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University of Minnesota
1.
Rastgar, Neema.
Effects of water adsorption and surface oxidation on the
electrical conductivity of silicon nanocrystal films.
Degree: 2012, University of Minnesota
URL: http://purl.umn.edu/160270
► University of Minnesota M.S. December 2012. Major: Material Science and Engineering. Advisor: Eray Aydil. 1 computer file (PDF); iv, 27 pages, appendix p. 19-27.
Electrical…
(more)
▼ University of Minnesota M.S. December 2012. Major:
Material Science and Engineering. Advisor: Eray Aydil. 1 computer
file (PDF); iv, 27 pages, appendix p. 19-27.
Electrical conductivities of thin films of silicon
nanocrystals (4-6 nm) exhibit high sensitivity to water vapor.
Specifically, water adsorption on the surface of silicon
nanocrystal (NC) films increases their electrical conductivity by a
factor of four at room temperature and an order of magnitude at 175
K. The increase in conductivity is reversible and can manifest as
peaks or hysteresis loops in temperature-dependent conductivity
measurements even when the measurements are conducted under vacuum
at 10-5 Torr and in the presence of only residual amounts of water
vapor. Hydrogen-terminated silicon nanocrystals are easily oxidized
to form submonolayer to monolayer of chemically bound oxygen on
their surfaces when annealed at 300°C in a glovebox with 0.1 ppm of
water vapor. Annealing under vacuum at 300°C retains H-passivation
without oxidation. The electrical conductivity of films made from
hydrogen-terminated silicon nanocrystals is 200 times higher than
the electrical conductivity of films made from silicon nanocrystals
with a monolayer of chemically bound oxygen. However, the
conductivities of both types of films increase upon adsorption of
water on the nanocrystal surfaces. These findings underscore the
importance of controlling silicon nanocrystal surfaces in
determining the electrical properties of their thin
films.
Subjects/Keywords: Silicon Nanocrystals
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APA (6th Edition):
Rastgar, N. (2012). Effects of water adsorption and surface oxidation on the
electrical conductivity of silicon nanocrystal films. (Masters Thesis). University of Minnesota. Retrieved from http://purl.umn.edu/160270
Chicago Manual of Style (16th Edition):
Rastgar, Neema. “Effects of water adsorption and surface oxidation on the
electrical conductivity of silicon nanocrystal films.” 2012. Masters Thesis, University of Minnesota. Accessed February 16, 2019.
http://purl.umn.edu/160270.
MLA Handbook (7th Edition):
Rastgar, Neema. “Effects of water adsorption and surface oxidation on the
electrical conductivity of silicon nanocrystal films.” 2012. Web. 16 Feb 2019.
Vancouver:
Rastgar N. Effects of water adsorption and surface oxidation on the
electrical conductivity of silicon nanocrystal films. [Internet] [Masters thesis]. University of Minnesota; 2012. [cited 2019 Feb 16].
Available from: http://purl.umn.edu/160270.
Council of Science Editors:
Rastgar N. Effects of water adsorption and surface oxidation on the
electrical conductivity of silicon nanocrystal films. [Masters Thesis]. University of Minnesota; 2012. Available from: http://purl.umn.edu/160270

Université de Neuchâtel
2.
Bailat, Julien.
Growth, microstructure and electrical performances of thin
film microcrystalline silicon solar cells.
Degree: 2005, Université de Neuchâtel
URL: http://doc.rero.ch/record/4910
► The goal of this thesis work is to improve the understanding of the growth of microcrystalline silicon solar cells and the relationships between their microstructure…
(more)
▼ The goal of this thesis work is to improve the
understanding of the growth of microcrystalline
silicon solar cells
and the relationships between their microstructure and their
electrical performances. For that purpose, the work was divided
into three different parts: - microstructure and growth of the
microcrystalline layer and devices - growth simulations -
electronic quality of the intrinsic layer (i-layer) and
open-circuit voltage (Voc) Microstructure of µc-Si:H The
microstructure was first fully characterized by TEM. The main
questions were how the microstructure of the intrinsic layer
(i-layer) is influenced by the deposition parameters and the nature
of the substrate. It was shown that the substrate surface chemistry
has a strong influence on the nucleation, whereas the surface
roughness plays a minor role. The silane concentration (SC), one of
the main deposition parameters, has a strong effect on the
nucleation and crystallinity of the whole intrinsic layer. Growth
simulations An innovative model for simulating the growth of
microcrystalline and amorphous
silicon was developed in order to
understand in a better way the formation of the microstructure. It
is based on two simple selection rules and three intuitive
simulation parameters (i.e. critical size of nuclei, number of
crystallographic orientations and desorption probability). This
model is able to reproduce the main characteristics of the growth
dynamics and microstructure of microcrystalline
silicon: conical
shape of the grains, thickness transition from amorphous to
crystalline material, amorphous to crystalline transition with
respect to deposition parameter (SC) and surface roughness
evolution with respect to layer thickness. This simple model gives
the keys to understanding the growth dynamics and microstructure of
microcrystalline
silicon layers. Electronic quality of i-layer and
Voc The electronic quality of the i-layer was evaluated by the
optical absorption of the defects of the i-layer as measured with
the help of Fourier transform photocurrent spectroscopy (FTPS).
Defects in the i-layer were artificially created by proton
irradiation in order to demonstrate that FTPS is able to monitor
the defect related absorption of the i-layer within complete thin
film
silicon solar cells In order to observe the influence of SC on
the defect density, two series of cells deposited with different SC
were fabricated. The FTPS measurements demonstrated that the defect
related absorption of the i-layer decreases as SC is raised.
Finally, variation of the defect density either by stepwise
annealing of a sample irradiated by a proton beam or by variation
of SC of i-layer was shown to influence the Voc significantly. From
the above observations and conclusions one speculates that further
tailoring of the structure of the solar cells could lead to a
better open-circuit voltage for µc-Si:H solar cells.
Advisors/Committee Members: Arvind (Dir.).
Subjects/Keywords: silicon
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APA (6th Edition):
Bailat, J. (2005). Growth, microstructure and electrical performances of thin
film microcrystalline silicon solar cells. (Thesis). Université de Neuchâtel. Retrieved from http://doc.rero.ch/record/4910
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Bailat, Julien. “Growth, microstructure and electrical performances of thin
film microcrystalline silicon solar cells.” 2005. Thesis, Université de Neuchâtel. Accessed February 16, 2019.
http://doc.rero.ch/record/4910.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Bailat, Julien. “Growth, microstructure and electrical performances of thin
film microcrystalline silicon solar cells.” 2005. Web. 16 Feb 2019.
Vancouver:
Bailat J. Growth, microstructure and electrical performances of thin
film microcrystalline silicon solar cells. [Internet] [Thesis]. Université de Neuchâtel; 2005. [cited 2019 Feb 16].
Available from: http://doc.rero.ch/record/4910.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Bailat J. Growth, microstructure and electrical performances of thin
film microcrystalline silicon solar cells. [Thesis]. Université de Neuchâtel; 2005. Available from: http://doc.rero.ch/record/4910
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Addis Ababa University
3.
Sioma, Debela.
RADIATIVE LIFETIME AND INTERNAL QUANTUM EFFICIENCY OF SMALL SCALE SILICON NANOSTRUCTURES
.
Degree: 2012, Addis Ababa University
URL: http://etd.aau.edu.et/dspace/handle/123456789/1222
► Nanosilicon (nanocrystal and porous) research is gaining tremendous attention in recent years due to the light emitting properties of the material. Improving efficiencies in radiative…
(more)
▼ Nanosilicon (nanocrystal and porous) research is gaining tremendous attention in recent
years due to the light emitting properties of the material. Improving efficiencies in radiative
recombination and light extraction of this material enhances potential applications as
microelectronic and optoelectronic devices with new operational capabilities. In this work
we investigate the influence of quantum confinement and excitation laser pump flux on
the optical parameters of
silicon nanocrystal. Our work presents a new approach for the
photoluminescence mechanism of
silicon nanocrystal by using phenomenological formulations
that explain the size and laser pump flux dependence of photoluminescence intensity,
radiative lifetime and internal quantum efficiency. To investigate the mechanism of the
photoluminescence we perform computer simulation using fortran programming. These
results show that, miniaturizing the size and increasing laser pump flux strongly alters
photoluminescence intensity, radiative lifetime and internal quantum efficiency of
silicon
nanocrystal. Our results have in well agreement with many other theoretical and experimental
findings. Our model confirms photoluminescence emission intensity and internal
quantum efficiency enhance due to quantum confinement and we can tune the emission
spectral range across the visible by using proper sized
silicon nanocrystal
Advisors/Committee Members: Dr. Sib Krishna Ghoshal (advisor).
Subjects/Keywords: SILICON NANOSTRUCTURES
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APA ·
Chicago ·
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Manager
APA (6th Edition):
Sioma, D. (2012). RADIATIVE LIFETIME AND INTERNAL QUANTUM EFFICIENCY OF SMALL SCALE SILICON NANOSTRUCTURES
. (Thesis). Addis Ababa University. Retrieved from http://etd.aau.edu.et/dspace/handle/123456789/1222
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Sioma, Debela. “RADIATIVE LIFETIME AND INTERNAL QUANTUM EFFICIENCY OF SMALL SCALE SILICON NANOSTRUCTURES
.” 2012. Thesis, Addis Ababa University. Accessed February 16, 2019.
http://etd.aau.edu.et/dspace/handle/123456789/1222.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Sioma, Debela. “RADIATIVE LIFETIME AND INTERNAL QUANTUM EFFICIENCY OF SMALL SCALE SILICON NANOSTRUCTURES
.” 2012. Web. 16 Feb 2019.
Vancouver:
Sioma D. RADIATIVE LIFETIME AND INTERNAL QUANTUM EFFICIENCY OF SMALL SCALE SILICON NANOSTRUCTURES
. [Internet] [Thesis]. Addis Ababa University; 2012. [cited 2019 Feb 16].
Available from: http://etd.aau.edu.et/dspace/handle/123456789/1222.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Sioma D. RADIATIVE LIFETIME AND INTERNAL QUANTUM EFFICIENCY OF SMALL SCALE SILICON NANOSTRUCTURES
. [Thesis]. Addis Ababa University; 2012. Available from: http://etd.aau.edu.et/dspace/handle/123456789/1222
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
4.
森田, 誠.
金属吸着Si表面に閉じ込められた二次元電子状態 : Two-dimensional electronic states confined in metal-adsorbed silicon surface; キンゾク キュウチャク Si ヒョウメン ニ トジコメラレタ ニジゲン デンシ ジョウタイ.
Degree: Nara Institute of Science and Technology / 奈良先端科学技術大学院大学
URL: http://hdl.handle.net/10061/6321
Subjects/Keywords: silicon
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APA (6th Edition):
森田, . (n.d.). 金属吸着Si表面に閉じ込められた二次元電子状態 : Two-dimensional electronic states confined in metal-adsorbed silicon surface; キンゾク キュウチャク Si ヒョウメン ニ トジコメラレタ ニジゲン デンシ ジョウタイ. (Thesis). Nara Institute of Science and Technology / 奈良先端科学技術大学院大学. Retrieved from http://hdl.handle.net/10061/6321
Note: this citation may be lacking information needed for this citation format:
No year of publication.
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
森田, 誠. “金属吸着Si表面に閉じ込められた二次元電子状態 : Two-dimensional electronic states confined in metal-adsorbed silicon surface; キンゾク キュウチャク Si ヒョウメン ニ トジコメラレタ ニジゲン デンシ ジョウタイ.” Thesis, Nara Institute of Science and Technology / 奈良先端科学技術大学院大学. Accessed February 16, 2019.
http://hdl.handle.net/10061/6321.
Note: this citation may be lacking information needed for this citation format:
No year of publication.
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
森田, 誠. “金属吸着Si表面に閉じ込められた二次元電子状態 : Two-dimensional electronic states confined in metal-adsorbed silicon surface; キンゾク キュウチャク Si ヒョウメン ニ トジコメラレタ ニジゲン デンシ ジョウタイ.” Web. 16 Feb 2019.
Note: this citation may be lacking information needed for this citation format:
No year of publication.
Vancouver:
森田 . 金属吸着Si表面に閉じ込められた二次元電子状態 : Two-dimensional electronic states confined in metal-adsorbed silicon surface; キンゾク キュウチャク Si ヒョウメン ニ トジコメラレタ ニジゲン デンシ ジョウタイ. [Internet] [Thesis]. Nara Institute of Science and Technology / 奈良先端科学技術大学院大学; [cited 2019 Feb 16].
Available from: http://hdl.handle.net/10061/6321.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
No year of publication.
Council of Science Editors:
森田 . 金属吸着Si表面に閉じ込められた二次元電子状態 : Two-dimensional electronic states confined in metal-adsorbed silicon surface; キンゾク キュウチャク Si ヒョウメン ニ トジコメラレタ ニジゲン デンシ ジョウタイ. [Thesis]. Nara Institute of Science and Technology / 奈良先端科学技術大学院大学; Available from: http://hdl.handle.net/10061/6321
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
No year of publication.

