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You searched for subject:(Lithography). Showing records 1 – 30 of 878 total matches.

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Cornell University

1. Krysak, Marie. Small Molecule Photoresist Materials For Next Generation Lithography .

Degree: 2013, Cornell University

 Photolithography remains the most efficient method to create semiconductor devices. Moore's law states that the number of transistors per integrated circuit will double every four… (more)

Subjects/Keywords: photoresists; lithography

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APA (6th Edition):

Krysak, M. (2013). Small Molecule Photoresist Materials For Next Generation Lithography . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/33898

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Krysak, Marie. “Small Molecule Photoresist Materials For Next Generation Lithography .” 2013. Thesis, Cornell University. Accessed January 23, 2019. http://hdl.handle.net/1813/33898.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Krysak, Marie. “Small Molecule Photoresist Materials For Next Generation Lithography .” 2013. Web. 23 Jan 2019.

Vancouver:

Krysak M. Small Molecule Photoresist Materials For Next Generation Lithography . [Internet] [Thesis]. Cornell University; 2013. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1813/33898.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Krysak M. Small Molecule Photoresist Materials For Next Generation Lithography . [Thesis]. Cornell University; 2013. Available from: http://hdl.handle.net/1813/33898

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Montana State University

2. Aring, Lois Hoefert. Multiple-stone lithography.

Degree: College of Arts & Architecture, 1963, Montana State University

Subjects/Keywords: Lithography.

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APA (6th Edition):

Aring, L. H. (1963). Multiple-stone lithography. (Thesis). Montana State University. Retrieved from https://scholarworks.montana.edu/xmlui/handle/1/6234

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Aring, Lois Hoefert. “Multiple-stone lithography.” 1963. Thesis, Montana State University. Accessed January 23, 2019. https://scholarworks.montana.edu/xmlui/handle/1/6234.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Aring, Lois Hoefert. “Multiple-stone lithography.” 1963. Web. 23 Jan 2019.

Vancouver:

Aring LH. Multiple-stone lithography. [Internet] [Thesis]. Montana State University; 1963. [cited 2019 Jan 23]. Available from: https://scholarworks.montana.edu/xmlui/handle/1/6234.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Aring LH. Multiple-stone lithography. [Thesis]. Montana State University; 1963. Available from: https://scholarworks.montana.edu/xmlui/handle/1/6234

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

3. Mell, Michael. A tutorial in frequency modulation screening technology for lithography.

Degree: School of Print Media (CIAS), 1994, Rochester Institute of Technology

 An impressive diversity of opinions concerning many important aspects of the Frequency Modulation process are heard from users and vendors. It has not been difficult… (more)

Subjects/Keywords: Lithography

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APA (6th Edition):

Mell, M. (1994). A tutorial in frequency modulation screening technology for lithography. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/3872

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Mell, Michael. “A tutorial in frequency modulation screening technology for lithography.” 1994. Thesis, Rochester Institute of Technology. Accessed January 23, 2019. https://scholarworks.rit.edu/theses/3872.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Mell, Michael. “A tutorial in frequency modulation screening technology for lithography.” 1994. Web. 23 Jan 2019.

Vancouver:

Mell M. A tutorial in frequency modulation screening technology for lithography. [Internet] [Thesis]. Rochester Institute of Technology; 1994. [cited 2019 Jan 23]. Available from: https://scholarworks.rit.edu/theses/3872.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Mell M. A tutorial in frequency modulation screening technology for lithography. [Thesis]. Rochester Institute of Technology; 1994. Available from: https://scholarworks.rit.edu/theses/3872

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

4. Meyers, Bernard C. Nagual interpretations.

Degree: School of Art (CIAS), 1990, Rochester Institute of Technology

Not Included Advisors/Committee Members: Williams, Lawrence, Dickinson, David, Kemp, Weston.

Subjects/Keywords: Lithography

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APA (6th Edition):

Meyers, B. C. (1990). Nagual interpretations. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/2345

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Meyers, Bernard C. “Nagual interpretations.” 1990. Thesis, Rochester Institute of Technology. Accessed January 23, 2019. https://scholarworks.rit.edu/theses/2345.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Meyers, Bernard C. “Nagual interpretations.” 1990. Web. 23 Jan 2019.

Vancouver:

Meyers BC. Nagual interpretations. [Internet] [Thesis]. Rochester Institute of Technology; 1990. [cited 2019 Jan 23]. Available from: https://scholarworks.rit.edu/theses/2345.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Meyers BC. Nagual interpretations. [Thesis]. Rochester Institute of Technology; 1990. Available from: https://scholarworks.rit.edu/theses/2345

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Boston College

5. Paudel, Trilochan. Nanosphere Lithography for Nano Optical Applications.

Degree: PhD, Physics, 2011, Boston College

 Many different techniques are available to create nanopatterns in nanoscale devices. However, a few are flexible and inexpensive enough to be practical in the nanotechnology.… (more)

Subjects/Keywords: Nanosphere lithography

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APA (6th Edition):

Paudel, T. (2011). Nanosphere Lithography for Nano Optical Applications. (Doctoral Dissertation). Boston College. Retrieved from http://dlib.bc.edu/islandora/object/bc-ir:101371

Chicago Manual of Style (16th Edition):

Paudel, Trilochan. “Nanosphere Lithography for Nano Optical Applications.” 2011. Doctoral Dissertation, Boston College. Accessed January 23, 2019. http://dlib.bc.edu/islandora/object/bc-ir:101371.

MLA Handbook (7th Edition):

Paudel, Trilochan. “Nanosphere Lithography for Nano Optical Applications.” 2011. Web. 23 Jan 2019.

