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You searched for subject:(Photolithography). Showing records 1 – 30 of 161 total matches.

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University of Hong Kong

1. 屈拓; Qu, Tuo. Fiber based interference lithography for large-area nanopatterning.

Degree: M. Phil., 2015, University of Hong Kong

The research work during my MPhil study, a fiber optic interference lithography system, is concluded and presented in this thesis. The first part of this… (more)

Subjects/Keywords: Photolithography

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APA (6th Edition):

屈拓; Qu, T. (2015). Fiber based interference lithography for large-area nanopatterning. (Masters Thesis). University of Hong Kong. Retrieved from Qu, T. [屈拓]. (2015). Fiber based interference lithography for large-area nanopatterning. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b5610996 ; http://hdl.handle.net/10722/221197

Chicago Manual of Style (16th Edition):

屈拓; Qu, Tuo. “Fiber based interference lithography for large-area nanopatterning.” 2015. Masters Thesis, University of Hong Kong. Accessed December 06, 2019. Qu, T. [屈拓]. (2015). Fiber based interference lithography for large-area nanopatterning. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b5610996 ; http://hdl.handle.net/10722/221197.

MLA Handbook (7th Edition):

屈拓; Qu, Tuo. “Fiber based interference lithography for large-area nanopatterning.” 2015. Web. 06 Dec 2019.

Vancouver:

屈拓; Qu T. Fiber based interference lithography for large-area nanopatterning. [Internet] [Masters thesis]. University of Hong Kong; 2015. [cited 2019 Dec 06]. Available from: Qu, T. [屈拓]. (2015). Fiber based interference lithography for large-area nanopatterning. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b5610996 ; http://hdl.handle.net/10722/221197.

Council of Science Editors:

屈拓; Qu T. Fiber based interference lithography for large-area nanopatterning. [Masters Thesis]. University of Hong Kong; 2015. Available from: Qu, T. [屈拓]. (2015). Fiber based interference lithography for large-area nanopatterning. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b5610996 ; http://hdl.handle.net/10722/221197


Boston University

2. Wang, Sen. Patterning porosity in hydrogels by arresting phase separation.

Degree: MS, Materials Science & Engineering, 2018, Boston University

 Poly (ethylene glycol) (PEG) hydrogels have been used extensively in biological and tissue engineering, because of their outstanding biocompatibility and processability. However, it is not… (more)

Subjects/Keywords: Bioengineering; Photolithography

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APA (6th Edition):

Wang, S. (2018). Patterning porosity in hydrogels by arresting phase separation. (Masters Thesis). Boston University. Retrieved from http://hdl.handle.net/2144/32079

Chicago Manual of Style (16th Edition):

Wang, Sen. “Patterning porosity in hydrogels by arresting phase separation.” 2018. Masters Thesis, Boston University. Accessed December 06, 2019. http://hdl.handle.net/2144/32079.

MLA Handbook (7th Edition):

Wang, Sen. “Patterning porosity in hydrogels by arresting phase separation.” 2018. Web. 06 Dec 2019.

Vancouver:

Wang S. Patterning porosity in hydrogels by arresting phase separation. [Internet] [Masters thesis]. Boston University; 2018. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/2144/32079.

Council of Science Editors:

Wang S. Patterning porosity in hydrogels by arresting phase separation. [Masters Thesis]. Boston University; 2018. Available from: http://hdl.handle.net/2144/32079


Rochester Institute of Technology

3. Comard, Matthew J. GCA 4800 DSN wafer stepper.

Degree: Electrical Engineering, 1988, Rochester Institute of Technology

 The following work lays the foundation for the further development of high resolution photolithography at RIT using a GCA 4800 DSW wafer stepper. It has… (more)

Subjects/Keywords: Photolithography

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APA (6th Edition):

Comard, M. J. (1988). GCA 4800 DSN wafer stepper. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5601

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Comard, Matthew J. “GCA 4800 DSN wafer stepper.” 1988. Thesis, Rochester Institute of Technology. Accessed December 06, 2019. https://scholarworks.rit.edu/theses/5601.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Comard, Matthew J. “GCA 4800 DSN wafer stepper.” 1988. Web. 06 Dec 2019.

Vancouver:

Comard MJ. GCA 4800 DSN wafer stepper. [Internet] [Thesis]. Rochester Institute of Technology; 1988. [cited 2019 Dec 06]. Available from: https://scholarworks.rit.edu/theses/5601.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Comard MJ. GCA 4800 DSN wafer stepper. [Thesis]. Rochester Institute of Technology; 1988. Available from: https://scholarworks.rit.edu/theses/5601

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Université de Neuchâtel

4. Cubero García, Oscar Jesús. Dynamics of Josephson junctions in a superconducting ring using a “Three-Coils” technique.

Degree: 2007, Université de Neuchâtel

 The aim of this thesis is to observe the Berezinskii-Kosterlitz-Thouless (BKT) transition on a magnetically shielded array of Josephson Junctions using an inductive technique. A… (more)

Subjects/Keywords: photolithography

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APA (6th Edition):

Cubero García, O. J. (2007). Dynamics of Josephson junctions in a superconducting ring using a “Three-Coils” technique. (Thesis). Université de Neuchâtel. Retrieved from http://doc.rero.ch/record/8758

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Cubero García, Oscar Jesús. “Dynamics of Josephson junctions in a superconducting ring using a “Three-Coils” technique.” 2007. Thesis, Université de Neuchâtel. Accessed December 06, 2019. http://doc.rero.ch/record/8758.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Cubero García, Oscar Jesús. “Dynamics of Josephson junctions in a superconducting ring using a “Three-Coils” technique.” 2007. Web. 06 Dec 2019.

