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University: Indian Institute of Science

You searched for subject:( CVD). Showing records 1 – 18 of 18 total matches.

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Indian Institute of Science

1. Krishna Bharadwaj, BB. Controlling Defects in CVD Grown Graphene : Device Application Perspective.

Degree: 2016, Indian Institute of Science

 Necessity is the mother of all inventions. With Si hitting the speed bottleneck, newer materials to replace Si are being sought out. The ex-foliation based… (more)

Subjects/Keywords: Chemical Vapor Deposition; Graphene; Graphene Growth; Raman Spectroscopy of Graphene; Graphene Devices; CVD Graphene; Nanoscience and Engineering

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APA (6th Edition):

Krishna Bharadwaj, B. (2016). Controlling Defects in CVD Grown Graphene : Device Application Perspective. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/2868

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Krishna Bharadwaj, BB. “Controlling Defects in CVD Grown Graphene : Device Application Perspective.” 2016. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/2868.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Krishna Bharadwaj, BB. “Controlling Defects in CVD Grown Graphene : Device Application Perspective.” 2016. Web. 11 Nov 2019.

Vancouver:

Krishna Bharadwaj B. Controlling Defects in CVD Grown Graphene : Device Application Perspective. [Internet] [Thesis]. Indian Institute of Science; 2016. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/2868.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Krishna Bharadwaj B. Controlling Defects in CVD Grown Graphene : Device Application Perspective. [Thesis]. Indian Institute of Science; 2016. Available from: http://hdl.handle.net/2005/2868

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

2. Dagur, Pritesh. Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3.

Degree: 2009, Indian Institute of Science

 Thin films and coatings of oxides are used in various fields of science and technology, such as semiconductor and optoelectronic devices, gas sensors, protective and… (more)

Subjects/Keywords: Thin Film Technology; Chemical Vapour Deposition (CVD); Aluminium Gallium Oxide; Vanadium Oxide; Metalorganic Precursors; Thin Film Deposition; Atomic Layer Deposition (ALD); VO2; Electronic Engineering

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APA (6th Edition):

Dagur, P. (2009). Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/668

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Dagur, Pritesh. “Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3.” 2009. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/668.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Dagur, Pritesh. “Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3.” 2009. Web. 11 Nov 2019.

Vancouver:

Dagur P. Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3. [Internet] [Thesis]. Indian Institute of Science; 2009. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/668.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Dagur P. Thin Films From Metalorganic Precursors : ALD Of VO2 And CVD Of (Al1-xGax)2O3. [Thesis]. Indian Institute of Science; 2009. Available from: http://hdl.handle.net/2005/668

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

3. Kumar, V Kranthi. Large Area MoS2 : Growth and Device Characteristics.

Degree: 2016, Indian Institute of Science

 There has been growing interest in two-dimensional (2-D) crystals beyond graphene for next-generation nano-electronics. Transition metal dichalcogenides have been most widely studied, for their semiconducting… (more)

Subjects/Keywords: Nano Electronics; Chemical Vapor Deposition (CVD); Two Dimensional Crystal; Optoelectronic Applications; MoS2; Transition Metal Di-Chalcogemides (TMDs); Mo-S-C-O-H System; 2D Crystals; Nano Science

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APA (6th Edition):

Kumar, V. K. (2016). Large Area MoS2 : Growth and Device Characteristics. (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/2005/3760 ; http://etd.iisc.ernet.in/abstracts/4631/G28449-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kumar, V Kranthi. “Large Area MoS2 : Growth and Device Characteristics.” 2016. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://etd.iisc.ernet.in/2005/3760 ; http://etd.iisc.ernet.in/abstracts/4631/G28449-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kumar, V Kranthi. “Large Area MoS2 : Growth and Device Characteristics.” 2016. Web. 11 Nov 2019.