Vancouver:

Paudel T. Nanosphere Lithography for Nano Optical Applications. [Internet] [Doctoral dissertation]. Boston College; 2011. [cited 2019 Jan 23]. Available from: http://dlib.bc.edu/islandora/object/bc-ir:101371.

Council of Science Editors:

Paudel T. Nanosphere Lithography for Nano Optical Applications. [Doctoral Dissertation]. Boston College; 2011. Available from: http://dlib.bc.edu/islandora/object/bc-ir:101371


University of Arizona

6. Waddell, George Harry, 1931-. Lithographic illustrations for "The Cry," a poem by Robert Pack .

Degree: 1964, University of Arizona

Subjects/Keywords: Lithography.; Lithography  – Technique.

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APA (6th Edition):

Waddell, George Harry, 1. (1964). Lithographic illustrations for "The Cry," a poem by Robert Pack . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/347485

Chicago Manual of Style (16th Edition):

Waddell, George Harry, 1931-. “Lithographic illustrations for "The Cry," a poem by Robert Pack .” 1964. Masters Thesis, University of Arizona. Accessed January 23, 2019. http://hdl.handle.net/10150/347485.

MLA Handbook (7th Edition):

Waddell, George Harry, 1931-. “Lithographic illustrations for "The Cry," a poem by Robert Pack .” 1964. Web. 23 Jan 2019.

Vancouver:

Waddell, George Harry 1. Lithographic illustrations for "The Cry," a poem by Robert Pack . [Internet] [Masters thesis]. University of Arizona; 1964. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/10150/347485.

Council of Science Editors:

Waddell, George Harry 1. Lithographic illustrations for "The Cry," a poem by Robert Pack . [Masters Thesis]. University of Arizona; 1964. Available from: http://hdl.handle.net/10150/347485


University of Waterloo

7. Con, Celal. Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography.

Degree: 2011, University of Waterloo

 Electron beam lithography (EBL) and Nanoimprint Lithography (NIL) are the promising tools for today’s technology in terms of resolution capability, fidelity and cost of operation.… (more)

Subjects/Keywords: Electron Beam Lithography; Resists; Nanoimprint Lithography

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APA (6th Edition):

Con, C. (2011). Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography. (Thesis). University of Waterloo. Retrieved from http://hdl.handle.net/10012/6212

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Con, Celal. “Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography.” 2011. Thesis, University of Waterloo. Accessed January 23, 2019. http://hdl.handle.net/10012/6212.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Con, Celal. “Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography.” 2011. Web. 23 Jan 2019.

Vancouver:

Con C. Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography. [Internet] [Thesis]. University of Waterloo; 2011. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/10012/6212.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Con C. Design and Characterization of Resist and Mold Materials for Electron-Beam and Nanoimprint Lithography. [Thesis]. University of Waterloo; 2011. Available from: http://hdl.handle.net/10012/6212

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Newcastle

8. Tayefeh Ghalehbeygi, Omid. Exposure planning for scanning laser lithography.

Degree: PhD, 2018, University of Newcastle

Research Doctorate - Doctor of Philosophy (PhD)

Lithography is the process of selectively exposing optically sensitive materials during semiconductor fabrication. One issue with standard projection… (more)

Subjects/Keywords: maskless lithography; optimisation; laser scanning lithography

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APA (6th Edition):

Tayefeh Ghalehbeygi, O. (2018). Exposure planning for scanning laser lithography. (Doctoral Dissertation). University of Newcastle. Retrieved from http://hdl.handle.net/1959.13/1391403

Chicago Manual of Style (16th Edition):

Tayefeh Ghalehbeygi, Omid. “Exposure planning for scanning laser lithography.” 2018. Doctoral Dissertation, University of Newcastle. Accessed January 23, 2019. http://hdl.handle.net/1959.13/1391403.

MLA Handbook (7th Edition):

Tayefeh Ghalehbeygi, Omid. “Exposure planning for scanning laser lithography.” 2018. Web. 23 Jan 2019.

Vancouver:

Tayefeh Ghalehbeygi O. Exposure planning for scanning laser lithography. [Internet] [Doctoral dissertation]. University of Newcastle; 2018. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1959.13/1391403.

Council of Science Editors:

Tayefeh Ghalehbeygi O. Exposure planning for scanning laser lithography. [Doctoral Dissertation]. University of Newcastle; 2018. Available from: http://hdl.handle.net/1959.13/1391403


Texas A&M University

9. Shah, Pratik Jitendra. Case studies on lithography-friendly vlsi circuit layout.

Degree: 2009, Texas A&M University

 Moore?s Law has driven a continuous demand for decreasing feature sizes used in Very Large Scale Integrated (VLSI) technology which has outpaced the solutions offered… (more)

Subjects/Keywords: Lithography; VLSI; layout

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APA (6th Edition):

Shah, P. J. (2009). Case studies on lithography-friendly vlsi circuit layout. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/ETD-TAMU-3120

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Shah, Pratik Jitendra. “Case studies on lithography-friendly vlsi circuit layout.” 2009. Thesis, Texas A&M University. Accessed January 23, 2019. http://hdl.handle.net/1969.1/ETD-TAMU-3120.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Shah, Pratik Jitendra. “Case studies on lithography-friendly vlsi circuit layout.” 2009. Web. 23 Jan 2019.