Vancouver:

Cubero García OJ. Dynamics of Josephson junctions in a superconducting ring using a “Three-Coils” technique. [Internet] [Thesis]. Université de Neuchâtel; 2007. [cited 2019 Dec 06]. Available from: http://doc.rero.ch/record/8758.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Cubero García OJ. Dynamics of Josephson junctions in a superconducting ring using a “Three-Coils” technique. [Thesis]. Université de Neuchâtel; 2007. Available from: http://doc.rero.ch/record/8758

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Urbana-Champaign

5. Alonso, Matthew P. Optimization of a light emitting diode based projection stereolithography system and its applications.

Degree: MS, 0133, 2010, University of Illinois – Urbana-Champaign

 The rapid manufacture of complex three-dimensional components has eluded researchers for decades. Several manufacturing options have been limited by either speed or the ability to… (more)

Subjects/Keywords: 3D microfabrication; photolithography

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APA (6th Edition):

Alonso, M. P. (2010). Optimization of a light emitting diode based projection stereolithography system and its applications. (Thesis). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/16160

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Alonso, Matthew P. “Optimization of a light emitting diode based projection stereolithography system and its applications.” 2010. Thesis, University of Illinois – Urbana-Champaign. Accessed December 06, 2019. http://hdl.handle.net/2142/16160.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Alonso, Matthew P. “Optimization of a light emitting diode based projection stereolithography system and its applications.” 2010. Web. 06 Dec 2019.

Vancouver:

Alonso MP. Optimization of a light emitting diode based projection stereolithography system and its applications. [Internet] [Thesis]. University of Illinois – Urbana-Champaign; 2010. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/2142/16160.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Alonso MP. Optimization of a light emitting diode based projection stereolithography system and its applications. [Thesis]. University of Illinois – Urbana-Champaign; 2010. Available from: http://hdl.handle.net/2142/16160

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Arizona

6. Bohac, Michael Thomas. Development of 248nm AR Coatings for Photolithography Applications .

Degree: 2018, University of Arizona

 A key application for thin film coatings, minimizing Fresnel reflections from each surface is critical to achieving high throughput for multi-component, transmissive optical systems. Assuming… (more)

Subjects/Keywords: Coatings; Photolithography; Ultraviolet

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APA (6th Edition):

Bohac, M. T. (2018). Development of 248nm AR Coatings for Photolithography Applications . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/628479

Chicago Manual of Style (16th Edition):

Bohac, Michael Thomas. “Development of 248nm AR Coatings for Photolithography Applications .” 2018. Masters Thesis, University of Arizona. Accessed December 06, 2019. http://hdl.handle.net/10150/628479.

MLA Handbook (7th Edition):

Bohac, Michael Thomas. “Development of 248nm AR Coatings for Photolithography Applications .” 2018. Web. 06 Dec 2019.

Vancouver:

Bohac MT. Development of 248nm AR Coatings for Photolithography Applications . [Internet] [Masters thesis]. University of Arizona; 2018. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/10150/628479.

Council of Science Editors:

Bohac MT. Development of 248nm AR Coatings for Photolithography Applications . [Masters Thesis]. University of Arizona; 2018. Available from: http://hdl.handle.net/10150/628479


Dalhousie University

7. Ismail, Ahmad G. Photolithography Patterning of Complementary Organic Circuits.

Degree: PhD, Department of Electrical & Computer Engineering, 2011, Dalhousie University

 The application of organic electronics to display technologies, large area electronic paper (or plastics), organic light emitting diodes (OLEDs), organic solar cells, radio frequency identification… (more)

Subjects/Keywords: OTFT; Organic electronics; Photolithography

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APA (6th Edition):

Ismail, A. G. (2011). Photolithography Patterning of Complementary Organic Circuits. (Doctoral Dissertation). Dalhousie University. Retrieved from http://hdl.handle.net/10222/13691

Chicago Manual of Style (16th Edition):

Ismail, Ahmad G. “Photolithography Patterning of Complementary Organic Circuits.” 2011. Doctoral Dissertation, Dalhousie University. Accessed December 06, 2019. http://hdl.handle.net/10222/13691.

MLA Handbook (7th Edition):

Ismail, Ahmad G. “Photolithography Patterning of Complementary Organic Circuits.” 2011. Web. 06 Dec 2019.

Vancouver:

Ismail AG. Photolithography Patterning of Complementary Organic Circuits. [Internet] [Doctoral dissertation]. Dalhousie University; 2011. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/10222/13691.

Council of Science Editors:

Ismail AG. Photolithography Patterning of Complementary Organic Circuits. [Doctoral Dissertation]. Dalhousie University; 2011. Available from: http://hdl.handle.net/10222/13691


Hong Kong University of Science and Technology

8. Cheung, Henry. Studies on diazonaphthoquinone-incorporated dissolution inhibitors in deep-UV photolithography.

Degree: 1997, Hong Kong University of Science and Technology

 The present main interest in photolithography is chemically amplified resists for 248 nm excimer laser lithography. However, the g-line and i-line photolithography is still predominately… (more)

Subjects/Keywords: Photoresists; Photolithography

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APA (6th Edition):

Cheung, H. (1997). Studies on diazonaphthoquinone-incorporated dissolution inhibitors in deep-UV photolithography. (Thesis). Hong Kong University of Science and Technology. Retrieved from https://doi.org/10.14711/thesis-b560643 ; http://repository.ust.hk/ir/bitstream/1783.1-3984/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Cheung, Henry. “Studies on diazonaphthoquinone-incorporated dissolution inhibitors in deep-UV photolithography.” 1997. Thesis, Hong Kong University of Science and Technology. Accessed December 06, 2019. https://doi.org/10.14711/thesis-b560643 ; http://repository.ust.hk/ir/bitstream/1783.1-3984/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Cheung, Henry. “Studies on diazonaphthoquinone-incorporated dissolution inhibitors in deep-UV photolithography.” 1997. Web. 06 Dec 2019.

