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You searched for subject:(Etching). Showing records 1 – 30 of 687 total matches.

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Rochester Institute of Technology

1. Bennett, Sulyn. Conflict within the continuum.

Degree: School of Art (CIAS), 1997, Rochester Institute of Technology

None provided. Advisors/Committee Members: Williams, Judd, Vadja, Kathy, Slutzky, Jack.

Subjects/Keywords: Etching

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APA (6th Edition):

Bennett, S. (1997). Conflict within the continuum. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/3611

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Bennett, Sulyn. “Conflict within the continuum.” 1997. Thesis, Rochester Institute of Technology. Accessed April 23, 2019. https://scholarworks.rit.edu/theses/3611.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Bennett, Sulyn. “Conflict within the continuum.” 1997. Web. 23 Apr 2019.

Vancouver:

Bennett S. Conflict within the continuum. [Internet] [Thesis]. Rochester Institute of Technology; 1997. [cited 2019 Apr 23]. Available from: https://scholarworks.rit.edu/theses/3611.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Bennett S. Conflict within the continuum. [Thesis]. Rochester Institute of Technology; 1997. Available from: https://scholarworks.rit.edu/theses/3611

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Houston

2. Zhu, Weiye 1987-. Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching.

Degree: Chemical and Biomolecular Engineering, Department of, 2014, University of Houston

 Precise control of ion energy distribution (IED) is critical to achieve highly selective, low damage etching. A novel approach to control IED using pulsed plasma… (more)

Subjects/Keywords: Plasma etching; IED; photo-assisted etching; EEDF

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APA (6th Edition):

Zhu, W. 1. (2014). Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching. (Thesis). University of Houston. Retrieved from http://hdl.handle.net/10657/1385

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Zhu, Weiye 1987-. “Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching.” 2014. Thesis, University of Houston. Accessed April 23, 2019. http://hdl.handle.net/10657/1385.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Zhu, Weiye 1987-. “Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching.” 2014. Web. 23 Apr 2019.

Vancouver:

Zhu W1. Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching. [Internet] [Thesis]. University of Houston; 2014. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10657/1385.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Zhu W1. Advanced Control of Ion and Electron Energy Distributions and Investigation of in-situ Photo-Assisted Etching. [Thesis]. University of Houston; 2014. Available from: http://hdl.handle.net/10657/1385

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Urbana-Champaign

3. Sawyer, Adam R. Fabrication of nanofluidic devices using electrochemical etching of sacrificial copper.

Degree: MS, 0133, 2010, University of Illinois – Urbana-Champaign

 Micro- and nanoscale mechanical systems provide unique capabilities for analyzing fluid samples in chemical and biological research. A method of creating nanofluidic systems with integrated… (more)

Subjects/Keywords: microfluidics; nanofluidics; electrochemical etching; copper etching

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APA (6th Edition):

Sawyer, A. R. (2010). Fabrication of nanofluidic devices using electrochemical etching of sacrificial copper. (Thesis). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/16235

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Sawyer, Adam R. “Fabrication of nanofluidic devices using electrochemical etching of sacrificial copper.” 2010. Thesis, University of Illinois – Urbana-Champaign. Accessed April 23, 2019. http://hdl.handle.net/2142/16235.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Sawyer, Adam R. “Fabrication of nanofluidic devices using electrochemical etching of sacrificial copper.” 2010. Web. 23 Apr 2019.

Vancouver:

Sawyer AR. Fabrication of nanofluidic devices using electrochemical etching of sacrificial copper. [Internet] [Thesis]. University of Illinois – Urbana-Champaign; 2010. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/2142/16235.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Sawyer AR. Fabrication of nanofluidic devices using electrochemical etching of sacrificial copper. [Thesis]. University of Illinois – Urbana-Champaign; 2010. Available from: http://hdl.handle.net/2142/16235

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Hong Kong

4. 贾宁宁.; Jia, Ningning. Optimization schemes for process robustness enhancement in optical lithography.

Degree: PhD, 2011, University of Hong Kong

published_or_final_version

Electrical and Electronic Engineering

Doctoral

Doctor of Philosophy

Advisors/Committee Members: Lam, EYM.

Subjects/Keywords: Microlithography.; Semiconductors - Etching.

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APA (6th Edition):

贾宁宁.; Jia, N. (2011). Optimization schemes for process robustness enhancement in optical lithography. (Doctoral Dissertation). University of Hong Kong. Retrieved from Jia, N. [贾宁宁]. (2011). Optimization schemes for process robustness enhancement in optical lithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4702859 ; http://dx.doi.org/10.5353/th_b4702859 ; http://hdl.handle.net/10722/144791

Chicago Manual of Style (16th Edition):

贾宁宁.; Jia, Ningning. “Optimization schemes for process robustness enhancement in optical lithography.” 2011. Doctoral Dissertation, University of Hong Kong. Accessed April 23, 2019. Jia, N. [贾宁宁]. (2011). Optimization schemes for process robustness enhancement in optical lithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4702859 ; http://dx.doi.org/10.5353/th_b4702859 ; http://hdl.handle.net/10722/144791.

