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You searched for subject:(Nanoimprint). Showing records 1 – 30 of 90 total matches.

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Texas A&M University

1. Choo, Gihoon. High-Throughput Transfer Imprinting for Organic Semiconductors.

Degree: 2013, Texas A&M University

 Development of nanoimprint lithography(NIL) has enabled high-throughput and high-resolution patterning over the optical limitation. In recent years, thermal nanoimprint has been used to directly pattern… (more)

Subjects/Keywords: Nanoimprint; transfer printing

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APA (6th Edition):

Choo, G. (2013). High-Throughput Transfer Imprinting for Organic Semiconductors. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/151356

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Choo, Gihoon. “High-Throughput Transfer Imprinting for Organic Semiconductors.” 2013. Thesis, Texas A&M University. Accessed October 15, 2019. http://hdl.handle.net/1969.1/151356.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Choo, Gihoon. “High-Throughput Transfer Imprinting for Organic Semiconductors.” 2013. Web. 15 Oct 2019.

Vancouver:

Choo G. High-Throughput Transfer Imprinting for Organic Semiconductors. [Internet] [Thesis]. Texas A&M University; 2013. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1969.1/151356.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Choo G. High-Throughput Transfer Imprinting for Organic Semiconductors. [Thesis]. Texas A&M University; 2013. Available from: http://hdl.handle.net/1969.1/151356

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Texas A&M University

2. Luo, Bingqing. Methods and Material Developed beyond Conventional Nanoimprint.

Degree: PhD, Electrical Engineering, 2016, Texas A&M University

Nanoimprint lithography (NIL) has been regarded as one of the next-generation lithography techniques due to its ability to fabricate nanoscale structures with low cost and… (more)

Subjects/Keywords: nanoimprint; defect rate; throughput

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APA (6th Edition):

Luo, B. (2016). Methods and Material Developed beyond Conventional Nanoimprint. (Doctoral Dissertation). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/158997

Chicago Manual of Style (16th Edition):

Luo, Bingqing. “Methods and Material Developed beyond Conventional Nanoimprint.” 2016. Doctoral Dissertation, Texas A&M University. Accessed October 15, 2019. http://hdl.handle.net/1969.1/158997.

MLA Handbook (7th Edition):

Luo, Bingqing. “Methods and Material Developed beyond Conventional Nanoimprint.” 2016. Web. 15 Oct 2019.

Vancouver:

Luo B. Methods and Material Developed beyond Conventional Nanoimprint. [Internet] [Doctoral dissertation]. Texas A&M University; 2016. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1969.1/158997.

Council of Science Editors:

Luo B. Methods and Material Developed beyond Conventional Nanoimprint. [Doctoral Dissertation]. Texas A&M University; 2016. Available from: http://hdl.handle.net/1969.1/158997


IUPUI

3. Kim, Jeonghwan. High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography.

Degree: 2016, IUPUI

Indiana University-Purdue University Indianapolis (IUPUI)

Infrared (IR) polarizers have been widely used in military and commercial applications. Controlling the polarization of incident light is one… (more)

Subjects/Keywords: Subwavelength; Polarizer; Infrared; Nanoimprint Lithography

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APA (6th Edition):

Kim, J. (2016). High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography. (Thesis). IUPUI. Retrieved from http://hdl.handle.net/1805/10920 ; http://dx.doi.org/10.7912/C2F888

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kim, Jeonghwan. “High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography.” 2016. Thesis, IUPUI. Accessed October 15, 2019. http://hdl.handle.net/1805/10920 ; http://dx.doi.org/10.7912/C2F888.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kim, Jeonghwan. “High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography.” 2016. Web. 15 Oct 2019.

Vancouver:

Kim J. High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography. [Internet] [Thesis]. IUPUI; 2016. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1805/10920 ; http://dx.doi.org/10.7912/C2F888.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kim J. High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography. [Thesis]. IUPUI; 2016. Available from: http://hdl.handle.net/1805/10920 ; http://dx.doi.org/10.7912/C2F888

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


IUPUI

4. Kim, Jeonghwan. High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography.

Degree: 2016, IUPUI

Indiana University-Purdue University Indianapolis (IUPUI)

Infrared (IR) polarizers have been widely used in military and commercial applications. Controlling the polarization of incident light is one… (more)

Subjects/Keywords: Subwavelength; Polarizer; Infrared; Nanoimprint Lithography

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APA (6th Edition):

Kim, J. (2016). High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography. (Thesis). IUPUI. Retrieved from http://hdl.handle.net/1805/10920

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kim, Jeonghwan. “High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography.” 2016. Thesis, IUPUI. Accessed October 15, 2019. http://hdl.handle.net/1805/10920.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kim, Jeonghwan. “High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography.” 2016. Web. 15 Oct 2019.

Vancouver:

Kim J. High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography. [Internet] [Thesis]. IUPUI; 2016. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1805/10920.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kim J. High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography. [Thesis]. IUPUI; 2016. Available from: http://hdl.handle.net/1805/10920

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Princeton University

5. Chen, Hao. NANOSTRUCTURE ENGINEERING BY NANOIMPRINT LITHOGRAPHY FOR NANOPHOTONIC DEVICES .

Degree: PhD, 2015, Princeton University

 Nanostructure engineering has been enabling the fast development of state-of-the-art electronic and optical devices. As the nanofabricated feature size becomes comparable to, or even smaller… (more)

Subjects/Keywords: Nanofabrication; Nanoimprint; Nanophotonic devices

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APA (6th Edition):

Chen, H. (2015). NANOSTRUCTURE ENGINEERING BY NANOIMPRINT LITHOGRAPHY FOR NANOPHOTONIC DEVICES . (Doctoral Dissertation). Princeton University. Retrieved from http://arks.princeton.edu/ark:/88435/dsp01k3569665q

Chicago Manual of Style (16th Edition):

Chen, Hao. “NANOSTRUCTURE ENGINEERING BY NANOIMPRINT LITHOGRAPHY FOR NANOPHOTONIC DEVICES .” 2015. Doctoral Dissertation, Princeton University. Accessed October 15, 2019. http://arks.princeton.edu/ark:/88435/dsp01k3569665q.

MLA Handbook (7th Edition):

Chen, Hao. “NANOSTRUCTURE ENGINEERING BY NANOIMPRINT LITHOGRAPHY FOR NANOPHOTONIC DEVICES .” 2015. Web. 15 Oct 2019.