Vancouver:

Cheung H. Studies on diazonaphthoquinone-incorporated dissolution inhibitors in deep-UV photolithography. [Internet] [Thesis]. Hong Kong University of Science and Technology; 1997. [cited 2019 Dec 06]. Available from: https://doi.org/10.14711/thesis-b560643 ; http://repository.ust.hk/ir/bitstream/1783.1-3984/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Cheung H. Studies on diazonaphthoquinone-incorporated dissolution inhibitors in deep-UV photolithography. [Thesis]. Hong Kong University of Science and Technology; 1997. Available from: https://doi.org/10.14711/thesis-b560643 ; http://repository.ust.hk/ir/bitstream/1783.1-3984/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Hong Kong University of Science and Technology

9. Law, Sui Chun. Structural effects of diazonaphthoquinone-based dissolution inhibitors in photolithographic performance.

Degree: 1997, Hong Kong University of Science and Technology

 In order to investigate the hydrogen bonding effect of the dissolution inhibitor, 2,4-di(5-sulfonyloxymethyl-l-oxo-2-diazonaphthalene)-3-hydroxybenzophen-one and 4,4'-di(5-sulfonyloxymethyl-1-oxo-2-diazonap-htha-lene)-2-hydroxy-benzophenone were synthesized, which were then mixed with (p-t-butylphenol- CH2O) novolak… (more)

Subjects/Keywords: Photoresists; Photolithography

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APA (6th Edition):

Law, S. C. (1997). Structural effects of diazonaphthoquinone-based dissolution inhibitors in photolithographic performance. (Thesis). Hong Kong University of Science and Technology. Retrieved from https://doi.org/10.14711/thesis-b560642 ; http://repository.ust.hk/ir/bitstream/1783.1-3983/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Law, Sui Chun. “Structural effects of diazonaphthoquinone-based dissolution inhibitors in photolithographic performance.” 1997. Thesis, Hong Kong University of Science and Technology. Accessed December 06, 2019. https://doi.org/10.14711/thesis-b560642 ; http://repository.ust.hk/ir/bitstream/1783.1-3983/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Law, Sui Chun. “Structural effects of diazonaphthoquinone-based dissolution inhibitors in photolithographic performance.” 1997. Web. 06 Dec 2019.

Vancouver:

Law SC. Structural effects of diazonaphthoquinone-based dissolution inhibitors in photolithographic performance. [Internet] [Thesis]. Hong Kong University of Science and Technology; 1997. [cited 2019 Dec 06]. Available from: https://doi.org/10.14711/thesis-b560642 ; http://repository.ust.hk/ir/bitstream/1783.1-3983/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Law SC. Structural effects of diazonaphthoquinone-based dissolution inhibitors in photolithographic performance. [Thesis]. Hong Kong University of Science and Technology; 1997. Available from: https://doi.org/10.14711/thesis-b560642 ; http://repository.ust.hk/ir/bitstream/1783.1-3983/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Penn State University

10. Morrow, Thomas J. Programmed Assembly of Biofunctionalized Nanowires for Biosensing Applications.

Degree: PhD, Chemistry, 2010, Penn State University

 The experiments performed in this dissertation were designed to investigate a fabrication method that could ultimately be used to develop chip-based biosensors such as high-density… (more)

Subjects/Keywords: Assembly; Nanowires; Dielectrophoresis; Photolithography; DNA

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APA (6th Edition):

Morrow, T. J. (2010). Programmed Assembly of Biofunctionalized Nanowires for Biosensing Applications. (Doctoral Dissertation). Penn State University. Retrieved from https://etda.libraries.psu.edu/catalog/11090

Chicago Manual of Style (16th Edition):

Morrow, Thomas J. “Programmed Assembly of Biofunctionalized Nanowires for Biosensing Applications.” 2010. Doctoral Dissertation, Penn State University. Accessed December 06, 2019. https://etda.libraries.psu.edu/catalog/11090.

MLA Handbook (7th Edition):

Morrow, Thomas J. “Programmed Assembly of Biofunctionalized Nanowires for Biosensing Applications.” 2010. Web. 06 Dec 2019.

Vancouver:

Morrow TJ. Programmed Assembly of Biofunctionalized Nanowires for Biosensing Applications. [Internet] [Doctoral dissertation]. Penn State University; 2010. [cited 2019 Dec 06]. Available from: https://etda.libraries.psu.edu/catalog/11090.

Council of Science Editors:

Morrow TJ. Programmed Assembly of Biofunctionalized Nanowires for Biosensing Applications. [Doctoral Dissertation]. Penn State University; 2010. Available from: https://etda.libraries.psu.edu/catalog/11090


Cornell University

11. DeFranco, John. Patterning And Processing Of Organic Electronic Devices Using Photolithography .

Degree: 2011, Cornell University

 Patterning methods for chemically sensitive organic semiconductors are developed and applied to making devices and studying interesting device physics. The patterning methods developed center around… (more)

Subjects/Keywords: organic electronics; photolithography; patterning

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APA (6th Edition):

DeFranco, J. (2011). Patterning And Processing Of Organic Electronic Devices Using Photolithography . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/29328

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

DeFranco, John. “Patterning And Processing Of Organic Electronic Devices Using Photolithography .” 2011. Thesis, Cornell University. Accessed December 06, 2019. http://hdl.handle.net/1813/29328.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

DeFranco, John. “Patterning And Processing Of Organic Electronic Devices Using Photolithography .” 2011. Web. 06 Dec 2019.

Vancouver:

DeFranco J. Patterning And Processing Of Organic Electronic Devices Using Photolithography . [Internet] [Thesis]. Cornell University; 2011. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1813/29328.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

DeFranco J. Patterning And Processing Of Organic Electronic Devices Using Photolithography . [Thesis]. Cornell University; 2011. Available from: http://hdl.handle.net/1813/29328

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Virginia Tech

12. Hand, Davis Kyle. A Manufacturing Process for Single Micron Resolution Optical Gratings Used in X-ray Computed Tomography.