MLA Handbook (7th Edition):

贾宁宁.; Jia, Ningning. “Optimization schemes for process robustness enhancement in optical lithography.” 2011. Web. 23 Apr 2019.

Vancouver:

贾宁宁.; Jia N. Optimization schemes for process robustness enhancement in optical lithography. [Internet] [Doctoral dissertation]. University of Hong Kong; 2011. [cited 2019 Apr 23]. Available from: Jia, N. [贾宁宁]. (2011). Optimization schemes for process robustness enhancement in optical lithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4702859 ; http://dx.doi.org/10.5353/th_b4702859 ; http://hdl.handle.net/10722/144791.

Council of Science Editors:

贾宁宁.; Jia N. Optimization schemes for process robustness enhancement in optical lithography. [Doctoral Dissertation]. University of Hong Kong; 2011. Available from: Jia, N. [贾宁宁]. (2011). Optimization schemes for process robustness enhancement in optical lithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4702859 ; http://dx.doi.org/10.5353/th_b4702859 ; http://hdl.handle.net/10722/144791


UCLA

5. Altieri, Nicholas Dominic. Atomic Layer Etching of Magnetic and Noble Metals.

Degree: Chemical Engineering, 2018, UCLA

 This work has focused on the study and development of atomic layer etching for metallic and intermetallic thin films commonly used in front and back… (more)

Subjects/Keywords: Chemical engineering; atomic layer etching; interconnect; magnetic metal; noble metal; plasma etching; reactive ion etching

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APA (6th Edition):

Altieri, N. D. (2018). Atomic Layer Etching of Magnetic and Noble Metals. (Thesis). UCLA. Retrieved from http://www.escholarship.org/uc/item/28m072gc

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Altieri, Nicholas Dominic. “Atomic Layer Etching of Magnetic and Noble Metals.” 2018. Thesis, UCLA. Accessed April 23, 2019. http://www.escholarship.org/uc/item/28m072gc.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Altieri, Nicholas Dominic. “Atomic Layer Etching of Magnetic and Noble Metals.” 2018. Web. 23 Apr 2019.

Vancouver:

Altieri ND. Atomic Layer Etching of Magnetic and Noble Metals. [Internet] [Thesis]. UCLA; 2018. [cited 2019 Apr 23]. Available from: http://www.escholarship.org/uc/item/28m072gc.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Altieri ND. Atomic Layer Etching of Magnetic and Noble Metals. [Thesis]. UCLA; 2018. Available from: http://www.escholarship.org/uc/item/28m072gc

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Western Australia

6. Jiang, Fei. Technologies for all-optical micro-electro-mechanical systems cantilever-based sensing systems.

Degree: PhD, 2012, University of Western Australia

[Truncated abstract] This thesis considers a sensing technology for simultaneous measurement of many integrated cantilever sensors in which the displacement or resonant frequency changes induced… (more)

Subjects/Keywords: MEMS; SOI; Etching; Photonics

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APA (6th Edition):

Jiang, F. (2012). Technologies for all-optical micro-electro-mechanical systems cantilever-based sensing systems. (Doctoral Dissertation). University of Western Australia. Retrieved from http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=34588&local_base=GEN01-INS01

Chicago Manual of Style (16th Edition):

Jiang, Fei. “Technologies for all-optical micro-electro-mechanical systems cantilever-based sensing systems.” 2012. Doctoral Dissertation, University of Western Australia. Accessed April 23, 2019. http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=34588&local_base=GEN01-INS01.

MLA Handbook (7th Edition):

Jiang, Fei. “Technologies for all-optical micro-electro-mechanical systems cantilever-based sensing systems.” 2012. Web. 23 Apr 2019.

Vancouver:

Jiang F. Technologies for all-optical micro-electro-mechanical systems cantilever-based sensing systems. [Internet] [Doctoral dissertation]. University of Western Australia; 2012. [cited 2019 Apr 23]. Available from: http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=34588&local_base=GEN01-INS01.

Council of Science Editors:

Jiang F. Technologies for all-optical micro-electro-mechanical systems cantilever-based sensing systems. [Doctoral Dissertation]. University of Western Australia; 2012. Available from: http://repository.uwa.edu.au:80/R/?func=dbin-jump-full&object_id=34588&local_base=GEN01-INS01


Oregon State University

7. Venkataraman, Arjun. Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures.

Degree: MS, Chemical Engineering, 2004, Oregon State University

Subjects/Keywords: Plasma etching

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APA (6th Edition):

Venkataraman, A. (2004). Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures. (Masters Thesis). Oregon State University. Retrieved from http://hdl.handle.net/1957/29838

Chicago Manual of Style (16th Edition):

Venkataraman, Arjun. “Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures.” 2004. Masters Thesis, Oregon State University. Accessed April 23, 2019. http://hdl.handle.net/1957/29838.

MLA Handbook (7th Edition):

Venkataraman, Arjun. “Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures.” 2004. Web. 23 Apr 2019.

Vancouver:

Venkataraman A. Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures. [Internet] [Masters thesis]. Oregon State University; 2004. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/1957/29838.