Georgia Tech
5.
Kenton, Arthur Craig.
Electronic structure of local centers in silicon.
Degree: PhD, Physics, 1981, Georgia Tech
URL: http://hdl.handle.net/1853/30648
Subjects/Keywords: Silicon
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APA ·
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APA (6th Edition):
Kenton, A. C. (1981). Electronic structure of local centers in silicon. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/30648
Chicago Manual of Style (16th Edition):
Kenton, Arthur Craig. “Electronic structure of local centers in silicon.” 1981. Doctoral Dissertation, Georgia Tech. Accessed February 16, 2019.
http://hdl.handle.net/1853/30648.
MLA Handbook (7th Edition):
Kenton, Arthur Craig. “Electronic structure of local centers in silicon.” 1981. Web. 16 Feb 2019.
Vancouver:
Kenton AC. Electronic structure of local centers in silicon. [Internet] [Doctoral dissertation]. Georgia Tech; 1981. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1853/30648.
Council of Science Editors:
Kenton AC. Electronic structure of local centers in silicon. [Doctoral Dissertation]. Georgia Tech; 1981. Available from: http://hdl.handle.net/1853/30648

Oregon State University
6.
Mai, Chao Chen.
Thermal growth and chemical etching of silicon dioxide film.
Degree: MS, Electrical Engineering, 1964, Oregon State University
URL: http://hdl.handle.net/1957/48584
► Some important factors that affect the dimensional control of oxide films on silicon were studied. Both N- and P-type silicon with resistivities in the range…
(more)
▼ Some important factors that affect the dimensional
control of oxide films on
silicon were studied. Both N- and
P-type
silicon with resistivities in the range of
0.014 to 200 ohm-cm and a (111) surface orientation
were employed in this experiment. The etching rates of
silicon dioxide in hydrofluoric acid (111) were studied
as a function of the concentration of HF, temperature,
and stirring speed. The experimental results show that
the etching rates varied directly with these variables,
but no difference in etching rate was found due to concentration
or type of impurity in the
silicon substrate
over the range studied.
The oxide layers on
silicon used in this experiment
were prepared by five different oxidation methods.
They are: wet oxygen, dry oxygen, steam, wet nitrogen
during diffusion of boron, and dry oxygen during diffusion
of phosphorus. The etching rates of the oxide
layer grown by the above methods have the same average value except for the oxide layer grown in dry oxygen
during a phosphorus diffusion which has a much faster
etching rate.
The thickness of the oxide layers employed in this
experiment was determined by a multiple-beam interference
method. Comparisons of this method to other optical
interference methods were made. It was found that the
multiple-beam method was the most accurate of the four
interference techniques.
Advisors/Committee Members: Looney, James C. (advisor).
Subjects/Keywords: Silicon
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APA ·
Chicago ·
MLA ·
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APA (6th Edition):
Mai, C. C. (1964). Thermal growth and chemical etching of silicon dioxide film. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/48584
Chicago Manual of Style (16th Edition):
Mai, Chao Chen. “Thermal growth and chemical etching of silicon dioxide film.” 1964. Masters Thesis, Oregon State University. Accessed February 16, 2019.
http://hdl.handle.net/1957/48584.
MLA Handbook (7th Edition):
Mai, Chao Chen. “Thermal growth and chemical etching of silicon dioxide film.” 1964. Web. 16 Feb 2019.
Vancouver:
Mai CC. Thermal growth and chemical etching of silicon dioxide film. [Internet] [Masters thesis]. Oregon State University; 1964. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1957/48584.
Council of Science Editors:
Mai CC. Thermal growth and chemical etching of silicon dioxide film. [Masters Thesis]. Oregon State University; 1964. Available from: http://hdl.handle.net/1957/48584

Oregon State University
7.
Cheng, Dan Sang.
The effect of etches on surface recombination in silicon.
Degree: MS, Electrical Engineering, 1962, Oregon State University
URL: http://hdl.handle.net/1957/49071
► This thesis presents a limited investigation of the effects of various etches on the surface properties of silicon. Surface recombination velocities of silicon under different…
(more)
▼ This thesis presents a limited investigation of the effects
of various etches on the surface properties of
silicon. Surface
recombination velocities of
silicon under different etching treatments
are compared by using the photoelectromagnetic effect. A
measure of the minority carriers lifetime by the photoconductive
decay method provides another means of comparing various surface
treatments and ambient atmospheres.
CP-4 etch yields the smallest surface recombination velocity
in
silicon; while sodium dichromate solution has the pronounced
effect of reducing the minority carrier lifetimes in
silicon. Ambient
atmospheres have no obvious influence on the surface recombination
velocity of
silicon.
Advisors/Committee Members: Looney, James C. (advisor).
Subjects/Keywords: Silicon
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❌
APA ·
Chicago ·
MLA ·
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CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Cheng, D. S. (1962). The effect of etches on surface recombination in silicon. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/49071
Chicago Manual of Style (16th Edition):
Cheng, Dan Sang. “The effect of etches on surface recombination in silicon.” 1962. Masters Thesis, Oregon State University. Accessed February 16, 2019.
http://hdl.handle.net/1957/49071.
MLA Handbook (7th Edition):
Cheng, Dan Sang. “The effect of etches on surface recombination in silicon.” 1962. Web. 16 Feb 2019.
Vancouver:
Cheng DS. The effect of etches on surface recombination in silicon. [Internet] [Masters thesis]. Oregon State University; 1962. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1957/49071.
Council of Science Editors:
Cheng DS. The effect of etches on surface recombination in silicon. [Masters Thesis]. Oregon State University; 1962. Available from: http://hdl.handle.net/1957/49071

Oregon State University
8.
Frescura, Bert Louis.
Impact ionization in gold-doped silicon.
Degree: MS, Electrical Engineering, 1963, Oregon State University
URL: http://hdl.handle.net/1957/49166
Subjects/Keywords: Silicon
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APA ·
Chicago ·
MLA ·
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to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Frescura, B. L. (1963). Impact ionization in gold-doped silicon. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/49166
Chicago Manual of Style (16th Edition):
Frescura, Bert Louis. “Impact ionization in gold-doped silicon.” 1963. Masters Thesis, Oregon State University. Accessed February 16, 2019.
http://hdl.handle.net/1957/49166.
MLA Handbook (7th Edition):
Frescura, Bert Louis. “Impact ionization in gold-doped silicon.” 1963. Web. 16 Feb 2019.
Vancouver:
Frescura BL. Impact ionization in gold-doped silicon. [Internet] [Masters thesis]. Oregon State University; 1963. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1957/49166.
Council of Science Editors:
Frescura BL. Impact ionization in gold-doped silicon. [Masters Thesis]. Oregon State University; 1963. Available from: http://hdl.handle.net/1957/49166

Oregon State University
9.
Kong, Ming J.
Diffusion in silicone polymers.
Degree: MS, Chemistry, 1974, Oregon State University
URL: http://hdl.handle.net/1957/44362
► The study of diffusion coefficients of n-alkanes and other organic compounds in silicones is undertaken by gas-liquid chromatography. About 0. 3% of stationary phase is…
(more)
▼ The study of diffusion coefficients of n-alkanes and other organic compounds in silicones is undertaken by gas-liquid chromatography. About 0. 3% of stationary phase is coated on glass bead support so that the only significant source of peak spreading is due to slow liquid phase mass transfer. Diffusion coefficients are higher in higher molecular weight methylsilicones than in lower molecular weight. The anomaly is partially explained by the increase of free volume with increasing molecular weight. Partition coefficients of n-alkanes in the methylsilicones are independent of the molecular weights of the silicones. Chromatographic peaks for n-alkanes in methylsilicones become increasingly skewed as the molecular weight of the n-alkane increases. Diffusion coefficients in phenyl, fluoro and cyanosilicones are strongly dependent on the steric hindrance of the substituent groups of the silicones and the molecular size and shape of the penetrants. Three equations for the dependence of the diffusion coefficients of n-alkanes on the physical properties of the penetrant-polymer system are investigated by linear regression. It is found that the best fit through the 158 data points is obtained when the densities and the percent phenyl content of silicones are included in the regression equation. It suggests the diffusion process is dependent on the free volume and steric hindrance of the silicones studied, and is independent of intermolecular attraction between the polymer and the penetrant.
Advisors/Committee Members: Hawkes, Stephen J. (advisor).
Subjects/Keywords: Silicon
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Kong, M. J. (1974). Diffusion in silicone polymers. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/44362
Chicago Manual of Style (16th Edition):
Kong, Ming J. “Diffusion in silicone polymers.” 1974. Masters Thesis, Oregon State University. Accessed February 16, 2019.
http://hdl.handle.net/1957/44362.
MLA Handbook (7th Edition):
Kong, Ming J. “Diffusion in silicone polymers.” 1974. Web. 16 Feb 2019.
Vancouver:
Kong MJ. Diffusion in silicone polymers. [Internet] [Masters thesis]. Oregon State University; 1974. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1957/44362.
Council of Science Editors:
Kong MJ. Diffusion in silicone polymers. [Masters Thesis]. Oregon State University; 1974. Available from: http://hdl.handle.net/1957/44362

Oregon State University
10.
Lai, Cheng-wen.
Microstrips on gold-doped silicon substrates.
Degree: MS, Electrical and Electronics Engineering, 1972, Oregon State University
URL: http://hdl.handle.net/1957/45670
► The power dissipation of microstrip transmission-line on gold-doped silicon substrates was investigated. The gold-doping was applied to a regular n-type silicon substrate with resistivity of…
(more)
▼ The power dissipation of microstrip transmission-line on
gold-doped
silicon substrates was investigated. The gold-doping was
applied to a regular n-type
silicon substrate with resistivity of 5 to
10 ohm-cm. Insertion-loss tests were employed to measure the
power dissipation of the microstrips. Power dissipation somewhat
less than that for intrinsic
silicon with resistivities in the order of
1000 ohm-cm were obtained. For application, band-pass filters, of
the parallel-coupled microstrip-line type were also built on
silicon
substrates and tested. The performance of the filters showed that a
great deal of care should be taken in the design and fabricating
process if a good result is to be obtained.
Advisors/Committee Members: Alexander, G. C. (advisor).
Subjects/Keywords: Silicon
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Lai, C. (1972). Microstrips on gold-doped silicon substrates. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/45670
Chicago Manual of Style (16th Edition):
Lai, Cheng-wen. “Microstrips on gold-doped silicon substrates.” 1972. Masters Thesis, Oregon State University. Accessed February 16, 2019.
http://hdl.handle.net/1957/45670.
MLA Handbook (7th Edition):
Lai, Cheng-wen. “Microstrips on gold-doped silicon substrates.” 1972. Web. 16 Feb 2019.
Vancouver:
Lai C. Microstrips on gold-doped silicon substrates. [Internet] [Masters thesis]. Oregon State University; 1972. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1957/45670.
Council of Science Editors:
Lai C. Microstrips on gold-doped silicon substrates. [Masters Thesis]. Oregon State University; 1972. Available from: http://hdl.handle.net/1957/45670

