid. It is believed… (more)

Subjects/Keywords: Vapor-plating ; Colloidal crystals ; Friction ; Higgs bosons

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APA (6th Edition):

Cao, X. P. (2017). Vapour-deposited colloidal glass and the microscopic friction. (Thesis). Hong Kong University of Science and Technology. Retrieved from http://repository.ust.hk/ir/Record/1783.1-95323 ; https://doi.org/10.14711/thesis-991012572368303412 ; http://repository.ust.hk/ir/bitstream/1783.1-95323/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Cao, Xin PHYS. “Vapour-deposited colloidal glass and the microscopic friction.” 2017. Thesis, Hong Kong University of Science and Technology. Accessed January 29, 2020. http://repository.ust.hk/ir/Record/1783.1-95323 ; https://doi.org/10.14711/thesis-991012572368303412 ; http://repository.ust.hk/ir/bitstream/1783.1-95323/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Cao, Xin PHYS. “Vapour-deposited colloidal glass and the microscopic friction.” 2017. Web. 29 Jan 2020.

Vancouver:

Cao XP. Vapour-deposited colloidal glass and the microscopic friction. [Internet] [Thesis]. Hong Kong University of Science and Technology; 2017. [cited 2020 Jan 29]. Available from: http://repository.ust.hk/ir/Record/1783.1-95323 ; https://doi.org/10.14711/thesis-991012572368303412 ; http://repository.ust.hk/ir/bitstream/1783.1-95323/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Cao XP. Vapour-deposited colloidal glass and the microscopic friction. [Thesis]. Hong Kong University of Science and Technology; 2017. Available from: http://repository.ust.hk/ir/Record/1783.1-95323 ; https://doi.org/10.14711/thesis-991012572368303412 ; http://repository.ust.hk/ir/bitstream/1783.1-95323/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


The Ohio State University

4. Smith, Russell Guy. Characterization of inorganic pigment production by vapor phase reaction.

Degree: PhD, Graduate School, 1972, The Ohio State University

Subjects/Keywords: Engineering; Vapor-liquid equilibrium; Vapor-plating

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APA (6th Edition):

Smith, R. G. (1972). Characterization of inorganic pigment production by vapor phase reaction. (Doctoral Dissertation). The Ohio State University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=osu1486739989928641

Chicago Manual of Style (16th Edition):

Smith, Russell Guy. “Characterization of inorganic pigment production by vapor phase reaction.” 1972. Doctoral Dissertation, The Ohio State University. Accessed January 29, 2020. http://rave.ohiolink.edu/etdc/view?acc_num=osu1486739989928641.

MLA Handbook (7th Edition):

Smith, Russell Guy. “Characterization of inorganic pigment production by vapor phase reaction.” 1972. Web. 29 Jan 2020.

Vancouver:

Smith RG. Characterization of inorganic pigment production by vapor phase reaction. [Internet] [Doctoral dissertation]. The Ohio State University; 1972. [cited 2020 Jan 29]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=osu1486739989928641.

Council of Science Editors:

Smith RG. Characterization of inorganic pigment production by vapor phase reaction. [Doctoral Dissertation]. The Ohio State University; 1972. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=osu1486739989928641


University of South Australia

5. McPhee, Michael Angus. Studies of the quality assurance and failure mechanisms of PVD coating systems for the optimised performancae of HSS drills.

Degree: PhD, 1995, University of South Australia

Subjects/Keywords: Electric drills.; Vapor-plating.

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APA (6th Edition):

McPhee, M. A. (1995). Studies of the quality assurance and failure mechanisms of PVD coating systems for the optimised performancae of HSS drills. (Doctoral Dissertation). University of South Australia. Retrieved from http://arrow.unisa.edu.au:8081/1959.8/84190 ; http://arrow.unisa.edu.au/vital/access/manager/Repository/unisa:42723

Chicago Manual of Style (16th Edition):

McPhee, Michael Angus. “Studies of the quality assurance and failure mechanisms of PVD coating systems for the optimised performancae of HSS drills.” 1995. Doctoral Dissertation, University of South Australia. Accessed January 29, 2020. http://arrow.unisa.edu.au:8081/1959.8/84190 ; http://arrow.unisa.edu.au/vital/access/manager/Repository/unisa:42723.

MLA Handbook (7th Edition):

McPhee, Michael Angus. “Studies of the quality assurance and failure mechanisms of PVD coating systems for the optimised performancae of HSS drills.” 1995. Web. 29 Jan 2020.

Vancouver:

McPhee MA. Studies of the quality assurance and failure mechanisms of PVD coating systems for the optimised performancae of HSS drills. [Internet] [Doctoral dissertation]. University of South Australia; 1995. [cited 2020 Jan 29]. Available from: http://arrow.unisa.edu.au:8081/1959.8/84190 ; http://arrow.unisa.edu.au/vital/access/manager/Repository/unisa:42723.

Council of Science Editors:

McPhee MA. Studies of the quality assurance and failure mechanisms of PVD coating systems for the optimised performancae of HSS drills. [Doctoral Dissertation]. University of South Australia; 1995. Available from: http://arrow.unisa.edu.au:8081/1959.8/84190 ; http://arrow.unisa.edu.au/vital/access/manager/Repository/unisa:42723


Montana State University

6. Gokce, Huseyin. Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten.

Degree: College of Engineering, 1991, Montana State University

Subjects/Keywords: Tungsten.; Vapor-plating.; Silane.

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APA (6th Edition):

Gokce, H. (1991). Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten. (Thesis). Montana State University. Retrieved from https://scholarworks.montana.edu/xmlui/handle/1/6869

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Gokce, Huseyin. “Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten.” 1991. Thesis, Montana State University. Accessed January 29, 2020. https://scholarworks.montana.edu/xmlui/handle/1/6869.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Gokce, Huseyin. “Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten.” 1991. Web. 29 Jan 2020.

