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You searched for subject:(Etch). Showing records 1 – 30 of 92 total matches.

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Texas A&M University

1. Liu, Guojun. Process and reliability assessment of plasma-based copper etch process.

Degree: 2009, Texas A&M University

 The plasma-based etching processes of copper (Cu) and titanium tungsten (TiW) thin films, and the electromigration of the copper lines patterned by above etching processes… (more)

Subjects/Keywords: copper; plasma etch; electromigration

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Liu, G. (2009). Process and reliability assessment of plasma-based copper etch process. (Thesis). Texas A&M University. Retrieved from http://hdl.handle.net/1969.1/ETD-TAMU-2902

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Liu, Guojun. “Process and reliability assessment of plasma-based copper etch process.” 2009. Thesis, Texas A&M University. Accessed April 21, 2019. http://hdl.handle.net/1969.1/ETD-TAMU-2902.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Liu, Guojun. “Process and reliability assessment of plasma-based copper etch process.” 2009. Web. 21 Apr 2019.

Vancouver:

Liu G. Process and reliability assessment of plasma-based copper etch process. [Internet] [Thesis]. Texas A&M University; 2009. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2902.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Liu G. Process and reliability assessment of plasma-based copper etch process. [Thesis]. Texas A&M University; 2009. Available from: http://hdl.handle.net/1969.1/ETD-TAMU-2902

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Manitoba

2. Beaudet, Antoine. Shear bond strength of rebonded orthodontic attachments using self-etching primers.

Degree: Preventive Dental Science, 2017, University of Manitoba

 The purposes were to evaluate the difference in SBS of bonding and rebonding orthodontic attachments when using a CEP compared to a SEP and to… (more)

Subjects/Keywords: Orthodontic Bonding; Shear Bond Strength; Self-Etch; Total Etch; Rebonding

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APA (6th Edition):

Beaudet, A. (2017). Shear bond strength of rebonded orthodontic attachments using self-etching primers. (Masters Thesis). University of Manitoba. Retrieved from http://hdl.handle.net/1993/32914

Chicago Manual of Style (16th Edition):

Beaudet, Antoine. “Shear bond strength of rebonded orthodontic attachments using self-etching primers.” 2017. Masters Thesis, University of Manitoba. Accessed April 21, 2019. http://hdl.handle.net/1993/32914.

MLA Handbook (7th Edition):

Beaudet, Antoine. “Shear bond strength of rebonded orthodontic attachments using self-etching primers.” 2017. Web. 21 Apr 2019.

Vancouver:

Beaudet A. Shear bond strength of rebonded orthodontic attachments using self-etching primers. [Internet] [Masters thesis]. University of Manitoba; 2017. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/1993/32914.

Council of Science Editors:

Beaudet A. Shear bond strength of rebonded orthodontic attachments using self-etching primers. [Masters Thesis]. University of Manitoba; 2017. Available from: http://hdl.handle.net/1993/32914

3. Rocha, Catarina Alexandra Mendes. Avaliação in vitro da resistência adesiva à microtracção e caracterização morfológica com SEM de um novo sistema adesivo.

Degree: 2013, RCAAP

Dissertação para obtenção do grau de Mestre no Instituto Superior de Ciências da Saúde Egas Moniz

A restauração a resina composta de cavidades dentárias é… (more)

Subjects/Keywords: Resistência adesiva na dentina; Microtracção; Self-Etch; Etch-and-Rinse

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APA (6th Edition):

Rocha, C. A. M. (2013). Avaliação in vitro da resistência adesiva à microtracção e caracterização morfológica com SEM de um novo sistema adesivo. (Thesis). RCAAP. Retrieved from https://www.rcaap.pt/detail.jsp?id=oai:comum.rcaap.pt:10400.26/13954

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Rocha, Catarina Alexandra Mendes. “Avaliação in vitro da resistência adesiva à microtracção e caracterização morfológica com SEM de um novo sistema adesivo.” 2013. Thesis, RCAAP. Accessed April 21, 2019. https://www.rcaap.pt/detail.jsp?id=oai:comum.rcaap.pt:10400.26/13954.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Rocha, Catarina Alexandra Mendes. “Avaliação in vitro da resistência adesiva à microtracção e caracterização morfológica com SEM de um novo sistema adesivo.” 2013. Web. 21 Apr 2019.

Vancouver:

Rocha CAM. Avaliação in vitro da resistência adesiva à microtracção e caracterização morfológica com SEM de um novo sistema adesivo. [Internet] [Thesis]. RCAAP; 2013. [cited 2019 Apr 21]. Available from: https://www.rcaap.pt/detail.jsp?id=oai:comum.rcaap.pt:10400.26/13954.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Rocha CAM. Avaliação in vitro da resistência adesiva à microtracção e caracterização morfológica com SEM de um novo sistema adesivo. [Thesis]. RCAAP; 2013. Available from: https://www.rcaap.pt/detail.jsp?id=oai:comum.rcaap.pt:10400.26/13954

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Illinois – Urbana-Champaign

4. Rangarajan, Aniruddh. Graphene etch mask for silicon.

Degree: MS, 1200, 2015, University of Illinois – Urbana-Champaign

 In this thesis, an alternative future use for graphene will be explored. Graphene, a popular two-dimensional material of remarkable electrical properties, has been thought to… (more)

Subjects/Keywords: graphene; etch mask; silicon; nano-fabrication; xenon difluoride; reactive ion etch

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APA (6th Edition):

Rangarajan, A. (2015). Graphene etch mask for silicon. (Thesis). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/72832

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Rangarajan, Aniruddh. “Graphene etch mask for silicon.” 2015. Thesis, University of Illinois – Urbana-Champaign. Accessed April 21, 2019. http://hdl.handle.net/2142/72832.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Rangarajan, Aniruddh. “Graphene etch mask for silicon.” 2015. Web. 21 Apr 2019.