Vancouver:

Shah PJ. Case studies on lithography-friendly vlsi circuit layout. [Internet] [Thesis]. Texas A&M University; 2009. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-3120.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Shah PJ. Case studies on lithography-friendly vlsi circuit layout. [Thesis]. Texas A&M University; 2009. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-3120

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Chicago

10. Maamari, Khodr. 3D Electron Beam Lithography for Biomedical Applications.

Degree: 2015, University of Illinois – Chicago

 We have developed a new state of the art high aspect ratio 3D fabrication technique based on the electron-beam lithography system (EBL) available at the… (more)

Subjects/Keywords: Electron beam lithography

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APA (6th Edition):

Maamari, K. (2015). 3D Electron Beam Lithography for Biomedical Applications. (Thesis). University of Illinois – Chicago. Retrieved from http://hdl.handle.net/10027/19774

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Maamari, Khodr. “3D Electron Beam Lithography for Biomedical Applications.” 2015. Thesis, University of Illinois – Chicago. Accessed January 23, 2019. http://hdl.handle.net/10027/19774.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Maamari, Khodr. “3D Electron Beam Lithography for Biomedical Applications.” 2015. Web. 23 Jan 2019.

Vancouver:

Maamari K. 3D Electron Beam Lithography for Biomedical Applications. [Internet] [Thesis]. University of Illinois – Chicago; 2015. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/10027/19774.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Maamari K. 3D Electron Beam Lithography for Biomedical Applications. [Thesis]. University of Illinois – Chicago; 2015. Available from: http://hdl.handle.net/10027/19774

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

11. Lafferty, Neal. Evanescent wave assist features for optical projection lithography.

Degree: Microsystems Engineering, 2011, Rochester Institute of Technology

  Evanescent Wave Assist Features (EWAFs) are features that are sensitive to near-field radiation that modify diffracted order intensities from photomask patterns. In implementations studied… (more)

Subjects/Keywords: Evanescent; Lithography; Plasmon

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APA (6th Edition):

Lafferty, N. (2011). Evanescent wave assist features for optical projection lithography. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/7097

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lafferty, Neal. “Evanescent wave assist features for optical projection lithography.” 2011. Thesis, Rochester Institute of Technology. Accessed January 23, 2019. https://scholarworks.rit.edu/theses/7097.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lafferty, Neal. “Evanescent wave assist features for optical projection lithography.” 2011. Web. 23 Jan 2019.

Vancouver:

Lafferty N. Evanescent wave assist features for optical projection lithography. [Internet] [Thesis]. Rochester Institute of Technology; 2011. [cited 2019 Jan 23]. Available from: https://scholarworks.rit.edu/theses/7097.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lafferty N. Evanescent wave assist features for optical projection lithography. [Thesis]. Rochester Institute of Technology; 2011. Available from: https://scholarworks.rit.edu/theses/7097

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Georgia Tech

12. Sharp, Brandon. Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers.

Degree: PhD, Chemistry and Biochemistry, 2018, Georgia Tech

 As feature sizes on integrated circuits (computer chips) continue to decrease in accordance with Moore’s Law, new technologies are needed to maintain pace. Next-generation lithographic… (more)

Subjects/Keywords: Lithography; Molecular resists; Positive tone; Negative tone; Epoxides; Crosslinked resists; EUV lithography; E-beam lithography

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APA (6th Edition):

Sharp, B. (2018). Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/60283

Chicago Manual of Style (16th Edition):

Sharp, Brandon. “Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers.” 2018. Doctoral Dissertation, Georgia Tech. Accessed January 23, 2019. http://hdl.handle.net/1853/60283.

MLA Handbook (7th Edition):

Sharp, Brandon. “Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers.” 2018. Web. 23 Jan 2019.

Vancouver:

Sharp B. Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers. [Internet] [Doctoral dissertation]. Georgia Tech; 2018. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1853/60283.

Council of Science Editors:

Sharp B. Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers. [Doctoral Dissertation]. Georgia Tech; 2018. Available from: http://hdl.handle.net/1853/60283


UCLA

13. Yang, Qing. Scalable Lithographic Approaches for Nanoscale Chemical Patterning and Hierarchical Nanostructure Fabrication.

Degree: Chemistry, 2018, UCLA

 The ability to fabricate materials, structures, devices, and systems with nanometer-scale precision is the key to obtain superior properties and performance. The scalability of lithographic… (more)

Subjects/Keywords: Nanotechnology; Nanoscience; Engineering; Chemical lift-off lithography; Lithography; Nanofabrication; Nanosphere lithography; Nanostructures; Silicon

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APA (6th Edition):

Yang, Q. (2018). Scalable Lithographic Approaches for Nanoscale Chemical Patterning and Hierarchical Nanostructure Fabrication. (Thesis). UCLA. Retrieved from http://www.escholarship.org/uc/item/49m3b18m

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Yang, Qing. “Scalable Lithographic Approaches for Nanoscale Chemical Patterning and Hierarchical Nanostructure Fabrication.” 2018. Thesis, UCLA. Accessed January 23, 2019. http://www.escholarship.org/uc/item/49m3b18m.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Yang, Qing. “Scalable Lithographic Approaches for Nanoscale Chemical Patterning and Hierarchical Nanostructure Fabrication.” 2018. Web. 23 Jan 2019.

