Advanced search options

Advanced Search Options 🞨

Browse by author name (“Author name starts with…”).

Find ETDs with:

in
/  
in
/  
in
/  
in

Written in Published in Earliest date Latest date

Sorted by

Results per page:

Sorted by: relevance · author · university · dateNew search

You searched for subject:(Silicon nitride). Showing records 1 – 30 of 242 total matches.

[1] [2] [3] [4] [5] [6] [7] [8] [9]

Search Limiters

Last 2 Years | English Only

Degrees

Levels

Languages

Country

▼ Search Limiters


Oregon State University

1. Vas-Umnuay, Paravee. Flow characterization of multiple-tube reactors for synthesis of nano-sized silicon nitride powder via silicon monoxide ammonolysis.

Degree: MS, Chemical Engineering, 2008, Oregon State University

 Concentrically arranged multiple-tube reactors with different dimensions were built for synthesizing nano-sized silicon nitride powder via the ammonolysis of SiO vapor. The reaction was operated… (more)

Subjects/Keywords: nano-sized silicon nitride; Silicon nitride  – Synthesis

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Vas-Umnuay, P. (2008). Flow characterization of multiple-tube reactors for synthesis of nano-sized silicon nitride powder via silicon monoxide ammonolysis. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/9531

Chicago Manual of Style (16th Edition):

Vas-Umnuay, Paravee. “Flow characterization of multiple-tube reactors for synthesis of nano-sized silicon nitride powder via silicon monoxide ammonolysis.” 2008. Masters Thesis, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/9531.

MLA Handbook (7th Edition):

Vas-Umnuay, Paravee. “Flow characterization of multiple-tube reactors for synthesis of nano-sized silicon nitride powder via silicon monoxide ammonolysis.” 2008. Web. 18 Oct 2019.

Vancouver:

Vas-Umnuay P. Flow characterization of multiple-tube reactors for synthesis of nano-sized silicon nitride powder via silicon monoxide ammonolysis. [Internet] [Masters thesis]. Oregon State University; 2008. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/9531.

Council of Science Editors:

Vas-Umnuay P. Flow characterization of multiple-tube reactors for synthesis of nano-sized silicon nitride powder via silicon monoxide ammonolysis. [Masters Thesis]. Oregon State University; 2008. Available from: http://hdl.handle.net/1957/9531


Oregon State University

2. Jovanovic, Zoran R. Kinetic study on the production of silicon nitride by direct nitridation of silicon in a fluidized bed : experiment and modeling.

Degree: PhD, Chemical Engineering, 1994, Oregon State University

Subjects/Keywords: Silicon nitride

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Jovanovic, Z. R. (1994). Kinetic study on the production of silicon nitride by direct nitridation of silicon in a fluidized bed : experiment and modeling. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/34894

Chicago Manual of Style (16th Edition):

Jovanovic, Zoran R. “Kinetic study on the production of silicon nitride by direct nitridation of silicon in a fluidized bed : experiment and modeling.” 1994. Doctoral Dissertation, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/34894.

MLA Handbook (7th Edition):

Jovanovic, Zoran R. “Kinetic study on the production of silicon nitride by direct nitridation of silicon in a fluidized bed : experiment and modeling.” 1994. Web. 18 Oct 2019.

Vancouver:

Jovanovic ZR. Kinetic study on the production of silicon nitride by direct nitridation of silicon in a fluidized bed : experiment and modeling. [Internet] [Doctoral dissertation]. Oregon State University; 1994. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/34894.

Council of Science Editors:

Jovanovic ZR. Kinetic study on the production of silicon nitride by direct nitridation of silicon in a fluidized bed : experiment and modeling. [Doctoral Dissertation]. Oregon State University; 1994. Available from: http://hdl.handle.net/1957/34894


Oregon State University

3. Pavarajarn, Varong. Roles of gas and solid components in the direct nitridation of silicon.

Degree: PhD, Chemical Engineering, 2002, Oregon State University

 The factors influencing the direct nitridation of silicon, including the effects of the native oxide layer covering the surface of silicon, the effects of hydrogen… (more)

Subjects/Keywords: Silicon nitride

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Pavarajarn, V. (2002). Roles of gas and solid components in the direct nitridation of silicon. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/31597

Chicago Manual of Style (16th Edition):

Pavarajarn, Varong. “Roles of gas and solid components in the direct nitridation of silicon.” 2002. Doctoral Dissertation, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/31597.

MLA Handbook (7th Edition):

Pavarajarn, Varong. “Roles of gas and solid components in the direct nitridation of silicon.” 2002. Web. 18 Oct 2019.

Vancouver:

Pavarajarn V. Roles of gas and solid components in the direct nitridation of silicon. [Internet] [Doctoral dissertation]. Oregon State University; 2002. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/31597.

Council of Science Editors:

Pavarajarn V. Roles of gas and solid components in the direct nitridation of silicon. [Doctoral Dissertation]. Oregon State University; 2002. Available from: http://hdl.handle.net/1957/31597


Oregon State University

4. Delzer, Dennis Richard. Reactively sputtered films of silicon nitride for diffusion masking.

Degree: MS, Electrical and Electronics Engineering, 1966, Oregon State University

 The experimental procedure for reactively sputtering films of silicon nitride together with the methods for measuring the film thickness have been investigated. Some of the… (more)

Subjects/Keywords: Silicon nitride

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Delzer, D. R. (1966). Reactively sputtered films of silicon nitride for diffusion masking. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/48245

Chicago Manual of Style (16th Edition):

Delzer, Dennis Richard. “Reactively sputtered films of silicon nitride for diffusion masking.” 1966. Masters Thesis, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/48245.

MLA Handbook (7th Edition):

Delzer, Dennis Richard. “Reactively sputtered films of silicon nitride for diffusion masking.” 1966. Web. 18 Oct 2019.

Vancouver:

Delzer DR. Reactively sputtered films of silicon nitride for diffusion masking. [Internet] [Masters thesis]. Oregon State University; 1966. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/48245.