Vancouver:

Rangarajan A. Graphene etch mask for silicon. [Internet] [Thesis]. University of Illinois – Urbana-Champaign; 2015. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/2142/72832.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Rangarajan A. Graphene etch mask for silicon. [Thesis]. University of Illinois – Urbana-Champaign; 2015. Available from: http://hdl.handle.net/2142/72832

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


San Jose State University

5. Mahzoon, Razieh. In-situ Measurement of Plasma Etch Rate Using EtchRate Wafer.

Degree: MS, Physics, 2018, San Jose State University

  This paper presents the "EtchRate Wafer," a wireless monitoring silicon wafer that was invented by KLA-Tencor Corporation and patented in September 2014. This monitoring… (more)

Subjects/Keywords: Etch; Etch rate; Interference; Monitoring silicon wafer; Plasma chamber; Semiconductor industry

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APA (6th Edition):

Mahzoon, R. (2018). In-situ Measurement of Plasma Etch Rate Using EtchRate Wafer. (Masters Thesis). San Jose State University. Retrieved from https://scholarworks.sjsu.edu/etd_theses/4913

Chicago Manual of Style (16th Edition):

Mahzoon, Razieh. “In-situ Measurement of Plasma Etch Rate Using EtchRate Wafer.” 2018. Masters Thesis, San Jose State University. Accessed April 21, 2019. https://scholarworks.sjsu.edu/etd_theses/4913.

MLA Handbook (7th Edition):

Mahzoon, Razieh. “In-situ Measurement of Plasma Etch Rate Using EtchRate Wafer.” 2018. Web. 21 Apr 2019.

Vancouver:

Mahzoon R. In-situ Measurement of Plasma Etch Rate Using EtchRate Wafer. [Internet] [Masters thesis]. San Jose State University; 2018. [cited 2019 Apr 21]. Available from: https://scholarworks.sjsu.edu/etd_theses/4913.

Council of Science Editors:

Mahzoon R. In-situ Measurement of Plasma Etch Rate Using EtchRate Wafer. [Masters Thesis]. San Jose State University; 2018. Available from: https://scholarworks.sjsu.edu/etd_theses/4913


NSYSU

6. Lin, Chi-kuan. Fabrication and characteristics of thin film bulk acoustic resonator device using double piezoelectric layers.

Degree: Master, Electrical Engineering, 2015, NSYSU

 In this study, using the structure of dual piezoelectric layers:ZnO/AlN to fabricate the thin film bulk acoustic resonator (TFBAR).First seeding layer-titanium (Ti) and bottom electrode-platinum… (more)

Subjects/Keywords: Dual piezoelectric layers; TFBAR; ZnO; AlN; Etch

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APA (6th Edition):

Lin, C. (2015). Fabrication and characteristics of thin film bulk acoustic resonator device using double piezoelectric layers. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706115-135844

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lin, Chi-kuan. “Fabrication and characteristics of thin film bulk acoustic resonator device using double piezoelectric layers.” 2015. Thesis, NSYSU. Accessed April 21, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706115-135844.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lin, Chi-kuan. “Fabrication and characteristics of thin film bulk acoustic resonator device using double piezoelectric layers.” 2015. Web. 21 Apr 2019.

Vancouver:

Lin C. Fabrication and characteristics of thin film bulk acoustic resonator device using double piezoelectric layers. [Internet] [Thesis]. NSYSU; 2015. [cited 2019 Apr 21]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706115-135844.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lin C. Fabrication and characteristics of thin film bulk acoustic resonator device using double piezoelectric layers. [Thesis]. NSYSU; 2015. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0706115-135844

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Georgia Tech

7. Jiang, Lu. Scalable technologies to control liquid wetting and adhesion on fiber based substrates.

Degree: PhD, Chemical and Biomolecular Engineering, 2017, Georgia Tech

 In this thesis, we explored how wetting properties change with surface chemistry and the topology of the fiber network through controlled plasma etching with combined… (more)

Subjects/Keywords: Wetting control; Fiber; Plasma etch; Superamphiphobicity

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APA (6th Edition):

Jiang, L. (2017). Scalable technologies to control liquid wetting and adhesion on fiber based substrates. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/60159

Chicago Manual of Style (16th Edition):

Jiang, Lu. “Scalable technologies to control liquid wetting and adhesion on fiber based substrates.” 2017. Doctoral Dissertation, Georgia Tech. Accessed April 21, 2019. http://hdl.handle.net/1853/60159.

MLA Handbook (7th Edition):

Jiang, Lu. “Scalable technologies to control liquid wetting and adhesion on fiber based substrates.” 2017. Web. 21 Apr 2019.

Vancouver:

Jiang L. Scalable technologies to control liquid wetting and adhesion on fiber based substrates. [Internet] [Doctoral dissertation]. Georgia Tech; 2017. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/1853/60159.

Council of Science Editors:

Jiang L. Scalable technologies to control liquid wetting and adhesion on fiber based substrates. [Doctoral Dissertation]. Georgia Tech; 2017. Available from: http://hdl.handle.net/1853/60159


University of Illinois – Urbana-Champaign

8. Ouyang, Zihao. Characterization, optimization, and simulation in through silicon via (TSV) dry etch.

Degree: PhD, 5183, 2014, University of Illinois – Urbana-Champaign

 Two approaches of through-silicon-via (TSV) etching methods, the Bosch process (alternating etching/passivation phases) and the single-step etching, have been experimentally investigated and theoretically modeled in… (more)

Subjects/Keywords: Through-Silicon-Vias (TSVs); Plasma; Dry etch

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APA (6th Edition):

Ouyang, Z. (2014). Characterization, optimization, and simulation in through silicon via (TSV) dry etch. (Doctoral Dissertation). University of Illinois – Urbana-Champaign. Retrieved from http://hdl.handle.net/2142/46941

Chicago Manual of Style (16th Edition):

Ouyang, Zihao. “Characterization, optimization, and simulation in through silicon via (TSV) dry etch.” 2014. Doctoral Dissertation, University of Illinois – Urbana-Champaign. Accessed April 21, 2019. http://hdl.handle.net/2142/46941.

MLA Handbook (7th Edition):

Ouyang, Zihao. “Characterization, optimization, and simulation in through silicon via (TSV) dry etch.” 2014. Web. 21 Apr 2019.

Vancouver:

Ouyang Z. Characterization, optimization, and simulation in through silicon via (TSV) dry etch. [Internet] [Doctoral dissertation]. University of Illinois – Urbana-Champaign; 2014. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/2142/46941.