Vancouver:

Yang Q. Scalable Lithographic Approaches for Nanoscale Chemical Patterning and Hierarchical Nanostructure Fabrication. [Internet] [Thesis]. UCLA; 2018. [cited 2019 Jan 23]. Available from: http://www.escholarship.org/uc/item/49m3b18m.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Yang Q. Scalable Lithographic Approaches for Nanoscale Chemical Patterning and Hierarchical Nanostructure Fabrication. [Thesis]. UCLA; 2018. Available from: http://www.escholarship.org/uc/item/49m3b18m

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

14. Xiaohui, Cao. Substrate preparation for optimized growth of vertically aligned carbon nanofibers.

Degree: 2010, Chalmers University of Technology

 In order to explore the optimal growth condition of carbon nanofibers on patterned metal on isolating substrate, we employ colloidal lithography to realize the mass… (more)

Subjects/Keywords: carbon nanofibers; TiN; colloidal lithography

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APA (6th Edition):

Xiaohui, C. (2010). Substrate preparation for optimized growth of vertically aligned carbon nanofibers. (Thesis). Chalmers University of Technology. Retrieved from http://studentarbeten.chalmers.se/publication/140334-substrate-preparation-for-optimized-growth-of-vertically-aligned-carbon-nanofibers

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Xiaohui, Cao. “Substrate preparation for optimized growth of vertically aligned carbon nanofibers.” 2010. Thesis, Chalmers University of Technology. Accessed January 23, 2019. http://studentarbeten.chalmers.se/publication/140334-substrate-preparation-for-optimized-growth-of-vertically-aligned-carbon-nanofibers.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Xiaohui, Cao. “Substrate preparation for optimized growth of vertically aligned carbon nanofibers.” 2010. Web. 23 Jan 2019.

Vancouver:

Xiaohui C. Substrate preparation for optimized growth of vertically aligned carbon nanofibers. [Internet] [Thesis]. Chalmers University of Technology; 2010. [cited 2019 Jan 23]. Available from: http://studentarbeten.chalmers.se/publication/140334-substrate-preparation-for-optimized-growth-of-vertically-aligned-carbon-nanofibers.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Xiaohui C. Substrate preparation for optimized growth of vertically aligned carbon nanofibers. [Thesis]. Chalmers University of Technology; 2010. Available from: http://studentarbeten.chalmers.se/publication/140334-substrate-preparation-for-optimized-growth-of-vertically-aligned-carbon-nanofibers

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Texas State University – San Marcos

15. Rezanezhad Gatabi, Javad. Exposure Tool for Lithography on Tilted and Curved Surfaces Using Spatial Light Modulator.

Degree: MS, Materials Physics, 2013, Texas State University – San Marcos

 This thesis is on research to develop a new laser lithography exposure tool for use on non-flat substrates. Such a tool does currently not exists… (more)

Subjects/Keywords: Lithography; Spatial Light Modulator; Laser

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APA (6th Edition):

Rezanezhad Gatabi, J. (2013). Exposure Tool for Lithography on Tilted and Curved Surfaces Using Spatial Light Modulator. (Masters Thesis). Texas State University – San Marcos. Retrieved from https://digital.library.txstate.edu/handle/10877/4724

Chicago Manual of Style (16th Edition):

Rezanezhad Gatabi, Javad. “Exposure Tool for Lithography on Tilted and Curved Surfaces Using Spatial Light Modulator.” 2013. Masters Thesis, Texas State University – San Marcos. Accessed January 23, 2019. https://digital.library.txstate.edu/handle/10877/4724.

MLA Handbook (7th Edition):

Rezanezhad Gatabi, Javad. “Exposure Tool for Lithography on Tilted and Curved Surfaces Using Spatial Light Modulator.” 2013. Web. 23 Jan 2019.

Vancouver:

Rezanezhad Gatabi J. Exposure Tool for Lithography on Tilted and Curved Surfaces Using Spatial Light Modulator. [Internet] [Masters thesis]. Texas State University – San Marcos; 2013. [cited 2019 Jan 23]. Available from: https://digital.library.txstate.edu/handle/10877/4724.

Council of Science Editors:

Rezanezhad Gatabi J. Exposure Tool for Lithography on Tilted and Curved Surfaces Using Spatial Light Modulator. [Masters Thesis]. Texas State University – San Marcos; 2013. Available from: https://digital.library.txstate.edu/handle/10877/4724


University of Alberta

16. Janzen, Alexander Ryan. Fabrication of large area resonator arrays using nanoimprint lithography.

Degree: MS, Department of Electrical and Computer Engineering, 2011, University of Alberta

 This work investigates the use of nanoimprint lithography for creating nanoscale resonator devices for applications in mass sensing. A bilayer resist consisting of PMMA 495/LOR… (more)

Subjects/Keywords: NEMS; lithography; nanotechnology; resonators

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APA (6th Edition):

Janzen, A. R. (2011). Fabrication of large area resonator arrays using nanoimprint lithography. (Masters Thesis). University of Alberta. Retrieved from https://era.library.ualberta.ca/files/q811kk74r

Chicago Manual of Style (16th Edition):

Janzen, Alexander Ryan. “Fabrication of large area resonator arrays using nanoimprint lithography.” 2011. Masters Thesis, University of Alberta. Accessed January 23, 2019. https://era.library.ualberta.ca/files/q811kk74r.

MLA Handbook (7th Edition):

Janzen, Alexander Ryan. “Fabrication of large area resonator arrays using nanoimprint lithography.” 2011. Web. 23 Jan 2019.

Vancouver:

Janzen AR. Fabrication of large area resonator arrays using nanoimprint lithography. [Internet] [Masters thesis]. University of Alberta; 2011. [cited 2019 Jan 23]. Available from: https://era.library.ualberta.ca/files/q811kk74r.

Council of Science Editors:

Janzen AR. Fabrication of large area resonator arrays using nanoimprint lithography. [Masters Thesis]. University of Alberta; 2011. Available from: https://era.library.ualberta.ca/files/q811kk74r


California State University – Sacramento

17. Allen, Dennis Eugene. An investigation of certain commercial offset processes and of their adaptability to public school art curricula.