Council of Science Editors:

Delzer DR. Reactively sputtered films of silicon nitride for diffusion masking. [Masters Thesis]. Oregon State University; 1966. Available from: http://hdl.handle.net/1957/48245


University of the Western Cape

5. Oliphant, Clive Justin. Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability .

Degree: 2012, University of the Western Cape

 Nanocrystalline silicon (nc-Si:H) is an interesting type of silicon with superior electrical properties that are more stable compared to amorphous silicon (a-Si:H). Silicon nitride (SiNₓ)… (more)

Subjects/Keywords: Nanocrystalline silicon; Silicon nitride; Electron backscatter diffraction

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Oliphant, C. J. (2012). Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability . (Thesis). University of the Western Cape. Retrieved from http://hdl.handle.net/11394/5203

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Oliphant, Clive Justin. “Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability .” 2012. Thesis, University of the Western Cape. Accessed October 18, 2019. http://hdl.handle.net/11394/5203.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Oliphant, Clive Justin. “Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability .” 2012. Web. 18 Oct 2019.

Vancouver:

Oliphant CJ. Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability . [Internet] [Thesis]. University of the Western Cape; 2012. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/11394/5203.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Oliphant CJ. Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability . [Thesis]. University of the Western Cape; 2012. Available from: http://hdl.handle.net/11394/5203

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

6. 宋, 昊. 極薄窒化Si膜による 結晶Si太陽電池の裏面パッシベーション.

Degree: Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学

Supervisor:大平 圭介

先端科学技術研究科

修士(マテリアルサイエンス)

Subjects/Keywords: silicon nitride; passivation

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

宋, . (n.d.). 極薄窒化Si膜による 結晶Si太陽電池の裏面パッシベーション. (Thesis). Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学. Retrieved from http://hdl.handle.net/10119/15246

Note: this citation may be lacking information needed for this citation format:
No year of publication.
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

宋, 昊. “極薄窒化Si膜による 結晶Si太陽電池の裏面パッシベーション.” Thesis, Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学. Accessed October 18, 2019. http://hdl.handle.net/10119/15246.

Note: this citation may be lacking information needed for this citation format:
No year of publication.
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

宋, 昊. “極薄窒化Si膜による 結晶Si太陽電池の裏面パッシベーション.” Web. 18 Oct 2019.

Note: this citation may be lacking information needed for this citation format:
No year of publication.

Vancouver:

宋 . 極薄窒化Si膜による 結晶Si太陽電池の裏面パッシベーション. [Internet] [Thesis]. Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学; [cited 2019 Oct 18]. Available from: http://hdl.handle.net/10119/15246.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
No year of publication.

Council of Science Editors:

宋 . 極薄窒化Si膜による 結晶Si太陽電池の裏面パッシベーション. [Thesis]. Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学; Available from: http://hdl.handle.net/10119/15246

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation
No year of publication.


University of KwaZulu-Natal

7. [No author]. Formulation of the anisotropic coarsening theory and applications to the liquid-phase sintering of Si3N4.

Degree: Chemistry, 2002, University of KwaZulu-Natal

 We have developed a new coarsening theory that more completely describes grain growth of a system of anisotropic particles such as completely faceted crystals by… (more)

Subjects/Keywords: Chemistry.; Silicon Nitride.

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

author], [. (2002). Formulation of the anisotropic coarsening theory and applications to the liquid-phase sintering of Si3N4. (Thesis). University of KwaZulu-Natal. Retrieved from http://hdl.handle.net/10413/3737

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

author], [No. “Formulation of the anisotropic coarsening theory and applications to the liquid-phase sintering of Si3N4. ” 2002. Thesis, University of KwaZulu-Natal. Accessed October 18, 2019. http://hdl.handle.net/10413/3737.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

author], [No. “Formulation of the anisotropic coarsening theory and applications to the liquid-phase sintering of Si3N4. ” 2002. Web. 18 Oct 2019.

Vancouver:

author] [. Formulation of the anisotropic coarsening theory and applications to the liquid-phase sintering of Si3N4. [Internet] [Thesis]. University of KwaZulu-Natal; 2002. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/10413/3737.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

author] [. Formulation of the anisotropic coarsening theory and applications to the liquid-phase sintering of Si3N4. [Thesis]. University of KwaZulu-Natal; 2002. Available from: http://hdl.handle.net/10413/3737

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

8. Lee, Cheng-yuan. Characterization of Silicon Nitride Films on n-GaN Prepared by Low-Pressure Chemical Vapor Deposition.

Degree: Master, Electrical Engineering, 2008, NSYSU

 In this study, the characteristics of low-pressure chemical vapor deposition deposited silicon nitride films on n-GaN substrate were investigated. The physical and chemical properties were… (more)

Subjects/Keywords: LPCVD; Silicon Nitride Oxide; n-GaN

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Lee, C. (2008). Characterization of Silicon Nitride Films on n-GaN Prepared by Low-Pressure Chemical Vapor Deposition. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0804108-173141

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lee, Cheng-yuan. “Characterization of Silicon Nitride Films on n-GaN Prepared by Low-Pressure Chemical Vapor Deposition.” 2008. Thesis, NSYSU. Accessed October 18, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0804108-173141.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lee, Cheng-yuan. “Characterization of Silicon Nitride Films on n-GaN Prepared by Low-Pressure Chemical Vapor Deposition.” 2008. Web. 18 Oct 2019.

Vancouver:

Lee C. Characterization of Silicon Nitride Films on n-GaN Prepared by Low-Pressure Chemical Vapor Deposition. [Internet] [Thesis]. NSYSU; 2008. [cited 2019 Oct 18]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0804108-173141.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lee C. Characterization of Silicon Nitride Films on n-GaN Prepared by Low-Pressure Chemical Vapor Deposition. [Thesis]. NSYSU; 2008. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0804108-173141

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Oregon State University

9. Vongpayabal, Panut. Kinetics of nano-sized Si₃N₄ powder synthesis via ammonolysis of SiO vapor.

Degree: PhD, Chemical Engineering, 2003, Oregon State University

 An 89 mm-diameter vertical tubular-flow reactor was used to study the kinetics of nano-sized silicon nitride powder synthesis via the animonolysis of SiO vapor at… (more)

Subjects/Keywords: Silicon nitride  – Synthesis

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Vongpayabal, P. (2003). Kinetics of nano-sized Si₃N₄ powder synthesis via ammonolysis of SiO vapor. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/30356

Chicago Manual of Style (16th Edition):

Vongpayabal, Panut. “Kinetics of nano-sized Si₃N₄ powder synthesis via ammonolysis of SiO vapor.” 2003. Doctoral Dissertation, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/30356.