Vancouver:

Chen H. NANOSTRUCTURE ENGINEERING BY NANOIMPRINT LITHOGRAPHY FOR NANOPHOTONIC DEVICES . [Internet] [Doctoral dissertation]. Princeton University; 2015. [cited 2019 Oct 15]. Available from: http://arks.princeton.edu/ark:/88435/dsp01k3569665q.

Council of Science Editors:

Chen H. NANOSTRUCTURE ENGINEERING BY NANOIMPRINT LITHOGRAPHY FOR NANOPHOTONIC DEVICES . [Doctoral Dissertation]. Princeton University; 2015. Available from: http://arks.princeton.edu/ark:/88435/dsp01k3569665q

6. Teyssedre, Hubert. Simulation du procédé de nanoimpression thermiquesur silicium revêtu d’un film polymère ultramince : Thermal nanoimprint process simulation on siliconewafer covered with an ultra-thin polymer film layer.

Degree: Docteur es, Mécanique-matériaux, 2013, Paris, ENSAM

La nano-structuration des surfaces est un intrigant domaine de la physique des matériaux que l’homme s’est approprié aussi bien à des fins esthétiques que fonctionnelles.… (more)

Subjects/Keywords: Nanoimprint; Couches minces; Simulation; Nanoimprint; Ultra-thin layer; Simulation

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APA (6th Edition):

Teyssedre, H. (2013). Simulation du procédé de nanoimpression thermiquesur silicium revêtu d’un film polymère ultramince : Thermal nanoimprint process simulation on siliconewafer covered with an ultra-thin polymer film layer. (Doctoral Dissertation). Paris, ENSAM. Retrieved from http://www.theses.fr/2013ENAM0047

Chicago Manual of Style (16th Edition):

Teyssedre, Hubert. “Simulation du procédé de nanoimpression thermiquesur silicium revêtu d’un film polymère ultramince : Thermal nanoimprint process simulation on siliconewafer covered with an ultra-thin polymer film layer.” 2013. Doctoral Dissertation, Paris, ENSAM. Accessed October 15, 2019. http://www.theses.fr/2013ENAM0047.

MLA Handbook (7th Edition):

Teyssedre, Hubert. “Simulation du procédé de nanoimpression thermiquesur silicium revêtu d’un film polymère ultramince : Thermal nanoimprint process simulation on siliconewafer covered with an ultra-thin polymer film layer.” 2013. Web. 15 Oct 2019.

Vancouver:

Teyssedre H. Simulation du procédé de nanoimpression thermiquesur silicium revêtu d’un film polymère ultramince : Thermal nanoimprint process simulation on siliconewafer covered with an ultra-thin polymer film layer. [Internet] [Doctoral dissertation]. Paris, ENSAM; 2013. [cited 2019 Oct 15]. Available from: http://www.theses.fr/2013ENAM0047.

Council of Science Editors:

Teyssedre H. Simulation du procédé de nanoimpression thermiquesur silicium revêtu d’un film polymère ultramince : Thermal nanoimprint process simulation on siliconewafer covered with an ultra-thin polymer film layer. [Doctoral Dissertation]. Paris, ENSAM; 2013. Available from: http://www.theses.fr/2013ENAM0047


Texas A&M University

7. Li, Huifeng. Development of Advanced Nanomanufacturing: 3D Integration and High Speed Directed Self-assembly.

Degree: 2011, Texas A&M University

 Development of nanoscience and nanotechnology requires rapid and robust nanomanufacturing processes to produce nanoscale materials, structures and devices. The dissertation aims to contribute to two… (more)

Subjects/Keywords: Nanomanufacturing; nanoimprint; self-assembly; carbon nanotube; nanomaterial

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APA (6th Edition):

Li, H. (2011). Development of Advanced Nanomanufacturing: 3D Integration and High Speed Directed Self-assembly. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/ETD-TAMU-2010-08-8550

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Li, Huifeng. “Development of Advanced Nanomanufacturing: 3D Integration and High Speed Directed Self-assembly.” 2011. Thesis, Texas A&M University. Accessed October 15, 2019. http://hdl.handle.net/1969.1/ETD-TAMU-2010-08-8550.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Li, Huifeng. “Development of Advanced Nanomanufacturing: 3D Integration and High Speed Directed Self-assembly.” 2011. Web. 15 Oct 2019.

Vancouver:

Li H. Development of Advanced Nanomanufacturing: 3D Integration and High Speed Directed Self-assembly. [Internet] [Thesis]. Texas A&M University; 2011. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2010-08-8550.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Li H. Development of Advanced Nanomanufacturing: 3D Integration and High Speed Directed Self-assembly. [Thesis]. Texas A&M University; 2011. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2010-08-8550

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Texas A&M University

8. Jiang, Youwei. High Resolution Nanoimprint for Nanophotonics.

Degree: 2014, Texas A&M University

 Nanophotonics have drawn huge attention in recent years in various applications. Surface sensing technique, including surface-enhanced Raman spectroscopy (SERS), is an important topic of nanophotonics… (more)

Subjects/Keywords: nanoimprint; nanophotonics; SERS; step-and-repeat

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APA (6th Edition):

Jiang, Y. (2014). High Resolution Nanoimprint for Nanophotonics. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/152784

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Jiang, Youwei. “High Resolution Nanoimprint for Nanophotonics.” 2014. Thesis, Texas A&M University. Accessed October 15, 2019. http://hdl.handle.net/1969.1/152784.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Jiang, Youwei. “High Resolution Nanoimprint for Nanophotonics.” 2014. Web. 15 Oct 2019.

Vancouver:

Jiang Y. High Resolution Nanoimprint for Nanophotonics. [Internet] [Thesis]. Texas A&M University; 2014. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1969.1/152784.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Jiang Y. High Resolution Nanoimprint for Nanophotonics. [Thesis]. Texas A&M University; 2014. Available from: http://hdl.handle.net/1969.1/152784

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

9. Fan, Chen-Yi. Study of nanoimprint process by quartz glass mold.

Degree: Master, Mechanical and Electro-Mechanical Engineering, 2008, NSYSU

 This study investigates sub 200nm half-pitch polymer structures by nanoimprint process. The trench structures were fabricated on quartz glass with various depths and widths by… (more)

Subjects/Keywords: Quartz Glass; Nanoimprint; Nanofabrication; Filling Rate

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APA (6th Edition):

Fan, C. (2008). Study of nanoimprint process by quartz glass mold. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0815108-145431

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Fan, Chen-Yi. “Study of nanoimprint process by quartz glass mold.” 2008. Thesis, NSYSU. Accessed October 15, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0815108-145431.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Fan, Chen-Yi. “Study of nanoimprint process by quartz glass mold.” 2008. Web. 15 Oct 2019.