Council of Science Editors:

Venkataraman A. Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures. [Masters Thesis]. Oregon State University; 2004. Available from: http://hdl.handle.net/1957/29838


Hong Kong University of Science and Technology

8. Zhang, Jingcheng. Processing of hierarchical topography on titanium substrate.

Degree: 2014, Hong Kong University of Science and Technology

 Biomaterial implants have attracted increasing attention in the past few decades in the healthcare field, for the increasing demands for regenerative medicine and the serious… (more)

Subjects/Keywords: Biomedical materials; Surfaces; Etching; Titanium

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APA (6th Edition):

Zhang, J. (2014). Processing of hierarchical topography on titanium substrate. (Thesis). Hong Kong University of Science and Technology. Retrieved from https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Zhang, Jingcheng. “Processing of hierarchical topography on titanium substrate.” 2014. Thesis, Hong Kong University of Science and Technology. Accessed April 23, 2019. https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Zhang, Jingcheng. “Processing of hierarchical topography on titanium substrate.” 2014. Web. 23 Apr 2019.

Vancouver:

Zhang J. Processing of hierarchical topography on titanium substrate. [Internet] [Thesis]. Hong Kong University of Science and Technology; 2014. [cited 2019 Apr 23]. Available from: https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Zhang J. Processing of hierarchical topography on titanium substrate. [Thesis]. Hong Kong University of Science and Technology; 2014. Available from: https://doi.org/10.14711/thesis-b1333615 ; http://repository.ust.hk/ir/bitstream/1783.1-70860/1/th_redirect.html

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Louisiana State University

9. Narayanan, Purnima. Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100).

Degree: MSChE, Chemical Engineering, 2011, Louisiana State University

 Three-dimensional integration techniques have become increasingly popular to meet the ever rising demand of high capacity and reduced package size in microelectronics devices. Through Silicon… (more)

Subjects/Keywords: PHOTOELECTROCHEMICAL ETCHING; MICROSTRUCTURES; SILICON

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APA (6th Edition):

Narayanan, P. (2011). Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100). (Masters Thesis). Louisiana State University. Retrieved from etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273

Chicago Manual of Style (16th Edition):

Narayanan, Purnima. “Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100).” 2011. Masters Thesis, Louisiana State University. Accessed April 23, 2019. etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273.

MLA Handbook (7th Edition):

Narayanan, Purnima. “Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100).” 2011. Web. 23 Apr 2019.

Vancouver:

Narayanan P. Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100). [Internet] [Masters thesis]. Louisiana State University; 2011. [cited 2019 Apr 23]. Available from: etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273.

Council of Science Editors:

Narayanan P. Photoelectrochemical etching of isolated, high aspect ratio micorstructures in n-type silicon (100). [Masters Thesis]. Louisiana State University; 2011. Available from: etd-06112011-104922 ; https://digitalcommons.lsu.edu/gradschool_theses/4273


University of Arizona

10. O'Connell, Ryan. COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge .

Degree: 2018, University of Arizona

 In semiconductor manufacturing, the miniaturization of devices has always been a strong driving force in the industry. Making the individual transistors smaller makes it possible… (more)

Subjects/Keywords: Chemistry; COMSOL; Etching; Materials; Modeling

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APA (6th Edition):

O'Connell, R. (2018). COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/630136

Chicago Manual of Style (16th Edition):

O'Connell, Ryan. “COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge .” 2018. Masters Thesis, University of Arizona. Accessed April 23, 2019. http://hdl.handle.net/10150/630136.

MLA Handbook (7th Edition):

O'Connell, Ryan. “COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge .” 2018. Web. 23 Apr 2019.

Vancouver:

O'Connell R. COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge . [Internet] [Masters thesis]. University of Arizona; 2018. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10150/630136.

Council of Science Editors:

O'Connell R. COMSOL Multiphysics Simulations of Wet Etching of High-Aspect-Ratio Structures with Surface Charge . [Masters Thesis]. University of Arizona; 2018. Available from: http://hdl.handle.net/10150/630136


University of Arizona

11. Souden, James Gabriel, 1917-. A search for more brilliant color in the etching print .

Degree: 1953, University of Arizona

Subjects/Keywords: Etching.; Color.

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APA (6th Edition):

Souden, James Gabriel, 1. (1953). A search for more brilliant color in the etching print . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/319110

Chicago Manual of Style (16th Edition):

Souden, James Gabriel, 1917-. “A search for more brilliant color in the etching print .” 1953. Masters Thesis, University of Arizona. Accessed April 23, 2019. http://hdl.handle.net/10150/319110.

MLA Handbook (7th Edition):

Souden, James Gabriel, 1917-. “A search for more brilliant color in the etching print .” 1953. Web. 23 Apr 2019.

Vancouver:

Souden, James Gabriel 1. A search for more brilliant color in the etching print . [Internet] [Masters thesis]. University of Arizona; 1953. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10150/319110.