Degree: MA, Art, 2015, California State University – Sacramento

 The positive values of printmaking in public school education are generally recognized by educators. Block printing (linoleum or wood) and serigraphy (silk-screen), for example, are… (more)

Subjects/Keywords: Lithography – Metal plate processes

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APA (6th Edition):

Allen, D. E. (2015). An investigation of certain commercial offset processes and of their adaptability to public school art curricula. (Masters Thesis). California State University – Sacramento. Retrieved from http://hdl.handle.net/10211.3/140125

Chicago Manual of Style (16th Edition):

Allen, Dennis Eugene. “An investigation of certain commercial offset processes and of their adaptability to public school art curricula.” 2015. Masters Thesis, California State University – Sacramento. Accessed January 23, 2019. http://hdl.handle.net/10211.3/140125.

MLA Handbook (7th Edition):

Allen, Dennis Eugene. “An investigation of certain commercial offset processes and of their adaptability to public school art curricula.” 2015. Web. 23 Jan 2019.

Vancouver:

Allen DE. An investigation of certain commercial offset processes and of their adaptability to public school art curricula. [Internet] [Masters thesis]. California State University – Sacramento; 2015. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/10211.3/140125.

Council of Science Editors:

Allen DE. An investigation of certain commercial offset processes and of their adaptability to public school art curricula. [Masters Thesis]. California State University – Sacramento; 2015. Available from: http://hdl.handle.net/10211.3/140125


Cornell University

18. Lu, Yuerui. Radioisotope-Powered Parallel Electron Lithography: Applications To Solar Cells, Thermo-Opto Mechanical Excitation, Inertial Sensors .

Degree: 2012, Cornell University

 This thesis presents a new potentially low-cost massively parallel electron lithography system, which we term as RadioIsotope-powered Parallel Electron Lithography (RIPEL). We demonstrate its applications… (more)

Subjects/Keywords: nano-lithography; mems; bio-sensor

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APA (6th Edition):

Lu, Y. (2012). Radioisotope-Powered Parallel Electron Lithography: Applications To Solar Cells, Thermo-Opto Mechanical Excitation, Inertial Sensors . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/31188

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lu, Yuerui. “Radioisotope-Powered Parallel Electron Lithography: Applications To Solar Cells, Thermo-Opto Mechanical Excitation, Inertial Sensors .” 2012. Thesis, Cornell University. Accessed January 23, 2019. http://hdl.handle.net/1813/31188.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lu, Yuerui. “Radioisotope-Powered Parallel Electron Lithography: Applications To Solar Cells, Thermo-Opto Mechanical Excitation, Inertial Sensors .” 2012. Web. 23 Jan 2019.

Vancouver:

Lu Y. Radioisotope-Powered Parallel Electron Lithography: Applications To Solar Cells, Thermo-Opto Mechanical Excitation, Inertial Sensors . [Internet] [Thesis]. Cornell University; 2012. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1813/31188.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lu Y. Radioisotope-Powered Parallel Electron Lithography: Applications To Solar Cells, Thermo-Opto Mechanical Excitation, Inertial Sensors . [Thesis]. Cornell University; 2012. Available from: http://hdl.handle.net/1813/31188

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Hong Kong

19. 吴小飞; Wu, Xiaofei. Computational lithography with advanced optimization algorithms.

Degree: PhD, 2016, University of Hong Kong

Lithography techniques have long been the driving power for the advancement of Moore’s law for the semiconductor industry. In recent years, next generation lithog- raphy… (more)

Subjects/Keywords: Mathematical optimization; Lithography; Algorithms

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APA (6th Edition):

吴小飞; Wu, X. (2016). Computational lithography with advanced optimization algorithms. (Doctoral Dissertation). University of Hong Kong. Retrieved from http://hdl.handle.net/10722/238351

Chicago Manual of Style (16th Edition):

吴小飞; Wu, Xiaofei. “Computational lithography with advanced optimization algorithms.” 2016. Doctoral Dissertation, University of Hong Kong. Accessed January 23, 2019. http://hdl.handle.net/10722/238351.

MLA Handbook (7th Edition):

吴小飞; Wu, Xiaofei. “Computational lithography with advanced optimization algorithms.” 2016. Web. 23 Jan 2019.

Vancouver:

吴小飞; Wu X. Computational lithography with advanced optimization algorithms. [Internet] [Doctoral dissertation]. University of Hong Kong; 2016. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/10722/238351.

Council of Science Editors:

吴小飞; Wu X. Computational lithography with advanced optimization algorithms. [Doctoral Dissertation]. University of Hong Kong; 2016. Available from: http://hdl.handle.net/10722/238351


Penn State University

20. Srinivasan, Charan. Hybrid Strategies for Nanolithography and Chemical Patterning.

Degree: PhD, Engineering Science and Mechanics, 2008, Penn State University

 Remarkable technological advances in photolithography have extended patterning to the sub-50-nm regime. However, because photolithography is a top-down approach, it faces substantial technological and economic… (more)

Subjects/Keywords: Lithography; Chemical Patterning; Self-Assembly

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APA (6th Edition):

Srinivasan, C. (2008). Hybrid Strategies for Nanolithography and Chemical Patterning. (Doctoral Dissertation). Penn State University. Retrieved from https://etda.libraries.psu.edu/catalog/8144

Chicago Manual of Style (16th Edition):

Srinivasan, Charan. “Hybrid Strategies for Nanolithography and Chemical Patterning.” 2008. Doctoral Dissertation, Penn State University. Accessed January 23, 2019. https://etda.libraries.psu.edu/catalog/8144.

MLA Handbook (7th Edition):

Srinivasan, Charan. “Hybrid Strategies for Nanolithography and Chemical Patterning.” 2008. Web. 23 Jan 2019.