Vancouver:

Kumar VK. Large Area MoS2 : Growth and Device Characteristics. [Internet] [Thesis]. Indian Institute of Science; 2016. [cited 2019 Nov 11]. Available from: http://etd.iisc.ernet.in/2005/3760 ; http://etd.iisc.ernet.in/abstracts/4631/G28449-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kumar VK. Large Area MoS2 : Growth and Device Characteristics. [Thesis]. Indian Institute of Science; 2016. Available from: http://etd.iisc.ernet.in/2005/3760 ; http://etd.iisc.ernet.in/abstracts/4631/G28449-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

4. Das, Mahua. Thin Films Of A Carbonaceous Copper Oxide, Li Doped Cobalt Oxide And Li At Nanometric Dimension : Synthesis Through CVD, Solgel And Electromagnetic Irradiation And Characterisation.

Degree: 2007, Indian Institute of Science

 Thin film nanostructures may be defined as assemblies, arrays, or randomly distributed nanoparticles, nanowires, or nanotubes, which together form a layer of materials supported on… (more)

Subjects/Keywords: Thin Films - Synthesis; Chemical Vapour Deposition (CVD); Solgel Method; Electromagnetic Irradiation; Thin Film Nanostructures; Nanostructured Oxides Thin Films; Metalorganic Complexes - Synthesis; Novel Polynuclear Complexes; Copper Oxide-Carbon Nanocomposites; Nanoporous Composite Films; Nanocrystalline LixCoO2 Films; Nanocrystals; Carbonaceous Nanostructure; Materials Science

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APA (6th Edition):

Das, M. (2007). Thin Films Of A Carbonaceous Copper Oxide, Li Doped Cobalt Oxide And Li At Nanometric Dimension : Synthesis Through CVD, Solgel And Electromagnetic Irradiation And Characterisation. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/619

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Das, Mahua. “Thin Films Of A Carbonaceous Copper Oxide, Li Doped Cobalt Oxide And Li At Nanometric Dimension : Synthesis Through CVD, Solgel And Electromagnetic Irradiation And Characterisation.” 2007. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/619.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Das, Mahua. “Thin Films Of A Carbonaceous Copper Oxide, Li Doped Cobalt Oxide And Li At Nanometric Dimension : Synthesis Through CVD, Solgel And Electromagnetic Irradiation And Characterisation.” 2007. Web. 11 Nov 2019.

Vancouver:

Das M. Thin Films Of A Carbonaceous Copper Oxide, Li Doped Cobalt Oxide And Li At Nanometric Dimension : Synthesis Through CVD, Solgel And Electromagnetic Irradiation And Characterisation. [Internet] [Thesis]. Indian Institute of Science; 2007. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/619.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Das M. Thin Films Of A Carbonaceous Copper Oxide, Li Doped Cobalt Oxide And Li At Nanometric Dimension : Synthesis Through CVD, Solgel And Electromagnetic Irradiation And Characterisation. [Thesis]. Indian Institute of Science; 2007. Available from: http://hdl.handle.net/2005/619

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

5. Anuradha, S. Development Of A Tin Oxide Based Thermoelectric Gas Sensor For Volatile Organic Compounds.

Degree: 2007, Indian Institute of Science

 Today there is a great deal of interest in the development of gas sensors for applications like air pollution monitoring, indoor environment control, detection of… (more)

Subjects/Keywords: Thermoelectric Gas Sensor; Gas Detectors; Gas Sensors; Gas Sensors - Fabrication; Thin Film Deposition; Tin Oxide Films; Tin Oxide Films - Deposition; Semiconducting Metal Oxide Gas Sensors Theory; Field Effect Transistor (FET); Chemical Vapor Deposition (CVD); Gas Sensing; Instrumentation

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APA (6th Edition):

Anuradha, S. (2007). Development Of A Tin Oxide Based Thermoelectric Gas Sensor For Volatile Organic Compounds. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/623

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Anuradha, S. “Development Of A Tin Oxide Based Thermoelectric Gas Sensor For Volatile Organic Compounds.” 2007. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/623.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Anuradha, S. “Development Of A Tin Oxide Based Thermoelectric Gas Sensor For Volatile Organic Compounds.” 2007. Web. 11 Nov 2019.