Council of Science Editors:

Ouyang Z. Characterization, optimization, and simulation in through silicon via (TSV) dry etch. [Doctoral Dissertation]. University of Illinois – Urbana-Champaign; 2014. Available from: http://hdl.handle.net/2142/46941


University of North Texas

9. Rimal, Sirish. Characterization of Post-Plasma Etch Residues and Plasma Induced Damage Evaluation on Patterned Porous Low-K Dielectrics Using MIR-IR Spectroscopy.

Degree: 2016, University of North Texas

 As the miniaturization of functional devices in integrated circuit (IC) continues to scale down to sub-nanometer size, the process complexity increases and makes materials characterization… (more)

Subjects/Keywords: IR spectroscopy; novel metrology; post-etch residues; plasma induced damage; TiN etch defect

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APA (6th Edition):

Rimal, S. (2016). Characterization of Post-Plasma Etch Residues and Plasma Induced Damage Evaluation on Patterned Porous Low-K Dielectrics Using MIR-IR Spectroscopy. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc849694/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Rimal, Sirish. “Characterization of Post-Plasma Etch Residues and Plasma Induced Damage Evaluation on Patterned Porous Low-K Dielectrics Using MIR-IR Spectroscopy.” 2016. Thesis, University of North Texas. Accessed April 21, 2019. https://digital.library.unt.edu/ark:/67531/metadc849694/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Rimal, Sirish. “Characterization of Post-Plasma Etch Residues and Plasma Induced Damage Evaluation on Patterned Porous Low-K Dielectrics Using MIR-IR Spectroscopy.” 2016. Web. 21 Apr 2019.

Vancouver:

Rimal S. Characterization of Post-Plasma Etch Residues and Plasma Induced Damage Evaluation on Patterned Porous Low-K Dielectrics Using MIR-IR Spectroscopy. [Internet] [Thesis]. University of North Texas; 2016. [cited 2019 Apr 21]. Available from: https://digital.library.unt.edu/ark:/67531/metadc849694/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Rimal S. Characterization of Post-Plasma Etch Residues and Plasma Induced Damage Evaluation on Patterned Porous Low-K Dielectrics Using MIR-IR Spectroscopy. [Thesis]. University of North Texas; 2016. Available from: https://digital.library.unt.edu/ark:/67531/metadc849694/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

10. Grumolato, Eugenio. Comparação de sistemas adesivos.

Degree: 2017, RCAAP

 O conceito de adesão em Medicina Dentária foi introduzido no início dos anos 50: um dos pioneiros foi Hagger que propõe a utilização de um… (more)

Subjects/Keywords: Sistemas adesivos; Smear layer; Adesão dental; Adesão esmalte; Self etch; Total etch

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APA (6th Edition):

Grumolato, E. (2017). Comparação de sistemas adesivos. (Thesis). RCAAP. Retrieved from https://www.rcaap.pt/detail.jsp?id=oai:repositorio.cespu.pt:20.500.11816/2862

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Grumolato, Eugenio. “Comparação de sistemas adesivos.” 2017. Thesis, RCAAP. Accessed April 21, 2019. https://www.rcaap.pt/detail.jsp?id=oai:repositorio.cespu.pt:20.500.11816/2862.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Grumolato, Eugenio. “Comparação de sistemas adesivos.” 2017. Web. 21 Apr 2019.

Vancouver:

Grumolato E. Comparação de sistemas adesivos. [Internet] [Thesis]. RCAAP; 2017. [cited 2019 Apr 21]. Available from: https://www.rcaap.pt/detail.jsp?id=oai:repositorio.cespu.pt:20.500.11816/2862.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Grumolato E. Comparação de sistemas adesivos. [Thesis]. RCAAP; 2017. Available from: https://www.rcaap.pt/detail.jsp?id=oai:repositorio.cespu.pt:20.500.11816/2862

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of New Mexico

11. Narayanan Kutty, Maya. Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors.

Degree: Electrical and Computer Engineering, 2013, University of New Mexico

 Infrared (IR) detectors today are being utilized for a variety of imaging applications such as medical diagnostics, navigation instruments of automobiles and aircrafts, meteorological imaging,… (more)

Subjects/Keywords: Infrared Detectors; Type II SLS; Stained Layer Superlattice; InAs/GaSb superlattice; passivation; mesa etch; wet etch; dry etch; electro-chemical passivation; chalcogenide passivation; ZnTe; ECP

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Narayanan Kutty, M. (2013). Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors. (Doctoral Dissertation). University of New Mexico. Retrieved from http://hdl.handle.net/1928/23355

Chicago Manual of Style (16th Edition):

Narayanan Kutty, Maya. “Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors.” 2013. Doctoral Dissertation, University of New Mexico. Accessed April 21, 2019. http://hdl.handle.net/1928/23355.

MLA Handbook (7th Edition):

Narayanan Kutty, Maya. “Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors.” 2013. Web. 21 Apr 2019.

Vancouver:

Narayanan Kutty M. Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors. [Internet] [Doctoral dissertation]. University of New Mexico; 2013. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/1928/23355.

Council of Science Editors:

Narayanan Kutty M. Novel etch studies and passivation techniques on InAs/GaSb superlattice based infrared detectors. [Doctoral Dissertation]. University of New Mexico; 2013. Available from: http://hdl.handle.net/1928/23355

12. Tavares, Ana Sofia Peixe. Adesivos universais ou multi-mode.

Degree: 2016, Universidade Fernando Pessoa

Os adesivos Universais (SAU) ou Multi-mode são dispositivos recentemente lançados no mercado que visam oferecer ao Médico Dentista a livre escolha da estratégia de adesão… (more)

Subjects/Keywords: Adhesives; Adhesion; Universal; Multi-mode; Adhesives system; All-in-one; Self-etch; Etch & rinse; Domínio/Área Científica::Ciências Médicas::Medicina Clínica

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APA (6th Edition):

Tavares, A. S. P. (2016). Adesivos universais ou multi-mode. (Thesis). Universidade Fernando Pessoa. Retrieved from http://www.rcaap.pt/detail.jsp?id=oai:bdigital.ufp.pt:10284/5414

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Tavares, Ana Sofia Peixe. “Adesivos universais ou multi-mode.” 2016. Thesis, Universidade Fernando Pessoa. Accessed April 21, 2019. http://www.rcaap.pt/detail.jsp?id=oai:bdigital.ufp.pt:10284/5414.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Tavares, Ana Sofia Peixe. “Adesivos universais ou multi-mode.” 2016. Web. 21 Apr 2019.