Degree: MS, Electrical and Computer Engineering, 2011, Virginia Tech

 X-ray Computed Tomography (CT) is a process that produces three-dimensional x-ray images, allowing for better diagnosis and analysis of complex internal medical conditions. New advances… (more)

Subjects/Keywords: Computed Tomography; Photolithography; Electroplating; DRIE

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APA (6th Edition):

Hand, D. K. (2011). A Manufacturing Process for Single Micron Resolution Optical Gratings Used in X-ray Computed Tomography. (Masters Thesis). Virginia Tech. Retrieved from http://hdl.handle.net/10919/33804

Chicago Manual of Style (16th Edition):

Hand, Davis Kyle. “A Manufacturing Process for Single Micron Resolution Optical Gratings Used in X-ray Computed Tomography.” 2011. Masters Thesis, Virginia Tech. Accessed December 06, 2019. http://hdl.handle.net/10919/33804.

MLA Handbook (7th Edition):

Hand, Davis Kyle. “A Manufacturing Process for Single Micron Resolution Optical Gratings Used in X-ray Computed Tomography.” 2011. Web. 06 Dec 2019.

Vancouver:

Hand DK. A Manufacturing Process for Single Micron Resolution Optical Gratings Used in X-ray Computed Tomography. [Internet] [Masters thesis]. Virginia Tech; 2011. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/10919/33804.

Council of Science Editors:

Hand DK. A Manufacturing Process for Single Micron Resolution Optical Gratings Used in X-ray Computed Tomography. [Masters Thesis]. Virginia Tech; 2011. Available from: http://hdl.handle.net/10919/33804


University of Illinois – Urbana-Champaign

13. Ritchey, Joshua A. Design and applications of 4-yl-(methyl)coumarins and their derivatives.

Degree: PhD, 0335, 2010, University of Illinois – Urbana-Champaign

 Surface chemistry is a well-established area of research and is required in many commercial applications. However, most surface modifications are static in nature meaning a… (more)

Subjects/Keywords: Photoresponsive; coumarins; greyscale photolithography

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APA (6th Edition):

Ritchey, J. A. (2010). Design and applications of 4-yl-(methyl)coumarins and their derivatives. (Doctoral Dissertation). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/16842

Chicago Manual of Style (16th Edition):

Ritchey, Joshua A. “Design and applications of 4-yl-(methyl)coumarins and their derivatives.” 2010. Doctoral Dissertation, University of Illinois – Urbana-Champaign. Accessed December 06, 2019. http://hdl.handle.net/2142/16842.

MLA Handbook (7th Edition):

Ritchey, Joshua A. “Design and applications of 4-yl-(methyl)coumarins and their derivatives.” 2010. Web. 06 Dec 2019.

Vancouver:

Ritchey JA. Design and applications of 4-yl-(methyl)coumarins and their derivatives. [Internet] [Doctoral dissertation]. University of Illinois – Urbana-Champaign; 2010. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/2142/16842.

Council of Science Editors:

Ritchey JA. Design and applications of 4-yl-(methyl)coumarins and their derivatives. [Doctoral Dissertation]. University of Illinois – Urbana-Champaign; 2010. Available from: http://hdl.handle.net/2142/16842


Drexel University

14. Liu, Kewei. Excimer Laser Micromachining of MEMS Materials.

Degree: 2013, Drexel University

Conventional photolithography-based microfabrication techniques are limited to two-dimensional fabrication and only particular materials can be used. Excimer laser micromachining enables to overcome those limitations and… (more)

Subjects/Keywords: Mechanical engineering; Microfabrication; Photolithography

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APA (6th Edition):

Liu, K. (2013). Excimer Laser Micromachining of MEMS Materials. (Thesis). Drexel University. Retrieved from http://hdl.handle.net/1860/4311

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Liu, Kewei. “Excimer Laser Micromachining of MEMS Materials.” 2013. Thesis, Drexel University. Accessed December 06, 2019. http://hdl.handle.net/1860/4311.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Liu, Kewei. “Excimer Laser Micromachining of MEMS Materials.” 2013. Web. 06 Dec 2019.

Vancouver:

Liu K. Excimer Laser Micromachining of MEMS Materials. [Internet] [Thesis]. Drexel University; 2013. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1860/4311.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Liu K. Excimer Laser Micromachining of MEMS Materials. [Thesis]. Drexel University; 2013. Available from: http://hdl.handle.net/1860/4311

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Colorado State University

15. Frondorf, Aaron William. Hoodoo and the Law : Mostly Printed Works.

Degree: Master of Fine Arts (M.F.A.), Art and Art History, 2015, Colorado State University

 This paper discusses the relationship of ideas to their media, through the relationship of contents to a book and through the use of aesthetic barriers.… (more)

Subjects/Keywords: Intaglio; Photolithography; Bookmaking; Printmaking; Litography

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APA (6th Edition):

Frondorf, A. W. (2015). Hoodoo and the Law : Mostly Printed Works. (Masters Thesis). Colorado State University. Retrieved from http://hdl.handle.net/10217/167025

Chicago Manual of Style (16th Edition):

Frondorf, Aaron William. “Hoodoo and the Law : Mostly Printed Works.” 2015. Masters Thesis, Colorado State University. Accessed December 06, 2019. http://hdl.handle.net/10217/167025.

MLA Handbook (7th Edition):

Frondorf, Aaron William. “Hoodoo and the Law : Mostly Printed Works.” 2015. Web. 06 Dec 2019.

Vancouver:

Frondorf AW. Hoodoo and the Law : Mostly Printed Works. [Internet] [Masters thesis]. Colorado State University; 2015. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/10217/167025.

Council of Science Editors:

Frondorf AW. Hoodoo and the Law : Mostly Printed Works. [Masters Thesis]. Colorado State University; 2015. Available from: http://hdl.handle.net/10217/167025

16. Leibovici, Matthieu. Pattern-integrated interference lithography for two-dimensional and three-dimensional periodic-lattice-based microstructures.