MLA Handbook (7th Edition):

Vongpayabal, Panut. “Kinetics of nano-sized Si₃N₄ powder synthesis via ammonolysis of SiO vapor.” 2003. Web. 18 Oct 2019.

Vancouver:

Vongpayabal P. Kinetics of nano-sized Si₃N₄ powder synthesis via ammonolysis of SiO vapor. [Internet] [Doctoral dissertation]. Oregon State University; 2003. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/30356.

Council of Science Editors:

Vongpayabal P. Kinetics of nano-sized Si₃N₄ powder synthesis via ammonolysis of SiO vapor. [Doctoral Dissertation]. Oregon State University; 2003. Available from: http://hdl.handle.net/1957/30356


Penn State University

10. Gagnon, Jarod Christopher. MOCVD growth of GaN on Si through novel substrate modification techniques.

Degree: PhD, Materials Science and Engineering, 2014, Penn State University

 GaN is a semiconductor material with great potential for use in high power electronics and optoelectronics due to the high electron mobility, high breakdown voltage,… (more)

Subjects/Keywords: III/Nitride; MOCVD; Silicon; substrate modification

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Gagnon, J. C. (2014). MOCVD growth of GaN on Si through novel substrate modification techniques. (Doctoral Dissertation). Penn State University. Retrieved from https://etda.libraries.psu.edu/catalog/22348

Chicago Manual of Style (16th Edition):

Gagnon, Jarod Christopher. “MOCVD growth of GaN on Si through novel substrate modification techniques.” 2014. Doctoral Dissertation, Penn State University. Accessed October 18, 2019. https://etda.libraries.psu.edu/catalog/22348.

MLA Handbook (7th Edition):

Gagnon, Jarod Christopher. “MOCVD growth of GaN on Si through novel substrate modification techniques.” 2014. Web. 18 Oct 2019.

Vancouver:

Gagnon JC. MOCVD growth of GaN on Si through novel substrate modification techniques. [Internet] [Doctoral dissertation]. Penn State University; 2014. [cited 2019 Oct 18]. Available from: https://etda.libraries.psu.edu/catalog/22348.

Council of Science Editors:

Gagnon JC. MOCVD growth of GaN on Si through novel substrate modification techniques. [Doctoral Dissertation]. Penn State University; 2014. Available from: https://etda.libraries.psu.edu/catalog/22348


Montana State University

11. Friholm, Robert Andreas. Silicon nitride membrane mirrors for focus control.

Degree: College of Engineering, 2001, Montana State University

Subjects/Keywords: Silicon nitride.; Mirrors.

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Friholm, R. A. (2001). Silicon nitride membrane mirrors for focus control. (Thesis). Montana State University. Retrieved from https://scholarworks.montana.edu/xmlui/handle/1/8145

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Friholm, Robert Andreas. “Silicon nitride membrane mirrors for focus control.” 2001. Thesis, Montana State University. Accessed October 18, 2019. https://scholarworks.montana.edu/xmlui/handle/1/8145.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Friholm, Robert Andreas. “Silicon nitride membrane mirrors for focus control.” 2001. Web. 18 Oct 2019.

Vancouver:

Friholm RA. Silicon nitride membrane mirrors for focus control. [Internet] [Thesis]. Montana State University; 2001. [cited 2019 Oct 18]. Available from: https://scholarworks.montana.edu/xmlui/handle/1/8145.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Friholm RA. Silicon nitride membrane mirrors for focus control. [Thesis]. Montana State University; 2001. Available from: https://scholarworks.montana.edu/xmlui/handle/1/8145

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Clemson University

12. Chen, Xiangfeng. Designs and Fabrications On Array Waveguide Gratings for Hybrid Integration.

Degree: MS, Photonic Science and Technology, 2018, Clemson University

 Array waveguide gratings (AWG) plays an important role in the field of in-formation and communication technologies through implementation of wavelength division multiplexing(WDM). An AWG consists… (more)

Subjects/Keywords: AWG; Hybrid Integration; Silicon Nitride On Insulator

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Chen, X. (2018). Designs and Fabrications On Array Waveguide Gratings for Hybrid Integration. (Masters Thesis). Clemson University. Retrieved from https://tigerprints.clemson.edu/all_theses/2826

Chicago Manual of Style (16th Edition):

Chen, Xiangfeng. “Designs and Fabrications On Array Waveguide Gratings for Hybrid Integration.” 2018. Masters Thesis, Clemson University. Accessed October 18, 2019. https://tigerprints.clemson.edu/all_theses/2826.

MLA Handbook (7th Edition):

Chen, Xiangfeng. “Designs and Fabrications On Array Waveguide Gratings for Hybrid Integration.” 2018. Web. 18 Oct 2019.

Vancouver:

Chen X. Designs and Fabrications On Array Waveguide Gratings for Hybrid Integration. [Internet] [Masters thesis]. Clemson University; 2018. [cited 2019 Oct 18]. Available from: https://tigerprints.clemson.edu/all_theses/2826.

Council of Science Editors:

Chen X. Designs and Fabrications On Array Waveguide Gratings for Hybrid Integration. [Masters Thesis]. Clemson University; 2018. Available from: https://tigerprints.clemson.edu/all_theses/2826


Oregon State University

13. Lin, Dah-cheng. Kinetic study on the synthesis of Si₃N₄ via the ammonization of SiO vapor.

Degree: PhD, Chemical Engineering, 1995, Oregon State University

Subjects/Keywords: Silicon nitride  – Synthesis

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Lin, D. (1995). Kinetic study on the synthesis of Si₃N₄ via the ammonization of SiO vapor. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/34606

Chicago Manual of Style (16th Edition):

Lin, Dah-cheng. “Kinetic study on the synthesis of Si₃N₄ via the ammonization of SiO vapor.” 1995. Doctoral Dissertation, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/34606.