Vancouver:

Tavares ASP. Adesivos universais ou multi-mode. [Internet] [Thesis]. Universidade Fernando Pessoa; 2016. [cited 2019 Apr 21]. Available from: http://www.rcaap.pt/detail.jsp?id=oai:bdigital.ufp.pt:10284/5414.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Tavares ASP. Adesivos universais ou multi-mode. [Thesis]. Universidade Fernando Pessoa; 2016. Available from: http://www.rcaap.pt/detail.jsp?id=oai:bdigital.ufp.pt:10284/5414

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

13. Singh, Ajay Kumar. Uranium and radon studies using track etch detectors;.

Degree: Applied Physics, 1998, Aligarh Muslim University

Abstract available newline newline

_

Advisors/Committee Members: Prasad, Rajendra.

Subjects/Keywords: Uranium; Radon; Detectors; Etch; Track

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APA (6th Edition):

Singh, A. K. (1998). Uranium and radon studies using track etch detectors;. (Thesis). Aligarh Muslim University. Retrieved from http://shodhganga.inflibnet.ac.in/handle/10603/53785

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Singh, Ajay Kumar. “Uranium and radon studies using track etch detectors;.” 1998. Thesis, Aligarh Muslim University. Accessed April 21, 2019. http://shodhganga.inflibnet.ac.in/handle/10603/53785.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Singh, Ajay Kumar. “Uranium and radon studies using track etch detectors;.” 1998. Web. 21 Apr 2019.

Vancouver:

Singh AK. Uranium and radon studies using track etch detectors;. [Internet] [Thesis]. Aligarh Muslim University; 1998. [cited 2019 Apr 21]. Available from: http://shodhganga.inflibnet.ac.in/handle/10603/53785.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Singh AK. Uranium and radon studies using track etch detectors;. [Thesis]. Aligarh Muslim University; 1998. Available from: http://shodhganga.inflibnet.ac.in/handle/10603/53785

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

14. Ma, Beibei. Unsupervised Feature Extraction Techniques for Plasma Semiconductor Etch Processes.

Degree: 2009, RIAN

 As feature sizes on semiconductor chips continue to shrink plasma etching is becoming a more and more critical process in achieving low cost high-volume manufacturing.… (more)

Subjects/Keywords: Electronic Engineering; Feature Extraction Techniques; Plasma Semiconductor Etch Processes

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APA (6th Edition):

Ma, B. (2009). Unsupervised Feature Extraction Techniques for Plasma Semiconductor Etch Processes. (Thesis). RIAN. Retrieved from http://eprints.maynoothuniversity.ie/4079/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Ma, Beibei. “Unsupervised Feature Extraction Techniques for Plasma Semiconductor Etch Processes.” 2009. Thesis, RIAN. Accessed April 21, 2019. http://eprints.maynoothuniversity.ie/4079/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Ma, Beibei. “Unsupervised Feature Extraction Techniques for Plasma Semiconductor Etch Processes.” 2009. Web. 21 Apr 2019.

Vancouver:

Ma B. Unsupervised Feature Extraction Techniques for Plasma Semiconductor Etch Processes. [Internet] [Thesis]. RIAN; 2009. [cited 2019 Apr 21]. Available from: http://eprints.maynoothuniversity.ie/4079/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Ma B. Unsupervised Feature Extraction Techniques for Plasma Semiconductor Etch Processes. [Thesis]. RIAN; 2009. Available from: http://eprints.maynoothuniversity.ie/4079/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

15. Lynn, Shane. Virtual metrology for plasma etch processes.

Degree: 2011, RIAN

 Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use… (more)

Subjects/Keywords: Electronic Engineering; Vitual metrology(EM); Plasma processes; Semiconductor plasma etch

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APA (6th Edition):

Lynn, S. (2011). Virtual metrology for plasma etch processes. (Thesis). RIAN. Retrieved from http://eprints.maynoothuniversity.ie/2657/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lynn, Shane. “Virtual metrology for plasma etch processes.” 2011. Thesis, RIAN. Accessed April 21, 2019. http://eprints.maynoothuniversity.ie/2657/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lynn, Shane. “Virtual metrology for plasma etch processes.” 2011. Web. 21 Apr 2019.

Vancouver:

Lynn S. Virtual metrology for plasma etch processes. [Internet] [Thesis]. RIAN; 2011. [cited 2019 Apr 21]. Available from: http://eprints.maynoothuniversity.ie/2657/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lynn S. Virtual metrology for plasma etch processes. [Thesis]. RIAN; 2011. Available from: http://eprints.maynoothuniversity.ie/2657/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Windsor

16. Shi, Jiakai. Investigation of the Effects of Heating & Quenching on the Mechanical Properties and Microstructure of 22MnB5 Steel Sheets.

Degree: MA, Mechanical, Automotive, and Materials Engineering, 2018, University of Windsor

 Hot stamping of high-strength structural automotive components with tailored mechanical properties will help to reduce vehicle weight as well as improve crashworthiness. The purpose of… (more)

Subjects/Keywords: 22MnB5; boron steel; hot forming; tailored property; two-stage tint etch

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APA (6th Edition):

Shi, J. (2018). Investigation of the Effects of Heating & Quenching on the Mechanical Properties and Microstructure of 22MnB5 Steel Sheets. (Masters Thesis). University of Windsor. Retrieved from https://scholar.uwindsor.ca/etd/7444

Chicago Manual of Style (16th Edition):

Shi, Jiakai. “Investigation of the Effects of Heating & Quenching on the Mechanical Properties and Microstructure of 22MnB5 Steel Sheets.” 2018. Masters Thesis, University of Windsor. Accessed April 21, 2019. https://scholar.uwindsor.ca/etd/7444.

MLA Handbook (7th Edition):

Shi, Jiakai. “Investigation of the Effects of Heating & Quenching on the Mechanical Properties and Microstructure of 22MnB5 Steel Sheets.” 2018. Web. 21 Apr 2019.