Vancouver:

Srinivasan C. Hybrid Strategies for Nanolithography and Chemical Patterning. [Internet] [Doctoral dissertation]. Penn State University; 2008. [cited 2019 Jan 23]. Available from: https://etda.libraries.psu.edu/catalog/8144.

Council of Science Editors:

Srinivasan C. Hybrid Strategies for Nanolithography and Chemical Patterning. [Doctoral Dissertation]. Penn State University; 2008. Available from: https://etda.libraries.psu.edu/catalog/8144


Cornell University

21. Taylor, Priscilla. Lithographic Patterning Processes For Organic Electronics And Biomaterials .

Degree: 2011, Cornell University

 Organic electronics is a newly developed field that promises inexpensive, mechanically-flexible, large-area devices. Through the use of solution-processable organic materials, electronic devices can be fabricated… (more)

Subjects/Keywords: Lithography; Organic Electronics; Protein Patterning

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APA (6th Edition):

Taylor, P. (2011). Lithographic Patterning Processes For Organic Electronics And Biomaterials . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/33594

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Taylor, Priscilla. “Lithographic Patterning Processes For Organic Electronics And Biomaterials .” 2011. Thesis, Cornell University. Accessed January 23, 2019. http://hdl.handle.net/1813/33594.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Taylor, Priscilla. “Lithographic Patterning Processes For Organic Electronics And Biomaterials .” 2011. Web. 23 Jan 2019.

Vancouver:

Taylor P. Lithographic Patterning Processes For Organic Electronics And Biomaterials . [Internet] [Thesis]. Cornell University; 2011. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1813/33594.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Taylor P. Lithographic Patterning Processes For Organic Electronics And Biomaterials . [Thesis]. Cornell University; 2011. Available from: http://hdl.handle.net/1813/33594

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Louisiana State University

22. Li, Jie-Ren. Fabrication of nanostructured surfaces with well-defined chemistry using particle lithography.

Degree: PhD, Chemistry, 2009, Louisiana State University

 Natural self-assembly processes provide nanofabrication capabilities for designing surfaces with nanoscale control of surface chemistry and relative orientation of the nanomaterials on the surfaces. Particle… (more)

Subjects/Keywords: Surface Chemistry; Particle Lithography; Nanofabrication

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APA (6th Edition):

Li, J. (2009). Fabrication of nanostructured surfaces with well-defined chemistry using particle lithography. (Doctoral Dissertation). Louisiana State University. Retrieved from etd-04172009-001138 ; https://digitalcommons.lsu.edu/gradschool_dissertations/201

Chicago Manual of Style (16th Edition):

Li, Jie-Ren. “Fabrication of nanostructured surfaces with well-defined chemistry using particle lithography.” 2009. Doctoral Dissertation, Louisiana State University. Accessed January 23, 2019. etd-04172009-001138 ; https://digitalcommons.lsu.edu/gradschool_dissertations/201.

MLA Handbook (7th Edition):

Li, Jie-Ren. “Fabrication of nanostructured surfaces with well-defined chemistry using particle lithography.” 2009. Web. 23 Jan 2019.

Vancouver:

Li J. Fabrication of nanostructured surfaces with well-defined chemistry using particle lithography. [Internet] [Doctoral dissertation]. Louisiana State University; 2009. [cited 2019 Jan 23]. Available from: etd-04172009-001138 ; https://digitalcommons.lsu.edu/gradschool_dissertations/201.

Council of Science Editors:

Li J. Fabrication of nanostructured surfaces with well-defined chemistry using particle lithography. [Doctoral Dissertation]. Louisiana State University; 2009. Available from: etd-04172009-001138 ; https://digitalcommons.lsu.edu/gradschool_dissertations/201


Louisiana State University

23. Lusker, Kathie Lee. Fabrication of Organosilane Nanostructures as Selective Sites for Surface Chemical Reactions.

Degree: PhD, Chemistry, 2011, Louisiana State University

 Naturally self-assembled mesospheres provide a practical route for controlling the arrangement of materials on surfaces at the nanoscale. Periodic arrays of well-defined nanostructures can be… (more)

Subjects/Keywords: lithography; nanopattern; atomic force microscopy

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APA (6th Edition):

Lusker, K. L. (2011). Fabrication of Organosilane Nanostructures as Selective Sites for Surface Chemical Reactions. (Doctoral Dissertation). Louisiana State University. Retrieved from etd-10132011-152121 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1750

Chicago Manual of Style (16th Edition):

Lusker, Kathie Lee. “Fabrication of Organosilane Nanostructures as Selective Sites for Surface Chemical Reactions.” 2011. Doctoral Dissertation, Louisiana State University. Accessed January 23, 2019. etd-10132011-152121 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1750.

MLA Handbook (7th Edition):

Lusker, Kathie Lee. “Fabrication of Organosilane Nanostructures as Selective Sites for Surface Chemical Reactions.” 2011. Web. 23 Jan 2019.

Vancouver:

Lusker KL. Fabrication of Organosilane Nanostructures as Selective Sites for Surface Chemical Reactions. [Internet] [Doctoral dissertation]. Louisiana State University; 2011. [cited 2019 Jan 23]. Available from: etd-10132011-152121 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1750.