Vancouver:

Gokce H. Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten. [Internet] [Thesis]. Montana State University; 1991. [cited 2020 Jan 29]. Available from: https://scholarworks.montana.edu/xmlui/handle/1/6869.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Gokce H. Kinetics of the tungsten hexafluoride-silane reaction for the chemical vapor deposition of tungsten. [Thesis]. Montana State University; 1991. Available from: https://scholarworks.montana.edu/xmlui/handle/1/6869

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of British Columbia

7. Chaurasia, Hari Krishna. Studies on thin films of gold .

Degree: 1965, University of British Columbia

 Investigations are made into the properties of 20 - 600 A gold films deposited onto freshly cleaved mica substrates by high vacuum evaporation. An accurate… (more)

Subjects/Keywords: Metallic films; Vapor-plating

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APA (6th Edition):

Chaurasia, H. K. (1965). Studies on thin films of gold . (Thesis). University of British Columbia. Retrieved from http://hdl.handle.net/2429/37541

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Chaurasia, Hari Krishna. “Studies on thin films of gold .” 1965. Thesis, University of British Columbia. Accessed January 29, 2020. http://hdl.handle.net/2429/37541.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Chaurasia, Hari Krishna. “Studies on thin films of gold .” 1965. Web. 29 Jan 2020.

Vancouver:

Chaurasia HK. Studies on thin films of gold . [Internet] [Thesis]. University of British Columbia; 1965. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/2429/37541.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Chaurasia HK. Studies on thin films of gold . [Thesis]. University of British Columbia; 1965. Available from: http://hdl.handle.net/2429/37541

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Arizona

8. Merrill, Spencer Kenneth, 1939-. Vacuum chamber experiments in thin film deposition .

Degree: 1967, University of Arizona

Subjects/Keywords: Vapor-plating.; Metallic films.

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APA (6th Edition):

Merrill, Spencer Kenneth, 1. (1967). Vacuum chamber experiments in thin film deposition . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/551904

Chicago Manual of Style (16th Edition):

Merrill, Spencer Kenneth, 1939-. “Vacuum chamber experiments in thin film deposition .” 1967. Masters Thesis, University of Arizona. Accessed January 29, 2020. http://hdl.handle.net/10150/551904.

MLA Handbook (7th Edition):

Merrill, Spencer Kenneth, 1939-. “Vacuum chamber experiments in thin film deposition .” 1967. Web. 29 Jan 2020.

Vancouver:

Merrill, Spencer Kenneth 1. Vacuum chamber experiments in thin film deposition . [Internet] [Masters thesis]. University of Arizona; 1967. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10150/551904.

Council of Science Editors:

Merrill, Spencer Kenneth 1. Vacuum chamber experiments in thin film deposition . [Masters Thesis]. University of Arizona; 1967. Available from: http://hdl.handle.net/10150/551904


Michigan State University

9. Baumbach, James Allen. Growth studies of vacuum evaporated thin metal films deposited on amorphous substrates.

Degree: PhD, Department of Chemistry, 1967, Michigan State University

Subjects/Keywords: Metallic films; Vapor-plating

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APA (6th Edition):

Baumbach, J. A. (1967). Growth studies of vacuum evaporated thin metal films deposited on amorphous substrates. (Doctoral Dissertation). Michigan State University. Retrieved from http://etd.lib.msu.edu/islandora/object/etd:18257

Chicago Manual of Style (16th Edition):

Baumbach, James Allen. “Growth studies of vacuum evaporated thin metal films deposited on amorphous substrates.” 1967. Doctoral Dissertation, Michigan State University. Accessed January 29, 2020. http://etd.lib.msu.edu/islandora/object/etd:18257.

MLA Handbook (7th Edition):

Baumbach, James Allen. “Growth studies of vacuum evaporated thin metal films deposited on amorphous substrates.” 1967. Web. 29 Jan 2020.

Vancouver:

Baumbach JA. Growth studies of vacuum evaporated thin metal films deposited on amorphous substrates. [Internet] [Doctoral dissertation]. Michigan State University; 1967. [cited 2020 Jan 29]. Available from: http://etd.lib.msu.edu/islandora/object/etd:18257.

Council of Science Editors:

Baumbach JA. Growth studies of vacuum evaporated thin metal films deposited on amorphous substrates. [Doctoral Dissertation]. Michigan State University; 1967. Available from: http://etd.lib.msu.edu/islandora/object/etd:18257


The Ohio State University

10. Ownby, P. D. Surface studies in the vapor-solid system boron triiodide-tungsten.

Degree: PhD, Graduate School, 1967, The Ohio State University

Subjects/Keywords: Engineering; Vapor-plating; Boron; Iodides; Tungsten

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APA (6th Edition):

Ownby, P. D. (1967). Surface studies in the vapor-solid system boron triiodide-tungsten. (Doctoral Dissertation). The Ohio State University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=osu1486732330176751

Chicago Manual of Style (16th Edition):

Ownby, P D. “Surface studies in the vapor-solid system boron triiodide-tungsten.” 1967. Doctoral Dissertation, The Ohio State University. Accessed January 29, 2020. http://rave.ohiolink.edu/etdc/view?acc_num=osu1486732330176751.

MLA Handbook (7th Edition):

Ownby, P D. “Surface studies in the vapor-solid system boron triiodide-tungsten.” 1967. Web. 29 Jan 2020.