Council of Science Editors:

Souden, James Gabriel 1. A search for more brilliant color in the etching print . [Masters Thesis]. University of Arizona; 1953. Available from: http://hdl.handle.net/10150/319110


University of Houston

12. Sridhar, Shyam. Photo-Assisted Etching in Halogen Containing Plasmas.

Degree: Chemical and Biomolecular Engineering, Department of, 2016, University of Houston

 Plasma etching is indispensable in microelectronics manufacturing, due to its ability to precisely pattern feature with lateral dimensions of <10 nm. To advance this capability… (more)

Subjects/Keywords: Photo Assisted Etching; Plasma

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APA (6th Edition):

Sridhar, S. (2016). Photo-Assisted Etching in Halogen Containing Plasmas. (Thesis). University of Houston. Retrieved from http://hdl.handle.net/10657/3626

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Sridhar, Shyam. “Photo-Assisted Etching in Halogen Containing Plasmas.” 2016. Thesis, University of Houston. Accessed April 23, 2019. http://hdl.handle.net/10657/3626.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Sridhar, Shyam. “Photo-Assisted Etching in Halogen Containing Plasmas.” 2016. Web. 23 Apr 2019.

Vancouver:

Sridhar S. Photo-Assisted Etching in Halogen Containing Plasmas. [Internet] [Thesis]. University of Houston; 2016. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10657/3626.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Sridhar S. Photo-Assisted Etching in Halogen Containing Plasmas. [Thesis]. University of Houston; 2016. Available from: http://hdl.handle.net/10657/3626

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Oregon State University

13. Hsu, Chia-Chang. Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma.

Degree: PhD, Chemical Engineering, 1999, Oregon State University

Subjects/Keywords: Plasma etching

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APA (6th Edition):

Hsu, C. (1999). Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma. (Doctoral Dissertation). Oregon State University. Retrieved from http://hdl.handle.net/1957/33505

Chicago Manual of Style (16th Edition):

Hsu, Chia-Chang. “Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma.” 1999. Doctoral Dissertation, Oregon State University. Accessed April 23, 2019. http://hdl.handle.net/1957/33505.

MLA Handbook (7th Edition):

Hsu, Chia-Chang. “Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma.” 1999. Web. 23 Apr 2019.

Vancouver:

Hsu C. Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma. [Internet] [Doctoral dissertation]. Oregon State University; 1999. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/1957/33505.

Council of Science Editors:

Hsu C. Etch products dynamics of polyphenylene oxide laminates using a CF₄/O₂/Ar downstream microwave plasma. [Doctoral Dissertation]. Oregon State University; 1999. Available from: http://hdl.handle.net/1957/33505


University of North Texas

14. Lambert, Alexander S. Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths.

Degree: 2017, University of North Texas

 The continuously increasing demand for innovation in the miniaturization of microelectronics has driven the need for ever more precise fabrication strategies for device packaging, especially… (more)

Subjects/Keywords: Cu Etching; UV-Vis Spectroscopy

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APA (6th Edition):

Lambert, A. S. (2017). Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc1011880/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lambert, Alexander S. “Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths.” 2017. Thesis, University of North Texas. Accessed April 23, 2019. https://digital.library.unt.edu/ark:/67531/metadc1011880/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lambert, Alexander S. “Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths.” 2017. Web. 23 Apr 2019.

Vancouver:

Lambert AS. Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths. [Internet] [Thesis]. University of North Texas; 2017. [cited 2019 Apr 23]. Available from: https://digital.library.unt.edu/ark:/67531/metadc1011880/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lambert AS. Application of UV-Vis Spectroscopy to the Monitoring, Characterization and Analysis of Chemical Equilibria of Copper Etching Baths. [Thesis]. University of North Texas; 2017. Available from: https://digital.library.unt.edu/ark:/67531/metadc1011880/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of North Texas

15. Jones, Jason David. Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning.

Degree: 2012, University of North Texas

 In this dissertation, I present the mechanism of graphene hydrogenation via three different electron sources: scanning electron microscopy, e-beam irradiation and H2 and He plasma… (more)

Subjects/Keywords: Thinning,etching; grapheme; graphane; hydrogenation

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APA (6th Edition):

Jones, J. D. (2012). Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc115101/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Jones, Jason David. “Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning.” 2012. Thesis, University of North Texas. Accessed April 23, 2019. https://digital.library.unt.edu/ark:/67531/metadc115101/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Jones, Jason David. “Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning.” 2012. Web. 23 Apr 2019.

Vancouver:

Jones JD. Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning. [Internet] [Thesis]. University of North Texas; 2012. [cited 2019 Apr 23]. Available from: https://digital.library.unt.edu/ark:/67531/metadc115101/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Jones JD. Modification of Graphene Properties: Electron Induced Reversible Hydrogenation, Oxidative Etching and Layer-by-layer Thinning. [Thesis]. University of North Texas; 2012. Available from: https://digital.library.unt.edu/ark:/67531/metadc115101/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Stellenbosch University

16. Buttner, Ulrich. The development of equipment for the fabrication of thin film superconductor and nano structures.

Degree: Electrical and Electronic Engineering, 2011, Stellenbosch University

Thesis (MScEng (Electrical and Electronic Engineering)) – University of Stellenbosch, 2011.