Council of Science Editors:

Lusker KL. Fabrication of Organosilane Nanostructures as Selective Sites for Surface Chemical Reactions. [Doctoral Dissertation]. Louisiana State University; 2011. Available from: etd-10132011-152121 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1750


Louisiana State University

24. Plick, William Nicholas. Quantum light for quantum technologies.

Degree: PhD, Physical Sciences and Mathematics, 2010, Louisiana State University

 In this thesis we will theoretically investigate three potentially useful physical systems, after first developing the theoretical framework necessary for studying them. First, we will… (more)

Subjects/Keywords: metrology; quantum optics; lithography; quantum

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APA (6th Edition):

Plick, W. N. (2010). Quantum light for quantum technologies. (Doctoral Dissertation). Louisiana State University. Retrieved from etd-04192010-140026 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1032

Chicago Manual of Style (16th Edition):

Plick, William Nicholas. “Quantum light for quantum technologies.” 2010. Doctoral Dissertation, Louisiana State University. Accessed January 23, 2019. etd-04192010-140026 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1032.

MLA Handbook (7th Edition):

Plick, William Nicholas. “Quantum light for quantum technologies.” 2010. Web. 23 Jan 2019.

Vancouver:

Plick WN. Quantum light for quantum technologies. [Internet] [Doctoral dissertation]. Louisiana State University; 2010. [cited 2019 Jan 23]. Available from: etd-04192010-140026 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1032.

Council of Science Editors:

Plick WN. Quantum light for quantum technologies. [Doctoral Dissertation]. Louisiana State University; 2010. Available from: etd-04192010-140026 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1032


Louisiana State University

25. Kulkarni, Shalaka. Chemically Patterned Surfaces as Test Platforms to Study Magnetic and Solvent-Responsive Properties at the Nanoscale: Investigations Using Scanning Probe Microscopy.

Degree: PhD, Chemistry, 2015, Louisiana State University

 Chemically patterned surfaces were fabricated using a combination of molecular self-assembly and particle lithography to generate billions of nanostructures of organosilane self-assembled monolayers (SAMs). Monodisperse… (more)

Subjects/Keywords: AFM; Particle Lithography; Organosilane nanostructures

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APA (6th Edition):

Kulkarni, S. (2015). Chemically Patterned Surfaces as Test Platforms to Study Magnetic and Solvent-Responsive Properties at the Nanoscale: Investigations Using Scanning Probe Microscopy. (Doctoral Dissertation). Louisiana State University. Retrieved from etd-08202015-221535 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3046

Chicago Manual of Style (16th Edition):

Kulkarni, Shalaka. “Chemically Patterned Surfaces as Test Platforms to Study Magnetic and Solvent-Responsive Properties at the Nanoscale: Investigations Using Scanning Probe Microscopy.” 2015. Doctoral Dissertation, Louisiana State University. Accessed January 23, 2019. etd-08202015-221535 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3046.

MLA Handbook (7th Edition):

Kulkarni, Shalaka. “Chemically Patterned Surfaces as Test Platforms to Study Magnetic and Solvent-Responsive Properties at the Nanoscale: Investigations Using Scanning Probe Microscopy.” 2015. Web. 23 Jan 2019.

Vancouver:

Kulkarni S. Chemically Patterned Surfaces as Test Platforms to Study Magnetic and Solvent-Responsive Properties at the Nanoscale: Investigations Using Scanning Probe Microscopy. [Internet] [Doctoral dissertation]. Louisiana State University; 2015. [cited 2019 Jan 23]. Available from: etd-08202015-221535 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3046.

Council of Science Editors:

Kulkarni S. Chemically Patterned Surfaces as Test Platforms to Study Magnetic and Solvent-Responsive Properties at the Nanoscale: Investigations Using Scanning Probe Microscopy. [Doctoral Dissertation]. Louisiana State University; 2015. Available from: etd-08202015-221535 ; https://digitalcommons.lsu.edu/gradschool_dissertations/3046


Virginia Tech

26. Stoianov, Stefan Vladimirov. Properties modification of nanopatterned surfaces functionalized with photo activated ligands.

Degree: Physics, 2011, Virginia Tech

 This dissertation focuses on four research topics: self-assembly of colloidal nanoparticles, surface modifications of the properties of ionically self-assembled multilayer films, surface enhanced Raman spectroscopy… (more)

Subjects/Keywords: nanosphere lithography; self assembly; SERS

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APA (6th Edition):

Stoianov, S. V. (2011). Properties modification of nanopatterned surfaces functionalized with photo activated ligands. (Thesis). Virginia Tech. Retrieved from http://hdl.handle.net/10919/40434

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Stoianov, Stefan Vladimirov. “Properties modification of nanopatterned surfaces functionalized with photo activated ligands.” 2011. Thesis, Virginia Tech. Accessed January 23, 2019. http://hdl.handle.net/10919/40434.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Stoianov, Stefan Vladimirov. “Properties modification of nanopatterned surfaces functionalized with photo activated ligands.” 2011. Web. 23 Jan 2019.

Vancouver:

Stoianov SV. Properties modification of nanopatterned surfaces functionalized with photo activated ligands. [Internet] [Thesis]. Virginia Tech; 2011. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/10919/40434.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Stoianov SV. Properties modification of nanopatterned surfaces functionalized with photo activated ligands. [Thesis]. Virginia Tech; 2011. Available from: http://hdl.handle.net/10919/40434

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Cornell University

27. Yu, Mufei. Study Of The Effects Of Ligands On Positive And Negative Tone Oxide Nanoparticle Photoresists .

Degree: 2015, Cornell University

 Motivated by Moore's law, hybrid nanoparticle photoresists composed of metal oxide (ZrO2 and HfO2) and carboxylic acid ligands have been developed as a novel resist… (more)

Subjects/Keywords: nanoparticle; photoresist; EUV lithography

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APA (6th Edition):

Yu, M. (2015). Study Of The Effects Of Ligands On Positive And Negative Tone Oxide Nanoparticle Photoresists . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/40988

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Yu, Mufei. “Study Of The Effects Of Ligands On Positive And Negative Tone Oxide Nanoparticle Photoresists .” 2015. Thesis, Cornell University. Accessed January 23, 2019. http://hdl.handle.net/1813/40988.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Yu, Mufei. “Study Of The Effects Of Ligands On Positive And Negative Tone Oxide Nanoparticle Photoresists .” 2015. Web. 23 Jan 2019.