Vancouver:

Ownby PD. Surface studies in the vapor-solid system boron triiodide-tungsten. [Internet] [Doctoral dissertation]. The Ohio State University; 1967. [cited 2020 Jan 29]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=osu1486732330176751.

Council of Science Editors:

Ownby PD. Surface studies in the vapor-solid system boron triiodide-tungsten. [Doctoral Dissertation]. The Ohio State University; 1967. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=osu1486732330176751


Virginia Tech

11. Si, Jie. Metalorganic chemical vapor deposition of metal oxides.

Degree: MS, Materials Science and Engineering, 1993, Virginia Tech

Subjects/Keywords: Vapor-plating.; LD5655.V855 1993.S56

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APA (6th Edition):

Si, J. (1993). Metalorganic chemical vapor deposition of metal oxides. (Masters Thesis). Virginia Tech. Retrieved from http://hdl.handle.net/10919/46433

Chicago Manual of Style (16th Edition):

Si, Jie. “Metalorganic chemical vapor deposition of metal oxides.” 1993. Masters Thesis, Virginia Tech. Accessed January 29, 2020. http://hdl.handle.net/10919/46433.

MLA Handbook (7th Edition):

Si, Jie. “Metalorganic chemical vapor deposition of metal oxides.” 1993. Web. 29 Jan 2020.

Vancouver:

Si J. Metalorganic chemical vapor deposition of metal oxides. [Internet] [Masters thesis]. Virginia Tech; 1993. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10919/46433.

Council of Science Editors:

Si J. Metalorganic chemical vapor deposition of metal oxides. [Masters Thesis]. Virginia Tech; 1993. Available from: http://hdl.handle.net/10919/46433


Kansas State University

12. Chai, An-Ti. A single-source technique for vacuum deposition of alloy films.

Degree: MS, 1966, Kansas State University

Subjects/Keywords: Vapor-plating.; Thin films.; Masters theses

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APA (6th Edition):

Chai, A. (1966). A single-source technique for vacuum deposition of alloy films. (Masters Thesis). Kansas State University. Retrieved from http://hdl.handle.net/2097/26016

Chicago Manual of Style (16th Edition):

Chai, An-Ti. “A single-source technique for vacuum deposition of alloy films.” 1966. Masters Thesis, Kansas State University. Accessed January 29, 2020. http://hdl.handle.net/2097/26016.

MLA Handbook (7th Edition):

Chai, An-Ti. “A single-source technique for vacuum deposition of alloy films.” 1966. Web. 29 Jan 2020.

Vancouver:

Chai A. A single-source technique for vacuum deposition of alloy films. [Internet] [Masters thesis]. Kansas State University; 1966. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/2097/26016.

Council of Science Editors:

Chai A. A single-source technique for vacuum deposition of alloy films. [Masters Thesis]. Kansas State University; 1966. Available from: http://hdl.handle.net/2097/26016


Michigan State University

13. Hendrikson, James Erik. Optical and electrical properties of vapor deposited thin films of a sodide and an electride.

Degree: PhD, Department of Physics and Astronomy, 1994, Michigan State University

Subjects/Keywords: Vapor-plating; Thin films; Alkalies; Electrides

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APA (6th Edition):

Hendrikson, J. E. (1994). Optical and electrical properties of vapor deposited thin films of a sodide and an electride. (Doctoral Dissertation). Michigan State University. Retrieved from http://etd.lib.msu.edu/islandora/object/etd:23982

Chicago Manual of Style (16th Edition):

Hendrikson, James Erik. “Optical and electrical properties of vapor deposited thin films of a sodide and an electride.” 1994. Doctoral Dissertation, Michigan State University. Accessed January 29, 2020. http://etd.lib.msu.edu/islandora/object/etd:23982.

MLA Handbook (7th Edition):

Hendrikson, James Erik. “Optical and electrical properties of vapor deposited thin films of a sodide and an electride.” 1994. Web. 29 Jan 2020.

Vancouver:

Hendrikson JE. Optical and electrical properties of vapor deposited thin films of a sodide and an electride. [Internet] [Doctoral dissertation]. Michigan State University; 1994. [cited 2020 Jan 29]. Available from: http://etd.lib.msu.edu/islandora/object/etd:23982.

Council of Science Editors:

Hendrikson JE. Optical and electrical properties of vapor deposited thin films of a sodide and an electride. [Doctoral Dissertation]. Michigan State University; 1994. Available from: http://etd.lib.msu.edu/islandora/object/etd:23982


University of Alberta

14. Leonard, Sean. A framework for reactor-scale PVD simulations.

Degree: MS, Department of Electrical and Computer Engineering, 2002, University of Alberta

Subjects/Keywords: Monte Carlo method – Computer programs.; Vapor-plating – Computer simulation.

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APA (6th Edition):

Leonard, S. (2002). A framework for reactor-scale PVD simulations. (Masters Thesis). University of Alberta. Retrieved from https://era.library.ualberta.ca/files/m039k6655

Chicago Manual of Style (16th Edition):

Leonard, Sean. “A framework for reactor-scale PVD simulations.” 2002. Masters Thesis, University of Alberta. Accessed January 29, 2020. https://era.library.ualberta.ca/files/m039k6655.

MLA Handbook (7th Edition):

Leonard, Sean. “A framework for reactor-scale PVD simulations.” 2002. Web. 29 Jan 2020.

Vancouver:

Leonard S. A framework for reactor-scale PVD simulations. [Internet] [Masters thesis]. University of Alberta; 2002. [cited 2020 Jan 29]. Available from: https://era.library.ualberta.ca/files/m039k6655.