ENGLISH ABSTRACT: The nano-age is more about the mesoscopic phenomena, than those occurring at molecular… (more)

Subjects/Keywords: Electronic engineering; Nanotechnology; Dry etching

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APA (6th Edition):

Buttner, U. (2011). The development of equipment for the fabrication of thin film superconductor and nano structures. (Thesis). Stellenbosch University. Retrieved from http://hdl.handle.net/10019.1/6595

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Buttner, Ulrich. “The development of equipment for the fabrication of thin film superconductor and nano structures.” 2011. Thesis, Stellenbosch University. Accessed April 23, 2019. http://hdl.handle.net/10019.1/6595.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Buttner, Ulrich. “The development of equipment for the fabrication of thin film superconductor and nano structures.” 2011. Web. 23 Apr 2019.

Vancouver:

Buttner U. The development of equipment for the fabrication of thin film superconductor and nano structures. [Internet] [Thesis]. Stellenbosch University; 2011. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10019.1/6595.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Buttner U. The development of equipment for the fabrication of thin film superconductor and nano structures. [Thesis]. Stellenbosch University; 2011. Available from: http://hdl.handle.net/10019.1/6595

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Minnesota

17. Liptak, Richard William. In-flight gas phase passivation of silicon nanocrystals for novel inorganic-silicon nanocrystal based electroluminescent devices.

Degree: PhD, Electrical Engineering, 2009, University of Minnesota

 Silicon nanocrystals (SiNCs) have become a heavily researched material over the past several years. Researchers envision that this material can be used in many diverse… (more)

Subjects/Keywords: Devices; Etching; Nanocrystals; Passivation; Silicon

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APA (6th Edition):

Liptak, R. W. (2009). In-flight gas phase passivation of silicon nanocrystals for novel inorganic-silicon nanocrystal based electroluminescent devices. (Doctoral Dissertation). University of Minnesota. Retrieved from http://purl.umn.edu/57226

Chicago Manual of Style (16th Edition):

Liptak, Richard William. “In-flight gas phase passivation of silicon nanocrystals for novel inorganic-silicon nanocrystal based electroluminescent devices.” 2009. Doctoral Dissertation, University of Minnesota. Accessed April 23, 2019. http://purl.umn.edu/57226.

MLA Handbook (7th Edition):

Liptak, Richard William. “In-flight gas phase passivation of silicon nanocrystals for novel inorganic-silicon nanocrystal based electroluminescent devices.” 2009. Web. 23 Apr 2019.

Vancouver:

Liptak RW. In-flight gas phase passivation of silicon nanocrystals for novel inorganic-silicon nanocrystal based electroluminescent devices. [Internet] [Doctoral dissertation]. University of Minnesota; 2009. [cited 2019 Apr 23]. Available from: http://purl.umn.edu/57226.

Council of Science Editors:

Liptak RW. In-flight gas phase passivation of silicon nanocrystals for novel inorganic-silicon nanocrystal based electroluminescent devices. [Doctoral Dissertation]. University of Minnesota; 2009. Available from: http://purl.umn.edu/57226


University of Arizona

18. Morrish, Rachel Marie. Synthesis of Nanostructured Materials by Etching in Supercritical Carbon Dioxide .

Degree: 2009, University of Arizona

 Supercritical CO₂ (scCO₂) is emerging as a viable and environmentally sustainable platform for nanomaterials synthesis due to its tunable solvent properties combined with low surface… (more)

Subjects/Keywords: etching; supercritical C02; thin films

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APA (6th Edition):

Morrish, R. M. (2009). Synthesis of Nanostructured Materials by Etching in Supercritical Carbon Dioxide . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/194127

Chicago Manual of Style (16th Edition):

Morrish, Rachel Marie. “Synthesis of Nanostructured Materials by Etching in Supercritical Carbon Dioxide .” 2009. Doctoral Dissertation, University of Arizona. Accessed April 23, 2019. http://hdl.handle.net/10150/194127.

MLA Handbook (7th Edition):

Morrish, Rachel Marie. “Synthesis of Nanostructured Materials by Etching in Supercritical Carbon Dioxide .” 2009. Web. 23 Apr 2019.

Vancouver:

Morrish RM. Synthesis of Nanostructured Materials by Etching in Supercritical Carbon Dioxide . [Internet] [Doctoral dissertation]. University of Arizona; 2009. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10150/194127.

Council of Science Editors:

Morrish RM. Synthesis of Nanostructured Materials by Etching in Supercritical Carbon Dioxide . [Doctoral Dissertation]. University of Arizona; 2009. Available from: http://hdl.handle.net/10150/194127


University of Tasmania

19. Rees-Pagh, YD. Printmaking and the language of violence.

Degree: 2013, University of Tasmania

 The aim of the project is to demonstrate that the traditional processes of printmaking, in particular etching, are relevant as a medium for artistic engagement… (more)

Subjects/Keywords: Printmaking; etching; violence; racism; Cronulla

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APA (6th Edition):

Rees-Pagh, Y. (2013). Printmaking and the language of violence. (Thesis). University of Tasmania. Retrieved from https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Rees-Pagh, YD. “Printmaking and the language of violence.” 2013. Thesis, University of Tasmania. Accessed April 23, 2019. https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Rees-Pagh, YD. “Printmaking and the language of violence.” 2013. Web. 23 Apr 2019.