Vancouver:

Anuradha S. Development Of A Tin Oxide Based Thermoelectric Gas Sensor For Volatile Organic Compounds. [Internet] [Thesis]. Indian Institute of Science; 2007. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/623.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Anuradha S. Development Of A Tin Oxide Based Thermoelectric Gas Sensor For Volatile Organic Compounds. [Thesis]. Indian Institute of Science; 2007. Available from: http://hdl.handle.net/2005/623

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

6. Kunte, Girish V. Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides.

Degree: 2008, Indian Institute of Science

 This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel… (more)

Subjects/Keywords: Vapour Pressure Deposition; Vacuum Deposition; Thin Film Deposition; Titanium Oxide Deposition; Atomic Layer Deposition (ALD); Metalorganic Complexes - Synthesis; Titanium Oxide Thin Films; Titanium Oxides - Properties; Titanium Oxide Magneli Phases; Chemical Vapour Deposition (CVD); Titanium Precursors; Vapour Pressure Determination; Vapour Pressure; Materials Science

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APA (6th Edition):

Kunte, G. V. (2008). Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/762

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kunte, Girish V. “Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides.” 2008. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/762.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kunte, Girish V. “Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides.” 2008. Web. 11 Nov 2019.

Vancouver:

Kunte GV. Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides. [Internet] [Thesis]. Indian Institute of Science; 2008. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/762.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kunte GV. Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides. [Thesis]. Indian Institute of Science; 2008. Available from: http://hdl.handle.net/2005/762

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

7. Varade, Ashish. MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies.

Degree: 2009, Indian Institute of Science

 Metalorganic Chemical Vapour Deposition (MOCVD) is a versatile technique for the deposition of thin films of oxide materials as it offers advantages, such as deposition… (more)

Subjects/Keywords: Electrochemistry; Manganese Oxide; Chemical Vapour Deposition (CVD); Metal Oxide; Carbon Coating; Manganese Complexes - Synthesis; Thin Films - Deposition; Metalorganic Complexes - Synthesis; Electrochemical Capacitors; Carbonaceous Manganese Oxide Films; Metalorganic Chemical Vapour Deposition (MOCVD); MnO Coatings; MnO/C Nanocomposite Coatings; Electrochemistry

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APA (6th Edition):

Varade, A. (2009). MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/999

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Varade, Ashish. “MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies.” 2009. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/999.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Varade, Ashish. “MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies.” 2009. Web. 11 Nov 2019.

Vancouver:

Varade A. MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies. [Internet] [Thesis]. Indian Institute of Science; 2009. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/999.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Varade A. MOCVD Of Carbonaceous MnO Coating : Electrochemical And Charge Transport Studies. [Thesis]. Indian Institute of Science; 2009. Available from: http://hdl.handle.net/2005/999

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

8. Gairola, Anshita. Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics.

Degree: 2011, Indian Institute of Science

 The work carried out as a part of this thesis has been focussed on understanding different aspects of the chemical vapor deposition process namely, ALD… (more)

Subjects/Keywords: Chemical Vapor Deposition (CVD); Dielectrics; Thin Films; Atomic Layer Deposition (ALD); Titanium Oxide Thin Films; Metalorganic Chemical Vapor Deposition; Metaloxide Thin Films; Thin Film Deposition; Physical Vapor Deposition (PVD); Titanium Oxide; Titanium Dioxide Film; MOCVD; Materials Science

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APA (6th Edition):

Gairola, A. (2011). Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/2104

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Gairola, Anshita. “Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics.” 2011. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/2104.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Gairola, Anshita. “Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics.” 2011. Web. 11 Nov 2019.