Degree: PhD, Electrical and Computer Engineering, 2015, Georgia Tech

 Two-dimensional (2D) and three-dimensional (3D) periodic-lattice-based microstructures have found multifaceted applications in photonics, microfluidics, tissue engineering, biomedical engineering, and mechanical metamaterials. To fabricate functional periodic… (more)

Subjects/Keywords: Interference; Photolithography

…medium in immersion photolithography nPR Photoresist complex refractive index nPR Real part… …Finally, well-established conventional photolithography can be used to produce 2D PLB… 

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APA (6th Edition):

Leibovici, M. (2015). Pattern-integrated interference lithography for two-dimensional and three-dimensional periodic-lattice-based microstructures. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/54410

Chicago Manual of Style (16th Edition):

Leibovici, Matthieu. “Pattern-integrated interference lithography for two-dimensional and three-dimensional periodic-lattice-based microstructures.” 2015. Doctoral Dissertation, Georgia Tech. Accessed December 06, 2019. http://hdl.handle.net/1853/54410.

MLA Handbook (7th Edition):

Leibovici, Matthieu. “Pattern-integrated interference lithography for two-dimensional and three-dimensional periodic-lattice-based microstructures.” 2015. Web. 06 Dec 2019.

Vancouver:

Leibovici M. Pattern-integrated interference lithography for two-dimensional and three-dimensional periodic-lattice-based microstructures. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1853/54410.

Council of Science Editors:

Leibovici M. Pattern-integrated interference lithography for two-dimensional and three-dimensional periodic-lattice-based microstructures. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/54410


University of Dayton

17. Niu, Xiaoxu. Through Thin Film Ablation of Iron-Nickel Pixel Target.

Degree: MS(M.S.), Materials Engineering, 2010, University of Dayton

 A novel multi-element nanoparticle synthesis technique, noted pixel target ablation (PTA) is reported here. In the experiments described here, Iron-Nickel pixel targets were prepared on… (more)

Subjects/Keywords: Materials Science; laser ablation; photolithography; alloy nanoparticle

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APA (6th Edition):

Niu, X. (2010). Through Thin Film Ablation of Iron-Nickel Pixel Target. (Masters Thesis). University of Dayton. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=dayton1280153225

Chicago Manual of Style (16th Edition):

Niu, Xiaoxu. “Through Thin Film Ablation of Iron-Nickel Pixel Target.” 2010. Masters Thesis, University of Dayton. Accessed December 06, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1280153225.

MLA Handbook (7th Edition):

Niu, Xiaoxu. “Through Thin Film Ablation of Iron-Nickel Pixel Target.” 2010. Web. 06 Dec 2019.

Vancouver:

Niu X. Through Thin Film Ablation of Iron-Nickel Pixel Target. [Internet] [Masters thesis]. University of Dayton; 2010. [cited 2019 Dec 06]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=dayton1280153225.

Council of Science Editors:

Niu X. Through Thin Film Ablation of Iron-Nickel Pixel Target. [Masters Thesis]. University of Dayton; 2010. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=dayton1280153225


University of California – Berkeley

18. Stearns, Hoday Margaret. Iterative Methods for High Precision Motion Control with Application to a Wafer Scanner System.

Degree: Mechanical Engineering, 2011, University of California – Berkeley

 Advances in photolithography are one of the key driving factors in the continuing expansion in capacity and decrease in cost of semiconductors. Extending this trend… (more)

Subjects/Keywords: Mechanical Engineering; Control; Learning; Motion; Photolithography

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APA (6th Edition):

Stearns, H. M. (2011). Iterative Methods for High Precision Motion Control with Application to a Wafer Scanner System. (Thesis). University of California – Berkeley. Retrieved from http://www.escholarship.org/uc/item/1p96c6g6

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Stearns, Hoday Margaret. “Iterative Methods for High Precision Motion Control with Application to a Wafer Scanner System.” 2011. Thesis, University of California – Berkeley. Accessed December 06, 2019. http://www.escholarship.org/uc/item/1p96c6g6.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Stearns, Hoday Margaret. “Iterative Methods for High Precision Motion Control with Application to a Wafer Scanner System.” 2011. Web. 06 Dec 2019.

Vancouver:

Stearns HM. Iterative Methods for High Precision Motion Control with Application to a Wafer Scanner System. [Internet] [Thesis]. University of California – Berkeley; 2011. [cited 2019 Dec 06]. Available from: http://www.escholarship.org/uc/item/1p96c6g6.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Stearns HM. Iterative Methods for High Precision Motion Control with Application to a Wafer Scanner System. [Thesis]. University of California – Berkeley; 2011. Available from: http://www.escholarship.org/uc/item/1p96c6g6

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

19. Burbine, Andrew M. Bayesian Analysis for Photolithographic Models.

Degree: MS, Microelectronic Engineering, 2017, Rochester Institute of Technology

  The use of optical proximity correction (OPC) as a resolution enhancement technique (RET) in microelectronic photolithographic manufacturing demands increasingly accurate models of the systems… (more)

Subjects/Keywords: Bayesian analysis; Opc modeling; Photolithography; Uncertainty

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APA (6th Edition):

Burbine, A. M. (2017). Bayesian Analysis for Photolithographic Models. (Masters Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/9983

Chicago Manual of Style (16th Edition):

Burbine, Andrew M. “Bayesian Analysis for Photolithographic Models.” 2017. Masters Thesis, Rochester Institute of Technology. Accessed December 06, 2019. https://scholarworks.rit.edu/theses/9983.

MLA Handbook (7th Edition):

Burbine, Andrew M. “Bayesian Analysis for Photolithographic Models.” 2017. Web. 06 Dec 2019.

Vancouver:

Burbine AM. Bayesian Analysis for Photolithographic Models. [Internet] [Masters thesis]. Rochester Institute of Technology; 2017. [cited 2019 Dec 06]. Available from: https://scholarworks.rit.edu/theses/9983.