MLA Handbook (7th Edition):

Lin, Dah-cheng. “Kinetic study on the synthesis of Si₃N₄ via the ammonization of SiO vapor.” 1995. Web. 18 Oct 2019.

Vancouver:

Lin D. Kinetic study on the synthesis of Si₃N₄ via the ammonization of SiO vapor. [Internet] [Doctoral dissertation]. Oregon State University; 1995. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/34606.

Council of Science Editors:

Lin D. Kinetic study on the synthesis of Si₃N₄ via the ammonization of SiO vapor. [Doctoral Dissertation]. Oregon State University; 1995. Available from: http://hdl.handle.net/1957/34606


Oregon State University

14. Hirayama, Michiru. Synthesis of nano-sized silicon nitride powder in microchannel reactors.

Degree: MS, Chemical Engineering, 2006, Oregon State University

 Four types of microchannel reactors were built, using a combination of smallest alumina-tubes commercially available, for testing the feasibility of applying high-temperature microchannel reactors to… (more)

Subjects/Keywords: Silicon Nitride; Microreactors

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Hirayama, M. (2006). Synthesis of nano-sized silicon nitride powder in microchannel reactors. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/3092

Chicago Manual of Style (16th Edition):

Hirayama, Michiru. “Synthesis of nano-sized silicon nitride powder in microchannel reactors.” 2006. Masters Thesis, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/3092.

MLA Handbook (7th Edition):

Hirayama, Michiru. “Synthesis of nano-sized silicon nitride powder in microchannel reactors.” 2006. Web. 18 Oct 2019.

Vancouver:

Hirayama M. Synthesis of nano-sized silicon nitride powder in microchannel reactors. [Internet] [Masters thesis]. Oregon State University; 2006. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/3092.

Council of Science Editors:

Hirayama M. Synthesis of nano-sized silicon nitride powder in microchannel reactors. [Masters Thesis]. Oregon State University; 2006. Available from: http://hdl.handle.net/1957/3092


Oklahoma State University

15. Gerlick, Robert E. Polishing of 3/4 Inch Silicon Nitride Balls Using the Large Batch Magnetic Float Polishing Apparatus.

Degree: Mechanical & Aerospace Engineering, 2004, Oklahoma State University

 The purpose of this study was to polish 3/4 inch silicon nitride (Si3N4) balls to the best possible sphericity and surface finish using the large… (more)

Subjects/Keywords: silicon nitride; polishing

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Gerlick, R. E. (2004). Polishing of 3/4 Inch Silicon Nitride Balls Using the Large Batch Magnetic Float Polishing Apparatus. (Thesis). Oklahoma State University. Retrieved from http://hdl.handle.net/11244/9935

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Gerlick, Robert E. “Polishing of 3/4 Inch Silicon Nitride Balls Using the Large Batch Magnetic Float Polishing Apparatus.” 2004. Thesis, Oklahoma State University. Accessed October 18, 2019. http://hdl.handle.net/11244/9935.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Gerlick, Robert E. “Polishing of 3/4 Inch Silicon Nitride Balls Using the Large Batch Magnetic Float Polishing Apparatus.” 2004. Web. 18 Oct 2019.

Vancouver:

Gerlick RE. Polishing of 3/4 Inch Silicon Nitride Balls Using the Large Batch Magnetic Float Polishing Apparatus. [Internet] [Thesis]. Oklahoma State University; 2004. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/11244/9935.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Gerlick RE. Polishing of 3/4 Inch Silicon Nitride Balls Using the Large Batch Magnetic Float Polishing Apparatus. [Thesis]. Oklahoma State University; 2004. Available from: http://hdl.handle.net/11244/9935

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Houston

16. Kaler, Sanbir S. Etching of Si and SiNx by Beams Emanating from Inductively Coupled CH3F/O2 and CH3F/CO2 Plasmas.

Degree: Chemical and Biomolecular Engineering, Department of, 2014, University of Houston

 In advanced microelectronic device fabrications, novel gate electrode designs for field effect transistors (FinFETs) require highly anisotropic and selective silicon nitride (SiNx) etching over Si… (more)

Subjects/Keywords: Silicon-nitride etching; Hydro-fluorocarbon plasmas

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Kaler, S. S. (2014). Etching of Si and SiNx by Beams Emanating from Inductively Coupled CH3F/O2 and CH3F/CO2 Plasmas. (Thesis). University of Houston. Retrieved from http://hdl.handle.net/10657/1451

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kaler, Sanbir S. “Etching of Si and SiNx by Beams Emanating from Inductively Coupled CH3F/O2 and CH3F/CO2 Plasmas.” 2014. Thesis, University of Houston. Accessed October 18, 2019. http://hdl.handle.net/10657/1451.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kaler, Sanbir S. “Etching of Si and SiNx by Beams Emanating from Inductively Coupled CH3F/O2 and CH3F/CO2 Plasmas.” 2014. Web. 18 Oct 2019.

Vancouver:

Kaler SS. Etching of Si and SiNx by Beams Emanating from Inductively Coupled CH3F/O2 and CH3F/CO2 Plasmas. [Internet] [Thesis]. University of Houston; 2014. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/10657/1451.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kaler SS. Etching of Si and SiNx by Beams Emanating from Inductively Coupled CH3F/O2 and CH3F/CO2 Plasmas. [Thesis]. University of Houston; 2014. Available from: http://hdl.handle.net/10657/1451

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Minnesota

17. Schramke, Katelyn. Nonthermal Plasma Synthesis and Plasmonic Properties of Doped Silicon and Titanium Nitride Nanocrystals.