Vancouver:

Fan C. Study of nanoimprint process by quartz glass mold. [Internet] [Thesis]. NSYSU; 2008. [cited 2019 Oct 15]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0815108-145431.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Fan C. Study of nanoimprint process by quartz glass mold. [Thesis]. NSYSU; 2008. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0815108-145431

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Halmstad University

10. Anokhina, Ksenia. Investigation of Metal-assisted Si Etching for Fabrication of Nanoimprint Lithography Stamps.

Degree: Computer and Electrical Engineering (IDE), 2010, Halmstad University

  This diploma thesis deals with the investigation of the metal-assisted catalytic etching (MaCE) of Si. One of the main goals is to study fabrication… (more)

Subjects/Keywords: metal-assisted chemical etching; nanoimprint stamps

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APA (6th Edition):

Anokhina, K. (2010). Investigation of Metal-assisted Si Etching for Fabrication of Nanoimprint Lithography Stamps. (Thesis). Halmstad University. Retrieved from http://urn.kb.se/resolve?urn=urn:nbn:se:hh:diva-14459

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Anokhina, Ksenia. “Investigation of Metal-assisted Si Etching for Fabrication of Nanoimprint Lithography Stamps.” 2010. Thesis, Halmstad University. Accessed October 15, 2019. http://urn.kb.se/resolve?urn=urn:nbn:se:hh:diva-14459.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Anokhina, Ksenia. “Investigation of Metal-assisted Si Etching for Fabrication of Nanoimprint Lithography Stamps.” 2010. Web. 15 Oct 2019.

Vancouver:

Anokhina K. Investigation of Metal-assisted Si Etching for Fabrication of Nanoimprint Lithography Stamps. [Internet] [Thesis]. Halmstad University; 2010. [cited 2019 Oct 15]. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:hh:diva-14459.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Anokhina K. Investigation of Metal-assisted Si Etching for Fabrication of Nanoimprint Lithography Stamps. [Thesis]. Halmstad University; 2010. Available from: http://urn.kb.se/resolve?urn=urn:nbn:se:hh:diva-14459

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Colorado School of Mines

11. Makoutz, Emily. Process development of nanoimprint lithography for selective area growth of III-V materials on silicon.

Degree: MS(M.S.), Physics, 2018, Colorado School of Mines

 Heteroepitaxy of III-V semiconductors on Si substrates is inherently challenging due to the mismatch of various material properties that lead to the formation of dislocations… (more)

Subjects/Keywords: Nanofabrication; III-V semiconductors; Nanoimprint lithography

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APA (6th Edition):

Makoutz, E. (2018). Process development of nanoimprint lithography for selective area growth of III-V materials on silicon. (Masters Thesis). Colorado School of Mines. Retrieved from http://hdl.handle.net/11124/172040

Chicago Manual of Style (16th Edition):

Makoutz, Emily. “Process development of nanoimprint lithography for selective area growth of III-V materials on silicon.” 2018. Masters Thesis, Colorado School of Mines. Accessed October 15, 2019. http://hdl.handle.net/11124/172040.

MLA Handbook (7th Edition):

Makoutz, Emily. “Process development of nanoimprint lithography for selective area growth of III-V materials on silicon.” 2018. Web. 15 Oct 2019.

Vancouver:

Makoutz E. Process development of nanoimprint lithography for selective area growth of III-V materials on silicon. [Internet] [Masters thesis]. Colorado School of Mines; 2018. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/11124/172040.

Council of Science Editors:

Makoutz E. Process development of nanoimprint lithography for selective area growth of III-V materials on silicon. [Masters Thesis]. Colorado School of Mines; 2018. Available from: http://hdl.handle.net/11124/172040


University of Waterloo

12. Con, Celal. Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography.

Degree: 2011, University of Waterloo

 Electron beam lithography (EBL) and Nanoimprint Lithography (NIL) are the promising tools for today’s technology in terms of resolution capability, fidelity and cost of operation.… (more)

Subjects/Keywords: Electron Beam Lithography; Resists; Nanoimprint Lithography

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APA (6th Edition):

Con, C. (2011). Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography. (Thesis). University of Waterloo. Retrieved from http://hdl.handle.net/10012/6212

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Con, Celal. “Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography.” 2011. Thesis, University of Waterloo. Accessed October 15, 2019. http://hdl.handle.net/10012/6212.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Con, Celal. “Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography.” 2011. Web. 15 Oct 2019.

Vancouver:

Con C. Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography. [Internet] [Thesis]. University of Waterloo; 2011. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/10012/6212.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Con C. Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography. [Thesis]. University of Waterloo; 2011. Available from: http://hdl.handle.net/10012/6212

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Urbana-Champaign

13. Dixon, Forest P. Design and development of distributed feedback transistor lasers.

Degree: PhD, 1200, 2010, University of Illinois – Urbana-Champaign

 The transistor laser is a unique three-port device that operates simultaneously as a transistor and a laser. With quantum wells incorporated in the base regions… (more)

Subjects/Keywords: Transistor laser; Distributed feedback; Nanoimprint lithography

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APA (6th Edition):

Dixon, F. P. (2010). Design and development of distributed feedback transistor lasers. (Doctoral Dissertation). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/16840

Chicago Manual of Style (16th Edition):

Dixon, Forest P. “Design and development of distributed feedback transistor lasers.” 2010. Doctoral Dissertation, University of Illinois – Urbana-Champaign. Accessed October 15, 2019. http://hdl.handle.net/2142/16840.

MLA Handbook (7th Edition):

Dixon, Forest P. “Design and development of distributed feedback transistor lasers.” 2010. Web. 15 Oct 2019.

Vancouver:

Dixon FP. Design and development of distributed feedback transistor lasers. [Internet] [Doctoral dissertation]. University of Illinois – Urbana-Champaign; 2010. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/2142/16840.

Council of Science Editors:

Dixon FP. Design and development of distributed feedback transistor lasers. [Doctoral Dissertation]. University of Illinois – Urbana-Champaign; 2010. Available from: http://hdl.handle.net/2142/16840


Université Paris-Sud – Paris XI

14. Chen, Jing. Soft UV nanoimprint lithography : a versatile technique for the fabrication of plasmonic biosensors : Nanoimpression douce assistée au UV : une technique lithographique adaptée à la fabrication de biocapteurs plasmoniques.