Vancouver:

Shi J. Investigation of the Effects of Heating & Quenching on the Mechanical Properties and Microstructure of 22MnB5 Steel Sheets. [Internet] [Masters thesis]. University of Windsor; 2018. [cited 2019 Apr 21]. Available from: https://scholar.uwindsor.ca/etd/7444.

Council of Science Editors:

Shi J. Investigation of the Effects of Heating & Quenching on the Mechanical Properties and Microstructure of 22MnB5 Steel Sheets. [Masters Thesis]. University of Windsor; 2018. Available from: https://scholar.uwindsor.ca/etd/7444


North Carolina State University

17. Koretchko, Kim. Solvent Free Post Metal Etch Veil Removal Process Development.

Degree: MS, Materials Science and Engineering, 2002, North Carolina State University

 As the feature size of advanced integrated circuits decrease, it has become necessary for the semiconductor industry to start investigating advanced methods of polymer residual… (more)

Subjects/Keywords: sidewall polymers; etch residues; veils

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APA (6th Edition):

Koretchko, K. (2002). Solvent Free Post Metal Etch Veil Removal Process Development. (Thesis). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/1899

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Koretchko, Kim. “Solvent Free Post Metal Etch Veil Removal Process Development.” 2002. Thesis, North Carolina State University. Accessed April 21, 2019. http://www.lib.ncsu.edu/resolver/1840.16/1899.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Koretchko, Kim. “Solvent Free Post Metal Etch Veil Removal Process Development.” 2002. Web. 21 Apr 2019.

Vancouver:

Koretchko K. Solvent Free Post Metal Etch Veil Removal Process Development. [Internet] [Thesis]. North Carolina State University; 2002. [cited 2019 Apr 21]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/1899.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Koretchko K. Solvent Free Post Metal Etch Veil Removal Process Development. [Thesis]. North Carolina State University; 2002. Available from: http://www.lib.ncsu.edu/resolver/1840.16/1899

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of North Texas

18. Tafoya, Keirsten Breann. Process Improvement of Surface Preparation of Structurally Bonded Helicopter Detail Parts.

Degree: 2018, University of North Texas

 The objective of this study was to increase the bond strength at the surface interface of a thin stainless-steel panel for structural bonding on a… (more)

Subjects/Keywords: Stainless steel; bisulfate; etch; helicopter; abrasion; strip; sulfuric; acid

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APA (6th Edition):

Tafoya, K. B. (2018). Process Improvement of Surface Preparation of Structurally Bonded Helicopter Detail Parts. (Thesis). University of North Texas. Retrieved from https://digital.library.unt.edu/ark:/67531/metadc1404599/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Tafoya, Keirsten Breann. “Process Improvement of Surface Preparation of Structurally Bonded Helicopter Detail Parts.” 2018. Thesis, University of North Texas. Accessed April 21, 2019. https://digital.library.unt.edu/ark:/67531/metadc1404599/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Tafoya, Keirsten Breann. “Process Improvement of Surface Preparation of Structurally Bonded Helicopter Detail Parts.” 2018. Web. 21 Apr 2019.

Vancouver:

Tafoya KB. Process Improvement of Surface Preparation of Structurally Bonded Helicopter Detail Parts. [Internet] [Thesis]. University of North Texas; 2018. [cited 2019 Apr 21]. Available from: https://digital.library.unt.edu/ark:/67531/metadc1404599/.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Tafoya KB. Process Improvement of Surface Preparation of Structurally Bonded Helicopter Detail Parts. [Thesis]. University of North Texas; 2018. Available from: https://digital.library.unt.edu/ark:/67531/metadc1404599/

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of Helsinki

19. Houttu, Piritta. Dentiinin erillisen fosforihappoetsauksen vaikutus itse-etsaavan sidosaineen sidoslujuuteen pitkällä aikavälillä.

Degree: Medicinska fakulteten, 2016, University of Helsinki

 Tutkielman kirjallisuusosuudessa käytiin läpi sidostamisen perusteet ja dentiinin rakenne sekä selvitettiin vanhentamisen vaikutusta yhdistelmämuovien ja sidosaineiden sidoslujuuteen. Lisäksi tarkasteltiin MMP-entsyymien aktiivisuuden vaikutuksia sidoksen kestävyyteen. Yksivaiheisen… (more)

Subjects/Keywords: self-etch adhesive; dentin bonding; MMP; matrix metalloproteinase; Cariology and Endodontics; Kariologia ja endodontia; Kariologi och endodonti; self-etch adhesive; dentin bonding; MMP; matrix metalloproteinase

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APA (6th Edition):

Houttu, P. (2016). Dentiinin erillisen fosforihappoetsauksen vaikutus itse-etsaavan sidosaineen sidoslujuuteen pitkällä aikavälillä. (Masters Thesis). University of Helsinki. Retrieved from http://hdl.handle.net/10138/178510

Chicago Manual of Style (16th Edition):

Houttu, Piritta. “Dentiinin erillisen fosforihappoetsauksen vaikutus itse-etsaavan sidosaineen sidoslujuuteen pitkällä aikavälillä.” 2016. Masters Thesis, University of Helsinki. Accessed April 21, 2019. http://hdl.handle.net/10138/178510.

MLA Handbook (7th Edition):

Houttu, Piritta. “Dentiinin erillisen fosforihappoetsauksen vaikutus itse-etsaavan sidosaineen sidoslujuuteen pitkällä aikavälillä.” 2016. Web. 21 Apr 2019.

Vancouver:

Houttu P. Dentiinin erillisen fosforihappoetsauksen vaikutus itse-etsaavan sidosaineen sidoslujuuteen pitkällä aikavälillä. [Internet] [Masters thesis]. University of Helsinki; 2016. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/10138/178510.

Council of Science Editors:

Houttu P. Dentiinin erillisen fosforihappoetsauksen vaikutus itse-etsaavan sidosaineen sidoslujuuteen pitkällä aikavälillä. [Masters Thesis]. University of Helsinki; 2016. Available from: http://hdl.handle.net/10138/178510


NSYSU

20. Liang, Che-Hsin. Hybrid Heterogeneously Integrated Optical Waveguide by Ultra-thin DVS-BCB Adhesive Bonding of III-V/Silicon using Selective Dry Etching.

