Advanced search options

Advanced Search Options 🞨

Browse by author name (“Author name starts with…”).

Find ETDs with:

in
/  
in
/  
in
/  
in

Written in Published in Earliest date Latest date

Sorted by

Results per page:

Sorted by: relevance · author · university · dateNew search

You searched for subject:( co compatible). Showing records 1 – 3 of 3 total matches.

Search Limiters

Last 2 Years | English Only

No search limiters apply to these results.

▼ Search Limiters


Louisiana State University

1. Lee, Seokhyun. New Binary Ti Vectors with Co-directional Replicons for Agrobacterium Tumefaciens-mediated Transformation of Higher Plants.

Degree: PhD, Plant Sciences, 2010, Louisiana State University

Small, high-yielding binary Ti vectors of Agrobacterium tumefaciens were constructed. All four basic components of the vector, ColE1 replicon (715 bp) for Escherichia coli, VS1 replicon (2,659 bp) for A. tumefaciens, a bacterial kanamycin resistance gene (999 bp), and the T-DNA region (170 bp), were modified to reduce the vector size to 4,566 bp and to introduce a number of mutations to increase the copy number and other functionality. The transcriptional direction of VS1 replicon can be the same as that of ColE1 replicon (co-directional transcription), or opposite (head-on transcription) as in the case of widely used vectors (pPZP or pCambia). The new binary vectors with co-directional transcription yielded up to four-fold higher E. coli transformation frequency, and 1.2 to 1.7-fold higher in A. tumefaciens than the head-on transcription. Compared to the pCambia vector, the new vectors have over ten-fold higher transformation frequencies in A. tumefaciens and five-fold greater DNA yields in E. coli. The proper functions of the new T-DNA borders and new plant selection marker genes were confirmed after tobacco leaf discs transformation. Genetic analysis of kanamycin resistance trait among T1 progeny indicates that the kanamycin resistance genes were integrated stably into a locus or closely linked loci of the nuclear chromosomal DNA of the primary transgenic plants and inherited to the second generation. A tetracycline-based binary Ti vectors was also constructed to facilitate efficient cloning afforded by the Gateway Technology for Agrobacterium-mediated transformation of higher plants. Because the Gateway Technology entry/donor vectors are kanamycin-based, tetracycline-based destination and expression vectors are easily selected for the antibiotic resistance in the E. coli. The Gateway expression vector with a gus gene was constructed. The appendices include a manuscript by Su G, Park S, Lee S, and Murai N entitled “Low co-cultivatin temperature at 20°C improved Agrobacterium tumefacciens-mediated transformation of tobacco leaf discs”. Provisional Patent (application number 61328250) entitled “Binary Ti vectors with Co-directional replicons for transformation of eukaryotes and prokaryotes” was applied.

Subjects/Keywords: co-directional replicon; Gateway compatible; binary vector

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Lee, S. (2010). New Binary Ti Vectors with Co-directional Replicons for Agrobacterium Tumefaciens-mediated Transformation of Higher Plants. (Doctoral Dissertation). Louisiana State University. Retrieved from etd-11182010-160247 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1623

Chicago Manual of Style (16th Edition):

Lee, Seokhyun. “New Binary Ti Vectors with Co-directional Replicons for Agrobacterium Tumefaciens-mediated Transformation of Higher Plants.” 2010. Doctoral Dissertation, Louisiana State University. Accessed January 20, 2021. etd-11182010-160247 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1623.

MLA Handbook (7th Edition):

Lee, Seokhyun. “New Binary Ti Vectors with Co-directional Replicons for Agrobacterium Tumefaciens-mediated Transformation of Higher Plants.” 2010. Web. 20 Jan 2021.

Vancouver:

Lee S. New Binary Ti Vectors with Co-directional Replicons for Agrobacterium Tumefaciens-mediated Transformation of Higher Plants. [Internet] [Doctoral dissertation]. Louisiana State University; 2010. [cited 2021 Jan 20]. Available from: etd-11182010-160247 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1623.

Council of Science Editors:

Lee S. New Binary Ti Vectors with Co-directional Replicons for Agrobacterium Tumefaciens-mediated Transformation of Higher Plants. [Doctoral Dissertation]. Louisiana State University; 2010. Available from: etd-11182010-160247 ; https://digitalcommons.lsu.edu/gradschool_dissertations/1623


North Carolina State University

2. Zweber, Amy Elizabeth. Enhancement of the Lithographic Process using Supercritical Carbon Dioxide in the Development Step.