Vancouver:

Gairola A. Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics. [Internet] [Thesis]. Indian Institute of Science; 2011. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/2104.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Gairola A. Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics. [Thesis]. Indian Institute of Science; 2011. Available from: http://hdl.handle.net/2005/2104

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

9. Gairola, Anshita. Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics.

Degree: 2011, Indian Institute of Science

 The work carried out as a part of this thesis has been focussed on understanding different aspects of the chemical vapor deposition process namely, ALD… (more)

Subjects/Keywords: Chemical Vapor Deposition (CVD); Dielectrics; Thin Films; Atomic Layer Deposition (ALD); Titanium Oxide Thin Films; Metalorganic Chemical Vapor Deposition; Metaloxide Thin Films; Thin Film Deposition; Physical Vapor Deposition (PVD); Titanium Oxide; Titanium Dioxide Film; MOCVD; Materials Science

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Gairola, A. (2011). Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics. (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/handle/2005/2104 ; http://etd.ncsi.iisc.ernet.in/abstracts/2707/G25128-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Gairola, Anshita. “Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics.” 2011. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://etd.iisc.ernet.in/handle/2005/2104 ; http://etd.ncsi.iisc.ernet.in/abstracts/2707/G25128-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Gairola, Anshita. “Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics.” 2011. Web. 11 Nov 2019.

Vancouver:

Gairola A. Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics. [Internet] [Thesis]. Indian Institute of Science; 2011. [cited 2019 Nov 11]. Available from: http://etd.iisc.ernet.in/handle/2005/2104 ; http://etd.ncsi.iisc.ernet.in/abstracts/2707/G25128-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Gairola A. Studies On CVD And ALD Of Thin Films Of Substituted And Composite Metal Oxides, Including Potential High-k Dielectrics. [Thesis]. Indian Institute of Science; 2011. Available from: http://etd.iisc.ernet.in/handle/2005/2104 ; http://etd.ncsi.iisc.ernet.in/abstracts/2707/G25128-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

10. Reddy, Siva Kumar C. Mechanical Behavior Study of Microporous Assemblies of Carbon Nanotube and Graphene.

Degree: 2015, Indian Institute of Science

 Carbon nanotubes (CNT) and graphene have been one of the noticeable research areas in science and technology. In recent years, the assembly of these carbon… (more)

Subjects/Keywords: Carbon Nanotube (CNT); Graphene; Carbon Nanotube Bundle; Chemical Vapor Deposition (CVD); Graphene Foam; Carbon Nanotube Assembly; Polymer Composite; Carbon Nanotubes; Carbon Nanotube Foam; Polymer Matrix Composite; Polydimethyl Siloxane (PDMS); Instrumentation and Applied Physics

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APA (6th Edition):

Reddy, S. K. C. (2015). Mechanical Behavior Study of Microporous Assemblies of Carbon Nanotube and Graphene. (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/2005/3957 ; http://etd.iisc.ernet.in/abstracts/4830/G27240-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Reddy, Siva Kumar C. “Mechanical Behavior Study of Microporous Assemblies of Carbon Nanotube and Graphene.” 2015. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://etd.iisc.ernet.in/2005/3957 ; http://etd.iisc.ernet.in/abstracts/4830/G27240-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Reddy, Siva Kumar C. “Mechanical Behavior Study of Microporous Assemblies of Carbon Nanotube and Graphene.” 2015. Web. 11 Nov 2019.