Degree: PhD, Mechanical Engineering, 2017, University of Minnesota

 This work examines the nonthermal plasma synthesis of phosphorus and boron doped silicon and titanium nitride nanocrystals. The localized surface plasmon resonance (LSPR) of these… (more)

Subjects/Keywords: Nanocrystal; Plasma; Plasmon; Silicon; Titanium Nitride

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Schramke, K. (2017). Nonthermal Plasma Synthesis and Plasmonic Properties of Doped Silicon and Titanium Nitride Nanocrystals. (Doctoral Dissertation). University of Minnesota. Retrieved from http://hdl.handle.net/11299/191447

Chicago Manual of Style (16th Edition):

Schramke, Katelyn. “Nonthermal Plasma Synthesis and Plasmonic Properties of Doped Silicon and Titanium Nitride Nanocrystals.” 2017. Doctoral Dissertation, University of Minnesota. Accessed October 18, 2019. http://hdl.handle.net/11299/191447.

MLA Handbook (7th Edition):

Schramke, Katelyn. “Nonthermal Plasma Synthesis and Plasmonic Properties of Doped Silicon and Titanium Nitride Nanocrystals.” 2017. Web. 18 Oct 2019.

Vancouver:

Schramke K. Nonthermal Plasma Synthesis and Plasmonic Properties of Doped Silicon and Titanium Nitride Nanocrystals. [Internet] [Doctoral dissertation]. University of Minnesota; 2017. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/11299/191447.

Council of Science Editors:

Schramke K. Nonthermal Plasma Synthesis and Plasmonic Properties of Doped Silicon and Titanium Nitride Nanocrystals. [Doctoral Dissertation]. University of Minnesota; 2017. Available from: http://hdl.handle.net/11299/191447


University of Toronto

18. Barchet, David Karl. Low-Temperature Ozone Native Oxide – Silicon Nitride Bilayer Passivation of the Silicon Surface.

Degree: 2015, University of Toronto

Passivation of crystalline silicon is critical for the development of high efficiency, low cost solar cells. The objective of this project is to advance low… (more)

Subjects/Keywords: Characterization; Hydrogen; Nitride; Passivation; PECVD; Silicon; 0544

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Barchet, D. K. (2015). Low-Temperature Ozone Native Oxide – Silicon Nitride Bilayer Passivation of the Silicon Surface. (Masters Thesis). University of Toronto. Retrieved from http://hdl.handle.net/1807/80180

Chicago Manual of Style (16th Edition):

Barchet, David Karl. “Low-Temperature Ozone Native Oxide – Silicon Nitride Bilayer Passivation of the Silicon Surface.” 2015. Masters Thesis, University of Toronto. Accessed October 18, 2019. http://hdl.handle.net/1807/80180.

MLA Handbook (7th Edition):

Barchet, David Karl. “Low-Temperature Ozone Native Oxide – Silicon Nitride Bilayer Passivation of the Silicon Surface.” 2015. Web. 18 Oct 2019.

Vancouver:

Barchet DK. Low-Temperature Ozone Native Oxide – Silicon Nitride Bilayer Passivation of the Silicon Surface. [Internet] [Masters thesis]. University of Toronto; 2015. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1807/80180.

Council of Science Editors:

Barchet DK. Low-Temperature Ozone Native Oxide – Silicon Nitride Bilayer Passivation of the Silicon Surface. [Masters Thesis]. University of Toronto; 2015. Available from: http://hdl.handle.net/1807/80180


Rutgers University

19. Theron, Claire. Determination of sintering parameters for liquid phase sintering of silicon nitride.

Degree: PhD, Ceramic and Materials Science and Engineering, 2008, Rutgers University

The sintering parameters of silicon nitride were determined during the second stage of liquid phase sintering via interrupted sinter forging tests under compressive uniaxial load.… (more)

Subjects/Keywords: Silicon nitride; Sintering

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Theron, C. (2008). Determination of sintering parameters for liquid phase sintering of silicon nitride. (Doctoral Dissertation). Rutgers University. Retrieved from http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.17229

Chicago Manual of Style (16th Edition):

Theron, Claire. “Determination of sintering parameters for liquid phase sintering of silicon nitride.” 2008. Doctoral Dissertation, Rutgers University. Accessed October 18, 2019. http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.17229.

MLA Handbook (7th Edition):

Theron, Claire. “Determination of sintering parameters for liquid phase sintering of silicon nitride.” 2008. Web. 18 Oct 2019.

Vancouver:

Theron C. Determination of sintering parameters for liquid phase sintering of silicon nitride. [Internet] [Doctoral dissertation]. Rutgers University; 2008. [cited 2019 Oct 18]. Available from: http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.17229.

Council of Science Editors:

Theron C. Determination of sintering parameters for liquid phase sintering of silicon nitride. [Doctoral Dissertation]. Rutgers University; 2008. Available from: http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.17229


Loughborough University

20. Kaminski, Piotr M. Remote plasma sputtering for silicon solar cells.

Degree: PhD, 2013, Loughborough University

 The global energy market is continuously changing due to changes in demand and fuel availability. Amongst the technologies considered as capable of fulfilling these future… (more)

Subjects/Keywords: 621.31; ARC; Surface passivation; Crystalline silicon; Solar cells; Sputtering; Remote plasma; HiTUS; Silicon nitride; Aluminium nitride; Silicon carbide; Silicon carbonitride.

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Kaminski, P. M. (2013). Remote plasma sputtering for silicon solar cells. (Doctoral Dissertation). Loughborough University. Retrieved from http://hdl.handle.net/2134/13058

Chicago Manual of Style (16th Edition):

Kaminski, Piotr M. “Remote plasma sputtering for silicon solar cells.” 2013. Doctoral Dissertation, Loughborough University. Accessed October 18, 2019. http://hdl.handle.net/2134/13058.

MLA Handbook (7th Edition):

Kaminski, Piotr M. “Remote plasma sputtering for silicon solar cells.” 2013. Web. 18 Oct 2019.

Vancouver:

Kaminski PM. Remote plasma sputtering for silicon solar cells. [Internet] [Doctoral dissertation]. Loughborough University; 2013. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/2134/13058.