Council of Science Editors:

Leonard S. A framework for reactor-scale PVD simulations. [Masters Thesis]. University of Alberta; 2002. Available from: https://era.library.ualberta.ca/files/m039k6655


University of Arizona

15. Nowrozi, Mojtaba Faiz. A systematic study of LPCVD refractory metal/silicide interconnect materials for very large scale integrated circuits.

Degree: 1988, University of Arizona

 Recently, refractory materials have been proposed as a strong alternative to poly-silicon and aluminum alloys as metallization systems for Very Large Scale Integrated (VLSI) circuits… (more)

Subjects/Keywords: Refractory materials.; Vapor-plating.; Silicides.; Thin films.; Tungsten.; Molybdenum.

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APA (6th Edition):

Nowrozi, M. F. (1988). A systematic study of LPCVD refractory metal/silicide interconnect materials for very large scale integrated circuits. (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/184396

Chicago Manual of Style (16th Edition):

Nowrozi, Mojtaba Faiz. “A systematic study of LPCVD refractory metal/silicide interconnect materials for very large scale integrated circuits. ” 1988. Doctoral Dissertation, University of Arizona. Accessed January 29, 2020. http://hdl.handle.net/10150/184396.

MLA Handbook (7th Edition):

Nowrozi, Mojtaba Faiz. “A systematic study of LPCVD refractory metal/silicide interconnect materials for very large scale integrated circuits. ” 1988. Web. 29 Jan 2020.

Vancouver:

Nowrozi MF. A systematic study of LPCVD refractory metal/silicide interconnect materials for very large scale integrated circuits. [Internet] [Doctoral dissertation]. University of Arizona; 1988. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10150/184396.

Council of Science Editors:

Nowrozi MF. A systematic study of LPCVD refractory metal/silicide interconnect materials for very large scale integrated circuits. [Doctoral Dissertation]. University of Arizona; 1988. Available from: http://hdl.handle.net/10150/184396


University of Arizona

16. BROWNING, STEPHEN DOUGLAS. ELECTRON BOMBARDMENT OF CERTAIN THIN FILMS DURING DEPOSITION (ANTIMONY TRIOXIDE, SILICON MONOXIDE, ZINC SULFIDE, POTASSIUM HEXAFLUOROZIRCONATE).

Degree: 1983, University of Arizona

 The performance of multilayer thin film optical filters depends largely on the microstructure of the component layers. This microstructure varies with the deposition parameters inside… (more)

Subjects/Keywords: Thin films  – Effect of radiation on.; Vapor-plating.

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APA (6th Edition):

BROWNING, S. D. (1983). ELECTRON BOMBARDMENT OF CERTAIN THIN FILMS DURING DEPOSITION (ANTIMONY TRIOXIDE, SILICON MONOXIDE, ZINC SULFIDE, POTASSIUM HEXAFLUOROZIRCONATE). (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/186382

Chicago Manual of Style (16th Edition):

BROWNING, STEPHEN DOUGLAS. “ELECTRON BOMBARDMENT OF CERTAIN THIN FILMS DURING DEPOSITION (ANTIMONY TRIOXIDE, SILICON MONOXIDE, ZINC SULFIDE, POTASSIUM HEXAFLUOROZIRCONATE). ” 1983. Doctoral Dissertation, University of Arizona. Accessed January 29, 2020. http://hdl.handle.net/10150/186382.

MLA Handbook (7th Edition):

BROWNING, STEPHEN DOUGLAS. “ELECTRON BOMBARDMENT OF CERTAIN THIN FILMS DURING DEPOSITION (ANTIMONY TRIOXIDE, SILICON MONOXIDE, ZINC SULFIDE, POTASSIUM HEXAFLUOROZIRCONATE). ” 1983. Web. 29 Jan 2020.

Vancouver:

BROWNING SD. ELECTRON BOMBARDMENT OF CERTAIN THIN FILMS DURING DEPOSITION (ANTIMONY TRIOXIDE, SILICON MONOXIDE, ZINC SULFIDE, POTASSIUM HEXAFLUOROZIRCONATE). [Internet] [Doctoral dissertation]. University of Arizona; 1983. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10150/186382.

Council of Science Editors:

BROWNING SD. ELECTRON BOMBARDMENT OF CERTAIN THIN FILMS DURING DEPOSITION (ANTIMONY TRIOXIDE, SILICON MONOXIDE, ZINC SULFIDE, POTASSIUM HEXAFLUOROZIRCONATE). [Doctoral Dissertation]. University of Arizona; 1983. Available from: http://hdl.handle.net/10150/186382


New Jersey Institute of Technology

17. Loney, Norman W. Mathematical modeling of chemical vapor deposition processes and its application to thin film technology.

Degree: PhD, Chemical Engineering, Chemistry and Environmental Science, 1991, New Jersey Institute of Technology

  A number of workers in the field of Chemical vapor deposition (CVD) have presented mathematical models in the literature. Some workers were able to… (more)

Subjects/Keywords: Vapor-plating – Mathematical models; Thin films; Chemical Engineering

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APA (6th Edition):

Loney, N. W. (1991). Mathematical modeling of chemical vapor deposition processes and its application to thin film technology. (Doctoral Dissertation). New Jersey Institute of Technology. Retrieved from https://digitalcommons.njit.edu/dissertations/1137

Chicago Manual of Style (16th Edition):

Loney, Norman W. “Mathematical modeling of chemical vapor deposition processes and its application to thin film technology.” 1991. Doctoral Dissertation, New Jersey Institute of Technology. Accessed January 29, 2020. https://digitalcommons.njit.edu/dissertations/1137.

MLA Handbook (7th Edition):

Loney, Norman W. “Mathematical modeling of chemical vapor deposition processes and its application to thin film technology.” 1991. Web. 29 Jan 2020.