Vancouver:

Reddy SKC. Mechanical Behavior Study of Microporous Assemblies of Carbon Nanotube and Graphene. [Internet] [Thesis]. Indian Institute of Science; 2015. [cited 2019 Nov 11]. Available from: http://etd.iisc.ernet.in/2005/3957 ; http://etd.iisc.ernet.in/abstracts/4830/G27240-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Reddy SKC. Mechanical Behavior Study of Microporous Assemblies of Carbon Nanotube and Graphene. [Thesis]. Indian Institute of Science; 2015. Available from: http://etd.iisc.ernet.in/2005/3957 ; http://etd.iisc.ernet.in/abstracts/4830/G27240-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

11. Dharmaprakash, M S. Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films.

Degree: 2004, Indian Institute of Science

Subjects/Keywords: Thin Film Devices; Chemical Vapour Deposition (CVD); Organometallic Complexes; Metalorganic Complexes; Zirconia Thin Films; HfO2 Thin Films; MOCVD; ZrO2 Thin Films; VO2 Thin Films; Electronic Engineering

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Dharmaprakash, M. S. (2004). Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/1261

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Dharmaprakash, M S. “Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films.” 2004. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/1261.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Dharmaprakash, M S. “Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films.” 2004. Web. 11 Nov 2019.

Vancouver:

Dharmaprakash MS. Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films. [Internet] [Thesis]. Indian Institute of Science; 2004. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/1261.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Dharmaprakash MS. Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films. [Thesis]. Indian Institute of Science; 2004. Available from: http://hdl.handle.net/2005/1261

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

12. Bharathi, R. "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications".

Degree: 2016, Indian Institute of Science

 Vanadium oxides are being used as the thermal sensing layer because of their applications in infrared detectors. They have high temperature coefficient of resistance, favorable… (more)

Subjects/Keywords: Vanadium Dioxide Thin Films; Semionducting to Metallic Transition (SMT); Thermal Sensing; Vanadium Dioxide Nanostructures; Vanadium Dioxide Thin Film Deposition; Chemical Vapor Deposition (CVD); Phase Transition; Ultrasonic Nebulised Spray Pyrolyis of Acqueous Combustion Mixture (UNSPACM); Solution Combustion Synthesis (SCS); Infrared Detectors; Metamaterials; VO2; V2O5; ITO (Indium Tin Oxide); Materials Science

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Bharathi, R. (2016). "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications". (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/handle/2005/2966 ; http://etd.ncsi.iisc.ernet.in/abstracts/3828/G27867-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Bharathi, R. “"Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications".” 2016. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://etd.iisc.ernet.in/handle/2005/2966 ; http://etd.ncsi.iisc.ernet.in/abstracts/3828/G27867-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Bharathi, R. “"Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications".” 2016. Web. 11 Nov 2019.

Vancouver:

Bharathi R. "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications". [Internet] [Thesis]. Indian Institute of Science; 2016. [cited 2019 Nov 11]. Available from: http://etd.iisc.ernet.in/handle/2005/2966 ; http://etd.ncsi.iisc.ernet.in/abstracts/3828/G27867-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Bharathi R. "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications". [Thesis]. Indian Institute of Science; 2016. Available from: http://etd.iisc.ernet.in/handle/2005/2966 ; http://etd.ncsi.iisc.ernet.in/abstracts/3828/G27867-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

13. Bharathi, R. "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications".

Degree: 2016, Indian Institute of Science

 Vanadium oxides are being used as the thermal sensing layer because of their applications in infrared detectors. They have high temperature coefficient of resistance, favorable… (more)

Subjects/Keywords: Vanadium Dioxide Thin Films; Semionducting to Metallic Transition (SMT); Thermal Sensing; Vanadium Dioxide Nanostructures; Vanadium Dioxide Thin Film Deposition; Chemical Vapor Deposition (CVD); Phase Transition; Ultrasonic Nebulised Spray Pyrolyis of Acqueous Combustion Mixture (UNSPACM); Solution Combustion Synthesis (SCS); Infrared Detectors; Metamaterials; VO2; V2O5; ITO (Indium Tin Oxide); Materials Science

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Bharathi, R. (2016). "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications". (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/2966

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Bharathi, R. “"Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications".” 2016. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/2966.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Bharathi, R. “"Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications".” 2016. Web. 11 Nov 2019.