Council of Science Editors:

Burbine AM. Bayesian Analysis for Photolithographic Models. [Masters Thesis]. Rochester Institute of Technology; 2017. Available from: https://scholarworks.rit.edu/theses/9983


University of Illinois – Urbana-Champaign

20. Maniscalco, Nicholas I. Design and fabrication of electro-thermal microcantilevers for ultrafast molecular sorting and delivery.

Degree: MS, 0133, 2010, University of Illinois – Urbana-Champaign

 Improvements to the current state of the art in microfabricated cantilevers are investigated in order to realize enhanced functionality and increased versatility for use in… (more)

Subjects/Keywords: Microcantilever; electro-thermal; electrophoresis; electrode; photolithography

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APA (6th Edition):

Maniscalco, N. I. (2010). Design and fabrication of electro-thermal microcantilevers for ultrafast molecular sorting and delivery. (Thesis). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/14761

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Maniscalco, Nicholas I. “Design and fabrication of electro-thermal microcantilevers for ultrafast molecular sorting and delivery.” 2010. Thesis, University of Illinois – Urbana-Champaign. Accessed December 06, 2019. http://hdl.handle.net/2142/14761.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Maniscalco, Nicholas I. “Design and fabrication of electro-thermal microcantilevers for ultrafast molecular sorting and delivery.” 2010. Web. 06 Dec 2019.

Vancouver:

Maniscalco NI. Design and fabrication of electro-thermal microcantilevers for ultrafast molecular sorting and delivery. [Internet] [Thesis]. University of Illinois – Urbana-Champaign; 2010. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/2142/14761.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Maniscalco NI. Design and fabrication of electro-thermal microcantilevers for ultrafast molecular sorting and delivery. [Thesis]. University of Illinois – Urbana-Champaign; 2010. Available from: http://hdl.handle.net/2142/14761

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Texas – Austin

21. Liu, Wanpeng. Precise protein photolithography (P3) for fabricating high performance bioarchitectures using silk fibroin light chain as the photoresist.

Degree: MSin Engineering, Mechanical Engineering, 2019, University of Texas – Austin

 High-resolution fabrication platforms using materials from biological precursors have been proposed as feasible routes not only for sustainable bionanomanufacturing, but also for creating organic devices… (more)

Subjects/Keywords: Protein photolithography; Silk fibroin light chain; Biopatterning

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APA (6th Edition):

Liu, W. (2019). Precise protein photolithography (P3) for fabricating high performance bioarchitectures using silk fibroin light chain as the photoresist. (Masters Thesis). University of Texas – Austin. Retrieved from http://dx.doi.org/10.26153/tsw/2753

Chicago Manual of Style (16th Edition):

Liu, Wanpeng. “Precise protein photolithography (P3) for fabricating high performance bioarchitectures using silk fibroin light chain as the photoresist.” 2019. Masters Thesis, University of Texas – Austin. Accessed December 06, 2019. http://dx.doi.org/10.26153/tsw/2753.

MLA Handbook (7th Edition):

Liu, Wanpeng. “Precise protein photolithography (P3) for fabricating high performance bioarchitectures using silk fibroin light chain as the photoresist.” 2019. Web. 06 Dec 2019.

Vancouver:

Liu W. Precise protein photolithography (P3) for fabricating high performance bioarchitectures using silk fibroin light chain as the photoresist. [Internet] [Masters thesis]. University of Texas – Austin; 2019. [cited 2019 Dec 06]. Available from: http://dx.doi.org/10.26153/tsw/2753.

Council of Science Editors:

Liu W. Precise protein photolithography (P3) for fabricating high performance bioarchitectures using silk fibroin light chain as the photoresist. [Masters Thesis]. University of Texas – Austin; 2019. Available from: http://dx.doi.org/10.26153/tsw/2753


Georgia Tech

22. Comeau, Benita M. Fabrication of tissue engineering scaffolds using stereolithography.

Degree: PhD, Chemical Engineering, 2007, Georgia Tech

 Fabrication of Tissue Engineering Scaffolds Using Stereolithography Benita M. Comeau 226 Pages Directed by Dr. Clifford L. Henderson New methods and materials for the fabrication… (more)

Subjects/Keywords: Photolithography; Stereolithography; Tissue scaffolds; Tissue engineering; Photolithography

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APA (6th Edition):

Comeau, B. M. (2007). Fabrication of tissue engineering scaffolds using stereolithography. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/26564

Chicago Manual of Style (16th Edition):

Comeau, Benita M. “Fabrication of tissue engineering scaffolds using stereolithography.” 2007. Doctoral Dissertation, Georgia Tech. Accessed December 06, 2019. http://hdl.handle.net/1853/26564.

MLA Handbook (7th Edition):

Comeau, Benita M. “Fabrication of tissue engineering scaffolds using stereolithography.” 2007. Web. 06 Dec 2019.

Vancouver:

Comeau BM. Fabrication of tissue engineering scaffolds using stereolithography. [Internet] [Doctoral dissertation]. Georgia Tech; 2007. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1853/26564.

Council of Science Editors:

Comeau BM. Fabrication of tissue engineering scaffolds using stereolithography. [Doctoral Dissertation]. Georgia Tech; 2007. Available from: http://hdl.handle.net/1853/26564


Texas State University – San Marcos

23. Miller, Geoffrey F. A Fast Fourier Transform Approach to Finding the Thickness of Single-Layer Thin Films with Slowly Varying Indices of Refraction and Negligible Absorption Coefficients.