Vancouver:

Loney NW. Mathematical modeling of chemical vapor deposition processes and its application to thin film technology. [Internet] [Doctoral dissertation]. New Jersey Institute of Technology; 1991. [cited 2020 Jan 29]. Available from: https://digitalcommons.njit.edu/dissertations/1137.

Council of Science Editors:

Loney NW. Mathematical modeling of chemical vapor deposition processes and its application to thin film technology. [Doctoral Dissertation]. New Jersey Institute of Technology; 1991. Available from: https://digitalcommons.njit.edu/dissertations/1137


New Jersey Institute of Technology

18. Niyomwas, Sutham. Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition.

Degree: MSin Engineering Science- (M.S.), Committee for the Interdisciplinary Program in Materials Science and Engineering, 1996, New Jersey Institute of Technology

  Ditertiarybutylsilane ( DTBS ) and oxygen have been used as precursors to produce silicon dioxide films by low pressure chemical vapor deposition. These films… (more)

Subjects/Keywords: Thin films.; Vapor-plating.; Engineering Science and Materials

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APA (6th Edition):

Niyomwas, S. (1996). Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition. (Thesis). New Jersey Institute of Technology. Retrieved from https://digitalcommons.njit.edu/theses/1025

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Niyomwas, Sutham. “Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition.” 1996. Thesis, New Jersey Institute of Technology. Accessed January 29, 2020. https://digitalcommons.njit.edu/theses/1025.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Niyomwas, Sutham. “Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition.” 1996. Web. 29 Jan 2020.

Vancouver:

Niyomwas S. Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition. [Internet] [Thesis]. New Jersey Institute of Technology; 1996. [cited 2020 Jan 29]. Available from: https://digitalcommons.njit.edu/theses/1025.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Niyomwas S. Synthesis and characterization of silicon dioxide thin films by low pressure chemical vapor deposition. [Thesis]. New Jersey Institute of Technology; 1996. Available from: https://digitalcommons.njit.edu/theses/1025

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Arizona

19. Scheidegger, Gary Louis. OPTICAL AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON PREPARED BY CHEMICAL VAPOR DEPOSITION AND PLASMA HYDROGENATION.

Degree: 1983, University of Arizona

Subjects/Keywords: Hydrogenation.; Silicon  – Electric properties.; Silicon  – Optical properties.; Vapor-plating.

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APA (6th Edition):

Scheidegger, G. L. (1983). OPTICAL AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON PREPARED BY CHEMICAL VAPOR DEPOSITION AND PLASMA HYDROGENATION. (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/274874

Chicago Manual of Style (16th Edition):

Scheidegger, Gary Louis. “OPTICAL AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON PREPARED BY CHEMICAL VAPOR DEPOSITION AND PLASMA HYDROGENATION. ” 1983. Masters Thesis, University of Arizona. Accessed January 29, 2020. http://hdl.handle.net/10150/274874.

MLA Handbook (7th Edition):

Scheidegger, Gary Louis. “OPTICAL AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON PREPARED BY CHEMICAL VAPOR DEPOSITION AND PLASMA HYDROGENATION. ” 1983. Web. 29 Jan 2020.

Vancouver:

Scheidegger GL. OPTICAL AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON PREPARED BY CHEMICAL VAPOR DEPOSITION AND PLASMA HYDROGENATION. [Internet] [Masters thesis]. University of Arizona; 1983. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10150/274874.

Council of Science Editors:

Scheidegger GL. OPTICAL AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON PREPARED BY CHEMICAL VAPOR DEPOSITION AND PLASMA HYDROGENATION. [Masters Thesis]. University of Arizona; 1983. Available from: http://hdl.handle.net/10150/274874


University of Arizona

20. Edgar, William Frank, 1939-. Chemical vapor deposition of silicon onto silver surfaces .

Degree: 1973, University of Arizona

Subjects/Keywords: Vapor-plating.; Silicon.; Silver  – Surfaces.; Thin films.

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APA (6th Edition):

Edgar, William Frank, 1. (1973). Chemical vapor deposition of silicon onto silver surfaces . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/554610

Chicago Manual of Style (16th Edition):

Edgar, William Frank, 1939-. “Chemical vapor deposition of silicon onto silver surfaces .” 1973. Masters Thesis, University of Arizona. Accessed January 29, 2020. http://hdl.handle.net/10150/554610.

MLA Handbook (7th Edition):

Edgar, William Frank, 1939-. “Chemical vapor deposition of silicon onto silver surfaces .” 1973. Web. 29 Jan 2020.

Vancouver:

Edgar, William Frank 1. Chemical vapor deposition of silicon onto silver surfaces . [Internet] [Masters thesis]. University of Arizona; 1973. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10150/554610.

Council of Science Editors:

Edgar, William Frank 1. Chemical vapor deposition of silicon onto silver surfaces . [Masters Thesis]. University of Arizona; 1973. Available from: http://hdl.handle.net/10150/554610


Georgia Tech

21. Patz, Timothy Matthew. Laser Processing of Biological Materials.

Degree: MS, Materials Science and Engineering, 2005, Georgia Tech

 I have explored the use of the matrix assisted pulsed laser evaporation (MAPLE) and MAPLE direct write (MDW) to create thin films of biological materials.… (more)

Subjects/Keywords: MAPLE; MDW; Thin films; Vapor-plating; Biomedical materials

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APA (6th Edition):

Patz, T. M. (2005). Laser Processing of Biological Materials. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/7451

Chicago Manual of Style (16th Edition):

Patz, Timothy Matthew. “Laser Processing of Biological Materials.” 2005. Masters Thesis, Georgia Tech. Accessed January 29, 2020. http://hdl.handle.net/1853/7451.