University of British Columbia
11.
Drews, Reinhold Eldor.
An experimental and theoretical investigation of the statistics of avalanche breakdown in silicon
.
Degree: 1957, University of British Columbia
URL: http://hdl.handle.net/2429/40875
► Measurements are made on Si p - n junctions under reverse bias in the unstable avalanche breakdown region to determine the statistics of the current…
(more)
▼ Measurements are made on Si p - n junctions under reverse bias in the unstable avalanche breakdown region to determine the statistics of the current pulses, and their effect on the measured mean current - mean voltage characteristics. It is found that the slope and shape of the measured mean current - mean voltage is not unique, but depends on the external resistance in series with the power supply. The mean current - mean voltage characteristics are also found to display turnover, with the voltage at turnover and the magnitude of the maximum negative resistance both increasing with increasing resistance R.
Measurements are also made to determine the relation between the current pulse amplitude I₁ and the voltage V₁ across the diode during the avalanche. The results show that over the range where data are available, a linear relation exists between reverse voltage and current pulse amplitude. The intersection of this line with the voltage axis is defined as the breakdown voltage V[subscript B], and its slope is the conductance denoted by g. A simple model consisting of a random switch in series with a two terminal device having the property that for V₁ < V[subscript B], I₁ = 0 and for V₁ > V[subscript B], I₁ = g(V₁- V[subscript B]) is proposed. An avalanche initiation transition probability which increases monotonically with increasing voltage in excess of V[subscript B], and an extinction transition probability which decreases monotonically with increasing excess voltage are postulated. The experimentally derived probability functions satisfy the chosen theoretical functional dependence on excess voltage to within experimental error. Assuming that the "switching" process is Markoffian, an expression for the fraction of the time during which the avalanche occurs is derived. Using this relation and the pulse amplitude data, a theoretical mean current - mean voltage characteristic is obtained which is in good agreement with the experimental curve.
The predicted mean pulse rate curve is also experimentally verified. Illumination experiments show that the initiation transition probability is directly proportional to the number of carriers entering the avalanche region; the discharge probability for an electron entering the avalanche region is independent of illumination and carrier density in the breakdown region. The apparent predominance of a form of "surface leakage" in the reverse current makes it impossible to obtain data regarding the discharge probability per incoming electron from temperature variation experiments. Measurements of the spectral density of the current fluctuations over a wide range of frequency confirms the simple form S[subscript I](ω) = S[subscript I](0) / (1 + ω²τ²) associated with a Markoffian process.
Subjects/Keywords: Silicon
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APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Drews, R. E. (1957). An experimental and theoretical investigation of the statistics of avalanche breakdown in silicon
. (Thesis). University of British Columbia. Retrieved from http://hdl.handle.net/2429/40875
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Drews, Reinhold Eldor. “An experimental and theoretical investigation of the statistics of avalanche breakdown in silicon
.” 1957. Thesis, University of British Columbia. Accessed February 16, 2019.
http://hdl.handle.net/2429/40875.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Drews, Reinhold Eldor. “An experimental and theoretical investigation of the statistics of avalanche breakdown in silicon
.” 1957. Web. 16 Feb 2019.
Vancouver:
Drews RE. An experimental and theoretical investigation of the statistics of avalanche breakdown in silicon
. [Internet] [Thesis]. University of British Columbia; 1957. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/2429/40875.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Drews RE. An experimental and theoretical investigation of the statistics of avalanche breakdown in silicon
. [Thesis]. University of British Columbia; 1957. Available from: http://hdl.handle.net/2429/40875
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

University of New South Wales
12.
Kunz, Oliver.
Evaporated solid-phase crystallised poly-silicon thin film solar cells on glass.
Degree: Photovoltaics & Renewable Energy Engineering, 2009, University of New South Wales
URL: http://handle.unsw.edu.au/1959.4/43644
;
https://unsworks.unsw.edu.au/fapi/datastream/unsworks:4983/SOURCE02?view=true
► The cost of photovoltaic electricity needs to be significantly reduced in order to achieve a high electricity market penetration. Thin-film solar cells have good potential…
(more)
▼ The cost of photovoltaic electricity needs to be significantly reduced in order to achieve a high electricity market penetration. Thin-film solar cells have good potential to achieve such cost savings though (i) large-area deposition onto low-cost foreign substrates, (ii) more streamlined processing, (iii) monolithic cell interconnection, and very efficient use of the expensive semiconductor material. Polycrystalline
silicon (poly-Si) on glass is a promising technology for the cost-effective large volume production of PV modules since it (i) makes use of an abundant raw material, (ii) is non-toxic, (iii) does not suffer from light-induced degradation, and (iv) does not rely on TCO layers. Usually plasma enhanced chemical vapour deposition (PECVD) is used for the layer formation. This thesis explores the use of e-beam evaporation as deposition method since it is potentially much faster and cheaper than PECVD. The resulting solar cells are referred to as EVA (from EVAporation).Two inherent shunting mechanisms in EVA cells are demonstrated to be shunting through sub-micron sized pinholes when the back electrode is deposited and shunting between the emitter and the absorber layer at the glass-side electrode. Through the improved understanding of these shunting mechanisms it was possible to develop a suitable metallisation scheme for EVA cells using an aligned deposition of emitter and back surface field line contacts and a specially developed shunt mitigation etching technique. For the first time appreciable efficiencies of up to 5.2% were demonstrated on this material. It was also shown that only very lightly doped absorber layers can lead to the required high short-circuit currents in EVA cells. The resulting cells are currently completely limited by space charge region recombination occurring with comparatively low ideality factors of only ~ 1.4This thesis also demonstrates the usefulness of Jsc-Suns measurements and investigates optical loss mechanisms in the current devices. Advanced modelling of distributed series resistance effects, influencing Suns-Voc, m-Voc and Jsc-Suns curves, is employed. PC1D modelling is used to extract relevant device parameters. In this work it was found that the diffusion length in the best EVA cells is longer than the absorber layer and that insufficient light trapping is currently the major hurdle to higher cell efficiencies.From the obtained results it can be concluded that EVA solar cells are promising candidates for the low-cost and high-volume production of solar modules.
Advisors/Committee Members: Sproul, Alistair, Photovoltaics & Renewable Energy Engineering, Faculty of Engineering, UNSW, Varlamov, Sergey, Photovoltaics & Renewable Energy Engineering, Faculty of Engineering, UNSW.
Subjects/Keywords: Polycrystalline silicon; Polycrystalline silicon; Silicon thin-film solar cells; Evaporated silicon
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Kunz, O. (2009). Evaporated solid-phase crystallised poly-silicon thin film solar cells on glass. (Doctoral Dissertation). University of New South Wales. Retrieved from http://handle.unsw.edu.au/1959.4/43644 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:4983/SOURCE02?view=true
Chicago Manual of Style (16th Edition):
Kunz, Oliver. “Evaporated solid-phase crystallised poly-silicon thin film solar cells on glass.” 2009. Doctoral Dissertation, University of New South Wales. Accessed February 16, 2019.
http://handle.unsw.edu.au/1959.4/43644 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:4983/SOURCE02?view=true.
MLA Handbook (7th Edition):
Kunz, Oliver. “Evaporated solid-phase crystallised poly-silicon thin film solar cells on glass.” 2009. Web. 16 Feb 2019.
Vancouver:
Kunz O. Evaporated solid-phase crystallised poly-silicon thin film solar cells on glass. [Internet] [Doctoral dissertation]. University of New South Wales; 2009. [cited 2019 Feb 16].
Available from: http://handle.unsw.edu.au/1959.4/43644 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:4983/SOURCE02?view=true.
Council of Science Editors:
Kunz O. Evaporated solid-phase crystallised poly-silicon thin film solar cells on glass. [Doctoral Dissertation]. University of New South Wales; 2009. Available from: http://handle.unsw.edu.au/1959.4/43644 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:4983/SOURCE02?view=true

University of New South Wales
13.
Pok, Wilson.
Atomically abrupt, highly-doped, coplanar nanogaps in silicon.
Degree: ARC Centre of Excellence for Quantum Computer Technology, 2011, University of New South Wales
URL: http://handle.unsw.edu.au/1959.4/50217
;
https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9095/SOURCE02?view=true
► In this thesis we investigate electron transport between ultra-thin, atomically abrupt, buried, nanoscale gaps in silicon, formed between coplanar source and drain leads consisting of…
(more)
▼ In this thesis we investigate electron transport between ultra-thin, atomically abrupt, buried, nanoscale gaps in silicon, formed between coplanar source and drain leads consisting of highly phosphorus doped silicon. The leads are patterned using scanning probe lithography, dosed with phosphine gas and encapsulated with silicon using low temperature molecular beam epitaxy. These unique tunnel gaps have leads with low sheet resistivities of <1 kohms, are atomically abrupt in all three dimensions, and are scaled down to sub-20 nm dimensions.The overall tunneling resistance of these devices depends exponentially on the aspect ratio (lead width/gap separation) such that, by engineering the gap dimensions, we control the resistance over seven orders of magnitude from <10 kohms to >500 Gohms. This relationship allows us to predictively engineer gap resistance with device geometry. We also demonstrate an asymmetric barriershape, forming an atomic-scale diode with clear rectifying behaviour. We explore six commonly used models to estimate the barrier heights in these nanoscale gaps (rectangular and parabolic barrier models, transition voltage, Fowler-Nordheim field emission and thermionic emission), and where appropriate, adapt these models to include the complex silicon bandstructure. Although these models provide reasonable estimates, no single model describes the conductance over the complete range of gaps studied, and highlight the need for more accurate models that self-consistently account for both tunneling within the electrostatic potential of the exact lead geometry and Thomas-Fermi screening.We develop three different methods of top-gating these devices using a Schottky barrier, a native oxide, or a silicon dioxide dielectric grown at low temperature. The low temperature oxide exhibits the largest gating range, and the overall tunnel gapresistance can be gated by three orders of magnitude. Finally, we investigate the possibility of engineering the dopants between the source and drain leads. We confirm that we can order dopants with sub-10 nm precision in the channel and demonstrate their overall effect on device conductance. This thesis shows that across a statistical number of devices, we can engineer the lead geometry, the tunneling resistance, the barrier height, and the level of disorder, between atomically abrupt source/drain leads.
Subjects/Keywords: Silicon; Nanoelectronics
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APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Pok, W. (2011). Atomically abrupt, highly-doped, coplanar nanogaps in silicon. (Doctoral Dissertation). University of New South Wales. Retrieved from http://handle.unsw.edu.au/1959.4/50217 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9095/SOURCE02?view=true
Chicago Manual of Style (16th Edition):
Pok, Wilson. “Atomically abrupt, highly-doped, coplanar nanogaps in silicon.” 2011. Doctoral Dissertation, University of New South Wales. Accessed February 16, 2019.
http://handle.unsw.edu.au/1959.4/50217 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9095/SOURCE02?view=true.
MLA Handbook (7th Edition):
Pok, Wilson. “Atomically abrupt, highly-doped, coplanar nanogaps in silicon.” 2011. Web. 16 Feb 2019.
Vancouver:
Pok W. Atomically abrupt, highly-doped, coplanar nanogaps in silicon. [Internet] [Doctoral dissertation]. University of New South Wales; 2011. [cited 2019 Feb 16].
Available from: http://handle.unsw.edu.au/1959.4/50217 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9095/SOURCE02?view=true.
Council of Science Editors:
Pok W. Atomically abrupt, highly-doped, coplanar nanogaps in silicon. [Doctoral Dissertation]. University of New South Wales; 2011. Available from: http://handle.unsw.edu.au/1959.4/50217 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9095/SOURCE02?view=true