Degree: PhD, Chemical Engineering, 2007, North Carolina State University

As microelectronic features reach the 45 nm-node and beyond, extreme ultraviolet (EUV) lithography and other techniques are being explored as the next generation lithographic process. The current and continuing challenges faced by these practices are the reduction of image collapse and line width roughness (LWR). This dissertation covers two techniques utilizing CO₂ in the development step with the means to reduce these challenges: a CO₂ drying method to remove the development rinse solution and a carbon dioxide compatible salt ⁄ supercritical carbon dioxide (CCS ⁄ scCO₂) direct development. The CO₂ drying method uses scCO₂ to reduce the surface tension of the water rinse solution after development. This method has potential to reduce image collapse but not in a timely manner due to the water solubility in CO₂ being too low for chemical removal and yet too high for mechanical removal. On the other hand, the CCS ⁄ scCO₂ direct development of standard EUV photoresists achieves reduction of both line width roughness and image collapse in high aspect ratio features. The CCS ⁄ scCO₂ one step development takes advantage of the scCO₂ low surface tension to help prevent image collapse and the plasticizing properties of CO₂ in polymers to assist in reduction of line width roughness. The CCS, a fluorinated ammonium salt, associates with the photoresist Brönsted acid groups in the unexposed regions promoting the photoresist dissolution into the scCO₂ rich phase, which results in a reverse development. A simplified rate model and quartz crystal microbalance (QCM) rate experiments were employed to understand the kinetics and overall mechanism of photoresist dissolution into the high pressure CCS ⁄ scCO₂ solution. At 5mM CCS, the zero order photoresist removal confirmed that the photoresist phase transfer, photoresist mass transfer, or both were the rate limiting steps which was the premise used for the rate equation. Increasing temperature (35°C-50°C) at a density of 0.896 g⁄ml was found to increase the removal rate due to phase transfer limitations and followed an Arrhenius behavior (Ea = 79.0 kJ⁄mol). Increasing pressure (4000-5000 psig) at 40°C also increased the removal rate due to an increasing CO₂ solubility parameter and phase transfer coefficient, but at 50°C pressure had little effect on the removal rate where phase transfer limitations were no longer present. When the CCS concentration was in global excess of Brönsted acid groups 2400:1 at 5mM, the CCS ⁄ scCO₂ developer removed the photoresist linearly with time. At lower CCS concentrations but still in global excess of Brönsted acid groups, the photoresist removal slowed (0.5mM CCS, ˜240:1) or was prevented (0.03mM CCS, ˜15:1) due to partitioning of the CCS between the CO₂ rich phase and the film. The fundamentals of CO₂ and CCS adsorption onto the SiO₂… Advisors/Committee Members: Ruben G. Carbonell, Committee Chair (advisor).

Subjects/Keywords: CO<; sub>; 2<; /sub>; compatible salt; lithography; image collapse; photoresist dissolution; carbon dioxide; line width roughness

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Zweber, A. E. (2007). Enhancement of the Lithographic Process using Supercritical Carbon Dioxide in the Development Step. (Doctoral Dissertation). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/2998

Chicago Manual of Style (16th Edition):

Zweber, Amy Elizabeth. “Enhancement of the Lithographic Process using Supercritical Carbon Dioxide in the Development Step.” 2007. Doctoral Dissertation, North Carolina State University. Accessed January 20, 2021. http://www.lib.ncsu.edu/resolver/1840.16/2998.

MLA Handbook (7th Edition):

Zweber, Amy Elizabeth. “Enhancement of the Lithographic Process using Supercritical Carbon Dioxide in the Development Step.” 2007. Web. 20 Jan 2021.

Vancouver:

Zweber AE. Enhancement of the Lithographic Process using Supercritical Carbon Dioxide in the Development Step. [Internet] [Doctoral dissertation]. North Carolina State University; 2007. [cited 2021 Jan 20]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/2998.

Council of Science Editors:

Zweber AE. Enhancement of the Lithographic Process using Supercritical Carbon Dioxide in the Development Step. [Doctoral Dissertation]. North Carolina State University; 2007. Available from: http://www.lib.ncsu.edu/resolver/1840.16/2998


Aristotle University Of Thessaloniki (AUTH); Αριστοτέλειο Πανεπιστήμιο Θεσσαλονίκης (ΑΠΘ)

3. Dabos, George. Integrated photonic and plasmonic circuits for optical interconnect applications.

Degree: 2018, Aristotle University Of Thessaloniki (AUTH); Αριστοτέλειο Πανεπιστήμιο Θεσσαλονίκης (ΑΠΘ)