Council of Science Editors:

Kaminski PM. Remote plasma sputtering for silicon solar cells. [Doctoral Dissertation]. Loughborough University; 2013. Available from: http://hdl.handle.net/2134/13058

21. Greene, Rawley Brandon. Fatigue reliability predictions in silicon nitride ceramics based on fatigue behavior, bridging stresses and fracture data.

Degree: PhD, Materials Science, 2012, Oregon State University

 Because of its attractive material properties like high hardness, high toughness, and excellent high temperature strength, materials like silicon nitride are becoming more common for… (more)

Subjects/Keywords: silicon nitride; Silicon nitride  – Fatigue

…static fracture R-curve for silicon nitride, supplied micrographs of the material and also… …calculated grain-size distributions in silicon nitride. Dr. Joel W. Ager III allowed for use of his… …3 2.1 Silicon Nitride… …17 2.2.5 Crack Growth Behavior in Silicon Nitride… …22 2.3.2 Behavior of Fatigue Crack Growth in Silicon Nitride… 

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Greene, R. B. (2012). Fatigue reliability predictions in silicon nitride ceramics based on fatigue behavior, bridging stresses and fracture data. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/36042

Chicago Manual of Style (16th Edition):

Greene, Rawley Brandon. “Fatigue reliability predictions in silicon nitride ceramics based on fatigue behavior, bridging stresses and fracture data.” 2012. Doctoral Dissertation, Oregon State University. Accessed October 18, 2019. http://hdl.handle.net/1957/36042.

MLA Handbook (7th Edition):

Greene, Rawley Brandon. “Fatigue reliability predictions in silicon nitride ceramics based on fatigue behavior, bridging stresses and fracture data.” 2012. Web. 18 Oct 2019.

Vancouver:

Greene RB. Fatigue reliability predictions in silicon nitride ceramics based on fatigue behavior, bridging stresses and fracture data. [Internet] [Doctoral dissertation]. Oregon State University; 2012. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1957/36042.

Council of Science Editors:

Greene RB. Fatigue reliability predictions in silicon nitride ceramics based on fatigue behavior, bridging stresses and fracture data. [Doctoral Dissertation]. Oregon State University; 2012. Available from: http://hdl.handle.net/1957/36042


University of New South Wales

22. Scardera, Giuseppe. Correlating structural and optical properties of silicon nanocrystals embedded in silicon nitride: An experimental study of quantum confinement for photovoltaic applications.

Degree: ARC Centre of Excellence in Advanced Silicon Photovoltaics & Photonics, 2008, University of New South Wales

Silicon nanocrystals embedded in silicon nitride have received attention as promising materials for optoelectronic applications. More specifically, band gap engineering of novel materials based on… (more)

Subjects/Keywords: multilayers; silicon nanocrystals; silicon nitride

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Scardera, G. (2008). Correlating structural and optical properties of silicon nanocrystals embedded in silicon nitride: An experimental study of quantum confinement for photovoltaic applications. (Doctoral Dissertation). University of New South Wales. Retrieved from http://handle.unsw.edu.au/1959.4/41472 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:3735/SOURCE2?view=true

Chicago Manual of Style (16th Edition):

Scardera, Giuseppe. “Correlating structural and optical properties of silicon nanocrystals embedded in silicon nitride: An experimental study of quantum confinement for photovoltaic applications.” 2008. Doctoral Dissertation, University of New South Wales. Accessed October 18, 2019. http://handle.unsw.edu.au/1959.4/41472 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:3735/SOURCE2?view=true.

MLA Handbook (7th Edition):

Scardera, Giuseppe. “Correlating structural and optical properties of silicon nanocrystals embedded in silicon nitride: An experimental study of quantum confinement for photovoltaic applications.” 2008. Web. 18 Oct 2019.

Vancouver:

Scardera G. Correlating structural and optical properties of silicon nanocrystals embedded in silicon nitride: An experimental study of quantum confinement for photovoltaic applications. [Internet] [Doctoral dissertation]. University of New South Wales; 2008. [cited 2019 Oct 18]. Available from: http://handle.unsw.edu.au/1959.4/41472 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:3735/SOURCE2?view=true.

Council of Science Editors:

Scardera G. Correlating structural and optical properties of silicon nanocrystals embedded in silicon nitride: An experimental study of quantum confinement for photovoltaic applications. [Doctoral Dissertation]. University of New South Wales; 2008. Available from: http://handle.unsw.edu.au/1959.4/41472 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:3735/SOURCE2?view=true


University of New South Wales

23. So, Yong Heng. Silicon nitride as alternative matrix for silicon quantum dot based all-silicon tandem solar cells.

Degree: ARC Centre of Excellence in Advanced Silicon Photovoltaics & Photonics, 2011, University of New South Wales

Silicon quantum dot based “all-silicon” tandem solar cells have emerged as a promising ‘third generation’ photovoltaic approach to realise high efficiency and cost effective solar… (more)

Subjects/Keywords: Solar cell; Silicon quantum dot; Silicon nitride; Quantum Conifinement; Doping

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

So, Y. H. (2011). Silicon nitride as alternative matrix for silicon quantum dot based all-silicon tandem solar cells. (Doctoral Dissertation). University of New South Wales. Retrieved from http://handle.unsw.edu.au/1959.4/50983 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9877/SOURCE02?view=true

Chicago Manual of Style (16th Edition):

So, Yong Heng. “Silicon nitride as alternative matrix for silicon quantum dot based all-silicon tandem solar cells.” 2011. Doctoral Dissertation, University of New South Wales. Accessed October 18, 2019. http://handle.unsw.edu.au/1959.4/50983 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9877/SOURCE02?view=true.

MLA Handbook (7th Edition):

So, Yong Heng. “Silicon nitride as alternative matrix for silicon quantum dot based all-silicon tandem solar cells.” 2011. Web. 18 Oct 2019.