University of Minnesota
14.
Rastgar, Neema.
Effects of water adsorption and surface oxidation on the electrical conductivity of silicon nanocrystal films.
Degree: Material Science and Engineering, 2012, University of Minnesota
URL: http://purl.umn.edu/160270
► Electrical conductivities of thin films of silicon nanocrystals (4-6 nm) exhibit high sensitivity to water vapor. Specifically, water adsorption on the surface of silicon nanocrystal…
(more)
▼ Electrical conductivities of thin films of silicon nanocrystals (4-6 nm) exhibit high sensitivity to water vapor. Specifically, water adsorption on the surface of silicon nanocrystal (NC) films increases their electrical conductivity by a factor of four at room temperature and an order of magnitude at 175 K. The increase in conductivity is reversible and can manifest as peaks or hysteresis loops in temperature-dependent conductivity measurements even when the measurements are conducted under vacuum at 10-5 Torr and in the presence of only residual amounts of water vapor. Hydrogen-terminated silicon nanocrystals are easily oxidized to form submonolayer to monolayer of chemically bound oxygen on their surfaces when annealed at 300°C in a glovebox with 0.1 ppm of water vapor. Annealing under vacuum at 300°C retains H-passivation without oxidation. The electrical conductivity of films made from hydrogen-terminated silicon nanocrystals is 200 times higher than the electrical conductivity of films made from silicon nanocrystals with a monolayer of chemically bound oxygen. However, the conductivities of both types of films increase upon adsorption of water on the nanocrystal surfaces. These findings underscore the importance of controlling silicon nanocrystal surfaces in determining the electrical properties of their thin films.
Subjects/Keywords: Silicon Nanocrystals
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Rastgar, N. (2012). Effects of water adsorption and surface oxidation on the electrical conductivity of silicon nanocrystal films. (Thesis). University of Minnesota. Retrieved from http://purl.umn.edu/160270
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Rastgar, Neema. “Effects of water adsorption and surface oxidation on the electrical conductivity of silicon nanocrystal films.” 2012. Thesis, University of Minnesota. Accessed February 16, 2019.
http://purl.umn.edu/160270.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Rastgar, Neema. “Effects of water adsorption and surface oxidation on the electrical conductivity of silicon nanocrystal films.” 2012. Web. 16 Feb 2019.
Vancouver:
Rastgar N. Effects of water adsorption and surface oxidation on the electrical conductivity of silicon nanocrystal films. [Internet] [Thesis]. University of Minnesota; 2012. [cited 2019 Feb 16].
Available from: http://purl.umn.edu/160270.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Rastgar N. Effects of water adsorption and surface oxidation on the electrical conductivity of silicon nanocrystal films. [Thesis]. University of Minnesota; 2012. Available from: http://purl.umn.edu/160270
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
15.
Swanepoel, Ryno.
Invloed van swaar neutronbestraling op die elektriese eienskappe van suiwer silikon.
Degree: 2015, University of Johannesburg
URL: http://hdl.handle.net/10210/14387
D.Sc..
Please refer to full text to view abstract
Subjects/Keywords: Silicon
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APA ·
Chicago ·
MLA ·
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CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Swanepoel, R. (2015). Invloed van swaar neutronbestraling op die elektriese eienskappe van suiwer silikon. (Thesis). University of Johannesburg. Retrieved from http://hdl.handle.net/10210/14387
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Swanepoel, Ryno. “Invloed van swaar neutronbestraling op die elektriese eienskappe van suiwer silikon.” 2015. Thesis, University of Johannesburg. Accessed February 16, 2019.
http://hdl.handle.net/10210/14387.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Swanepoel, Ryno. “Invloed van swaar neutronbestraling op die elektriese eienskappe van suiwer silikon.” 2015. Web. 16 Feb 2019.
Vancouver:
Swanepoel R. Invloed van swaar neutronbestraling op die elektriese eienskappe van suiwer silikon. [Internet] [Thesis]. University of Johannesburg; 2015. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/10210/14387.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Swanepoel R. Invloed van swaar neutronbestraling op die elektriese eienskappe van suiwer silikon. [Thesis]. University of Johannesburg; 2015. Available from: http://hdl.handle.net/10210/14387
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Oregon State University
16.
Vas-Umnuay, Paravee.
Flow characterization of multiple-tube reactors for synthesis of nano-sized
silicon nitride powder via silicon monoxide ammonolysis.
Degree: MS, Chemical Engineering, 2008, Oregon State University
URL: http://hdl.handle.net/1957/9531
► Concentrically arranged multiple-tube reactors with different dimensions were built for synthesizing nano-sized silicon nitride powder via the ammonolysis of SiO vapor. The reaction was operated…
(more)
▼ Concentrically arranged multiple-tube reactors with different dimensions were
built for synthesizing nano-sized
silicon nitride powder via the ammonolysis of SiO
vapor. The reaction was operated at temperatures ranging from 1350 to 1400°C and
pressure slightly above atmospheric pressure.
Silicon monoxide (SiO) vapor was
generated by charging argon gas through a bed of SiO particles packed in the
innermost feeding tube and reacted with ammonia gas introduced through a separate
feeding tube into the concentrical arrangement. Additional argon was fed into the
annular space between SiO feeder and ammonia feeder to prevent the two reactant
gases from reacting instantly at the feeder outlets and forming whiskers.
None of the reactors with micro-scale dimensions (less than 1 mm) could be
operated stably due to whisker formation at the SiO feeders. On the other hand, a
meso-scale reactor with a 3.25 mm ID innermost tube for feeding SiO vapor was
successfully operated for synthesizing nano-sized powder at measurable quantities.
The velocity feed ratio of argon through a bed of SiO particles/NH₃ was maintained at 8.5 for effective production, maximizing nano-sized powder production
and minimizing whisker formation. The arrangement of the feeding tubes of reactor
was one of the most important parameters that have a direct influence on nano-sized
powder formation. When a SiO generating tube was extended out of the annular Ar
feeder, the highest efficiency of nano-sized powder production was obtained. The
mean residence time of the reactants in the reacting zone was adjusted by the length of
product collection tube placed in the uniform temperature zone and set to be about
0.04 seconds.
High reaction temperature promoted the SiO utilization, leading to more nano-
sized Si₃N₄ powder as well as Si₃N₄ whiskers at the outlet of the SiO generator. The
apparent activation energy for the formation of nano-sized powder was 211 kJ/mol,
based on an assumption of first-order with respect to the SiO concentration. The
average particle size of nano-sized powder decreased with an increase in the reaction
temperature, lying in the same range as obtained in the preceding work.
The flow of a gaseous mixture in the reactor was simulated with a math
software as an effective aid for identifying a reactor structure and operating variables
suitable for synthesizing nano-sized
silicon nitride powders. The simulated results
suggested the optimal configuration of reactor and operating conditions to be
employed in the experimental runs. It also revealed that locations where whiskers
form corresponded to those appeared in the experimental runs.
Advisors/Committee Members: Kimura, Shoichi (advisor), Chang, Chih-hung (committee member).
Subjects/Keywords: nano-sized silicon nitride; Silicon nitride – Synthesis
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Vas-Umnuay, P. (2008). Flow characterization of multiple-tube reactors for synthesis of nano-sized
silicon nitride powder via silicon monoxide ammonolysis. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/9531
Chicago Manual of Style (16th Edition):
Vas-Umnuay, Paravee. “Flow characterization of multiple-tube reactors for synthesis of nano-sized
silicon nitride powder via silicon monoxide ammonolysis.” 2008. Masters Thesis, Oregon State University. Accessed February 16, 2019.
http://hdl.handle.net/1957/9531.
MLA Handbook (7th Edition):
Vas-Umnuay, Paravee. “Flow characterization of multiple-tube reactors for synthesis of nano-sized
silicon nitride powder via silicon monoxide ammonolysis.” 2008. Web. 16 Feb 2019.
Vancouver:
Vas-Umnuay P. Flow characterization of multiple-tube reactors for synthesis of nano-sized
silicon nitride powder via silicon monoxide ammonolysis. [Internet] [Masters thesis]. Oregon State University; 2008. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1957/9531.
Council of Science Editors:
Vas-Umnuay P. Flow characterization of multiple-tube reactors for synthesis of nano-sized
silicon nitride powder via silicon monoxide ammonolysis. [Masters Thesis]. Oregon State University; 2008. Available from: http://hdl.handle.net/1957/9531

University of California – Berkeley
17.
Alper, John Paul.
Silicon and Silicon Carbide Nanowires: Synthesis, Characterization, Modification, and Application as Micro-Supercapacitor Electrodes.
Degree: Chemical Engineering, 2014, University of California – Berkeley
URL: http://www.escholarship.org/uc/item/3k9463pp
► For applications in mobile and remote sensing platforms, microsupercapacitors are attractive energy storage devices due to their robust lifetimes and high specific power capacity. Utilization…
(more)
▼ For applications in mobile and remote sensing platforms, microsupercapacitors are attractive energy storage devices due to their robust lifetimes and high specific power capacity. Utilization of green electrolytes in these devices reduces environmental impact and simplifies packaging by avoiding the stringent oxygen and moisture free conditions required for organic and ionic liquid based electrolytes. Porous silicon nanowire based microsupercapacitor electrode materials are promising for on chip applications using an environmentally benign aqueous electrolyte, 1 M KCl, however they are prone to oxidation. A silicon carbide coating was found to mitigate this issue. The fabrication techniques, involving low-temperature electroless etching of silicon, are compatible with current integrated circuit processing methods and may be readily integrated at the micro device level. The electrode materials are in good electrical contact with the underlying substrate and require no additional current collector. The base porous silicon nanowires are coated with a thin silicon carbide passivation layer by low pressure chemical vapor deposition. The demonstrated capacitance of the electrode materials, ~1700 μF/cm2 projected area, is comparable to other carbon based microsupercapacitor electrodes, remains stable over many charge/discharge cycles, and maintains capacitive behavior over a wide range of charge/discharge rates. An improved passivation method for the porous silicon nanowires has also been developed. The selective coating procedure deposits an ultra-thin (~ 1-3 nm) carbon sheath over the nanowires and passivates them. The ultra-thin nature of the coating enables solvent access to the pore area and hence a large improvement of active specific surface over the SiC coated PSiNWs discussed above. The electrochemical performance of these coated nanowires is characterized in both an aqueous electrolyte and an ionic liquid electrolyte. Specific capacitance values reaching 325 mF cm 2 are achieved in ionic liquid, and calculations indicate that the theoretical maximum capacitance of the pristine wires is reached. TEM studies confirm the coating thickness and its conformality. Raman spectroscopy indicates that the carbon in the coating is mainly sp2 hybridized, with corresponding high conductivity. At the time of writing, these materials represent the largest specific energy microsupercapacitor electrode published. A test device is prepared and demonstrated powering an LED. The testing results of silicon carbide (SiC) nanowires (NW) as an electrode material for micro-supercapacitors is described. SiC NWs are grown on a SiC thin film coated with a thin Ni catalyst layer via chemical vapor deposition. A specific capacitance of ~240 µF cm-2 is demonstrated. Charge-discharge studies demonstrate the SiC nanowires exhibit exceptional stability, with 95% capacitance retention after 2×105 charge/discharge cycles in an environmentally benign, aqueous electrolyte. Doping of the nanowires with nitrogen through the addition of 5 at%…
Subjects/Keywords: Chemical engineering; microsupercapacitor; nanowires; silicon; silicon carbide
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Alper, J. P. (2014). Silicon and Silicon Carbide Nanowires: Synthesis, Characterization, Modification, and Application as Micro-Supercapacitor Electrodes. (Thesis). University of California – Berkeley. Retrieved from http://www.escholarship.org/uc/item/3k9463pp
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Alper, John Paul. “Silicon and Silicon Carbide Nanowires: Synthesis, Characterization, Modification, and Application as Micro-Supercapacitor Electrodes.” 2014. Thesis, University of California – Berkeley. Accessed February 16, 2019.
http://www.escholarship.org/uc/item/3k9463pp.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Alper, John Paul. “Silicon and Silicon Carbide Nanowires: Synthesis, Characterization, Modification, and Application as Micro-Supercapacitor Electrodes.” 2014. Web. 16 Feb 2019.
Vancouver:
Alper JP. Silicon and Silicon Carbide Nanowires: Synthesis, Characterization, Modification, and Application as Micro-Supercapacitor Electrodes. [Internet] [Thesis]. University of California – Berkeley; 2014. [cited 2019 Feb 16].
Available from: http://www.escholarship.org/uc/item/3k9463pp.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Alper JP. Silicon and Silicon Carbide Nanowires: Synthesis, Characterization, Modification, and Application as Micro-Supercapacitor Electrodes. [Thesis]. University of California – Berkeley; 2014. Available from: http://www.escholarship.org/uc/item/3k9463pp
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