Degree: Docteur es, Physique, 2011, Université Paris-Sud – Paris XI

Durant la dernière décennie, la résonance de plasmon de surface (SPR) est devenue très populaire pour effectuer des analyses au cours d’un greffage chimique (ou… (more)

Subjects/Keywords: Nanoimpression; Plasmonique; Biocapteurs; Nanoimprint lithography; Plasmonics; Biosensors

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APA (6th Edition):

Chen, J. (2011). Soft UV nanoimprint lithography : a versatile technique for the fabrication of plasmonic biosensors : Nanoimpression douce assistée au UV : une technique lithographique adaptée à la fabrication de biocapteurs plasmoniques. (Doctoral Dissertation). Université Paris-Sud – Paris XI. Retrieved from http://www.theses.fr/2011PA112024

Chicago Manual of Style (16th Edition):

Chen, Jing. “Soft UV nanoimprint lithography : a versatile technique for the fabrication of plasmonic biosensors : Nanoimpression douce assistée au UV : une technique lithographique adaptée à la fabrication de biocapteurs plasmoniques.” 2011. Doctoral Dissertation, Université Paris-Sud – Paris XI. Accessed October 15, 2019. http://www.theses.fr/2011PA112024.

MLA Handbook (7th Edition):

Chen, Jing. “Soft UV nanoimprint lithography : a versatile technique for the fabrication of plasmonic biosensors : Nanoimpression douce assistée au UV : une technique lithographique adaptée à la fabrication de biocapteurs plasmoniques.” 2011. Web. 15 Oct 2019.

Vancouver:

Chen J. Soft UV nanoimprint lithography : a versatile technique for the fabrication of plasmonic biosensors : Nanoimpression douce assistée au UV : une technique lithographique adaptée à la fabrication de biocapteurs plasmoniques. [Internet] [Doctoral dissertation]. Université Paris-Sud – Paris XI; 2011. [cited 2019 Oct 15]. Available from: http://www.theses.fr/2011PA112024.

Council of Science Editors:

Chen J. Soft UV nanoimprint lithography : a versatile technique for the fabrication of plasmonic biosensors : Nanoimpression douce assistée au UV : une technique lithographique adaptée à la fabrication de biocapteurs plasmoniques. [Doctoral Dissertation]. Université Paris-Sud – Paris XI; 2011. Available from: http://www.theses.fr/2011PA112024


San Jose State University

15. West, Melanie Maputol. Combining Nanofluidics and Plasmonics for Single Molecule Detection.

Degree: MS, Biomedical, Chemical & Materials Engineering, 2014, San Jose State University

  Single molecule detection is limited by the small scattering cross-section of molecules which leads to weak optical signals that can be obscured by background… (more)

Subjects/Keywords: Nanofabrication; Nanofluidics; Nanoimprint Lithography; Optofluidics; Plasmonics

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APA (6th Edition):

West, M. M. (2014). Combining Nanofluidics and Plasmonics for Single Molecule Detection. (Masters Thesis). San Jose State University. Retrieved from https://doi.org/10.31979/etd.a5mz-7fyk ; https://scholarworks.sjsu.edu/etd_theses/4487

Chicago Manual of Style (16th Edition):

West, Melanie Maputol. “Combining Nanofluidics and Plasmonics for Single Molecule Detection.” 2014. Masters Thesis, San Jose State University. Accessed October 15, 2019. https://doi.org/10.31979/etd.a5mz-7fyk ; https://scholarworks.sjsu.edu/etd_theses/4487.

MLA Handbook (7th Edition):

West, Melanie Maputol. “Combining Nanofluidics and Plasmonics for Single Molecule Detection.” 2014. Web. 15 Oct 2019.

Vancouver:

West MM. Combining Nanofluidics and Plasmonics for Single Molecule Detection. [Internet] [Masters thesis]. San Jose State University; 2014. [cited 2019 Oct 15]. Available from: https://doi.org/10.31979/etd.a5mz-7fyk ; https://scholarworks.sjsu.edu/etd_theses/4487.

Council of Science Editors:

West MM. Combining Nanofluidics and Plasmonics for Single Molecule Detection. [Masters Thesis]. San Jose State University; 2014. Available from: https://doi.org/10.31979/etd.a5mz-7fyk ; https://scholarworks.sjsu.edu/etd_theses/4487


Princeton University

16. Peng, Ruoming. TOWARDS PERSONAL HEALTH MONITORING: DETECTING BIOMOLECULES WITH MICROFLUIDICS AND NANOPLASMONIC SENSORS FABRICATED BY NANOIMPRINT LITHOGRAPHY .

Degree: PhD, 2017, Princeton University

 Abstract The research work presented in this dissertation includes the design, fabrication, and characterization of nanostructures for biosensing applications. The detection of proteins and nucleic… (more)

Subjects/Keywords: Biosensing; Fluorescence; Microfluidic; Nanofluidic; Nanoimprint Lithography; Plasmonic

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APA (6th Edition):

Peng, R. (2017). TOWARDS PERSONAL HEALTH MONITORING: DETECTING BIOMOLECULES WITH MICROFLUIDICS AND NANOPLASMONIC SENSORS FABRICATED BY NANOIMPRINT LITHOGRAPHY . (Doctoral Dissertation). Princeton University. Retrieved from http://arks.princeton.edu/ark:/88435/dsp01pv63g2891

Chicago Manual of Style (16th Edition):

Peng, Ruoming. “TOWARDS PERSONAL HEALTH MONITORING: DETECTING BIOMOLECULES WITH MICROFLUIDICS AND NANOPLASMONIC SENSORS FABRICATED BY NANOIMPRINT LITHOGRAPHY .” 2017. Doctoral Dissertation, Princeton University. Accessed October 15, 2019. http://arks.princeton.edu/ark:/88435/dsp01pv63g2891.

MLA Handbook (7th Edition):

Peng, Ruoming. “TOWARDS PERSONAL HEALTH MONITORING: DETECTING BIOMOLECULES WITH MICROFLUIDICS AND NANOPLASMONIC SENSORS FABRICATED BY NANOIMPRINT LITHOGRAPHY .” 2017. Web. 15 Oct 2019.

Vancouver:

Peng R. TOWARDS PERSONAL HEALTH MONITORING: DETECTING BIOMOLECULES WITH MICROFLUIDICS AND NANOPLASMONIC SENSORS FABRICATED BY NANOIMPRINT LITHOGRAPHY . [Internet] [Doctoral dissertation]. Princeton University; 2017. [cited 2019 Oct 15]. Available from: http://arks.princeton.edu/ark:/88435/dsp01pv63g2891.