Degree: Master, Electro-Optical Engineering, 2017, NSYSU

 Nowadays, three-dimensional integrated circuit (3-D IC) plays an important role in integrated circuit and optic communication for low loss transmission and bulk shrinking. We use… (more)

Subjects/Keywords: self-alignment technology; spot size converter; selective dry etch technology; heterogeneous integration; wafer bonding

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APA (6th Edition):

Liang, C. (2017). Hybrid Heterogeneously Integrated Optical Waveguide by Ultra-thin DVS-BCB Adhesive Bonding of III-V/Silicon using Selective Dry Etching. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0825117-125541

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Liang, Che-Hsin. “Hybrid Heterogeneously Integrated Optical Waveguide by Ultra-thin DVS-BCB Adhesive Bonding of III-V/Silicon using Selective Dry Etching.” 2017. Thesis, NSYSU. Accessed April 21, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0825117-125541.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Liang, Che-Hsin. “Hybrid Heterogeneously Integrated Optical Waveguide by Ultra-thin DVS-BCB Adhesive Bonding of III-V/Silicon using Selective Dry Etching.” 2017. Web. 21 Apr 2019.

Vancouver:

Liang C. Hybrid Heterogeneously Integrated Optical Waveguide by Ultra-thin DVS-BCB Adhesive Bonding of III-V/Silicon using Selective Dry Etching. [Internet] [Thesis]. NSYSU; 2017. [cited 2019 Apr 21]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0825117-125541.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Liang C. Hybrid Heterogeneously Integrated Optical Waveguide by Ultra-thin DVS-BCB Adhesive Bonding of III-V/Silicon using Selective Dry Etching. [Thesis]. NSYSU; 2017. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0825117-125541

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


NSYSU

21. James, Chang. Development of FPW Device with Groove Reflection Structure Design.

Degree: Master, Electrical Engineering, 2011, NSYSU

 Utilizing bulk micromachining technology, this thesis aimed to develop a flexural plate-wave(FPW) device with novel groove reflection microstructure for high-sensitivity and low insertion-loss biomedical microsystem… (more)

Subjects/Keywords: ZnO piezoelectric thin-film; insertion-loss; groove reflection microstructure; flexural plate-wave; electrochemical etch-stop

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APA (6th Edition):

James, C. (2011). Development of FPW Device with Groove Reflection Structure Design. (Thesis). NSYSU. Retrieved from http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0906111-004231

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

James, Chang. “Development of FPW Device with Groove Reflection Structure Design.” 2011. Thesis, NSYSU. Accessed April 21, 2019. http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0906111-004231.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

James, Chang. “Development of FPW Device with Groove Reflection Structure Design.” 2011. Web. 21 Apr 2019.

Vancouver:

James C. Development of FPW Device with Groove Reflection Structure Design. [Internet] [Thesis]. NSYSU; 2011. [cited 2019 Apr 21]. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0906111-004231.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

James C. Development of FPW Device with Groove Reflection Structure Design. [Thesis]. NSYSU; 2011. Available from: http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0906111-004231

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Georgia Tech

22. Pande, Ashish Arunkumar. Mechanism of fluoride-based etch and clean processes.

Degree: PhD, Chemical Engineering, 2011, Georgia Tech

 Fluoride-containing solutions are widely used to etch silicon dioxide-based films. A critical issue in integrated circuit (IC) and microelectromechanical systems (MEMS) fabrication is achievement of… (more)

Subjects/Keywords: Reflectometry; Reactor; State estimation; Modelling and simulation; CFD; Etch chemistry; Microelectronics; Integrated circuits; Microelectromechanical systems

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APA (6th Edition):

Pande, A. A. (2011). Mechanism of fluoride-based etch and clean processes. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/43600

Chicago Manual of Style (16th Edition):

Pande, Ashish Arunkumar. “Mechanism of fluoride-based etch and clean processes.” 2011. Doctoral Dissertation, Georgia Tech. Accessed April 21, 2019. http://hdl.handle.net/1853/43600.

MLA Handbook (7th Edition):

Pande, Ashish Arunkumar. “Mechanism of fluoride-based etch and clean processes.” 2011. Web. 21 Apr 2019.

Vancouver:

Pande AA. Mechanism of fluoride-based etch and clean processes. [Internet] [Doctoral dissertation]. Georgia Tech; 2011. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/1853/43600.

Council of Science Editors:

Pande AA. Mechanism of fluoride-based etch and clean processes. [Doctoral Dissertation]. Georgia Tech; 2011. Available from: http://hdl.handle.net/1853/43600


University of Louisville

23. Porter, Daniel Allen. Die separation strength for deep reactive ion etched wafers.

Degree: M. Eng., 2010, University of Louisville

 In the electronic and microfabrication industry, die separation is one of the most critical steps in producing an undamaged, stand-alone micro-scale device. For silicon based… (more)

Subjects/Keywords: Deep reactive ion etch; Die separation; Fracture; Three point bending; Die strength; Notch

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APA (6th Edition):

Porter, D. A. (2010). Die separation strength for deep reactive ion etched wafers. (Masters Thesis). University of Louisville. Retrieved from 10.18297/etd/1144 ; https://ir.library.louisville.edu/etd/1144

Chicago Manual of Style (16th Edition):

Porter, Daniel Allen. “Die separation strength for deep reactive ion etched wafers.” 2010. Masters Thesis, University of Louisville. Accessed April 21, 2019. 10.18297/etd/1144 ; https://ir.library.louisville.edu/etd/1144.

MLA Handbook (7th Edition):

Porter, Daniel Allen. “Die separation strength for deep reactive ion etched wafers.” 2010. Web. 21 Apr 2019.

Vancouver:

Porter DA. Die separation strength for deep reactive ion etched wafers. [Internet] [Masters thesis]. University of Louisville; 2010. [cited 2019 Apr 21]. Available from: 10.18297/etd/1144 ; https://ir.library.louisville.edu/etd/1144.