Vancouver:

Rees-Pagh Y. Printmaking and the language of violence. [Internet] [Thesis]. University of Tasmania; 2013. [cited 2019 Apr 23]. Available from: https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Rees-Pagh Y. Printmaking and the language of violence. [Thesis]. University of Tasmania; 2013. Available from: https://eprints.utas.edu.au/17119/2/Whole-_Rees-Pagh-thesis-2013.pdf ; https://eprints.utas.edu.au/17119/7/YVONNE%20REES-PAGH%20PhD%20Thesis%20Images%202013.zip

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Colorado State University

20. Conley, Allison. Psychosomatic condition : prints as symptoms, A.

Degree: Master of Fine Arts (M.F.A.), Art and Art History, 2015, Colorado State University

 To transcend my standard way of art making, I have revoked all intent or previous purpose. I work intuitively, reacting to each mark as it… (more)

Subjects/Keywords: intaglio; printmaking; lithography; etching

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APA (6th Edition):

Conley, A. (2015). Psychosomatic condition : prints as symptoms, A. (Masters Thesis). Colorado State University. Retrieved from http://hdl.handle.net/10217/167033

Chicago Manual of Style (16th Edition):

Conley, Allison. “Psychosomatic condition : prints as symptoms, A.” 2015. Masters Thesis, Colorado State University. Accessed April 23, 2019. http://hdl.handle.net/10217/167033.

MLA Handbook (7th Edition):

Conley, Allison. “Psychosomatic condition : prints as symptoms, A.” 2015. Web. 23 Apr 2019.

Vancouver:

Conley A. Psychosomatic condition : prints as symptoms, A. [Internet] [Masters thesis]. Colorado State University; 2015. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10217/167033.

Council of Science Editors:

Conley A. Psychosomatic condition : prints as symptoms, A. [Masters Thesis]. Colorado State University; 2015. Available from: http://hdl.handle.net/10217/167033


Rochester Institute of Technology

21. O'Connell, Christopher. An Etching Study for Self-Aligned Double Patterning.

Degree: MS, Microelectronic Engineering, 2018, Rochester Institute of Technology

  A proposed process flow for a complete FinFET etch module is presented as well as experiments to ensure that the target films are etched… (more)

Subjects/Keywords: Dry etching; MERIE; RIE; SADP

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APA (6th Edition):

O'Connell, C. (2018). An Etching Study for Self-Aligned Double Patterning. (Masters Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/9906

Chicago Manual of Style (16th Edition):

O'Connell, Christopher. “An Etching Study for Self-Aligned Double Patterning.” 2018. Masters Thesis, Rochester Institute of Technology. Accessed April 23, 2019. https://scholarworks.rit.edu/theses/9906.

MLA Handbook (7th Edition):

O'Connell, Christopher. “An Etching Study for Self-Aligned Double Patterning.” 2018. Web. 23 Apr 2019.

Vancouver:

O'Connell C. An Etching Study for Self-Aligned Double Patterning. [Internet] [Masters thesis]. Rochester Institute of Technology; 2018. [cited 2019 Apr 23]. Available from: https://scholarworks.rit.edu/theses/9906.

Council of Science Editors:

O'Connell C. An Etching Study for Self-Aligned Double Patterning. [Masters Thesis]. Rochester Institute of Technology; 2018. Available from: https://scholarworks.rit.edu/theses/9906


Rice University

22. Abramova, Vera. Meniscus-Mask Lithography.

Degree: PhD, Chemistry, 2015, Rice University

 This dissertation describes meniscus-mask lithography (MML): a planar top-down method for the fabrication of precisely positioned narrow graphene nanoribbons (GNRs) and metallic and semiconducting nanowires.… (more)

Subjects/Keywords: lithography; nanofabrication; dry etching; nanowires

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APA (6th Edition):

Abramova, V. (2015). Meniscus-Mask Lithography. (Doctoral Dissertation). Rice University. Retrieved from http://hdl.handle.net/1911/87691

Chicago Manual of Style (16th Edition):

Abramova, Vera. “Meniscus-Mask Lithography.” 2015. Doctoral Dissertation, Rice University. Accessed April 23, 2019. http://hdl.handle.net/1911/87691.

MLA Handbook (7th Edition):

Abramova, Vera. “Meniscus-Mask Lithography.” 2015. Web. 23 Apr 2019.

Vancouver:

Abramova V. Meniscus-Mask Lithography. [Internet] [Doctoral dissertation]. Rice University; 2015. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/1911/87691.

Council of Science Editors:

Abramova V. Meniscus-Mask Lithography. [Doctoral Dissertation]. Rice University; 2015. Available from: http://hdl.handle.net/1911/87691


University of Arizona

23. Hendricks, Douglas Ray, 1958-. REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE .

Degree: 1987, University of Arizona

Subjects/Keywords: Semiconductors  – Etching.