Council of Science Editors:

Peng R. TOWARDS PERSONAL HEALTH MONITORING: DETECTING BIOMOLECULES WITH MICROFLUIDICS AND NANOPLASMONIC SENSORS FABRICATED BY NANOIMPRINT LITHOGRAPHY . [Doctoral Dissertation]. Princeton University; 2017. Available from: http://arks.princeton.edu/ark:/88435/dsp01pv63g2891


Princeton University

17. Qi, Ji. ADVANCES IN LARGE-AREA NANOPATTERNING BY NANOIMPRINT LITHOGRAPHY AND APPLICATIONS IN LIGHT-EMITTING DEVICES .

Degree: PhD, 2018, Princeton University

 The research work presented in this dissertation focused on two main areas. One part is to discuss some novel nanofabrication techniques based on nanoimprint lithography… (more)

Subjects/Keywords: light extraction; Nanoimprint; OLED; transparent conducting electrode

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APA (6th Edition):

Qi, J. (2018). ADVANCES IN LARGE-AREA NANOPATTERNING BY NANOIMPRINT LITHOGRAPHY AND APPLICATIONS IN LIGHT-EMITTING DEVICES . (Doctoral Dissertation). Princeton University. Retrieved from http://arks.princeton.edu/ark:/88435/dsp018c97kt18v

Chicago Manual of Style (16th Edition):

Qi, Ji. “ADVANCES IN LARGE-AREA NANOPATTERNING BY NANOIMPRINT LITHOGRAPHY AND APPLICATIONS IN LIGHT-EMITTING DEVICES .” 2018. Doctoral Dissertation, Princeton University. Accessed October 15, 2019. http://arks.princeton.edu/ark:/88435/dsp018c97kt18v.

MLA Handbook (7th Edition):

Qi, Ji. “ADVANCES IN LARGE-AREA NANOPATTERNING BY NANOIMPRINT LITHOGRAPHY AND APPLICATIONS IN LIGHT-EMITTING DEVICES .” 2018. Web. 15 Oct 2019.

Vancouver:

Qi J. ADVANCES IN LARGE-AREA NANOPATTERNING BY NANOIMPRINT LITHOGRAPHY AND APPLICATIONS IN LIGHT-EMITTING DEVICES . [Internet] [Doctoral dissertation]. Princeton University; 2018. [cited 2019 Oct 15]. Available from: http://arks.princeton.edu/ark:/88435/dsp018c97kt18v.

Council of Science Editors:

Qi J. ADVANCES IN LARGE-AREA NANOPATTERNING BY NANOIMPRINT LITHOGRAPHY AND APPLICATIONS IN LIGHT-EMITTING DEVICES . [Doctoral Dissertation]. Princeton University; 2018. Available from: http://arks.princeton.edu/ark:/88435/dsp018c97kt18v


Texas A&M University

18. Park, Hyunsoo. ADVANCED NANOIMPRINT TECHNIQUE FOR MULTILAYER STRUCTURES AND FUNCTIONAL POLYMER APPLICATIONS.

Degree: 2010, Texas A&M University

 Three-dimensional (3D) polymer structures are very attractive because the extra structural dimension can provide denser integration and superior performance to accomplish complex tasks. Successful fabrication… (more)

Subjects/Keywords: Nanoimprint lithography; 3D multilayer structure; Reversal nanoimprint lithography; Transfer bonding; Residual layer; Functional polymer; Thermoplastic polymer

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APA (6th Edition):

Park, H. (2010). ADVANCED NANOIMPRINT TECHNIQUE FOR MULTILAYER STRUCTURES AND FUNCTIONAL POLYMER APPLICATIONS. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/ETD-TAMU-2009-05-466

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Park, Hyunsoo. “ADVANCED NANOIMPRINT TECHNIQUE FOR MULTILAYER STRUCTURES AND FUNCTIONAL POLYMER APPLICATIONS.” 2010. Thesis, Texas A&M University. Accessed October 15, 2019. http://hdl.handle.net/1969.1/ETD-TAMU-2009-05-466.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Park, Hyunsoo. “ADVANCED NANOIMPRINT TECHNIQUE FOR MULTILAYER STRUCTURES AND FUNCTIONAL POLYMER APPLICATIONS.” 2010. Web. 15 Oct 2019.

Vancouver:

Park H. ADVANCED NANOIMPRINT TECHNIQUE FOR MULTILAYER STRUCTURES AND FUNCTIONAL POLYMER APPLICATIONS. [Internet] [Thesis]. Texas A&M University; 2010. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2009-05-466.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Park H. ADVANCED NANOIMPRINT TECHNIQUE FOR MULTILAYER STRUCTURES AND FUNCTIONAL POLYMER APPLICATIONS. [Thesis]. Texas A&M University; 2010. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2009-05-466

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Alberta

19. Krabbe, Joshua Dirk. Development of photonic crystal display devices.

Degree: MS, Department of Electrical and Computer Engineering, 2011, University of Alberta

 This thesis investigates technologies directed towards developing photonic crystal display devices. A switching technology based on dye electrophoretic motion within a 1D porous photonic crystal… (more)

Subjects/Keywords: glancing angle deposition; photonic crystals; electrophoresis; thin films; nanoimprint lithography

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APA (6th Edition):

Krabbe, J. D. (2011). Development of photonic crystal display devices. (Masters Thesis). University of Alberta. Retrieved from https://era.library.ualberta.ca/files/xk81jk94m

Chicago Manual of Style (16th Edition):

Krabbe, Joshua Dirk. “Development of photonic crystal display devices.” 2011. Masters Thesis, University of Alberta. Accessed October 15, 2019. https://era.library.ualberta.ca/files/xk81jk94m.

MLA Handbook (7th Edition):

Krabbe, Joshua Dirk. “Development of photonic crystal display devices.” 2011. Web. 15 Oct 2019.

Vancouver:

Krabbe JD. Development of photonic crystal display devices. [Internet] [Masters thesis]. University of Alberta; 2011. [cited 2019 Oct 15]. Available from: https://era.library.ualberta.ca/files/xk81jk94m.