Council of Science Editors:

Porter DA. Die separation strength for deep reactive ion etched wafers. [Masters Thesis]. University of Louisville; 2010. Available from: 10.18297/etd/1144 ; https://ir.library.louisville.edu/etd/1144


Miami University

24. Opondo, Noah F. Transport Studies In The Ferromagnetic Semiconductor (Ga,Mn)As.

Degree: MS, Physics, 2009, Miami University

 We present experimental research on magneto-transport on micro and nanostructures based on the ferromagnetic semiconductor (Ga,Mn)As, as well as macroscopic (un-patterned) samples. We report the… (more)

Subjects/Keywords: Physics; Contact resistance; non local spin valves; (Ga,Mn)As; etch-anneal

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APA (6th Edition):

Opondo, N. F. (2009). Transport Studies In The Ferromagnetic Semiconductor (Ga,Mn)As. (Masters Thesis). Miami University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=miami1249688084

Chicago Manual of Style (16th Edition):

Opondo, Noah F. “Transport Studies In The Ferromagnetic Semiconductor (Ga,Mn)As.” 2009. Masters Thesis, Miami University. Accessed April 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=miami1249688084.

MLA Handbook (7th Edition):

Opondo, Noah F. “Transport Studies In The Ferromagnetic Semiconductor (Ga,Mn)As.” 2009. Web. 21 Apr 2019.

Vancouver:

Opondo NF. Transport Studies In The Ferromagnetic Semiconductor (Ga,Mn)As. [Internet] [Masters thesis]. Miami University; 2009. [cited 2019 Apr 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=miami1249688084.

Council of Science Editors:

Opondo NF. Transport Studies In The Ferromagnetic Semiconductor (Ga,Mn)As. [Masters Thesis]. Miami University; 2009. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=miami1249688084


University of Toronto

25. Serkies, Kyle Brandon. The Effect of Simulated Human Salivary Enzymes and Matrix Metalloproteinase (MMP) Inhibition on the Degradation and Fracture Toughness of the Self-etched Resin-dentin Interface.

Degree: 2015, University of Toronto

Background: Oral esterase activities and dentinal matrix metalloproteinases (MMPs) contribute to interfacial degradation of composite restorations, compromising structural integrity, and increasing risk of secondary caries.… (more)

Subjects/Keywords: Biodegradaion; Esterase; Fracture Toughness; Matrix metalloproteinase (MMPs); Resin-dentin interface; Self-etch adhesive; 0541

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APA (6th Edition):

Serkies, K. B. (2015). The Effect of Simulated Human Salivary Enzymes and Matrix Metalloproteinase (MMP) Inhibition on the Degradation and Fracture Toughness of the Self-etched Resin-dentin Interface. (Masters Thesis). University of Toronto. Retrieved from http://hdl.handle.net/1807/80135

Chicago Manual of Style (16th Edition):

Serkies, Kyle Brandon. “The Effect of Simulated Human Salivary Enzymes and Matrix Metalloproteinase (MMP) Inhibition on the Degradation and Fracture Toughness of the Self-etched Resin-dentin Interface.” 2015. Masters Thesis, University of Toronto. Accessed April 21, 2019. http://hdl.handle.net/1807/80135.

MLA Handbook (7th Edition):

Serkies, Kyle Brandon. “The Effect of Simulated Human Salivary Enzymes and Matrix Metalloproteinase (MMP) Inhibition on the Degradation and Fracture Toughness of the Self-etched Resin-dentin Interface.” 2015. Web. 21 Apr 2019.

Vancouver:

Serkies KB. The Effect of Simulated Human Salivary Enzymes and Matrix Metalloproteinase (MMP) Inhibition on the Degradation and Fracture Toughness of the Self-etched Resin-dentin Interface. [Internet] [Masters thesis]. University of Toronto; 2015. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/1807/80135.

Council of Science Editors:

Serkies KB. The Effect of Simulated Human Salivary Enzymes and Matrix Metalloproteinase (MMP) Inhibition on the Degradation and Fracture Toughness of the Self-etched Resin-dentin Interface. [Masters Thesis]. University of Toronto; 2015. Available from: http://hdl.handle.net/1807/80135


Arizona State University

26. Sayler, William Albert. The Application of Temper-Etch Inspection to Micromilled AISI 4340 Steel Specimen.

Degree: M.S.Tech, Technology, 2010, Arizona State University

 Micromachining has seen application growth in a variety of industries requiring a miniaturization of the machining process. Machining at the micro level generates different cutter/workpiece… (more)

Subjects/Keywords: Industrial Engineering; Engineering; Mechanical Engineering; Localized over-heating; Micromachining; Non-destructive test; Steel; Temper-Etch

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APA (6th Edition):

Sayler, W. A. (2010). The Application of Temper-Etch Inspection to Micromilled AISI 4340 Steel Specimen. (Masters Thesis). Arizona State University. Retrieved from http://repository.asu.edu/items/8645

Chicago Manual of Style (16th Edition):

Sayler, William Albert. “The Application of Temper-Etch Inspection to Micromilled AISI 4340 Steel Specimen.” 2010. Masters Thesis, Arizona State University. Accessed April 21, 2019. http://repository.asu.edu/items/8645.

MLA Handbook (7th Edition):

Sayler, William Albert. “The Application of Temper-Etch Inspection to Micromilled AISI 4340 Steel Specimen.” 2010. Web. 21 Apr 2019.

Vancouver:

Sayler WA. The Application of Temper-Etch Inspection to Micromilled AISI 4340 Steel Specimen. [Internet] [Masters thesis]. Arizona State University; 2010. [cited 2019 Apr 21]. Available from: http://repository.asu.edu/items/8645.

Council of Science Editors:

Sayler WA. The Application of Temper-Etch Inspection to Micromilled AISI 4340 Steel Specimen. [Masters Thesis]. Arizona State University; 2010. Available from: http://repository.asu.edu/items/8645


Universitat Politècnica de València

27. MAJER, ESZTER. Metabolic engineering of plants using a disarmed potyvirus vector .

Degree: 2016, Universitat Politècnica de València

 [EN] Plant viruses are obligate intracellular parasites which were used to develop recombinant plant virus vectors to express heterologous proteins and to modify endogenous metabolic… (more)

Subjects/Keywords: Tobacco etch virus; Potyvirus genome organization; Chimeric plant virus; Subcellular targeting; Metabolic engineering; Secondary metabolite

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APA (6th Edition):

MAJER, E. (2016). Metabolic engineering of plants using a disarmed potyvirus vector . (Doctoral Dissertation). Universitat Politècnica de València. Retrieved from http://hdl.handle.net/10251/68477

Chicago Manual of Style (16th Edition):

MAJER, ESZTER. “Metabolic engineering of plants using a disarmed potyvirus vector .” 2016. Doctoral Dissertation, Universitat Politècnica de València. Accessed April 21, 2019. http://hdl.handle.net/10251/68477.