University of Southern California
18.
Deng, Wangxue.
Fabrication of silicon carbide sintered supports and silicon
carbide membranes.
Degree: PhD, Chemical Engineering, 2013, University of Southern California
URL: http://digitallibrary.usc.edu/cdm/compoundobject/collection/p15799coll3/id/355292/rec/2700
► Efficient separation of hydrogen (H₂) under high temperatures and pressures is important to the development of the clean-energy industry, and has been among the key…
(more)
▼ Efficient separation of hydrogen (H₂) under high
temperatures and pressures is important to the development of the
clean-energy industry, and has been among the key drivers for
research on inorganic membranes for the last two decades. Although
substantial efforts have been devoted to date to the preparation of
nanoporous membranes for H₂ separation, the fabrication of
high-temperature and steam-stable inorganic membranes with high
hydrogen fluxes and large separation factors still remains a key
challenge. Among all the potential candidates,
silicon carbide
(SiC) membranes show potential advantages for use in hydrogen
separation processes under harsh and corrosive conditions such as,
for example, the steam reforming and the water gas shift reactions
commonly employed in H₂ production; this is because SiC is a
material that has high corrosion resistance, high thermal
conductivity, high thermal shock resistance, and excellent chemical
and mechanical stability, making it thus a promising material for
application in industrial processes for clean energy production. ❧
High-quality porous SiC supports are of great importance in the
fabrication of hydrogen permselective SiC nanoporous membranes and
their preparation has, thus, been a keen a key focus in this
research. In this Thesis, we report on the preparation, via the
pressureless sintering of β-SiC powders, of SiC tubular supports
that are both highly permeable and mechanically strong. Their
transport characteristics were studied via inert-gas permeation
tests, while their structure and surface morphology were
characterized by atomic force microscopy (AFM) and scanning
electron microscopy (SEM) analysis. In addition, the effect of
varying the composition of starting powders, the sintering
temperature, and the amount of sintering aids utilized on the
transport characteristics and the surface roughness of such
sintered SiC porous supports were also systematically investigated.
These tubular SiC supports exhibit high fluxes (a He permeance as
high as 5.8×10⁻⁵ mol*m⁻²*s⁻¹*Pa⁻¹) and are mechanically strong
(compressive strength as high as 106 MPa) to potentially withstand
the pressure drops required in their use as membrane supports. ❧
Utilizing these high-quality SiC sintered supports, nanoporous SiC
membranes were prepared by the pyrolysis of thin
ally-hydridopolycarbosilane (AHPCS) films coated on such supports,
using a combination of slip-casting and dip-coating techniques
coupled with periodic coatings of polystyrene sacrificial
interlayers. The membranes prepared using these SiC supports are
very permselective (a He/Ar separation factor as high as 2000) and
exhibit a He permeance as high as 2.4×10⁻⁷
mol*m⁻²*s⁻¹*Pa⁻¹.
Advisors/Committee Members: Tsotsis, Theodore T. (Committee Chair), Sahimi, Muhammad (Committee Member), Lu, Grace (Committee Member).
Subjects/Keywords: silicon carbide supports; silicon carbide membranes
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APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Deng, W. (2013). Fabrication of silicon carbide sintered supports and silicon
carbide membranes. (Doctoral Dissertation). University of Southern California. Retrieved from http://digitallibrary.usc.edu/cdm/compoundobject/collection/p15799coll3/id/355292/rec/2700
Chicago Manual of Style (16th Edition):
Deng, Wangxue. “Fabrication of silicon carbide sintered supports and silicon
carbide membranes.” 2013. Doctoral Dissertation, University of Southern California. Accessed February 16, 2019.
http://digitallibrary.usc.edu/cdm/compoundobject/collection/p15799coll3/id/355292/rec/2700.
MLA Handbook (7th Edition):
Deng, Wangxue. “Fabrication of silicon carbide sintered supports and silicon
carbide membranes.” 2013. Web. 16 Feb 2019.
Vancouver:
Deng W. Fabrication of silicon carbide sintered supports and silicon
carbide membranes. [Internet] [Doctoral dissertation]. University of Southern California; 2013. [cited 2019 Feb 16].
Available from: http://digitallibrary.usc.edu/cdm/compoundobject/collection/p15799coll3/id/355292/rec/2700.
Council of Science Editors:
Deng W. Fabrication of silicon carbide sintered supports and silicon
carbide membranes. [Doctoral Dissertation]. University of Southern California; 2013. Available from: http://digitallibrary.usc.edu/cdm/compoundobject/collection/p15799coll3/id/355292/rec/2700

University of the Western Cape
19.
Oliphant, Clive Justin.
Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
.
Degree: 2012, University of the Western Cape
URL: http://hdl.handle.net/11394/5203
► Nanocrystalline silicon (nc-Si:H) is an interesting type of silicon with superior electrical properties that are more stable compared to amorphous silicon (a-Si:H). Silicon nitride (SiNₓ)…
(more)
▼ Nanocrystalline
silicon (nc-Si:H) is an interesting type of
silicon with superior
electrical properties that are more stable compared to amorphous
silicon (a-Si:H).
Silicon nitride (SiNₓ) thin films are currently the dielectric widely applied in the
microelectronics industry and are also effective antireflective and passivating layers
for multicrystalline
silicon solar cells. Research into the synthesis and
characterization of nc-Si:H and SiNₓ thin films is vital from a renewable energy
aspect. In this thesis we investigated the film growth mechanisms and the filament
stability during the hot-wire chemical vapour deposition (HWCVD) of nc-Si:H and
SiNₓ thin films. During the HWCVD of nc-Si:H, electron backscatter diffraction (EBSD) revealed that the tantalum (Ta) filament aged to consists of a recrystallized Ta-core with Ta-rich silicides at the hotter centre regions and Si-rich Ta-silicides at the cooler ends nearer to the electrical contacts. The growth of nc-Si:H by HWCVD is controlled by surface reactions before and beyond the transition from a-Si:H to nc-Si:H. During the transition, the diffusion of hydrogen (H) within the film is proposed to be the reaction controlling step. The deposition pressure influenced the structural, mechanical and optical properties of nc-Si:H films mostly when the film thickness is below 250 nm. The film stress, optical band gap, refractive index and crystalline volume fraction approached similar values at longer deposition times irrespective of the deposition pressure. Filament degradation occurred during the HWCVD of SiNₓ thin films from low total flow rate SiH₄ / ammonia (NH₃) / H₂ gas mixture. Similar to the HWCVD of nc-Si:H, the Ta-core recrystallized and silicides formed around the perimeter. However, Tanitrides formed within the filament bulk. The extent of nitride and silicide formation, porosity and cracks were all enhanced at the hotter centre regions, where filament failure eventually occurred. We also applied HWCVD to deposit transparent, low reflective and hydrogen containing SiNₓ thin films at total gas flow rates less than 31 sccm with NH₃ flow rates as low as 3 sccm. Fluctuations within the SiNₓ thin film growth rates were attributed to the depletion of growth species (Si, N, and H) from the ambient and their incorporation within the filament during its degradation.
Advisors/Committee Members: Arendse, C. J (advisor), Knoesen, D (advisor), Muller, T. F. G (advisor).
Subjects/Keywords: Nanocrystalline silicon;
Silicon nitride;
Electron backscatter diffraction
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Oliphant, C. J. (2012). Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
. (Thesis). University of the Western Cape. Retrieved from http://hdl.handle.net/11394/5203
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Oliphant, Clive Justin. “Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
.” 2012. Thesis, University of the Western Cape. Accessed February 16, 2019.
http://hdl.handle.net/11394/5203.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Oliphant, Clive Justin. “Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
.” 2012. Web. 16 Feb 2019.
Vancouver:
Oliphant CJ. Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
. [Internet] [Thesis]. University of the Western Cape; 2012. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/11394/5203.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Oliphant CJ. Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
. [Thesis]. University of the Western Cape; 2012. Available from: http://hdl.handle.net/11394/5203
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

University of Minnesota
20.
Wienkes, Lee Raymond.
Electronic transport in mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films.
Degree: PhD, Physics, 2013, University of Minnesota
URL: http://purl.umn.edu/154984
► Interest in mixed-phase silicon thin film materials, composed of an amorphous semiconductor matrix in which nanocrystalline inclusions are embedded, stems in part from potential technological…
(more)
▼ Interest in mixed-phase silicon thin film materials, composed of an amorphous semiconductor matrix in which nanocrystalline inclusions are embedded, stems in part from potential technological applications, including photovoltaic and thin film transistor technologies. Conventional mixed-phase silicon films are produced in a single plasma reactor, where the conditions of the plasma must be precisely tuned, limiting the ability to adjust the film and nanoparticle parameters independently. The films presented in this thesis are deposited using a novel dual-plasma co-deposition approach in which the nanoparticles are produced separately in an upstream reactor and then injected into a secondary reactor where an amorphous silicon film is being grown. The degree of crystallinity and grain sizes of the films are evaluated using Raman spectroscopy and X-ray diffraction respectively. I describe detailed electronic measurements which reveal three distinct conduction mechanisms in n-type doped mixed-phase amorphous/nanocrystalline silicon thin films over a range of nanocrystallite concentrations and temperatures, covering the transition from fully amorphous to ~30% nanocrystalline. As the temperature is varied from 470 to 10 K, we observe activated conduction, multiphonon hopping (MPH) and Mott variable range hopping (VRH) as the nanocrystal content is increased. The transition from MPH to Mott-VRH hopping around 100K is ascribed to the freeze out of the phonon modes. A conduction model involving the parallel contributions of these three distinct conduction mechanisms is shown to describe both the conductivity and the reduced activation energy data to a high accuracy. Additional support is provided by measurements of thermal equilibration effects and noise spectroscopy, both done above room temperature (>300 K). This thesis provides a clear link between measurement and theory in these complex materials.
Subjects/Keywords: Amorphous silicon; Electronic transport; Hopping; Nanocrystalline silicon
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APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Wienkes, L. R. (2013). Electronic transport in mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films. (Doctoral Dissertation). University of Minnesota. Retrieved from http://purl.umn.edu/154984
Chicago Manual of Style (16th Edition):
Wienkes, Lee Raymond. “Electronic transport in mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films.” 2013. Doctoral Dissertation, University of Minnesota. Accessed February 16, 2019.
http://purl.umn.edu/154984.
MLA Handbook (7th Edition):
Wienkes, Lee Raymond. “Electronic transport in mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films.” 2013. Web. 16 Feb 2019.
Vancouver:
Wienkes LR. Electronic transport in mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films. [Internet] [Doctoral dissertation]. University of Minnesota; 2013. [cited 2019 Feb 16].
Available from: http://purl.umn.edu/154984.
Council of Science Editors:
Wienkes LR. Electronic transport in mixed-phase hydrogenated amorphous/nanocrystalline silicon thin films. [Doctoral Dissertation]. University of Minnesota; 2013. Available from: http://purl.umn.edu/154984