Council of Science Editors:

Krabbe JD. Development of photonic crystal display devices. [Masters Thesis]. University of Alberta; 2011. Available from: https://era.library.ualberta.ca/files/xk81jk94m

20. Cui, Dehu. Nanoimprint Lithography for Functional Polymer Patterning.

Degree: 2012, Texas A&M University

 Organic semiconductors have generated huge interested in recent years for low-cost and flexible electronics. Current and future device applications for semiconducting polymers include light-emitting diodes,… (more)

Subjects/Keywords: Nanoimprint; Functional polymer

…40 3.3.2 Absorption spectra of P3HT patterned by step-and-repeat thermal nanoimprint… …42 3.3.3 Double nanoimprint............................................................. 44… …47 CHAPTER IV A RAMAN SPECTROSCOPIC STUDY OF POLYMER CHAIN CONFORMATION AFTER NANOIMPRINT… …96 ix LIST OF FIGURES Page Figure 1. A schematic of thermal nanoimprint lithography… …3 Figure 2. A schematic of UV nanoimprint [5]… 

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APA (6th Edition):

Cui, D. (2012). Nanoimprint Lithography for Functional Polymer Patterning. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/ETD-TAMU-2011-12-10369

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Cui, Dehu. “Nanoimprint Lithography for Functional Polymer Patterning.” 2012. Thesis, Texas A&M University. Accessed October 15, 2019. http://hdl.handle.net/1969.1/ETD-TAMU-2011-12-10369.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Cui, Dehu. “Nanoimprint Lithography for Functional Polymer Patterning.” 2012. Web. 15 Oct 2019.

Vancouver:

Cui D. Nanoimprint Lithography for Functional Polymer Patterning. [Internet] [Thesis]. Texas A&M University; 2012. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2011-12-10369.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Cui D. Nanoimprint Lithography for Functional Polymer Patterning. [Thesis]. Texas A&M University; 2012. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2011-12-10369

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Canterbury

21. Mohamed, Khairudin. Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography.

Degree: Electrical and Computer Engineering, 2009, University of Canterbury

 Although a large number of works on nanoimprint lithography (NIL) techniques have been reported, the the ability for three-dimensional (3-D) patterning using NIL has not… (more)

Subjects/Keywords: three-dimensional; multilevel; ultraviolet; nanoimprint lithography; quartz substrate

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APA (6th Edition):

Mohamed, K. (2009). Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography. (Thesis). University of Canterbury. Retrieved from http://hdl.handle.net/10092/3049

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Mohamed, Khairudin. “Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography.” 2009. Thesis, University of Canterbury. Accessed October 15, 2019. http://hdl.handle.net/10092/3049.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Mohamed, Khairudin. “Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography.” 2009. Web. 15 Oct 2019.

Vancouver:

Mohamed K. Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography. [Internet] [Thesis]. University of Canterbury; 2009. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/10092/3049.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Mohamed K. Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography. [Thesis]. University of Canterbury; 2009. Available from: http://hdl.handle.net/10092/3049

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Penn State University

22. Main, Alexei Seresin. MORPHOLOGY STUDY OF ORGANIC PHOTOVOLTAIC MATERIALS AND ELECTROACTIVE POLYMERS.

Degree: MS, Chemistry, 2008, Penn State University

 Ultrafast infrared polarization resolved pump/probe spectroscopy was used to study the anisotropy of the electroactive polymer 2-ethylhexyl acrylate (EHA). An anisotropy of 0.48 +/- 0.01… (more)

Subjects/Keywords: solar energy; organic photovoltaics; nanoimprint lithography; anisotropy; electroactive polymers

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APA (6th Edition):

Main, A. S. (2008). MORPHOLOGY STUDY OF ORGANIC PHOTOVOLTAIC MATERIALS AND ELECTROACTIVE POLYMERS. (Masters Thesis). Penn State University. Retrieved from https://etda.libraries.psu.edu/catalog/8322

Chicago Manual of Style (16th Edition):

Main, Alexei Seresin. “MORPHOLOGY STUDY OF ORGANIC PHOTOVOLTAIC MATERIALS AND ELECTROACTIVE POLYMERS.” 2008. Masters Thesis, Penn State University. Accessed October 15, 2019. https://etda.libraries.psu.edu/catalog/8322.

MLA Handbook (7th Edition):

Main, Alexei Seresin. “MORPHOLOGY STUDY OF ORGANIC PHOTOVOLTAIC MATERIALS AND ELECTROACTIVE POLYMERS.” 2008. Web. 15 Oct 2019.

Vancouver:

Main AS. MORPHOLOGY STUDY OF ORGANIC PHOTOVOLTAIC MATERIALS AND ELECTROACTIVE POLYMERS. [Internet] [Masters thesis]. Penn State University; 2008. [cited 2019 Oct 15]. Available from: https://etda.libraries.psu.edu/catalog/8322.

Council of Science Editors:

Main AS. MORPHOLOGY STUDY OF ORGANIC PHOTOVOLTAIC MATERIALS AND ELECTROACTIVE POLYMERS. [Masters Thesis]. Penn State University; 2008. Available from: https://etda.libraries.psu.edu/catalog/8322


University of Illinois – Urbana-Champaign

23. Cannon, Andrew H. Investigating wetting characteristics on microstructured surfaces for superhydrophobicity and metal microcasting.

Degree: PhD, 0133, 2010, University of Illinois – Urbana-Champaign

 The engineering of liquid behavior on surfaces is important for infrastructure, transportation, manufacturing, and sensing. Surfaces can be rendered superhydrophobic by microstructuring, and superhydrophobic devices… (more)

Subjects/Keywords: superhydrophobic; superhydrophobicity; ultrahydrophobic; ultrahydrophobicity; micromolding; Nanoimprint lithography (NIL)

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APA (6th Edition):

Cannon, A. H. (2010). Investigating wetting characteristics on microstructured surfaces for superhydrophobicity and metal microcasting. (Doctoral Dissertation). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/14748

Chicago Manual of Style (16th Edition):

Cannon, Andrew H. “Investigating wetting characteristics on microstructured surfaces for superhydrophobicity and metal microcasting.” 2010. Doctoral Dissertation, University of Illinois – Urbana-Champaign. Accessed October 15, 2019. http://hdl.handle.net/2142/14748.

MLA Handbook (7th Edition):

Cannon, Andrew H. “Investigating wetting characteristics on microstructured surfaces for superhydrophobicity and metal microcasting.” 2010. Web. 15 Oct 2019.

Vancouver:

Cannon AH. Investigating wetting characteristics on microstructured surfaces for superhydrophobicity and metal microcasting. [Internet] [Doctoral dissertation]. University of Illinois – Urbana-Champaign; 2010. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/2142/14748.