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APA (6th Edition):

Hendricks, Douglas Ray, 1. (1987). REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/276394

Chicago Manual of Style (16th Edition):

Hendricks, Douglas Ray, 1958-. “REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE .” 1987. Masters Thesis, University of Arizona. Accessed April 23, 2019. http://hdl.handle.net/10150/276394.

MLA Handbook (7th Edition):

Hendricks, Douglas Ray, 1958-. “REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE .” 1987. Web. 23 Apr 2019.

Vancouver:

Hendricks, Douglas Ray 1. REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE . [Internet] [Masters thesis]. University of Arizona; 1987. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10150/276394.

Council of Science Editors:

Hendricks, Douglas Ray 1. REACTIVE ION ETCHING OF GALLIUM-ARSENIDE AND ALUMINUM-GALLIUM - ARSENIDE USING BORON TRICHLORIDE AND CHLORINE . [Masters Thesis]. University of Arizona; 1987. Available from: http://hdl.handle.net/10150/276394


Kansas State University

24. Lawyer, Fredrick C. Prints.

Degree: 1982, Kansas State University

Subjects/Keywords: Prints; Etching

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APA (6th Edition):

Lawyer, F. C. (1982). Prints. (Thesis). Kansas State University. Retrieved from http://hdl.handle.net/2097/9594

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lawyer, Fredrick C. “Prints.” 1982. Thesis, Kansas State University. Accessed April 23, 2019. http://hdl.handle.net/2097/9594.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lawyer, Fredrick C. “Prints.” 1982. Web. 23 Apr 2019.

Vancouver:

Lawyer FC. Prints. [Internet] [Thesis]. Kansas State University; 1982. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/2097/9594.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lawyer FC. Prints. [Thesis]. Kansas State University; 1982. Available from: http://hdl.handle.net/2097/9594

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

25. 井上, ちひろ. Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性.

Degree: 博士(歯学), 2016, Osaka Dental University / 大阪歯科大学

We evaluated the mechanical properties and bond strength of commercially available adhesives used with orthodontic brackets on enamel. Debonding of the brackets must be done… (more)

Subjects/Keywords: Enamel; Direct bonding; Etching; Enamel; Direct bonding; Etching

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APA (6th Edition):

井上, . (2016). Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性. (Thesis). Osaka Dental University / 大阪歯科大学. Retrieved from http://id.nii.ac.jp/1392/00000016/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

井上, ちひろ. “Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性.” 2016. Thesis, Osaka Dental University / 大阪歯科大学. Accessed April 23, 2019. http://id.nii.ac.jp/1392/00000016/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

井上, ちひろ. “Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性.” 2016. Web. 23 Apr 2019.

Vancouver:

井上 . Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性. [Internet] [Thesis]. Osaka Dental University / 大阪歯科大学; 2016. [cited 2019 Apr 23]. Available from: http://id.nii.ac.jp/1392/00000016/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

井上 . Study on adhesion of orthodontic brackets on enamel with resin cements : レジンセメントを用いた矯正用ブラケットのエナメル質への接着性. [Thesis]. Osaka Dental University / 大阪歯科大学; 2016. Available from: http://id.nii.ac.jp/1392/00000016/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Oxford

26. Toogood, Matthew John. Studies of the chemistry of plasmas used for semiconductor etching.

Degree: 1991, University of Oxford

 Optical diagnostic techniques have been developed and then used to investigate the chemistry of reactive species formed in CF4 / O2 rf parallel plate discharges,… (more)

Subjects/Keywords: 530.44; Semiconductors : Etching : Plasma etching

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APA (6th Edition):

Toogood, M. J. (1991). Studies of the chemistry of plasmas used for semiconductor etching. (Doctoral Dissertation). University of Oxford. Retrieved from http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549

Chicago Manual of Style (16th Edition):

Toogood, Matthew John. “Studies of the chemistry of plasmas used for semiconductor etching.” 1991. Doctoral Dissertation, University of Oxford. Accessed April 23, 2019. http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549.

MLA Handbook (7th Edition):

Toogood, Matthew John. “Studies of the chemistry of plasmas used for semiconductor etching.” 1991. Web. 23 Apr 2019.

Vancouver:

Toogood MJ. Studies of the chemistry of plasmas used for semiconductor etching. [Internet] [Doctoral dissertation]. University of Oxford; 1991. [cited 2019 Apr 23]. Available from: http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549.

Council of Science Editors:

Toogood MJ. Studies of the chemistry of plasmas used for semiconductor etching. [Doctoral Dissertation]. University of Oxford; 1991. Available from: http://ora.ox.ac.uk/objects/uuid:e234bbaa-d6e6-4ac8-a3dd-aa9a2c1b1e39 ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.291549


University of Oxford

27. Astell-Burt, P. J. Studies on etching and polymer deposition in halocarbon plasmas.

Degree: 1987, University of Oxford

 Plasma etching, the selective removal of materials by reaction with chemically active species formed in a glow-discharge, is widely used by the electronics industry because… (more)

Subjects/Keywords: 530.44; Halocarbons : Etching : Plasma etching

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APA (6th Edition):

Astell-Burt, P. J. (1987). Studies on etching and polymer deposition in halocarbon plasmas. (Doctoral Dissertation). University of Oxford. Retrieved from http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440

Chicago Manual of Style (16th Edition):

Astell-Burt, P J. “Studies on etching and polymer deposition in halocarbon plasmas.” 1987. Doctoral Dissertation, University of Oxford. Accessed April 23, 2019. http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440.