Vancouver:

Bharathi R. "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications". [Internet] [Thesis]. Indian Institute of Science; 2016. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/2966.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Bharathi R. "Developing Device Quality Vanadium Dioxide Thin Films for Infrared Applications". [Thesis]. Indian Institute of Science; 2016. Available from: http://hdl.handle.net/2005/2966

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

14. Dharmaprakash, M S. Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films.

Degree: 2004, Indian Institute of Science

Subjects/Keywords: Thin Film Devices; Chemical Vapour Deposition (CVD); Organometallic Complexes; Metalorganic Complexes; Zirconia Thin Films; HfO2 Thin Films; MOCVD; ZrO2 Thin Films; VO2 Thin Films; Electronic Engineering

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Dharmaprakash, M. S. (2004). Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films. (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/handle/2005/1261 ; http://etd.ncsi.iisc.ernet.in/abstracts/1642/G18604-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Dharmaprakash, M S. “Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films.” 2004. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://etd.iisc.ernet.in/handle/2005/1261 ; http://etd.ncsi.iisc.ernet.in/abstracts/1642/G18604-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Dharmaprakash, M S. “Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films.” 2004. Web. 11 Nov 2019.

Vancouver:

Dharmaprakash MS. Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films. [Internet] [Thesis]. Indian Institute of Science; 2004. [cited 2019 Nov 11]. Available from: http://etd.iisc.ernet.in/handle/2005/1261 ; http://etd.ncsi.iisc.ernet.in/abstracts/1642/G18604-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Dharmaprakash MS. Development And Synthesis Of Metalorganic Complexes Of Zr, Hf, And Cr For Application To The CVD And Sol-Gel Synthesis Of Oxide Thin Films. [Thesis]. Indian Institute of Science; 2004. Available from: http://etd.iisc.ernet.in/handle/2005/1261 ; http://etd.ncsi.iisc.ernet.in/abstracts/1642/G18604-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

15. Kavitha, R. Development And Study Of Oxide Films By Combustion Flame Pyrolysis.

Degree: 2005, Indian Institute of Science

Subjects/Keywords: Combustion Flame Pyrolysis; Oxide Films; Thin Film Deposition Process; Chemical Vapour Deposition (CVD); Spray Pyrolysis; Pyrolysis; Physical Vapour Deposition; Flame Spray Pyrolysis; Thin Film Deposition; ZnO Films; Alumina Films; Materials Engineering

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Kavitha, R. (2005). Development And Study Of Oxide Films By Combustion Flame Pyrolysis. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/1388

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kavitha, R. “Development And Study Of Oxide Films By Combustion Flame Pyrolysis.” 2005. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/1388.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kavitha, R. “Development And Study Of Oxide Films By Combustion Flame Pyrolysis.” 2005. Web. 11 Nov 2019.

Vancouver:

Kavitha R. Development And Study Of Oxide Films By Combustion Flame Pyrolysis. [Internet] [Thesis]. Indian Institute of Science; 2005. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/1388.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kavitha R. Development And Study Of Oxide Films By Combustion Flame Pyrolysis. [Thesis]. Indian Institute of Science; 2005. Available from: http://hdl.handle.net/2005/1388

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

16. Goswami, Jaydeb. Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x.

Degree: 1995, Indian Institute of Science

Subjects/Keywords: Cuprate Superconductors - Vapor Deposition; Yettrium Superconductors; Chemical Vapor Deposition (CVD); Thin Copper Films - Chemical Vapor Deposition; Thin Film Deposition; Thin Films; Copper Thin Films; YBCO Films; Manufacturing Engineering

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Goswami, J. (1995). Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x. (Thesis). Indian Institute of Science. Retrieved from http://hdl.handle.net/2005/2092

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Goswami, Jaydeb. “Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x.” 1995. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://hdl.handle.net/2005/2092.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Goswami, Jaydeb. “Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x.” 1995. Web. 11 Nov 2019.