Degree: MS, Mathematics, 2012, Texas State University – San Marcos

 A nonstandard photolithographic exposure tool motivates the search for a method to determine photoresist thickness in real time. Optical physics of two-interface thin film systems… (more)

Subjects/Keywords: Photolithograpthy; Photolithography on non-flat substrates; Fourier; Fast Fourier transform and Fourier series; Photoresists; Photolithography; Fourier transformations; Mathematical physics

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APA (6th Edition):

Miller, G. F. (2012). A Fast Fourier Transform Approach to Finding the Thickness of Single-Layer Thin Films with Slowly Varying Indices of Refraction and Negligible Absorption Coefficients. (Masters Thesis). Texas State University – San Marcos. Retrieved from https://digital.library.txstate.edu/handle/10877/4259

Chicago Manual of Style (16th Edition):

Miller, Geoffrey F. “A Fast Fourier Transform Approach to Finding the Thickness of Single-Layer Thin Films with Slowly Varying Indices of Refraction and Negligible Absorption Coefficients.” 2012. Masters Thesis, Texas State University – San Marcos. Accessed December 06, 2019. https://digital.library.txstate.edu/handle/10877/4259.

MLA Handbook (7th Edition):

Miller, Geoffrey F. “A Fast Fourier Transform Approach to Finding the Thickness of Single-Layer Thin Films with Slowly Varying Indices of Refraction and Negligible Absorption Coefficients.” 2012. Web. 06 Dec 2019.

Vancouver:

Miller GF. A Fast Fourier Transform Approach to Finding the Thickness of Single-Layer Thin Films with Slowly Varying Indices of Refraction and Negligible Absorption Coefficients. [Internet] [Masters thesis]. Texas State University – San Marcos; 2012. [cited 2019 Dec 06]. Available from: https://digital.library.txstate.edu/handle/10877/4259.

Council of Science Editors:

Miller GF. A Fast Fourier Transform Approach to Finding the Thickness of Single-Layer Thin Films with Slowly Varying Indices of Refraction and Negligible Absorption Coefficients. [Masters Thesis]. Texas State University – San Marcos; 2012. Available from: https://digital.library.txstate.edu/handle/10877/4259


Cornell University

24. Guo, Boyu. High Throughput Method for Hydrogen Permeability Measurement of Pd Alloy Membranes .

Degree: 2017, Cornell University

 Hydrogen is a promising source for future energy because of its energy density, low emission, and the ability to be obtained from various sources. The… (more)

Subjects/Keywords: Photolithography; Sputtering Deposition; thin film; Materials Science; Engineering; Hydrogen; Palladium; Permeability

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APA (6th Edition):

Guo, B. (2017). High Throughput Method for Hydrogen Permeability Measurement of Pd Alloy Membranes . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/56887

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Guo, Boyu. “High Throughput Method for Hydrogen Permeability Measurement of Pd Alloy Membranes .” 2017. Thesis, Cornell University. Accessed December 06, 2019. http://hdl.handle.net/1813/56887.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Guo, Boyu. “High Throughput Method for Hydrogen Permeability Measurement of Pd Alloy Membranes .” 2017. Web. 06 Dec 2019.

Vancouver:

Guo B. High Throughput Method for Hydrogen Permeability Measurement of Pd Alloy Membranes . [Internet] [Thesis]. Cornell University; 2017. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1813/56887.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Guo B. High Throughput Method for Hydrogen Permeability Measurement of Pd Alloy Membranes . [Thesis]. Cornell University; 2017. Available from: http://hdl.handle.net/1813/56887

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Texas A&M University

25. Wang, Miao. Design and Fabrication of Nanochannel Devices.

Degree: 2010, Texas A&M University

 Nanochannel devices have been explored over the years with wide applications in bio/chemical analysis. With a dimension comparable to many bio-samples, such as proteins, viruses… (more)

Subjects/Keywords: Nanochannel; Electrospinning; Heat-induced Stretching; Photolithography; Surface-enhanced Raman Spectroscopy; Biosensing

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APA (6th Edition):

Wang, M. (2010). Design and Fabrication of Nanochannel Devices. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/ETD-TAMU-2009-08-7201

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Wang, Miao. “Design and Fabrication of Nanochannel Devices.” 2010. Thesis, Texas A&M University. Accessed December 06, 2019. http://hdl.handle.net/1969.1/ETD-TAMU-2009-08-7201.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Wang, Miao. “Design and Fabrication of Nanochannel Devices.” 2010. Web. 06 Dec 2019.

Vancouver:

Wang M. Design and Fabrication of Nanochannel Devices. [Internet] [Thesis]. Texas A&M University; 2010. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2009-08-7201.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Wang M. Design and Fabrication of Nanochannel Devices. [Thesis]. Texas A&M University; 2010. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2009-08-7201

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

26. Chen, Pi-Shun. The design and development of a novel micro-structured stencil for high precision printings.

Degree: Master, Mechanical and Electro-Mechanical Engineering, 2014, NSYSU

 This work developed a novel micro-structured stencil for high precision printings. Printing technology are the major techniques for producing printing circuit board in electronic industry.… (more)

Subjects/Keywords: Photolithography; Electroplating; High precision printings; AZ4620; SU-8

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APA (6th Edition):

Chen, P. (2014). The design and development of a novel micro-structured stencil for high precision printings. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706114-104028

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Chen, Pi-Shun. “The design and development of a novel micro-structured stencil for high precision printings.” 2014. Thesis, NSYSU. Accessed December 06, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706114-104028.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Chen, Pi-Shun. “The design and development of a novel micro-structured stencil for high precision printings.” 2014. Web. 06 Dec 2019.

Vancouver:

Chen P. The design and development of a novel micro-structured stencil for high precision printings. [Internet] [Thesis]. NSYSU; 2014. [cited 2019 Dec 06]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706114-104028.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Chen P. The design and development of a novel micro-structured stencil for high precision printings. [Thesis]. NSYSU; 2014. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706114-104028

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

27. Kuo, Li-chi. Optical Waveguides and Microrings Fabricated using Ta2O5 Thin Films Grown by RF Magnetic Sputtering on Quartz Substrates.