Rochester Institute of Technology
21.
Narayanan, Karthik.
Hydrogenated amorphous silicon photonics.
Degree: PhD, Microsystems Engineering, 2011, Rochester Institute of Technology
URL: https://scholarworks.rit.edu/theses/10
► Silicon Photonics is quickly proving to be a suitable interconnect technology for meeting the future goals of on-chip bandwidth and low power requirements. However, it…
(more)
▼ Silicon Photonics is quickly proving to be a suitable interconnect technology for meeting the future goals of on-chip bandwidth and low power requirements. However, it is not clear how
silicon photonics will be integrated into CMOS chips, particularly microprocessors. The issue of integrating photonic circuits into electronic IC fabrication processes to achieve maximum flexibility and minimize complexity and cost is an important one. In order to maximize usage of chip real estate, it will be advantageous to integrate in three-dimensions. Hydrogenated-amorphous
silicon (a-Si:H) is emerging as a promising material for the 3-D integration of
silicon photonics for on-chip optical interconnects. In addition, a-Si:H film can be deposited using CMOS compatible low temperature plasma-enhanced chemical vapor deposition (PECVD) process at any point in the fabrication process allowing vertical stacking of optical interconnects. In this thesis we demonstrate a-Si:H as a high performance alternate platform to crystalline
silicon, enabling backend integration of optical interconnects in a hybrid photonic-electronic network-on-chip architecture. High quality passive devices are fabricated on a low-loss a-Si:H platform enabling wavelength division multiplexing schemes. We demonstrate a broadband all-optical modulation scheme based on free-carrier absorption effect, which can enable compact electro-optic modulators in a-Si:H. Furthermore, we comprehensively characterize the optical nonlinearities in a-Si:H and observe that a-Si:H exhibits enhanced nonlinearities as compared to crystalline
silicon. Based on the enhanced nonlinearities, we demonstrate low-power four-wave mixing in a-Si:H waveguides enabling high-speed all-optical devices in an a-Si:H platform. Finally, we demonstrate a novel data encoding scheme using thermal and all-optical tuning of
silicon waveguides, increasing the spectral efficiency in an interconnect link. Looking forward, we shall also discuss some of the challenges that still need to be overcome to realize an integrated a-Si:H based photonic link.
Advisors/Committee Members: Preble, Stefan.
Subjects/Keywords: Amorphous silicon photonics; Nonlinear photonics; Silicon photonics
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APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Narayanan, K. (2011). Hydrogenated amorphous silicon photonics. (Doctoral Dissertation). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/10
Chicago Manual of Style (16th Edition):
Narayanan, Karthik. “Hydrogenated amorphous silicon photonics.” 2011. Doctoral Dissertation, Rochester Institute of Technology. Accessed February 16, 2019.
https://scholarworks.rit.edu/theses/10.
MLA Handbook (7th Edition):
Narayanan, Karthik. “Hydrogenated amorphous silicon photonics.” 2011. Web. 16 Feb 2019.
Vancouver:
Narayanan K. Hydrogenated amorphous silicon photonics. [Internet] [Doctoral dissertation]. Rochester Institute of Technology; 2011. [cited 2019 Feb 16].
Available from: https://scholarworks.rit.edu/theses/10.
Council of Science Editors:
Narayanan K. Hydrogenated amorphous silicon photonics. [Doctoral Dissertation]. Rochester Institute of Technology; 2011. Available from: https://scholarworks.rit.edu/theses/10

University of Rochester
22.
Ni, Shih-Kai.
Electrical properties and infrared luminescence of
Er:SiO2/nc-Si multilayers under lateral carrier
injection.
Degree: PhD, 2014, University of Rochester
URL: http://hdl.handle.net/1802/28525
► The work described in this thesis presents investigations of Er-doped SiO2/nc-Si (nanocrystalline silicon) multilayers operating under a novel lateral electrical pumping geometry. The motivation for…
(more)
▼ The work described in this thesis presents
investigations of Er-doped SiO2/nc-Si
(nanocrystalline silicon)
multilayers operating under a novel lateral electrical
pumping
geometry. The motivation for this study is to design and prototype
an
efficient Si-based light emitting p-i-n device working at 1535
nm, in the forward
bias regime.
The first part presents the
electrical properties of Er-doped SiO2/nc-Si multilayers
where
each layer is a few nm thick. The current – voltage characteristics
taken from
samples fabricated under various depositions as well as
annealing conditions are
presented. It is also demonstrated that
lateral current can flow through multilayers
with nm-thick layers.
A space charge limited current model was used to explain the
collected I-V relations.
The next part of this work is focused on
investigations of infrared
electroluminescence (EL) from Er-doped
multilayers. When electrons and holes are
injected in the
intrinsic region of a p-i-n device, they can excite the Er ions in
the
SiO2 layers via energy transfer from the Si layers. The
precisely defined Er-Si
distance guaranteed by the very good
controllability of the deposition method is one
of the most
crucial parameters to achieve an effective energy transfer from
nc-Si to
Er. The major advantage of the proposed lateral carrier
injection approach, compared
to vertical carrier injection though
multiple SiO2 layers, is that transport is much
easier and more
efficient. The infrared electroluminescence (EL) and
photoluminescence (PL) spectra show identical features, which leads
us to the
conclusion that the mechanisms of Er excitation via
energy transfer and relaxation
are similar in these two
experiments. The observed strong PL under Er off-resonance
excitation and EL under forward bias are very promising for
Si-based light sources -
the missing link in an all-silicon
on-chip optical interconnection system.
The final part of the work
focuses on optimizing parameters of the structure to
design a
stable, strong and efficient infrared electroluminescent device.
The final
goal of this work is to achieve electrical gain from the
proposed device. Increased
infrared transmission at 1535nm under
electrical pumping indicates that gain has
been achieved for TM
polarized light.
Subjects/Keywords: Nanocrystalline silicon; Electrical luminescence; Multilayers; Silicon laser
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Ni, S. (2014). Electrical properties and infrared luminescence of
Er:SiO2/nc-Si multilayers under lateral carrier
injection. (Doctoral Dissertation). University of Rochester. Retrieved from http://hdl.handle.net/1802/28525
Chicago Manual of Style (16th Edition):
Ni, Shih-Kai. “Electrical properties and infrared luminescence of
Er:SiO2/nc-Si multilayers under lateral carrier
injection.” 2014. Doctoral Dissertation, University of Rochester. Accessed February 16, 2019.
http://hdl.handle.net/1802/28525.
MLA Handbook (7th Edition):
Ni, Shih-Kai. “Electrical properties and infrared luminescence of
Er:SiO2/nc-Si multilayers under lateral carrier
injection.” 2014. Web. 16 Feb 2019.
Vancouver:
Ni S. Electrical properties and infrared luminescence of
Er:SiO2/nc-Si multilayers under lateral carrier
injection. [Internet] [Doctoral dissertation]. University of Rochester; 2014. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1802/28525.
Council of Science Editors:
Ni S. Electrical properties and infrared luminescence of
Er:SiO2/nc-Si multilayers under lateral carrier
injection. [Doctoral Dissertation]. University of Rochester; 2014. Available from: http://hdl.handle.net/1802/28525