MLA Handbook (7th Edition):

Patz, Timothy Matthew. “Laser Processing of Biological Materials.” 2005. Web. 29 Jan 2020.

Vancouver:

Patz TM. Laser Processing of Biological Materials. [Internet] [Masters thesis]. Georgia Tech; 2005. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/1853/7451.

Council of Science Editors:

Patz TM. Laser Processing of Biological Materials. [Masters Thesis]. Georgia Tech; 2005. Available from: http://hdl.handle.net/1853/7451


Georgia Tech

22. Hanigofsky, John. Modeling of the chemical vapor deposition of YBa₂Cu₃O, TiB₂, and SiC thin films onto continuous ceramic tows.

Degree: PhD, Ceramic engineering, 1992, Georgia Tech

Subjects/Keywords: Ceramic-fiber materials; Vapor-plating; Thin films

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APA (6th Edition):

Hanigofsky, J. (1992). Modeling of the chemical vapor deposition of YBa₂Cu₃O, TiB₂, and SiC thin films onto continuous ceramic tows. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/36210

Chicago Manual of Style (16th Edition):

Hanigofsky, John. “Modeling of the chemical vapor deposition of YBa₂Cu₃O, TiB₂, and SiC thin films onto continuous ceramic tows.” 1992. Doctoral Dissertation, Georgia Tech. Accessed January 29, 2020. http://hdl.handle.net/1853/36210.

MLA Handbook (7th Edition):

Hanigofsky, John. “Modeling of the chemical vapor deposition of YBa₂Cu₃O, TiB₂, and SiC thin films onto continuous ceramic tows.” 1992. Web. 29 Jan 2020.

Vancouver:

Hanigofsky J. Modeling of the chemical vapor deposition of YBa₂Cu₃O, TiB₂, and SiC thin films onto continuous ceramic tows. [Internet] [Doctoral dissertation]. Georgia Tech; 1992. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/1853/36210.

Council of Science Editors:

Hanigofsky J. Modeling of the chemical vapor deposition of YBa₂Cu₃O, TiB₂, and SiC thin films onto continuous ceramic tows. [Doctoral Dissertation]. Georgia Tech; 1992. Available from: http://hdl.handle.net/1853/36210


Hong Kong University of Science and Technology

23. Lam, Ka Man. Determination of airborne carbonyl compounds by a thermal desorption GC/MS method : development and application of a vapour coating technique.

Degree: 2005, Hong Kong University of Science and Technology

 The standard method for the determination of airborne carbonyls is to collect carbonyls onto 2,4-dinitrophenylhydrazine (DNPH) coated solid sorbent followed by solvent extraction of the… (more)

Subjects/Keywords: Carbonyl compounds ; Carbonyl compounds  – Measurement ; Vapor-plating

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APA (6th Edition):

Lam, K. M. (2005). Determination of airborne carbonyl compounds by a thermal desorption GC/MS method : development and application of a vapour coating technique. (Thesis). Hong Kong University of Science and Technology. Retrieved from http://repository.ust.hk/ir/Record/1783.1-4036 ; https://doi.org/10.14711/thesis-b880215 ; http://repository.ust.hk/ir/bitstream/1783.1-4036/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lam, Ka Man. “Determination of airborne carbonyl compounds by a thermal desorption GC/MS method : development and application of a vapour coating technique.” 2005. Thesis, Hong Kong University of Science and Technology. Accessed January 29, 2020. http://repository.ust.hk/ir/Record/1783.1-4036 ; https://doi.org/10.14711/thesis-b880215 ; http://repository.ust.hk/ir/bitstream/1783.1-4036/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lam, Ka Man. “Determination of airborne carbonyl compounds by a thermal desorption GC/MS method : development and application of a vapour coating technique.” 2005. Web. 29 Jan 2020.

Vancouver:

Lam KM. Determination of airborne carbonyl compounds by a thermal desorption GC/MS method : development and application of a vapour coating technique. [Internet] [Thesis]. Hong Kong University of Science and Technology; 2005. [cited 2020 Jan 29]. Available from: http://repository.ust.hk/ir/Record/1783.1-4036 ; https://doi.org/10.14711/thesis-b880215 ; http://repository.ust.hk/ir/bitstream/1783.1-4036/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lam KM. Determination of airborne carbonyl compounds by a thermal desorption GC/MS method : development and application of a vapour coating technique. [Thesis]. Hong Kong University of Science and Technology; 2005. Available from: http://repository.ust.hk/ir/Record/1783.1-4036 ; https://doi.org/10.14711/thesis-b880215 ; http://repository.ust.hk/ir/bitstream/1783.1-4036/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Simon Fraser University

24. Gadgil, Prasad Narhar. Preparation of iron pyrite films for solar cells by metalorganic chemical vapor deposition.

Degree: 1990, Simon Fraser University

Subjects/Keywords: Solar cells.; Pyrites.; Thin films.; Vapor-plating.

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APA (6th Edition):

Gadgil, P. N. (1990). Preparation of iron pyrite films for solar cells by metalorganic chemical vapor deposition. (Thesis). Simon Fraser University. Retrieved from http://summit.sfu.ca/item/4666

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Gadgil, Prasad Narhar. “Preparation of iron pyrite films for solar cells by metalorganic chemical vapor deposition.” 1990. Thesis, Simon Fraser University. Accessed January 29, 2020. http://summit.sfu.ca/item/4666.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Gadgil, Prasad Narhar. “Preparation of iron pyrite films for solar cells by metalorganic chemical vapor deposition.” 1990. Web. 29 Jan 2020.