Vancouver:

So YH. Silicon nitride as alternative matrix for silicon quantum dot based all-silicon tandem solar cells. [Internet] [Doctoral dissertation]. University of New South Wales; 2011. [cited 2019 Oct 18]. Available from: http://handle.unsw.edu.au/1959.4/50983 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9877/SOURCE02?view=true.

Council of Science Editors:

So YH. Silicon nitride as alternative matrix for silicon quantum dot based all-silicon tandem solar cells. [Doctoral Dissertation]. University of New South Wales; 2011. Available from: http://handle.unsw.edu.au/1959.4/50983 ; https://unsworks.unsw.edu.au/fapi/datastream/unsworks:9877/SOURCE02?view=true


University of Toronto

24. Stepanov, Dmitri. Surface Passivation of Crystalline Silicon by Dual Layer Amorphous Silicon Films.

Degree: 2011, University of Toronto

The probability of recombination of photogenerated electron hole pairs in crystalline silicon is governed by the density of surface defect states and the density of… (more)

Subjects/Keywords: surface passivation; amorphous silicon; silicon nitride; high efficiency solar cell

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Stepanov, D. (2011). Surface Passivation of Crystalline Silicon by Dual Layer Amorphous Silicon Films. (Masters Thesis). University of Toronto. Retrieved from http://hdl.handle.net/1807/29630

Chicago Manual of Style (16th Edition):

Stepanov, Dmitri. “Surface Passivation of Crystalline Silicon by Dual Layer Amorphous Silicon Films.” 2011. Masters Thesis, University of Toronto. Accessed October 18, 2019. http://hdl.handle.net/1807/29630.

MLA Handbook (7th Edition):

Stepanov, Dmitri. “Surface Passivation of Crystalline Silicon by Dual Layer Amorphous Silicon Films.” 2011. Web. 18 Oct 2019.

Vancouver:

Stepanov D. Surface Passivation of Crystalline Silicon by Dual Layer Amorphous Silicon Films. [Internet] [Masters thesis]. University of Toronto; 2011. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1807/29630.

Council of Science Editors:

Stepanov D. Surface Passivation of Crystalline Silicon by Dual Layer Amorphous Silicon Films. [Masters Thesis]. University of Toronto; 2011. Available from: http://hdl.handle.net/1807/29630


Linköping University

25. Kuei, Chun-Fu. Transmission electron microscopy study on the formation of SiNX interlayer during InAlN growth on Si (111) substrate.

Degree: Thin Film Physics, 2015, Linköping University

  Ternary indium aluminum nitride (InXAl1-XN) semiconductor is an attractive material with a wide-range bandgap energy varied from ultraviolet (Eg(AlN): 6.2 eV) to near infrared… (more)

Subjects/Keywords: Indium aluminum nitride; silicon nitride; transmission electron microscopy; energy-dispersive X-ray spectroscopy

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Kuei, C. (2015). Transmission electron microscopy study on the formation of SiNX interlayer during InAlN growth on Si (111) substrate. (Thesis). Linköping University. Retrieved from http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-125472

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kuei, Chun-Fu. “Transmission electron microscopy study on the formation of SiNX interlayer during InAlN growth on Si (111) substrate.” 2015. Thesis, Linköping University. Accessed October 18, 2019. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-125472.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kuei, Chun-Fu. “Transmission electron microscopy study on the formation of SiNX interlayer during InAlN growth on Si (111) substrate.” 2015. Web. 18 Oct 2019.

Vancouver:

Kuei C. Transmission electron microscopy study on the formation of SiNX interlayer during InAlN growth on Si (111) substrate. [Internet] [Thesis]. Linköping University; 2015. [cited 2019 Oct 18]. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-125472.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kuei C. Transmission electron microscopy study on the formation of SiNX interlayer during InAlN growth on Si (111) substrate. [Thesis]. Linköping University; 2015. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-125472

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

26. Mahesh Kumar, *. Group III-Nitride Epi And Nanostructures On Si(111) By Molecular Beam Epitaxy.

Degree: 2011, Indian Institute of Science

 The present work has been focused on the growth of Group III-nitride epitaxial layers and nanostructures on Si (111) substrates by plasma-assisted molecular beam epitaxy.… (more)

Subjects/Keywords: Molecular Beam Epitaxy (MBE); Nitride Nanostructures; Nitride Epitaxial Layers; Nitrides - Silicon Substrate; Nitride Semiconductors; Gallium Nitride(GaN) Epilayers; Indium Nitride(InN) Epilayers; Nitrides - Epitaxial Growth; Gallium Nitride Nanostructures; Indium Nitride(InN) Nanostructures; Gallium/Indium/Silicon Heterostructures; Quantum Dots; Materials Science

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Mahesh Kumar, *. (2011). Group III-Nitride Epi And Nanostructures On Si(111) By Molecular Beam Epitaxy. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/2408

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Mahesh Kumar, *. “Group III-Nitride Epi And Nanostructures On Si(111) By Molecular Beam Epitaxy.” 2011. Thesis, Indian Institute of Science. Accessed October 18, 2019. http://hdl.handle.net/2005/2408.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Mahesh Kumar, *. “Group III-Nitride Epi And Nanostructures On Si(111) By Molecular Beam Epitaxy.” 2011. Web. 18 Oct 2019.

Vancouver:

Mahesh Kumar *. Group III-Nitride Epi And Nanostructures On Si(111) By Molecular Beam Epitaxy. [Internet] [Thesis]. Indian Institute of Science; 2011. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/2005/2408.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Mahesh Kumar *. Group III-Nitride Epi And Nanostructures On Si(111) By Molecular Beam Epitaxy. [Thesis]. Indian Institute of Science; 2011. Available from: http://hdl.handle.net/2005/2408

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Georgia Tech

27. Puybaret, Renaud. Epitaxial graphene and nitrides: New processes for improved electronics and optoelectronics.

Degree: PhD, Electrical and Computer Engineering, 2015, Georgia Tech

Silicon carbide and III-nitrides have been intensively used in the industry for the production of high-frequency electronics, power electronics, and optoelectronics, both separately and grown… (more)

Subjects/Keywords: Epitaxial graphene; Silicon carbide; Indium gallium nitride; Nano selective area growth; Silicon nitride; Electronics; Optoelectronics; Nanotechnology

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Puybaret, R. (2015). Epitaxial graphene and nitrides: New processes for improved electronics and optoelectronics. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/55541

Chicago Manual of Style (16th Edition):

Puybaret, Renaud. “Epitaxial graphene and nitrides: New processes for improved electronics and optoelectronics.” 2015. Doctoral Dissertation, Georgia Tech. Accessed October 18, 2019. http://hdl.handle.net/1853/55541.