Uppsala University
23.
Lindgren, Fredrik.
Silicon as Negative Electrode Material for Lithium-ion Batteries.
Degree: Materials Chemistry, 2010, Uppsala University
URL: http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-121210
► The performance of negative electrodes based on Si nanoparticles for Li-ion batteries has been investigated. Electrodes consisted of Si nanoparticles, carbon black and Na-CMC.…
(more)
▼ The performance of negative electrodes based on Si nanoparticles for Li-ion batteries has been investigated. Electrodes consisted of Si nanoparticles, carbon black and Na-CMC. The investigation covered electrode production parameters such as pre-treatment of the Si-powder, different emulsifiers and cycling with two different electrolytes. Testing of the electrodes’ performance was done electrochemically with two different galvanostatic approaches: constant charge rate and stepped-up charge rate. Electrodes’ morphology, stability and surface chemistry were also evaluated by scanning electron microscopy (SEM), differential scanning calorimetry (DSC), thickness measurements and X-ray photoelectron spectroscopy (XPS). High electrode capacities were achieved though strong variation depending on electrode thickness has been found. For the best performing electrodes the capacity exceeded 1600 mAh/g with slight fading after 10-15 cycles. The difference in performance could not be assigned to the different production parameters, but had a clear correlation to the thickness of the electrode and the different electrolytes used. Propylene carbonate based electrolyte gives a lower coulombic efficiency and lower capacity retention than an ethylene carbonate-diethyl carbonate based electrolyte. The electrodes could not store any capacity at cycling rates higher than 2C, but were not damaged by cycling rates up to 50C. SEM micrographs revealed that a solid electrolyte interface (SEI) was formed on the electrodes during cycling and their surface analysis by XPS suggested that the SEI was formed by decomposition of electrolyte components.
Subjects/Keywords: silicon; anodes; electrodes
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Lindgren, F. (2010). Silicon as Negative Electrode Material for Lithium-ion Batteries. (Thesis). Uppsala University. Retrieved from http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-121210
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Lindgren, Fredrik. “Silicon as Negative Electrode Material for Lithium-ion Batteries.” 2010. Thesis, Uppsala University. Accessed February 16, 2019.
http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-121210.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Lindgren, Fredrik. “Silicon as Negative Electrode Material for Lithium-ion Batteries.” 2010. Web. 16 Feb 2019.
Vancouver:
Lindgren F. Silicon as Negative Electrode Material for Lithium-ion Batteries. [Internet] [Thesis]. Uppsala University; 2010. [cited 2019 Feb 16].
Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-121210.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Lindgren F. Silicon as Negative Electrode Material for Lithium-ion Batteries. [Thesis]. Uppsala University; 2010. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-121210
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Texas A&M University
24.
Titriku, Alex K.
Efficient Wavelength Tuning Techniques for Integrated Silicon Photonics.
Degree: 2014, Texas A&M University
URL: http://hdl.handle.net/1969.1/154190
► The past decade has seen a significant amount of academic and industrial research into interconnect topologies that employ optical channels for next generation high speed…
(more)
▼ The past decade has seen a significant amount of academic and industrial research into interconnect topologies that employ optical channels for next generation high speed communication systems. Integrated optical interconnects have taken center stage in tackling channel loss limitations of traditional electrical links and bandwidth requirements for inter-chip and intra-chip signal processing for multi-core processors. Wavelength-division multiplexing (WDM) optical interconnect architectures based on microring resonator devices offer a low-area and energy-efficient approach to realize both high-speed modulation and WDM with high-speed transmit-side ring modulators and high-Q receive-side drop filters.
At the heart of
silicon photonics is the
silicon microring resonator. These high-Q refractive devices can achieve high contrast ratios with their small footprint and enable distance independent communication. A major challenge to the use of microring resonators is the sensitivity of their resonance wavelength to process and fabrication imperfections and temperature perturbations. To curtail the effects of resonance wavelength drifts, stabilization schemes are implemented to properly align the resonance wavelength of the microring device with the input laser wavelength.
This thesis work focuses on three main issues. Firstly, the sources and effects of mismatch in
silicon microring resonators are identified. Secondly, a review of literature is done to examine existing resonance wavelength stabilization techniques. Based on the reference search tuning algorithm, a new dual-loop tuning method which combines the benefits of bias-based and thermal-based tuning schemes is proposed. Furthermore, we evaluate the tuning efficiency of some existing and the proposed tuning schemes using a statistical model to determine optimal power and speed efficiency. Modeling results of carrier injection ring resonator devices with common thermal tuning and the new dual-bias/thermal scheme reveals that the latter scheme offers ~ 50% improvement in power with small variations and close to 16X speed improvement.
Finally, the tuning control loop is fabricated in GP 65nm CMOS process. Transmit-side and receive-side are independently implemented for a 5-channel WDM system. Measurement results are presented in both cases. The transmitter IC achieved both static and dynamic tuning, stabilizing ring resonance wavelength in the midst of temperature fluctuations from an adjacent ring. The total power consumed was 5.17mW while covering a wavelength tuning range of ~ 0:8nm. Static tuning was successfully demonstrated for the receiver IC. A tuning range of 0:7nm was achieved over a 2mA dynamic range of current.
Advisors/Committee Members: Palermo, Samuel (advisor), Sanchez-Sinencio, Edgar (committee member), Narayanan, Krishna (committee member), Choe, Yoonsuck (committee member).
Subjects/Keywords: Silicon; photonics; tuning
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Titriku, A. K. (2014). Efficient Wavelength Tuning Techniques for Integrated Silicon Photonics. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/154190
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Titriku, Alex K. “Efficient Wavelength Tuning Techniques for Integrated Silicon Photonics.” 2014. Thesis, Texas A&M University. Accessed February 16, 2019.
http://hdl.handle.net/1969.1/154190.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Titriku, Alex K. “Efficient Wavelength Tuning Techniques for Integrated Silicon Photonics.” 2014. Web. 16 Feb 2019.
Vancouver:
Titriku AK. Efficient Wavelength Tuning Techniques for Integrated Silicon Photonics. [Internet] [Thesis]. Texas A&M University; 2014. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1969.1/154190.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Titriku AK. Efficient Wavelength Tuning Techniques for Integrated Silicon Photonics. [Thesis]. Texas A&M University; 2014. Available from: http://hdl.handle.net/1969.1/154190
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Univerzitet u Beogradu
25.
Alkoash, Abedalhkem Sleman Ahmed, 1969-.
Silicon and silicon-carbide unipolar devices njith
specific geometry.
Degree: Tehnološko-metalurški fakultet, 2016, Univerzitet u Beogradu
URL: https://fedorabg.bg.ac.rs/fedora/get/o:12183/bdef:Content/get
► Elektrotehnika / Electrical engineering
The emergence of silicon carbide (SiC) based power semiconductor switches with their superior features compared with silicon (Si) based switches has…
(more)
▼ Elektrotehnika / Electrical
engineering
The emergence of silicon carbide (SiC) based power
semiconductor switches with their superior features compared with
silicon (Si) based switches has resulted in substantial
improvements in the performance of power electronics converter
systems. These systems with SiC power devices are more compact,
lighter, and more efficient, so they are ideal for high-voltage
power electronics applications including hybrid electric vehicle
(HEV) power converters. In this dissertation, first In this section
we studied physically based improvement of the analytical model for
a vertical double implanted metal-oxide-semiconductor (DIMOS)
transistor in 4H-Silicon Carbide (4H-SiC) is suggested. Special
attention has been paid to its vertical section, i.e. to its
geometrical profile. The answer to the question where this vertical
region starts narrowing and how abruptly it happens has been found
exploiting some fundamental principles of physics. This has made
possible to considerably reduce the number of free parameters
appearing in the construction of current-voltage characteristics.
In recent years, studies about Dual- Material Surrounding-Gate
(DMSG) transistor have successively been proposed, and have
attached a lot of attention. For future ULSI’S design, it is shown
that Dual- Material Surrounding-Gate (DMSG) transistor have the
following advantages, such as: reduced reduced short channel
effects (SCEs), high packing density, high-speed cut-off frequency,
low-power consumption, the application of Stacked circuit design,
the excellent gate control ability over the channel and reduced
fringe-induced barrier lowering (FIBL). To apply the device to the
simulation, it is necessary to develop an analytical 2D model to
predict precisely the performance of the Dual- Material
Surrounding-Gate (DMSG) transistor MOSFETs. On the basis of fully
solution of two dimensional Poisson’s equation, a new two
dimensional model including channel potential, threshold voltage,
subthreshold swing and subthreshold current for Dual- Material
Surrounding-Gate (DMSG) MOSFETs is successfully developed. The new
model is verified by published numerical simulations with a close
agreement. This model can be applied for SPISE simulation because
of its efficient computation.
Advisors/Committee Members: Šašić, Rajko, 1960-.
Subjects/Keywords: silicon; unipolar devices
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Chicago ·
MLA ·
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CSE |
Export
to Zotero / EndNote / Reference
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APA (6th Edition):
Alkoash, Abedalhkem Sleman Ahmed, 1. (2016). Silicon and silicon-carbide unipolar devices njith
specific geometry. (Thesis). Univerzitet u Beogradu. Retrieved from https://fedorabg.bg.ac.rs/fedora/get/o:12183/bdef:Content/get
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Chicago Manual of Style (16th Edition):
Alkoash, Abedalhkem Sleman Ahmed, 1969-. “Silicon and silicon-carbide unipolar devices njith
specific geometry.” 2016. Thesis, Univerzitet u Beogradu. Accessed February 16, 2019.
https://fedorabg.bg.ac.rs/fedora/get/o:12183/bdef:Content/get.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
MLA Handbook (7th Edition):
Alkoash, Abedalhkem Sleman Ahmed, 1969-. “Silicon and silicon-carbide unipolar devices njith
specific geometry.” 2016. Web. 16 Feb 2019.
Vancouver:
Alkoash, Abedalhkem Sleman Ahmed 1. Silicon and silicon-carbide unipolar devices njith
specific geometry. [Internet] [Thesis]. Univerzitet u Beogradu; 2016. [cited 2019 Feb 16].
Available from: https://fedorabg.bg.ac.rs/fedora/get/o:12183/bdef:Content/get.
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
Council of Science Editors:
Alkoash, Abedalhkem Sleman Ahmed 1. Silicon and silicon-carbide unipolar devices njith
specific geometry. [Thesis]. Univerzitet u Beogradu; 2016. Available from: https://fedorabg.bg.ac.rs/fedora/get/o:12183/bdef:Content/get
Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

University of Akron
26.
Withanage, Sajeevi Sankalpani.
Formation of Surface Features in Boron-Doped Silicon (100)
in the Presence of Propan-2-OL.
Degree: MS, Physics, 2015, University of Akron
URL: http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676
► Silicon is the most commonly used material for semiconductor device fabrication. Atomic force microscope/microscopy (AFM)-based nanolithography is a technique used in nanofabrication. Techniques discussed in…
(more)
▼ Silicon is the most commonly used material for
semiconductor device fabrication. Atomic force
microscope/microscopy (AFM)-based nanolithography is a technique
used in nanofabrication. Techniques discussed in relation to this
work include local anodic oxidation (LAO), Atomic Force Microscopy
assisted Electrostatic Nanolithography (AFMEN), which have been
studied for years and proven to be very flexible fabrication tools.
In this study, we report the possibility of patterning
nanostructures on
silicon without external bias. Samples we have
used in the study were HF passivated boron doped Si (100) wafers
treated with propan-2-ol. Amplitude Modulated AFMEN (without bias
voltage) has been selected for patterning the nanostructures in
silicon. The tip was isolated from the carrier to prevent grounding
and stray currents. Using the C++ codes, we were able to create
raised nanostructures on the surface with the height ranging 2-25
nm under ambient conditions. Mechanism and theory of the formation
of features is still under investigation. Furthermore, we present
three hypotheses to explain feature formation: 1) effects due to
boron defects on the surface, 2) electrification of the surface due
to friction (triboelectrification), and 3) electrochemical nanocell
formation modified in the presence of propan-2-ol.
Advisors/Committee Members: Lyuksyutov, Sergei (Advisor).
Subjects/Keywords: Physics; Silicon, Nanolithography
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APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Withanage, S. S. (2015). Formation of Surface Features in Boron-Doped Silicon (100)
in the Presence of Propan-2-OL. (Masters Thesis). University of Akron. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676
Chicago Manual of Style (16th Edition):
Withanage, Sajeevi Sankalpani. “Formation of Surface Features in Boron-Doped Silicon (100)
in the Presence of Propan-2-OL.” 2015. Masters Thesis, University of Akron. Accessed February 16, 2019.
http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676.
MLA Handbook (7th Edition):
Withanage, Sajeevi Sankalpani. “Formation of Surface Features in Boron-Doped Silicon (100)
in the Presence of Propan-2-OL.” 2015. Web. 16 Feb 2019.
Vancouver:
Withanage SS. Formation of Surface Features in Boron-Doped Silicon (100)
in the Presence of Propan-2-OL. [Internet] [Masters thesis]. University of Akron; 2015. [cited 2019 Feb 16].
Available from: http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676.
Council of Science Editors:
Withanage SS. Formation of Surface Features in Boron-Doped Silicon (100)
in the Presence of Propan-2-OL. [Masters Thesis]. University of Akron; 2015. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676

Penn State University
27.
Baril, Neil F.
HIGH-PRESSURE MICROFLUIDIC CHEMICAL DEPOSITION: REPLACING
THE AIR WITHIN MICROSTRUCTURED OPTICAL FIBERS.
Degree: PhD, Chemistry, 2008, Penn State University
URL: https://etda.libraries.psu.edu/catalog/8906
► There is currently great interest in advancing both the fundamental technology and underlying science of electronics and photonics. As chemists we can contribute to this…
(more)
▼ There is currently great interest in advancing both
the fundamental technology and underlying science of electronics
and photonics. As chemists we can contribute to this area through
the synthesis and fabrication of new materials and materials
structures with novel or interesting optical and/or electronic
properties. Synthesis of materials within templates, in particular,
is one powerful tool for realizing this goal. In this work
microstructured optical fibers have been employed as templates for
the synthesis and organization of materials. High-pressure gas
mixtures containing chemical precursors have been configured to
flow through the capillaries of MOFs and thermally decomposed
depositing materials onto the walls of the capillaries. The
deposition of silicon and germanium within the capillaries of
various MOF templates has been investigated. The deposition
conditions, including temperature, pressure, and concentration,
have been refined such that it is possible to deposit solid
microwires of silicon and germanium several centimeters in length
within the MOFs. Deposition of germanium within a 100 nm capillary
over several centimeters has been demonstrated and confirmed by
Raman spectra and FESEM cross sections. The thermal annealing
conditions to produce high quality crystalline materials without
degradation of the MOF integrity have also been investigated.
Infiber solid polycrystalline silicon microwire waveguides
exhibiting low optical attenuation, 5.8dB/cm at 1.55 μm,
and high electron mobilities are demonstrated. This value is the
lowest reported for any type of polycrystalline silicon waveguide.
Junctions, which are the foundation of semiconductor devices, have
been produced within the capillaries of MOFs via sequential
deposition of materials. Semiconductorsemiconductor and
metal-semiconductor hetero-junctions are demonstrated.
Demonstration of such junctions opens the door to the fabrication
of many potential in-fiber devices. A traveling furnace platform
was constructed for the deposition of uniform layers. Deposition
with the traveling furnace is investigated and the formation of a
highly uniform layer in a 1 m long 100 μm capillary is
presented. The deposition of a silicon-germanium junction with
uniform thickness over 1 m in length is demonstrated. The
deposition chemistry of silicon carbide and silicon nitride has
also been investigated. The ability to tune material composition
and optical properties by adjusting the deposition temperature and
the concentration of hydrogen gas in the precursor gas mixture is
presented. Silicon carbide layers with uniform composition were
deposited within a 100 μm capillary using a traveling
furnace.
Subjects/Keywords: optical fiber; Silicon
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Baril, N. F. (2008). HIGH-PRESSURE MICROFLUIDIC CHEMICAL DEPOSITION: REPLACING
THE AIR WITHIN MICROSTRUCTURED OPTICAL FIBERS. (Doctoral Dissertation). Penn State University. Retrieved from https://etda.libraries.psu.edu/catalog/8906
Chicago Manual of Style (16th Edition):
Baril, Neil F. “HIGH-PRESSURE MICROFLUIDIC CHEMICAL DEPOSITION: REPLACING
THE AIR WITHIN MICROSTRUCTURED OPTICAL FIBERS.” 2008. Doctoral Dissertation, Penn State University. Accessed February 16, 2019.
https://etda.libraries.psu.edu/catalog/8906.
MLA Handbook (7th Edition):
Baril, Neil F. “HIGH-PRESSURE MICROFLUIDIC CHEMICAL DEPOSITION: REPLACING
THE AIR WITHIN MICROSTRUCTURED OPTICAL FIBERS.” 2008. Web. 16 Feb 2019.
Vancouver:
Baril NF. HIGH-PRESSURE MICROFLUIDIC CHEMICAL DEPOSITION: REPLACING
THE AIR WITHIN MICROSTRUCTURED OPTICAL FIBERS. [Internet] [Doctoral dissertation]. Penn State University; 2008. [cited 2019 Feb 16].
Available from: https://etda.libraries.psu.edu/catalog/8906.
Council of Science Editors:
Baril NF. HIGH-PRESSURE MICROFLUIDIC CHEMICAL DEPOSITION: REPLACING
THE AIR WITHIN MICROSTRUCTURED OPTICAL FIBERS. [Doctoral Dissertation]. Penn State University; 2008. Available from: https://etda.libraries.psu.edu/catalog/8906