Vancouver:

Gadgil PN. Preparation of iron pyrite films for solar cells by metalorganic chemical vapor deposition. [Internet] [Thesis]. Simon Fraser University; 1990. [cited 2020 Jan 29]. Available from: http://summit.sfu.ca/item/4666.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Gadgil PN. Preparation of iron pyrite films for solar cells by metalorganic chemical vapor deposition. [Thesis]. Simon Fraser University; 1990. Available from: http://summit.sfu.ca/item/4666

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Michigan State University

25. Waner, Mark Joseph. Characterization of the sol-gel and MOCVD processes for the deposition of aluminum oxide thin films.

Degree: MS, Department of Chemistry, 1994, Michigan State University

Subjects/Keywords: Thin films; Aluminum oxide; Colloids; Vapor-plating

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APA (6th Edition):

Waner, M. J. (1994). Characterization of the sol-gel and MOCVD processes for the deposition of aluminum oxide thin films. (Masters Thesis). Michigan State University. Retrieved from http://etd.lib.msu.edu/islandora/object/etd:24621

Chicago Manual of Style (16th Edition):

Waner, Mark Joseph. “Characterization of the sol-gel and MOCVD processes for the deposition of aluminum oxide thin films.” 1994. Masters Thesis, Michigan State University. Accessed January 29, 2020. http://etd.lib.msu.edu/islandora/object/etd:24621.

MLA Handbook (7th Edition):

Waner, Mark Joseph. “Characterization of the sol-gel and MOCVD processes for the deposition of aluminum oxide thin films.” 1994. Web. 29 Jan 2020.

Vancouver:

Waner MJ. Characterization of the sol-gel and MOCVD processes for the deposition of aluminum oxide thin films. [Internet] [Masters thesis]. Michigan State University; 1994. [cited 2020 Jan 29]. Available from: http://etd.lib.msu.edu/islandora/object/etd:24621.

Council of Science Editors:

Waner MJ. Characterization of the sol-gel and MOCVD processes for the deposition of aluminum oxide thin films. [Masters Thesis]. Michigan State University; 1994. Available from: http://etd.lib.msu.edu/islandora/object/etd:24621


Colorado School of Mines

26. Barnes, Teresa M. Development of high vacuum plasma-assisted chemical vapor deposition and its application to zinc oxide.

Degree: PhD, Chemical Engineering, 2016, Colorado School of Mines

Subjects/Keywords: Plasma-enhanced chemical vapor deposition; Vapor-plating; Thin films; Zinc oxide

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APA (6th Edition):

Barnes, T. M. (2016). Development of high vacuum plasma-assisted chemical vapor deposition and its application to zinc oxide. (Doctoral Dissertation). Colorado School of Mines. Retrieved from http://hdl.handle.net/11124/170539

Chicago Manual of Style (16th Edition):

Barnes, Teresa M. “Development of high vacuum plasma-assisted chemical vapor deposition and its application to zinc oxide.” 2016. Doctoral Dissertation, Colorado School of Mines. Accessed January 29, 2020. http://hdl.handle.net/11124/170539.

MLA Handbook (7th Edition):

Barnes, Teresa M. “Development of high vacuum plasma-assisted chemical vapor deposition and its application to zinc oxide.” 2016. Web. 29 Jan 2020.

Vancouver:

Barnes TM. Development of high vacuum plasma-assisted chemical vapor deposition and its application to zinc oxide. [Internet] [Doctoral dissertation]. Colorado School of Mines; 2016. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/11124/170539.

Council of Science Editors:

Barnes TM. Development of high vacuum plasma-assisted chemical vapor deposition and its application to zinc oxide. [Doctoral Dissertation]. Colorado School of Mines; 2016. Available from: http://hdl.handle.net/11124/170539


Michigan State University

27. Regmi, Murari. Growth of single crystal diamond.

Degree: PhD, Department of Physics and Astronomy, 2007, Michigan State University

Subjects/Keywords: Diamonds; Crystal growth; Microwave plasmas; Chemical vapor deposition; Vapor-plating; Thin films

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APA (6th Edition):

Regmi, M. (2007). Growth of single crystal diamond. (Doctoral Dissertation). Michigan State University. Retrieved from http://etd.lib.msu.edu/islandora/object/etd:38539

Chicago Manual of Style (16th Edition):

Regmi, Murari. “Growth of single crystal diamond.” 2007. Doctoral Dissertation, Michigan State University. Accessed January 29, 2020. http://etd.lib.msu.edu/islandora/object/etd:38539.

MLA Handbook (7th Edition):

Regmi, Murari. “Growth of single crystal diamond.” 2007. Web. 29 Jan 2020.

Vancouver:

Regmi M. Growth of single crystal diamond. [Internet] [Doctoral dissertation]. Michigan State University; 2007. [cited 2020 Jan 29]. Available from: http://etd.lib.msu.edu/islandora/object/etd:38539.

Council of Science Editors:

Regmi M. Growth of single crystal diamond. [Doctoral Dissertation]. Michigan State University; 2007. Available from: http://etd.lib.msu.edu/islandora/object/etd:38539


University of Arizona

28. HILLMAN, PAUL DALLAS. CHEMICAL VAPOR DEPOSITION OF SAMARIUM COMPOUNDS FOR THE DEVELOPMENT OF THIN FILM OPTICAL SWITCHES BASED ON PHASE TRANSITION MATERIALS.

Degree: 1984, University of Arizona

 The physical properties of single crystals of samarium monosulfide exhibit a first order semiconductor-to-metal transition near 6.5 kbar. However, thin films of SmS show only… (more)

Subjects/Keywords: Optical films.; Phase transformations (Statistical physics); Samarium  – Optical properties.; Thin films.; Vapor-plating.