Degree: Master, Electro-Optical Engineering, 2015, NSYSU

 In this thesis, Tantalum pentoxide (Ta2O5) is proposed for photonic integrated circuits. Ta2O5 is a high transmittance and low-loss dielectric material. It was prepared in… (more)

Subjects/Keywords: Optical waveguide; E-beam lithography; Photolithography; RF-magnetron sputtering; Ta2O5; Microring

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APA (6th Edition):

Kuo, L. (2015). Optical Waveguides and Microrings Fabricated using Ta2O5 Thin Films Grown by RF Magnetic Sputtering on Quartz Substrates. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0521115-132632

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kuo, Li-chi. “Optical Waveguides and Microrings Fabricated using Ta2O5 Thin Films Grown by RF Magnetic Sputtering on Quartz Substrates.” 2015. Thesis, NSYSU. Accessed December 06, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0521115-132632.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kuo, Li-chi. “Optical Waveguides and Microrings Fabricated using Ta2O5 Thin Films Grown by RF Magnetic Sputtering on Quartz Substrates.” 2015. Web. 06 Dec 2019.

Vancouver:

Kuo L. Optical Waveguides and Microrings Fabricated using Ta2O5 Thin Films Grown by RF Magnetic Sputtering on Quartz Substrates. [Internet] [Thesis]. NSYSU; 2015. [cited 2019 Dec 06]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0521115-132632.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kuo L. Optical Waveguides and Microrings Fabricated using Ta2O5 Thin Films Grown by RF Magnetic Sputtering on Quartz Substrates. [Thesis]. NSYSU; 2015. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0521115-132632

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Western Australia

28. Lai, Meifang. Porous silicon and its application for micromachining technologies.

Degree: PhD, 2012, University of Western Australia

[Truncated abstract] Porous silicon (PS), which exhibits valuable characteristics including photoluminescence, easily tunable refractive index, and large surface area, has gained enormous attention worldwide for… (more)

Subjects/Keywords: Porous silicon; Passivation; Photolithography; Alkaline developer; Reactive ion etching; Micromachining

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APA (6th Edition):

Lai, M. (2012). Porous silicon and its application for micromachining technologies. (Doctoral Dissertation). University of Western Australia. Retrieved from http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01

Chicago Manual of Style (16th Edition):

Lai, Meifang. “Porous silicon and its application for micromachining technologies.” 2012. Doctoral Dissertation, University of Western Australia. Accessed December 06, 2019. http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01.

MLA Handbook (7th Edition):

Lai, Meifang. “Porous silicon and its application for micromachining technologies.” 2012. Web. 06 Dec 2019.

Vancouver:

Lai M. Porous silicon and its application for micromachining technologies. [Internet] [Doctoral dissertation]. University of Western Australia; 2012. [cited 2019 Dec 06]. Available from: http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01.

Council of Science Editors:

Lai M. Porous silicon and its application for micromachining technologies. [Doctoral Dissertation]. University of Western Australia; 2012. Available from: http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=33374&local_base=GEN01-INS01


Georgia Tech

29. Sedivy, Donald E. Modeling of multiple-optical-axis pattern-integrated interference lithography systems.

Degree: MS, Electrical and Computer Engineering, 2014, Georgia Tech

 The image quality and collimation in a multiple-optical-axis pattern-integrated interference lithography system are evaluated for an elementary optical system composed of single-element lenses. Image quality… (more)

Subjects/Keywords: Pattern-integrated interference lithography; Imaging systems; Simulation methods; Lithography; Photolithography; Photoresists

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Sedivy, D. E. (2014). Modeling of multiple-optical-axis pattern-integrated interference lithography systems. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/51826

Chicago Manual of Style (16th Edition):

Sedivy, Donald E. “Modeling of multiple-optical-axis pattern-integrated interference lithography systems.” 2014. Masters Thesis, Georgia Tech. Accessed December 06, 2019. http://hdl.handle.net/1853/51826.

MLA Handbook (7th Edition):

Sedivy, Donald E. “Modeling of multiple-optical-axis pattern-integrated interference lithography systems.” 2014. Web. 06 Dec 2019.

Vancouver:

Sedivy DE. Modeling of multiple-optical-axis pattern-integrated interference lithography systems. [Internet] [Masters thesis]. Georgia Tech; 2014. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1853/51826.

Council of Science Editors:

Sedivy DE. Modeling of multiple-optical-axis pattern-integrated interference lithography systems. [Masters Thesis]. Georgia Tech; 2014. Available from: http://hdl.handle.net/1853/51826


Georgia Tech

30. Underwood, William David. A thin film polymer system for the patterning of amines through thermochemical nanolithography.

Degree: MS, Chemistry and Biochemistry, 2009, Georgia Tech

 A system for the patterning of amines through the thermal decomposition of a thin polymer film was proposed. The polymer was synthesized and films were… (more)

Subjects/Keywords: Scanning probe lithography; SPL; Thermochemical nanolithography; Nanolithography; Amines; Photolithography; Lithography

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Underwood, W. D. (2009). A thin film polymer system for the patterning of amines through thermochemical nanolithography. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/31832

Chicago Manual of Style (16th Edition):

Underwood, William David. “A thin film polymer system for the patterning of amines through thermochemical nanolithography.” 2009. Masters Thesis, Georgia Tech. Accessed December 06, 2019. http://hdl.handle.net/1853/31832.

MLA Handbook (7th Edition):

Underwood, William David. “A thin film polymer system for the patterning of amines through thermochemical nanolithography.” 2009. Web. 06 Dec 2019.

Vancouver:

Underwood WD. A thin film polymer system for the patterning of amines through thermochemical nanolithography. [Internet] [Masters thesis]. Georgia Tech; 2009. [cited 2019 Dec 06]. Available from: http://hdl.handle.net/1853/31832.

Council of Science Editors:

Underwood WD. A thin film polymer system for the patterning of amines through thermochemical nanolithography. [Masters Thesis]. Georgia Tech; 2009. Available from: http://hdl.handle.net/1853/31832

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