MLA Handbook (7th Edition):

MAJER, ESZTER. “Metabolic engineering of plants using a disarmed potyvirus vector .” 2016. Web. 21 Apr 2019.

Vancouver:

MAJER E. Metabolic engineering of plants using a disarmed potyvirus vector . [Internet] [Doctoral dissertation]. Universitat Politècnica de València; 2016. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/10251/68477.

Council of Science Editors:

MAJER E. Metabolic engineering of plants using a disarmed potyvirus vector . [Doctoral Dissertation]. Universitat Politècnica de València; 2016. Available from: http://hdl.handle.net/10251/68477


University of South Florida

28. Rajgadkar, Ajay. Characterization of Dielectric Films for Electrowetting on Dielectric Systems.

Degree: 2010, University of South Florida

 Electrowetting is a phenomenon that controls the wettability of liquids on solid surfaces by the application of electric potential. It is an interesting method to… (more)

Subjects/Keywords: pecvd; silicon dioxide; silicon nitride; etch rates; electrical properties; American Studies; Arts and Humanities

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Rajgadkar, A. (2010). Characterization of Dielectric Films for Electrowetting on Dielectric Systems. (Thesis). University of South Florida. Retrieved from https://scholarcommons.usf.edu/etd/3607

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Rajgadkar, Ajay. “Characterization of Dielectric Films for Electrowetting on Dielectric Systems.” 2010. Thesis, University of South Florida. Accessed April 21, 2019. https://scholarcommons.usf.edu/etd/3607.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Rajgadkar, Ajay. “Characterization of Dielectric Films for Electrowetting on Dielectric Systems.” 2010. Web. 21 Apr 2019.

Vancouver:

Rajgadkar A. Characterization of Dielectric Films for Electrowetting on Dielectric Systems. [Internet] [Thesis]. University of South Florida; 2010. [cited 2019 Apr 21]. Available from: https://scholarcommons.usf.edu/etd/3607.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Rajgadkar A. Characterization of Dielectric Films for Electrowetting on Dielectric Systems. [Thesis]. University of South Florida; 2010. Available from: https://scholarcommons.usf.edu/etd/3607

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


University of the Western Cape

29. Adeniyi, Olushola Rotimi. Swift heavy ion irradiation of polyester and polyolefin polymeric film for gas separation application .

Degree: 2015, University of the Western Cape

 The combination of ion track technology and chemical etching as a tool to enhance polymer gas properties such as permeability and selectivity is regarded as… (more)

Subjects/Keywords: Polyethylene terephthalate; Polymethyl pentene; Swift heavy ion irradiation; Track-etch; Gas separation

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Adeniyi, O. R. (2015). Swift heavy ion irradiation of polyester and polyolefin polymeric film for gas separation application . (Thesis). University of the Western Cape. Retrieved from http://hdl.handle.net/11394/4929

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Adeniyi, Olushola Rotimi. “Swift heavy ion irradiation of polyester and polyolefin polymeric film for gas separation application .” 2015. Thesis, University of the Western Cape. Accessed April 21, 2019. http://hdl.handle.net/11394/4929.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Adeniyi, Olushola Rotimi. “Swift heavy ion irradiation of polyester and polyolefin polymeric film for gas separation application .” 2015. Web. 21 Apr 2019.

Vancouver:

Adeniyi OR. Swift heavy ion irradiation of polyester and polyolefin polymeric film for gas separation application . [Internet] [Thesis]. University of the Western Cape; 2015. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/11394/4929.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Adeniyi OR. Swift heavy ion irradiation of polyester and polyolefin polymeric film for gas separation application . [Thesis]. University of the Western Cape; 2015. Available from: http://hdl.handle.net/11394/4929

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


George Mason University

30. Farrell, Stuart B. Dislocation Density Reduction in Cadmium Telluride and Mercury Cadmium Telluride Grown on Silicon Using Thermal Cycle Annealing .

Degree: 2011, George Mason University

 Mercury Cadmium Telluride (HgCdTe) is a material of great importance for infrared focal plane array applications. In order to produce large format detector arrays this… (more)

Subjects/Keywords: mercury cadmium telluride; II-VI; thermal cycle annealing; Etch Pit Density (EPD); dislocations; infrared

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Farrell, S. B. (2011). Dislocation Density Reduction in Cadmium Telluride and Mercury Cadmium Telluride Grown on Silicon Using Thermal Cycle Annealing . (Thesis). George Mason University. Retrieved from http://hdl.handle.net/1920/6276

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Farrell, Stuart B. “Dislocation Density Reduction in Cadmium Telluride and Mercury Cadmium Telluride Grown on Silicon Using Thermal Cycle Annealing .” 2011. Thesis, George Mason University. Accessed April 21, 2019. http://hdl.handle.net/1920/6276.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Farrell, Stuart B. “Dislocation Density Reduction in Cadmium Telluride and Mercury Cadmium Telluride Grown on Silicon Using Thermal Cycle Annealing .” 2011. Web. 21 Apr 2019.

Vancouver:

Farrell SB. Dislocation Density Reduction in Cadmium Telluride and Mercury Cadmium Telluride Grown on Silicon Using Thermal Cycle Annealing . [Internet] [Thesis]. George Mason University; 2011. [cited 2019 Apr 21]. Available from: http://hdl.handle.net/1920/6276.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Farrell SB. Dislocation Density Reduction in Cadmium Telluride and Mercury Cadmium Telluride Grown on Silicon Using Thermal Cycle Annealing . [Thesis]. George Mason University; 2011. Available from: http://hdl.handle.net/1920/6276

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

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