Council of Science Editors:

Cannon AH. Investigating wetting characteristics on microstructured surfaces for superhydrophobicity and metal microcasting. [Doctoral Dissertation]. University of Illinois – Urbana-Champaign; 2010. Available from: http://hdl.handle.net/2142/14748


University of Michigan

24. Kaplan, Alexander Frank. Subwavelength Elements and Plasmonic Structures for Spectral Filtering.

Degree: PhD, Electrical Engineering, 2013, University of Michigan

 The ability to pattern smaller features on the sub-micron scale has allowed for constant improvements in the performance of electronics in recent decades, but it… (more)

Subjects/Keywords: Plasmonics; Hyperbolic Metamaterial; Nanoimprint Lithography; Spectrum Filter; Nanophotonics; Electrical Engineering; Engineering

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APA (6th Edition):

Kaplan, A. F. (2013). Subwavelength Elements and Plasmonic Structures for Spectral Filtering. (Doctoral Dissertation). University of Michigan. Retrieved from http://hdl.handle.net/2027.42/98050

Chicago Manual of Style (16th Edition):

Kaplan, Alexander Frank. “Subwavelength Elements and Plasmonic Structures for Spectral Filtering.” 2013. Doctoral Dissertation, University of Michigan. Accessed October 15, 2019. http://hdl.handle.net/2027.42/98050.

MLA Handbook (7th Edition):

Kaplan, Alexander Frank. “Subwavelength Elements and Plasmonic Structures for Spectral Filtering.” 2013. Web. 15 Oct 2019.

Vancouver:

Kaplan AF. Subwavelength Elements and Plasmonic Structures for Spectral Filtering. [Internet] [Doctoral dissertation]. University of Michigan; 2013. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/2027.42/98050.

Council of Science Editors:

Kaplan AF. Subwavelength Elements and Plasmonic Structures for Spectral Filtering. [Doctoral Dissertation]. University of Michigan; 2013. Available from: http://hdl.handle.net/2027.42/98050


University of Texas – Austin

25. -2754-875X. Patternable materials for next-generation lithography.

Degree: PhD, Chemical Engineering, 2019, University of Texas – Austin

 One of the salient truths facing the microelectronics industry today is that photolithography tools are unable to meet the resolution requirements for manufacturing next-generation devices.… (more)

Subjects/Keywords: Photolithography; Block copolymer; Nanoimprint lithography; Electron beam lithography; Nanofabrication; Depolymerization

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APA (6th Edition):

-2754-875X. (2019). Patternable materials for next-generation lithography. (Doctoral Dissertation). University of Texas – Austin. Retrieved from http://dx.doi.org/10.26153/tsw/2236

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Chicago Manual of Style (16th Edition):

-2754-875X. “Patternable materials for next-generation lithography.” 2019. Doctoral Dissertation, University of Texas – Austin. Accessed October 15, 2019. http://dx.doi.org/10.26153/tsw/2236.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

MLA Handbook (7th Edition):

-2754-875X. “Patternable materials for next-generation lithography.” 2019. Web. 15 Oct 2019.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Vancouver:

-2754-875X. Patternable materials for next-generation lithography. [Internet] [Doctoral dissertation]. University of Texas – Austin; 2019. [cited 2019 Oct 15]. Available from: http://dx.doi.org/10.26153/tsw/2236.

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete

Council of Science Editors:

-2754-875X. Patternable materials for next-generation lithography. [Doctoral Dissertation]. University of Texas – Austin; 2019. Available from: http://dx.doi.org/10.26153/tsw/2236

Note: this citation may be lacking information needed for this citation format:
Author name may be incomplete


Princeton University

26. Wang, Chao. ADVANCED NANOIMPRINT PATTERNING FOR FUNCTIONAL ELECTRONICS AND BIOCHEMICAL SENSING .

Degree: PhD, 2012, Princeton University

 Nano-fabrication has been widely used for a variety of disciplines, including electronics, material science, nano-optics, and nano-biotechnology. This dissertation focuses on nanoimprint lithography (NIL) based… (more)

Subjects/Keywords: biochemical sensing; graphene; nano-fluidics; Nanoimprint lithography; plasmonics; silicon nanowires

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APA (6th Edition):

Wang, C. (2012). ADVANCED NANOIMPRINT PATTERNING FOR FUNCTIONAL ELECTRONICS AND BIOCHEMICAL SENSING . (Doctoral Dissertation). Princeton University. Retrieved from http://arks.princeton.edu/ark:/88435/dsp01cr56n1010

Chicago Manual of Style (16th Edition):

Wang, Chao. “ADVANCED NANOIMPRINT PATTERNING FOR FUNCTIONAL ELECTRONICS AND BIOCHEMICAL SENSING .” 2012. Doctoral Dissertation, Princeton University. Accessed October 15, 2019. http://arks.princeton.edu/ark:/88435/dsp01cr56n1010.

MLA Handbook (7th Edition):

Wang, Chao. “ADVANCED NANOIMPRINT PATTERNING FOR FUNCTIONAL ELECTRONICS AND BIOCHEMICAL SENSING .” 2012. Web. 15 Oct 2019.

Vancouver:

Wang C. ADVANCED NANOIMPRINT PATTERNING FOR FUNCTIONAL ELECTRONICS AND BIOCHEMICAL SENSING . [Internet] [Doctoral dissertation]. Princeton University; 2012. [cited 2019 Oct 15]. Available from: http://arks.princeton.edu/ark:/88435/dsp01cr56n1010.

Council of Science Editors:

Wang C. ADVANCED NANOIMPRINT PATTERNING FOR FUNCTIONAL ELECTRONICS AND BIOCHEMICAL SENSING . [Doctoral Dissertation]. Princeton University; 2012. Available from: http://arks.princeton.edu/ark:/88435/dsp01cr56n1010


Princeton University

27. Zhang, Qi. Flexible Polymer Mold And UV-Curable Materials For Nanoimprint And Advanced Nanofabrication .

Degree: PhD, 2018, Princeton University

 As an emerging nanofabrication technique, nanoimprint lithography (NIL) has inspired and realized tremendous inventions of high-performance electronic, photonic, biological and nanodevices. However, challenges are still… (more)

Subjects/Keywords: Flexible Mold; Nanoimprint Lithography; Roller Imprint; Transfer Printing; UV Resist

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APA (6th Edition):

Zhang, Q. (2018). Flexible Polymer Mold And UV-Curable Materials For Nanoimprint And Advanced Nanofabrication . (Doctoral Dissertation). Princeton University. Retrieved from http://arks.princeton.edu/ark:/88435/dsp01fx719q176

Chicago Manual of Style (16th Edition):

Zhang, Qi. “Flexible Polymer Mold And UV-Curable Materials For Nanoimprint And Advanced Nanofabrication .” 2018. Doctoral Dissertation, Princeton University. Accessed October 15, 2019. http://arks.princeton.edu/ark:/88435/dsp01fx719q176.