MLA Handbook (7th Edition):

Puybaret, Renaud. “Epitaxial graphene and nitrides: New processes for improved electronics and optoelectronics.” 2015. Web. 18 Oct 2019.

Vancouver:

Puybaret R. Epitaxial graphene and nitrides: New processes for improved electronics and optoelectronics. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/1853/55541.

Council of Science Editors:

Puybaret R. Epitaxial graphene and nitrides: New processes for improved electronics and optoelectronics. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/55541


University of California – Irvine

28. Zhao, Qiancheng. Integrated Planar Optical Devices Based on Silicon Nitride Waveguides.

Degree: Electrical and Computer Engineering, 2017, University of California – Irvine

Silicon nitride is a subject of growing interest with the potential of delivering planar integrated optical devices as a complementary part of silicon photonics. The… (more)

Subjects/Keywords: Electrical engineering; optical leaky wave antennas; optical trapping; plasmo-thermomechanical detector; silicon nitride trench waveguides; silicon nitride waveguide; thermoplasmonics

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Zhao, Q. (2017). Integrated Planar Optical Devices Based on Silicon Nitride Waveguides. (Thesis). University of California – Irvine. Retrieved from http://www.escholarship.org/uc/item/4j5291nb

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Zhao, Qiancheng. “Integrated Planar Optical Devices Based on Silicon Nitride Waveguides.” 2017. Thesis, University of California – Irvine. Accessed October 18, 2019. http://www.escholarship.org/uc/item/4j5291nb.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Zhao, Qiancheng. “Integrated Planar Optical Devices Based on Silicon Nitride Waveguides.” 2017. Web. 18 Oct 2019.

Vancouver:

Zhao Q. Integrated Planar Optical Devices Based on Silicon Nitride Waveguides. [Internet] [Thesis]. University of California – Irvine; 2017. [cited 2019 Oct 18]. Available from: http://www.escholarship.org/uc/item/4j5291nb.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Zhao Q. Integrated Planar Optical Devices Based on Silicon Nitride Waveguides. [Thesis]. University of California – Irvine; 2017. Available from: http://www.escholarship.org/uc/item/4j5291nb

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

29. Chandrasekar, Hareesh. Dissimilar Hetero-Interfaces with Group III-A Nitrides : Material And Device Perspectives.

Degree: 2016, Indian Institute of Science

 Group III-A nitrides (GaN, AlN, InN and alloys) are materials of considerable contemporary interest and currently enable a wide variety of optoelectronic and high-power, high-frequency… (more)

Subjects/Keywords: Group III-A Nitrides; High Electron Mobility Transistor; Nitride Semiconductors; Aluminium Nitride-Silicon Interface; Gallium Nitride Films; Aluminium Nitride Thin Films; Nitride Films; Nitride Epitaxy; Nitride Hetero-Interfaces; Aluminium Nitride (AlN) Epitaxial Layers; GaN Films; AlN/Si Hetero-interface; AlN-Si Interface; Materials Science

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Chandrasekar, H. (2016). Dissimilar Hetero-Interfaces with Group III-A Nitrides : Material And Device Perspectives. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/2740

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Chandrasekar, Hareesh. “Dissimilar Hetero-Interfaces with Group III-A Nitrides : Material And Device Perspectives.” 2016. Thesis, Indian Institute of Science. Accessed October 18, 2019. http://hdl.handle.net/2005/2740.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Chandrasekar, Hareesh. “Dissimilar Hetero-Interfaces with Group III-A Nitrides : Material And Device Perspectives.” 2016. Web. 18 Oct 2019.

Vancouver:

Chandrasekar H. Dissimilar Hetero-Interfaces with Group III-A Nitrides : Material And Device Perspectives. [Internet] [Thesis]. Indian Institute of Science; 2016. [cited 2019 Oct 18]. Available from: http://hdl.handle.net/2005/2740.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Chandrasekar H. Dissimilar Hetero-Interfaces with Group III-A Nitrides : Material And Device Perspectives. [Thesis]. Indian Institute of Science; 2016. Available from: http://hdl.handle.net/2005/2740

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


The Ohio State University

30. Kim, Hyoun-Ee. Gaseous corrosion of silicon carbide and silicon nitride in hydrogen.

Degree: PhD, Graduate School, 1987, The Ohio State University

Subjects/Keywords: Engineering; Silicon carbide; Silicon nitride; Hydrogen

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Kim, H. (1987). Gaseous corrosion of silicon carbide and silicon nitride in hydrogen. (Doctoral Dissertation). The Ohio State University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=osu1487327695622538

Chicago Manual of Style (16th Edition):

Kim, Hyoun-Ee. “Gaseous corrosion of silicon carbide and silicon nitride in hydrogen.” 1987. Doctoral Dissertation, The Ohio State University. Accessed October 18, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=osu1487327695622538.

MLA Handbook (7th Edition):

Kim, Hyoun-Ee. “Gaseous corrosion of silicon carbide and silicon nitride in hydrogen.” 1987. Web. 18 Oct 2019.

Vancouver:

Kim H. Gaseous corrosion of silicon carbide and silicon nitride in hydrogen. [Internet] [Doctoral dissertation]. The Ohio State University; 1987. [cited 2019 Oct 18]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=osu1487327695622538.

Council of Science Editors:

Kim H. Gaseous corrosion of silicon carbide and silicon nitride in hydrogen. [Doctoral Dissertation]. The Ohio State University; 1987. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=osu1487327695622538

[1] [2] [3] [4] [5] [6] [7] [8] [9]

.