Penn State University
28.
Winter, Christopher Aylwin.
Improvement and Investigation of Silicon Nanowire
"Grow-In-Place" Approach.
Degree: MS, Engineering Science, 2011, Penn State University
URL: https://etda.libraries.psu.edu/catalog/11658
► For nearly a decade silicon nanowires have been the subject of intense research. Future integration of silicon nanowires into commercial devices requires the development and…
(more)
▼ For nearly a decade silicon nanowires have been the
subject of intense research. Future integration of silicon
nanowires into commercial devices requires the development and
further refinement of methods for synthesizing and assembling these
nanowires into densely packed rational structures with high
accuracy and repeatability. Current methods have two broad
classifications: “grow-and-place” and “grow-in-place”. The former
procedure involves forming the nanowires away from their final
orientation, harvesting them from this growth area, and finally
placing them in desired positions. The latter procedure sidesteps
the problems associated with the harvesting and placement steps of
the “grow-and-place” method by forming the nanowires in their final
preferred arrangement. In this thesis, we propose a novel
self-assembling variation of the “grow-in-place” approach for SiNW
growth where the interfacial area of the nanochannel template
interface can be formed out of various materials. This research has
improved on our group’s previous in-template “grow-in-place”
approach by growing SiNWs with smooth morphology and good
electrical properties upon partial exposure while still retaining
the benefits of the original “grow-in-place” approach, including
good control of the SiNW size, number, orientation, position, and
shape. The SiNWs grown using this approach were found to be
morphologically smooth, composed of crystalline silicon and
exhibited good electrical characteristics. Additionally, in this
thesis we explore the use of a metal adhesion layer as a means of
controlling SiNW electrical characteristics. Specifically, this
thesis compared iii electrical characteristics of SiNWs grown using
aluminum or titanium as an adhesion layer versus SiNWs grown
without an adhesion layer and found that the SiNWs grown with
aluminum or titanium as an adhesion layer were, on average, 6 or 9
times, respectively, more conductive than the SiNWs grown without
an adhesion layer. Finally, this thesis presents evidence that
nanowires grown using built-in platinum contacts form in a
dual-material structure. This evidence is in the form of high-
magnification FESEM images. It is suggested that, in the
inter-contact region, the platinum silicide grew as the “shell” of
the nanowire structure and that the core remained silicon because
of the physical configuration of the nanochannel.
Subjects/Keywords: silicon nanowire; growth
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Winter, C. A. (2011). Improvement and Investigation of Silicon Nanowire
"Grow-In-Place" Approach. (Masters Thesis). Penn State University. Retrieved from https://etda.libraries.psu.edu/catalog/11658
Chicago Manual of Style (16th Edition):
Winter, Christopher Aylwin. “Improvement and Investigation of Silicon Nanowire
"Grow-In-Place" Approach.” 2011. Masters Thesis, Penn State University. Accessed February 16, 2019.
https://etda.libraries.psu.edu/catalog/11658.
MLA Handbook (7th Edition):
Winter, Christopher Aylwin. “Improvement and Investigation of Silicon Nanowire
"Grow-In-Place" Approach.” 2011. Web. 16 Feb 2019.
Vancouver:
Winter CA. Improvement and Investigation of Silicon Nanowire
"Grow-In-Place" Approach. [Internet] [Masters thesis]. Penn State University; 2011. [cited 2019 Feb 16].
Available from: https://etda.libraries.psu.edu/catalog/11658.
Council of Science Editors:
Winter CA. Improvement and Investigation of Silicon Nanowire
"Grow-In-Place" Approach. [Masters Thesis]. Penn State University; 2011. Available from: https://etda.libraries.psu.edu/catalog/11658

McMaster University
29.
Wang, Zhao.
Silicon micro-ring resonator modulator for inter/intra-data centre applications.
Degree: PhD, 2017, McMaster University
URL: http://hdl.handle.net/11375/22105
► The recent and rapid growth of silicon photonics is driven by the ever-increasing demand for bandwidth inside and between data centres. Silicon photonics can offer…
(more)
▼ The recent and rapid growth of silicon photonics is driven by the ever-increasing demand for bandwidth inside and between data centres. Silicon photonics can offer an unparalleled performance in terms of scalability and power consumption with low-cost fabrication through the leveraging of CMOS fabrication techniques. This thesis describes research on the silicon micro-ring resonator modulator, a device which combines energy-efficiency with a compact footprint that is ideal for data centre applications. Both theoretical and experimental work is described in the context of improving the reachability, capacity and stability of the silicon micro-ring resonator modulator for inter/intra-data centre communication. Chapter 2 presents modeling work using MATLAB® that provides predictive results for both device-level and system-level performance. Chapter 3 studies the chirp characteristic of an over-coupled silicon micro-ring resonator modulator and its capability of generating a negative-chirp modulation. The resulting chirp-induced power penalty is measured to be as low as 2.5 dB after 100 km transmission. Chapter 4 focuses on the advanced modulation techniques that can be efficiently exploited for increasing the spectral efficiency in the typically band-limited system. A record single-polarization 104 Gb/s data rate per wavelength (direct-detect) was achieved by using digital signal processing to alleviate the modulation deficiencies that are specific to the silicon micro-ring resonator modulator. In Chapter 5, a generic resonance control method using intrinsic defect-mediated photocurrent is described and experimentally demonstrated to provide stability for the silicon micro-ring resonator modulator during high-speed operation. This control method can also lead to an “all-silicon” system without the need for power detection using germanium.
Thesis
Doctor of Philosophy (PhD)
Advisors/Committee Members: Knights, Andrew, Cassidy, Daniel, Engineering Physics.
Subjects/Keywords: Silicon Photonics; modulator
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
Wang, Z. (2017). Silicon micro-ring resonator modulator for inter/intra-data centre applications. (Doctoral Dissertation). McMaster University. Retrieved from http://hdl.handle.net/11375/22105
Chicago Manual of Style (16th Edition):
Wang, Zhao. “Silicon micro-ring resonator modulator for inter/intra-data centre applications.” 2017. Doctoral Dissertation, McMaster University. Accessed February 16, 2019.
http://hdl.handle.net/11375/22105.
MLA Handbook (7th Edition):
Wang, Zhao. “Silicon micro-ring resonator modulator for inter/intra-data centre applications.” 2017. Web. 16 Feb 2019.
Vancouver:
Wang Z. Silicon micro-ring resonator modulator for inter/intra-data centre applications. [Internet] [Doctoral dissertation]. McMaster University; 2017. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/11375/22105.
Council of Science Editors:
Wang Z. Silicon micro-ring resonator modulator for inter/intra-data centre applications. [Doctoral Dissertation]. McMaster University; 2017. Available from: http://hdl.handle.net/11375/22105

Oregon State University
30.
O'Connell, Steven G.
New applications and emerging contaminants : developing silicone passive sampling devices for environmental and novel monitoring applications.
Degree: PhD, Toxicology, 2014, Oregon State University
URL: http://hdl.handle.net/1957/47613
► Passive sampling is a popular technology for environmental monitoring, and silicone is an ideal choice for a variety of passive sampling applications. The silicone work…
(more)
▼ Passive sampling is a popular technology for environmental monitoring, and silicone is an ideal choice for a variety of passive sampling applications. The silicone work described here encompasses laboratory and field studies that demonstrate the use of this polymer in novel environments, for new applications, and for emerging compounds. Unique attributes of silicone polymers make them advantageous for targeting semi-polar contaminants not typically targeted in environmental research. Oxygenated polycyclic hydrocarbons (OPAHs) represent an emerging class of contaminants with chemical properties well suited to silicone passive sampling. The first challenge was to create a robust OPAH analytical method to examine these compounds in silicone, and two independent methods (liquid as well as gas chromatography) were optimized and demonstrated for 24 ketone-containing aromatic hydrocarbons, more than other methods published at that time. An isotopically labeled OPAH was used as an internal standard in contrast to previous methods which used only labeled polycyclic aromatic hydrocarbons (PAHs). The efficacy of each method was further demonstrated by comparing standard addition to internal standard quantitation. Next, OPAHs, PAHs and pesticides were used to compare several silicone materials with low density polyethylene (LDPE) at Portland Harbor Superfund field sites. Target analyte detection, precision, and practical considerations in the field and laboratory were used to evaluate
silicone materials. Individual differences between LDPE and the most optimal silicone polymer for OPAHs highlighted the importance of using optimized methods or polymer choice for a particular analyte class. Biggest differences were found for 9-fluorenone, benzanthrone, and 5,12-naphtacenequinone. After this successful polymer comparison, the next study involved a novel application of silicone wristbands as personal passive samplers. Commercially available silicone was modified to serve as personal samplers and tested in both an ambient and occupational settings. Silicone wristbands provided a valuable tool to monitor individual exposures that were time weighted averages of personalized exposure. The ambient study captured 49 individual compounds including PAHs, personal and consumer products, pesticides, phthalates, and as well as other industrial compounds. In the occupational study, roofers working with hot asphalt wore silicone samplers and evidence of both temporal (day versus week deployment, p < 0.05), and spatial (between two roofing sites p < 0.05), sensitivity was found for PAHs, and two OPAHs were detected in some samplers as well (9-fluorenone and benzofluorenone). Finally, another novel application was developed for silicone as an in vivo monitor of persistent organic pollutants. Human silicone breast explants were found to contain chlorinated pesticides, and p,p-DDE and PCB 118 were used in murine models as an in vivo sampler to explore silicone as a biomonitor and sink of organic contaminant exposure. Silicone was found to sequester…
Advisors/Committee Members: Anderson, Kim A. (advisor), Beckman, Joe (committee member).
Subjects/Keywords: passive; Silicon polymers
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❌
APA ·
Chicago ·
MLA ·
Vancouver ·
CSE |
Export
to Zotero / EndNote / Reference
Manager
APA (6th Edition):
O'Connell, S. G. (2014). New applications and emerging contaminants : developing silicone passive sampling devices for environmental and novel monitoring applications. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/47613
Chicago Manual of Style (16th Edition):
O'Connell, Steven G. “New applications and emerging contaminants : developing silicone passive sampling devices for environmental and novel monitoring applications.” 2014. Doctoral Dissertation, Oregon State University. Accessed February 16, 2019.
http://hdl.handle.net/1957/47613.
MLA Handbook (7th Edition):
O'Connell, Steven G. “New applications and emerging contaminants : developing silicone passive sampling devices for environmental and novel monitoring applications.” 2014. Web. 16 Feb 2019.
Vancouver:
O'Connell SG. New applications and emerging contaminants : developing silicone passive sampling devices for environmental and novel monitoring applications. [Internet] [Doctoral dissertation]. Oregon State University; 2014. [cited 2019 Feb 16].
Available from: http://hdl.handle.net/1957/47613.
Council of Science Editors:
O'Connell SG. New applications and emerging contaminants : developing silicone passive sampling devices for environmental and novel monitoring applications. [Doctoral Dissertation]. Oregon State University; 2014. Available from: http://hdl.handle.net/1957/47613
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