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APA (6th Edition):

HILLMAN, P. D. (1984). CHEMICAL VAPOR DEPOSITION OF SAMARIUM COMPOUNDS FOR THE DEVELOPMENT OF THIN FILM OPTICAL SWITCHES BASED ON PHASE TRANSITION MATERIALS. (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/187650

Chicago Manual of Style (16th Edition):

HILLMAN, PAUL DALLAS. “CHEMICAL VAPOR DEPOSITION OF SAMARIUM COMPOUNDS FOR THE DEVELOPMENT OF THIN FILM OPTICAL SWITCHES BASED ON PHASE TRANSITION MATERIALS. ” 1984. Doctoral Dissertation, University of Arizona. Accessed January 29, 2020. http://hdl.handle.net/10150/187650.

MLA Handbook (7th Edition):

HILLMAN, PAUL DALLAS. “CHEMICAL VAPOR DEPOSITION OF SAMARIUM COMPOUNDS FOR THE DEVELOPMENT OF THIN FILM OPTICAL SWITCHES BASED ON PHASE TRANSITION MATERIALS. ” 1984. Web. 29 Jan 2020.

Vancouver:

HILLMAN PD. CHEMICAL VAPOR DEPOSITION OF SAMARIUM COMPOUNDS FOR THE DEVELOPMENT OF THIN FILM OPTICAL SWITCHES BASED ON PHASE TRANSITION MATERIALS. [Internet] [Doctoral dissertation]. University of Arizona; 1984. [cited 2020 Jan 29]. Available from: http://hdl.handle.net/10150/187650.

Council of Science Editors:

HILLMAN PD. CHEMICAL VAPOR DEPOSITION OF SAMARIUM COMPOUNDS FOR THE DEVELOPMENT OF THIN FILM OPTICAL SWITCHES BASED ON PHASE TRANSITION MATERIALS. [Doctoral Dissertation]. University of Arizona; 1984. Available from: http://hdl.handle.net/10150/187650


New Jersey Institute of Technology

29. Ramanuja, Narahari. Low pressure chemical vapor deposition of boron nitride thin films from triethylamine borane complex and ammonia.

Degree: MSin Materials Science and Engineering - (M.S.), Committee for the Interdisciplinary Program in Materials Science and Engineering, 1997, New Jersey Institute of Technology

  Boron nitride thin films were synthesized on Silicon and quartz substrates by low pressure chemical vapor deposition using triethylamine-borane complex and ammonia as precursors.… (more)

Subjects/Keywords: Vapor-plating.; Thin films.; Boron nitride – Synthesis.; Materials Science and Engineering

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APA (6th Edition):

Ramanuja, N. (1997). Low pressure chemical vapor deposition of boron nitride thin films from triethylamine borane complex and ammonia. (Thesis). New Jersey Institute of Technology. Retrieved from https://digitalcommons.njit.edu/theses/954

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Ramanuja, Narahari. “Low pressure chemical vapor deposition of boron nitride thin films from triethylamine borane complex and ammonia.” 1997. Thesis, New Jersey Institute of Technology. Accessed January 29, 2020. https://digitalcommons.njit.edu/theses/954.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Ramanuja, Narahari. “Low pressure chemical vapor deposition of boron nitride thin films from triethylamine borane complex and ammonia.” 1997. Web. 29 Jan 2020.

Vancouver:

Ramanuja N. Low pressure chemical vapor deposition of boron nitride thin films from triethylamine borane complex and ammonia. [Internet] [Thesis]. New Jersey Institute of Technology; 1997. [cited 2020 Jan 29]. Available from: https://digitalcommons.njit.edu/theses/954.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Ramanuja N. Low pressure chemical vapor deposition of boron nitride thin films from triethylamine borane complex and ammonia. [Thesis]. New Jersey Institute of Technology; 1997. Available from: https://digitalcommons.njit.edu/theses/954

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


New Jersey Institute of Technology

30. King, Wei-Shang. Low pressure chemical vapor deposition of copper films from CU(I)(HFAC)(TMVS).

Degree: MSin Engineering Science- (M.S.), Committee for the Interdisciplinary Program in Materials Science and Engineering, 1994, New Jersey Institute of Technology

  Recently, copper has been found as a possible substitute for Al alloys because of its low resistivity (1.67 μΩ • cm) and potentially improved… (more)

Subjects/Keywords: Chemical vapor deposition.; Metallic films.; Copper plating.; Engineering Science and Materials

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APA (6th Edition):

King, W. (1994). Low pressure chemical vapor deposition of copper films from CU(I)(HFAC)(TMVS). (Thesis). New Jersey Institute of Technology. Retrieved from https://digitalcommons.njit.edu/theses/1168

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

King, Wei-Shang. “Low pressure chemical vapor deposition of copper films from CU(I)(HFAC)(TMVS).” 1994. Thesis, New Jersey Institute of Technology. Accessed January 29, 2020. https://digitalcommons.njit.edu/theses/1168.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

King, Wei-Shang. “Low pressure chemical vapor deposition of copper films from CU(I)(HFAC)(TMVS).” 1994. Web. 29 Jan 2020.

Vancouver:

King W. Low pressure chemical vapor deposition of copper films from CU(I)(HFAC)(TMVS). [Internet] [Thesis]. New Jersey Institute of Technology; 1994. [cited 2020 Jan 29]. Available from: https://digitalcommons.njit.edu/theses/1168.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

King W. Low pressure chemical vapor deposition of copper films from CU(I)(HFAC)(TMVS). [Thesis]. New Jersey Institute of Technology; 1994. Available from: https://digitalcommons.njit.edu/theses/1168

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

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