Living in the era of “BIG DATA” and Internet-Of-Things (IoT) optical interconnecttechnologies have been introduced as essential technological workhorse in scaling up thebandwidth of optical communications across several segments of networks with variousreach, spanning from inter-and intra- Data-Center (DC), rack-to-rack, board-to-board tochip-to-chip communication links. Photonic integration technologies employing SiliconPhotonics and Plasmonics continue to evolve with the prospect of revolutionizing futureoptical interconnects for multidisciplinary applications, by building up powerfulPhotonic-Integrated-Circuits (PICs), yet leveraging the existing CMOS infrastructures.The main research contributions of this thesis revolved around the development of novelsilicon photonic and plasmonic devices as well as circuits, addressing fundamentalrequirements imposed by optical interconnects for DCs and on-chip communications aswell as biosensing applications, complying with CMOS manufacturing standards andaiming at ultra-high performance.At first, a series of uni-directional and bi-directional fully etched Grating-Couplers(GCs) on 340 nm thick Si layer have been proposed aiming to face the challenge of 3Dintegrated Vertical-Cavity-Surface-Emitting-Laser arrays on SOI substrates for futureActive-Optical-Cables. GCs designs that employ a 340 nm thick Si layer against otherapproaches that employ grating structures with ultra-fine feature sizes, customized Silayer thickness, thinned oxide buffers, a-Si overlays and more than one etching-stepskeeping the manufacturing complexity at high levels. By applying chirping andapodization techniques based on “meta-heuristic algorithms”, the experimental couplinglosses for a uni-directional, fully etched, apodized and TM operating GC reached 4.8 dBat 1547 nm. Going one step further and taking into account an almost unmodified 0.35μm CMOS Back-End-Of-Line process along with its dielectric stack, bi-directionalSWGCs (Sub-Wavelength Grating Couplers) for TE or TM polarization have beentheoretically proposed exhibiting sub-dB coupling loss values with high immunity tooptical back-reflections and increased alignment tolerance. Sub-wavelength engineeringbased on grating nanostructures has been incorporated for the first time in a bidirectionalGC layout in view of flip-chip bonded VCSEL arrays on SOI.Moving far deeper into the development of photonic integration technologies, aplasmo-photonic waveguide platform is presented, merging Si3N4 photonics with nobleand CMOS Surface-Plasmon-Polariton (SPP) waveguides in view of optical interconnectapplications for DCs and biosensing. More specifically, the co-integration of Si3N4 photonics with gold based slot and stripe SPP waveguides for biosensing applications,relied on butt and vertical directionally coupled Si3N4-to-plasmonic interfaces, thatdemonstrated experimental insertion losses around 2.5 dB in aqueous environment at1550 nm. The proposed interfaces facilitated the excitation of SPP modes on-chipwithout using bulk optics. Si3N4 photonics have…

Subjects/Keywords: Active - optical - cables; Aluminum plasmonics; Podized grating couplers CMOS compatible; CMOS plasmonics; Co - integrated plasmonics; Fully etched grating couplers; Optical interconnects; Particle - warm - ptimization perfectly vertical coupling; Plasmonics; Plasmo - photonic waveguide platform; Silicon nitride; Silicon photonics; Sub - wavelength engineering; Surface - plasmon - polariton; VCSEL - to - SOI

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Dabos, G. (2018). Integrated photonic and plasmonic circuits for optical interconnect applications. (Thesis). Aristotle University Of Thessaloniki (AUTH); Αριστοτέλειο Πανεπιστήμιο Θεσσαλονίκης (ΑΠΘ). Retrieved from http://hdl.handle.net/10442/hedi/44291

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Dabos, George. “Integrated photonic and plasmonic circuits for optical interconnect applications.” 2018. Thesis, Aristotle University Of Thessaloniki (AUTH); Αριστοτέλειο Πανεπιστήμιο Θεσσαλονίκης (ΑΠΘ). Accessed January 20, 2021. http://hdl.handle.net/10442/hedi/44291.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Dabos, George. “Integrated photonic and plasmonic circuits for optical interconnect applications.” 2018. Web. 20 Jan 2021.

Vancouver:

Dabos G. Integrated photonic and plasmonic circuits for optical interconnect applications. [Internet] [Thesis]. Aristotle University Of Thessaloniki (AUTH); Αριστοτέλειο Πανεπιστήμιο Θεσσαλονίκης (ΑΠΘ); 2018. [cited 2021 Jan 20]. Available from: http://hdl.handle.net/10442/hedi/44291.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Dabos G. Integrated photonic and plasmonic circuits for optical interconnect applications. [Thesis]. Aristotle University Of Thessaloniki (AUTH); Αριστοτέλειο Πανεπιστήμιο Θεσσαλονίκης (ΑΠΘ); 2018. Available from: http://hdl.handle.net/10442/hedi/44291

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

.