MLA Handbook (7th Edition):

Astell-Burt, P J. “Studies on etching and polymer deposition in halocarbon plasmas.” 1987. Web. 23 Apr 2019.

Vancouver:

Astell-Burt PJ. Studies on etching and polymer deposition in halocarbon plasmas. [Internet] [Doctoral dissertation]. University of Oxford; 1987. [cited 2019 Apr 23]. Available from: http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440.

Council of Science Editors:

Astell-Burt PJ. Studies on etching and polymer deposition in halocarbon plasmas. [Doctoral Dissertation]. University of Oxford; 1987. Available from: http://ora.ox.ac.uk/objects/uuid:d8fd1069-a66b-4372-8ba0-b9ca5367445c ; http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.233440


Universitat Politècnica de València

28. Montoliu Álvaro, Carles. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .

Degree: 2015, Universitat Politècnica de València

 [EN] The main topic of the present thesis is the improvement of fabrication processes simulation by means of the Level Set (LS) method. The LS… (more)

Subjects/Keywords: Level Set; Wet Etching; Dry Etching; Parallel Computing; CUDA; GPGPU

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APA (6th Edition):

Montoliu Álvaro, C. (2015). Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . (Doctoral Dissertation). Universitat Politècnica de València. Retrieved from http://hdl.handle.net/10251/58609

Chicago Manual of Style (16th Edition):

Montoliu Álvaro, Carles. “Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .” 2015. Doctoral Dissertation, Universitat Politècnica de València. Accessed April 23, 2019. http://hdl.handle.net/10251/58609.

MLA Handbook (7th Edition):

Montoliu Álvaro, Carles. “Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes .” 2015. Web. 23 Apr 2019.

Vancouver:

Montoliu Álvaro C. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . [Internet] [Doctoral dissertation]. Universitat Politècnica de València; 2015. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/10251/58609.

Council of Science Editors:

Montoliu Álvaro C. Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes . [Doctoral Dissertation]. Universitat Politècnica de València; 2015. Available from: http://hdl.handle.net/10251/58609


Iowa State University

29. Paul, Dibyadeep. Focussed electric field induced ion transport: A novel nano-patterning process.

Degree: 2010, Iowa State University

 FEFIIT is a unique method, which can be utilized to imprint complex structures on the surface of a conducting substrate. Experimental results have shown that… (more)

Subjects/Keywords: electrochemical etching; electrochemistry; micromachining; micro/nano lithography; pulsed etching; Mechanical Engineering

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Paul, D. (2010). Focussed electric field induced ion transport: A novel nano-patterning process. (Thesis). Iowa State University. Retrieved from https://lib.dr.iastate.edu/etd/11467

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Paul, Dibyadeep. “Focussed electric field induced ion transport: A novel nano-patterning process.” 2010. Thesis, Iowa State University. Accessed April 23, 2019. https://lib.dr.iastate.edu/etd/11467.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Paul, Dibyadeep. “Focussed electric field induced ion transport: A novel nano-patterning process.” 2010. Web. 23 Apr 2019.

Vancouver:

Paul D. Focussed electric field induced ion transport: A novel nano-patterning process. [Internet] [Thesis]. Iowa State University; 2010. [cited 2019 Apr 23]. Available from: https://lib.dr.iastate.edu/etd/11467.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Paul D. Focussed electric field induced ion transport: A novel nano-patterning process. [Thesis]. Iowa State University; 2010. Available from: https://lib.dr.iastate.edu/etd/11467

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


IUPUI

30. Al-Johani, Hanan. Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic.

Degree: 2017, IUPUI

 EFFECTS OF ETCHING DURATION ON THE SURFACE ROUGHNESS, SURFACE LOSS, FLEXURAL STRENGTH OF E.MAX CAD GLASS CERAMIC AND SHEAR BOND STRENGTH TO A RESIN CEMENT… (more)

Subjects/Keywords: Lithium dislicate; Glass; Ceramics; Etching; Protocol; Dental Etching; Resin Cements

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Al-Johani, H. (2017). Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic. (Thesis). IUPUI. Retrieved from http://hdl.handle.net/1805/13751

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Al-Johani, Hanan. “Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic.” 2017. Thesis, IUPUI. Accessed April 23, 2019. http://hdl.handle.net/1805/13751.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Al-Johani, Hanan. “Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic.” 2017. Web. 23 Apr 2019.

Vancouver:

Al-Johani H. Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic. [Internet] [Thesis]. IUPUI; 2017. [cited 2019 Apr 23]. Available from: http://hdl.handle.net/1805/13751.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Al-Johani H. Effects of etching duration on the surface roughness, surface loss, flexural strength, and shear bond strength to a resin cement of e.max cad glass ceramic. [Thesis]. IUPUI; 2017. Available from: http://hdl.handle.net/1805/13751

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

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