Vancouver:

Goswami J. Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x. [Internet] [Thesis]. Indian Institute of Science; 1995. [cited 2019 Nov 11]. Available from: http://hdl.handle.net/2005/2092.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Goswami J. Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x. [Thesis]. Indian Institute of Science; 1995. Available from: http://hdl.handle.net/2005/2092

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

17. Kavitha, R. Development And Study Of Oxide Films By Combustion Flame Pyrolysis.

Degree: 2005, Indian Institute of Science

Subjects/Keywords: Combustion Flame Pyrolysis; Oxide Films; Thin Film Deposition Process; Chemical Vapour Deposition (CVD); Spray Pyrolysis; Pyrolysis; Physical Vapour Deposition; Flame Spray Pyrolysis; Thin Film Deposition; ZnO Films; Alumina Films; Materials Engineering

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Kavitha, R. (2005). Development And Study Of Oxide Films By Combustion Flame Pyrolysis. (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/handle/2005/1388 ; http://etd.ncsi.iisc.ernet.in/abstracts/1795/G19002-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kavitha, R. “Development And Study Of Oxide Films By Combustion Flame Pyrolysis.” 2005. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://etd.iisc.ernet.in/handle/2005/1388 ; http://etd.ncsi.iisc.ernet.in/abstracts/1795/G19002-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kavitha, R. “Development And Study Of Oxide Films By Combustion Flame Pyrolysis.” 2005. Web. 11 Nov 2019.

Vancouver:

Kavitha R. Development And Study Of Oxide Films By Combustion Flame Pyrolysis. [Internet] [Thesis]. Indian Institute of Science; 2005. [cited 2019 Nov 11]. Available from: http://etd.iisc.ernet.in/handle/2005/1388 ; http://etd.ncsi.iisc.ernet.in/abstracts/1795/G19002-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kavitha R. Development And Study Of Oxide Films By Combustion Flame Pyrolysis. [Thesis]. Indian Institute of Science; 2005. Available from: http://etd.iisc.ernet.in/handle/2005/1388 ; http://etd.ncsi.iisc.ernet.in/abstracts/1795/G19002-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Indian Institute of Science

18. Goswami, Jaydeb. Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x.

Degree: 1995, Indian Institute of Science

Subjects/Keywords: Cuprate Superconductors - Vapor Deposition; Yettrium Superconductors; Chemical Vapor Deposition (CVD); Thin Copper Films - Chemical Vapor Deposition; Thin Film Deposition; Thin Films; Copper Thin Films; YBCO Films; Manufacturing Engineering

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Goswami, J. (1995). Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x. (Thesis). Indian Institute of Science. Retrieved from http://etd.iisc.ernet.in/handle/2005/2092 ; http://etd.ncsi.iisc.ernet.in/abstracts/2693/G14454-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Goswami, Jaydeb. “Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x.” 1995. Thesis, Indian Institute of Science. Accessed November 11, 2019. http://etd.iisc.ernet.in/handle/2005/2092 ; http://etd.ncsi.iisc.ernet.in/abstracts/2693/G14454-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Goswami, Jaydeb. “Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x.” 1995. Web. 11 Nov 2019.

Vancouver:

Goswami J. Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x. [Internet] [Thesis]. Indian Institute of Science; 1995. [cited 2019 Nov 11]. Available from: http://etd.iisc.ernet.in/handle/2005/2092 ; http://etd.ncsi.iisc.ernet.in/abstracts/2693/G14454-Abs.pdf.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Goswami J. Chemical Vapor Deposition Of Thin Films Of Copper And YBa2Cu3O7-x. [Thesis]. Indian Institute of Science; 1995. Available from: http://etd.iisc.ernet.in/handle/2005/2092 ; http://etd.ncsi.iisc.ernet.in/abstracts/2693/G14454-Abs.pdf

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

.