MLA Handbook (7th Edition):

Zhang, Qi. “Flexible Polymer Mold And UV-Curable Materials For Nanoimprint And Advanced Nanofabrication .” 2018. Web. 15 Oct 2019.

Vancouver:

Zhang Q. Flexible Polymer Mold And UV-Curable Materials For Nanoimprint And Advanced Nanofabrication . [Internet] [Doctoral dissertation]. Princeton University; 2018. [cited 2019 Oct 15]. Available from: http://arks.princeton.edu/ark:/88435/dsp01fx719q176.

Council of Science Editors:

Zhang Q. Flexible Polymer Mold And UV-Curable Materials For Nanoimprint And Advanced Nanofabrication . [Doctoral Dissertation]. Princeton University; 2018. Available from: http://arks.princeton.edu/ark:/88435/dsp01fx719q176

28. 永原, 幸児. ナノインプリント法による機能性材料の微細パターニングに関する研究.

Degree: 博士(マテリアルサイエンス), 2016, Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学

Supervisor:下田 達也

マテリアルサイエンス研究科

博士

Subjects/Keywords: nanoimprint; direct nanoimprint; printed electronics; solution process; lanthanum ruthenium oxide

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

永原, . (2016). ナノインプリント法による機能性材料の微細パターニングに関する研究. (Thesis). Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学. Retrieved from http://hdl.handle.net/10119/13530

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

永原, 幸児. “ナノインプリント法による機能性材料の微細パターニングに関する研究.” 2016. Thesis, Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学. Accessed October 15, 2019. http://hdl.handle.net/10119/13530.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

永原, 幸児. “ナノインプリント法による機能性材料の微細パターニングに関する研究.” 2016. Web. 15 Oct 2019.

Vancouver:

永原 . ナノインプリント法による機能性材料の微細パターニングに関する研究. [Internet] [Thesis]. Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学; 2016. [cited 2019 Oct 15]. Available from: http://hdl.handle.net/10119/13530.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

永原 . ナノインプリント法による機能性材料の微細パターニングに関する研究. [Thesis]. Japan Advanced Institute of Science and Technology / 北陸先端科学技術大学院大学; 2016. Available from: http://hdl.handle.net/10119/13530

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Université de Grenoble

29. Gorisse, Thérèse. Auto-assemblage générique de nanofils de silicium dans une matrice d'alumine nanoporeuse assisté par nanoimpression : Self-assembly silicon nanowires in nanoporous matrix of alumina obtained with nanoimprint process.

Degree: Docteur es, Nanophysique, 2014, Université de Grenoble

Avec l'augmentation du nombre de dispositifs utilisant des nanostructures, tels les nanofils pour les systèmes photovoltaïques, les détecteurs, etc., il devient nécessaire de développer des… (more)

Subjects/Keywords: Alumine nanoporeuse; Nanofils de Silicium; Nanoimpression; Electrochimie; Nanoporous alumina; Silicon nanowire; Nanoimprint; Electrochemistry; 530

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APA (6th Edition):

Gorisse, T. (2014). Auto-assemblage générique de nanofils de silicium dans une matrice d'alumine nanoporeuse assisté par nanoimpression : Self-assembly silicon nanowires in nanoporous matrix of alumina obtained with nanoimprint process. (Doctoral Dissertation). Université de Grenoble. Retrieved from http://www.theses.fr/2014GRENY021

Chicago Manual of Style (16th Edition):

Gorisse, Thérèse. “Auto-assemblage générique de nanofils de silicium dans une matrice d'alumine nanoporeuse assisté par nanoimpression : Self-assembly silicon nanowires in nanoporous matrix of alumina obtained with nanoimprint process.” 2014. Doctoral Dissertation, Université de Grenoble. Accessed October 15, 2019. http://www.theses.fr/2014GRENY021.

MLA Handbook (7th Edition):

Gorisse, Thérèse. “Auto-assemblage générique de nanofils de silicium dans une matrice d'alumine nanoporeuse assisté par nanoimpression : Self-assembly silicon nanowires in nanoporous matrix of alumina obtained with nanoimprint process.” 2014. Web. 15 Oct 2019.

Vancouver:

Gorisse T. Auto-assemblage générique de nanofils de silicium dans une matrice d'alumine nanoporeuse assisté par nanoimpression : Self-assembly silicon nanowires in nanoporous matrix of alumina obtained with nanoimprint process. [Internet] [Doctoral dissertation]. Université de Grenoble; 2014. [cited 2019 Oct 15]. Available from: http://www.theses.fr/2014GRENY021.

Council of Science Editors:

Gorisse T. Auto-assemblage générique de nanofils de silicium dans une matrice d'alumine nanoporeuse assisté par nanoimpression : Self-assembly silicon nanowires in nanoporous matrix of alumina obtained with nanoimprint process. [Doctoral Dissertation]. Université de Grenoble; 2014. Available from: http://www.theses.fr/2014GRENY021


Louisiana State University

30. Amirsadeghi, Alborz. Developing defect-tolerant demolding process in nanoimprint lithography.

Degree: PhD, Mechanical Engineering, 2013, Louisiana State University

 Demolding, the process to separate stamp from molded resist, is most critical to the success of ultraviolet nanoimprint lithography (UV-NIL). In the present study we… (more)

Subjects/Keywords: polymerization shrinkage; surface energy; Young’s modulus; adhesion force; demolding force; UV nanoimprint lithography

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Amirsadeghi, A. (2013). Developing defect-tolerant demolding process in nanoimprint lithography. (Doctoral Dissertation). Louisiana State University. Retrieved from etd-06072013-163304 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3376

Chicago Manual of Style (16th Edition):

Amirsadeghi, Alborz. “Developing defect-tolerant demolding process in nanoimprint lithography.” 2013. Doctoral Dissertation, Louisiana State University. Accessed October 15, 2019. etd-06072013-163304 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3376.

MLA Handbook (7th Edition):

Amirsadeghi, Alborz. “Developing defect-tolerant demolding process in nanoimprint lithography.” 2013. Web. 15 Oct 2019.

Vancouver:

Amirsadeghi A. Developing defect-tolerant demolding process in nanoimprint lithography. [Internet] [Doctoral dissertation]. Louisiana State University; 2013. [cited 2019 Oct 15]. Available from: etd-06072013-163304 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3376.

Council of Science Editors:

Amirsadeghi A. Developing defect-tolerant demolding process in nanoimprint lithography. [Doctoral Dissertation]. Louisiana State University; 2013. Available from: etd-06072013-163304 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3376

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