Vancouver:

Yu M. Study Of The Effects Of Ligands On Positive And Negative Tone Oxide Nanoparticle Photoresists . [Internet] [Thesis]. Cornell University; 2015. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1813/40988.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Yu M. Study Of The Effects Of Ligands On Positive And Negative Tone Oxide Nanoparticle Photoresists . [Thesis]. Cornell University; 2015. Available from: http://hdl.handle.net/1813/40988

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Cornell University

28. Jiang, Jing. Organic Inorganic Photoresist And Laser Induced Heating Process For Next Generation Lithography .

Degree: 2015, Cornell University

 What technology will enable lithography to continue Moore's law beyond 10 nm node? Traditional photolithography, using a 193 nm wavelength and chemically amplified resist (CAR),… (more)

Subjects/Keywords: Lithography; polymer; laser induced heating

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APA (6th Edition):

Jiang, J. (2015). Organic Inorganic Photoresist And Laser Induced Heating Process For Next Generation Lithography . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/41105

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Jiang, Jing. “Organic Inorganic Photoresist And Laser Induced Heating Process For Next Generation Lithography .” 2015. Thesis, Cornell University. Accessed January 23, 2019. http://hdl.handle.net/1813/41105.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Jiang, Jing. “Organic Inorganic Photoresist And Laser Induced Heating Process For Next Generation Lithography .” 2015. Web. 23 Jan 2019.

Vancouver:

Jiang J. Organic Inorganic Photoresist And Laser Induced Heating Process For Next Generation Lithography . [Internet] [Thesis]. Cornell University; 2015. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1813/41105.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Jiang J. Organic Inorganic Photoresist And Laser Induced Heating Process For Next Generation Lithography . [Thesis]. Cornell University; 2015. Available from: http://hdl.handle.net/1813/41105

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Cornell University

29. Pinge, Shubham. Mesoscale Modeling Of Directed Self Assemblies Of Block Copolymer Lithography .

Degree: 2016, Cornell University

 Block copolymers (BCPs) self organize at molecular level building blocks and forming nano-structures with characteristic length scales. As these nano-structures resemble the lithographic features desired… (more)

Subjects/Keywords: Block Copolymers; Lithography; Molecular Dynamics

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APA (6th Edition):

Pinge, S. (2016). Mesoscale Modeling Of Directed Self Assemblies Of Block Copolymer Lithography . (Thesis). Cornell University. Retrieved from http://hdl.handle.net/1813/43701

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Pinge, Shubham. “Mesoscale Modeling Of Directed Self Assemblies Of Block Copolymer Lithography .” 2016. Thesis, Cornell University. Accessed January 23, 2019. http://hdl.handle.net/1813/43701.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Pinge, Shubham. “Mesoscale Modeling Of Directed Self Assemblies Of Block Copolymer Lithography .” 2016. Web. 23 Jan 2019.

Vancouver:

Pinge S. Mesoscale Modeling Of Directed Self Assemblies Of Block Copolymer Lithography . [Internet] [Thesis]. Cornell University; 2016. [cited 2019 Jan 23]. Available from: http://hdl.handle.net/1813/43701.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Pinge S. Mesoscale Modeling Of Directed Self Assemblies Of Block Copolymer Lithography . [Thesis]. Cornell University; 2016. Available from: http://hdl.handle.net/1813/43701

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Delft University of Technology

30. Shen, J. Novel Application of Imprinting Lithography for Multi-bit Ferroelectric Memories:.

Degree: 2011, Delft University of Technology

 This thesis is about an innovative application of nanoimprinting lithography in organic ferroelectric memories, which can achieve multi-bit data storage. Multi-bit data storage, defined here… (more)

Subjects/Keywords: nano-imprinting lithography; ferroelectric memory

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APA (6th Edition):

Shen, J. (2011). Novel Application of Imprinting Lithography for Multi-bit Ferroelectric Memories:. (Masters Thesis). Delft University of Technology. Retrieved from http://resolver.tudelft.nl/uuid:c18aa375-3ef5-4ce8-a572-14aee1141e5a

Chicago Manual of Style (16th Edition):

Shen, J. “Novel Application of Imprinting Lithography for Multi-bit Ferroelectric Memories:.” 2011. Masters Thesis, Delft University of Technology. Accessed January 23, 2019. http://resolver.tudelft.nl/uuid:c18aa375-3ef5-4ce8-a572-14aee1141e5a.

MLA Handbook (7th Edition):

Shen, J. “Novel Application of Imprinting Lithography for Multi-bit Ferroelectric Memories:.” 2011. Web. 23 Jan 2019.

Vancouver:

Shen J. Novel Application of Imprinting Lithography for Multi-bit Ferroelectric Memories:. [Internet] [Masters thesis]. Delft University of Technology; 2011. [cited 2019 Jan 23]. Available from: http://resolver.tudelft.nl/uuid:c18aa375-3ef5-4ce8-a572-14aee1141e5a.

Council of Science Editors:

Shen J. Novel Application of Imprinting Lithography for Multi-bit Ferroelectric Memories:. [Masters Thesis]. Delft University of Technology; 2011. Available from: http://resolver.tudelft.nl/uuid:c18aa375-3ef5-4ce8-a572-14aee1141e5a

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