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You searched for +publisher:"University of Arizona" +contributor:("Shadman, Farhang"). Showing records 1 – 30 of 79 total matches.

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University of Arizona

1. Jhothiraman, Jivaan Kishore. Comprehensive Methods for Contamination Control in UHP Fluids .

Degree: 2016, University of Arizona

 The demand for high performance electronic devices is ever increasing in today's world with advent of digital technology in every field. In order to support… (more)

Subjects/Keywords: contamination control; Gas Adsorption Desorption; Process modelling; Transport Phenomena; Ultra high pure gas distribution; Chemical Engineering; Computational fluid dynamics

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APA (6th Edition):

Jhothiraman, J. K. (2016). Comprehensive Methods for Contamination Control in UHP Fluids . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/605112

Chicago Manual of Style (16th Edition):

Jhothiraman, Jivaan Kishore. “Comprehensive Methods for Contamination Control in UHP Fluids .” 2016. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/605112.

MLA Handbook (7th Edition):

Jhothiraman, Jivaan Kishore. “Comprehensive Methods for Contamination Control in UHP Fluids .” 2016. Web. 14 Apr 2021.

Vancouver:

Jhothiraman JK. Comprehensive Methods for Contamination Control in UHP Fluids . [Internet] [Doctoral dissertation]. University of Arizona; 2016. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/605112.

Council of Science Editors:

Jhothiraman JK. Comprehensive Methods for Contamination Control in UHP Fluids . [Doctoral Dissertation]. University of Arizona; 2016. Available from: http://hdl.handle.net/10150/605112


University of Arizona

2. Zhao, Mingrui. Development of A Contactless Technique for Electrodeposition and Porous Silicon Formation .

Degree: 2017, University of Arizona

 In the recent years, there has been a growing interest in micro- and nano-structured composite systems due to their wide use in microelectronics, optoelectronics, magneto-optical… (more)

Subjects/Keywords: 3D packaging; Electrodeposition; High aspect ratio vias; Porous silicon; Semiconductor processing

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APA (6th Edition):

Zhao, M. (2017). Development of A Contactless Technique for Electrodeposition and Porous Silicon Formation . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/626314

Chicago Manual of Style (16th Edition):

Zhao, Mingrui. “Development of A Contactless Technique for Electrodeposition and Porous Silicon Formation .” 2017. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/626314.

MLA Handbook (7th Edition):

Zhao, Mingrui. “Development of A Contactless Technique for Electrodeposition and Porous Silicon Formation .” 2017. Web. 14 Apr 2021.

Vancouver:

Zhao M. Development of A Contactless Technique for Electrodeposition and Porous Silicon Formation . [Internet] [Doctoral dissertation]. University of Arizona; 2017. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/626314.

Council of Science Editors:

Zhao M. Development of A Contactless Technique for Electrodeposition and Porous Silicon Formation . [Doctoral Dissertation]. University of Arizona; 2017. Available from: http://hdl.handle.net/10150/626314


University of Arizona

3. Rottman, Jeffrey J. Fundamentals and Application of Porous Media Filtration for the Removal of Nanoparticles from Industrial Wastewater .

Degree: 2012, University of Arizona

 Increasing use of engineered nanomaterials presents concerns as some nanoparticles appear to be harmful to both human health and the environment. Effective treatment methods are… (more)

Subjects/Keywords: Porous Media; Sand; Silicon Dioxide; Titanium Dioxide; Chemical Engineering; Diatomaceous Earth; Nanoparticle

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APA (6th Edition):

Rottman, J. J. (2012). Fundamentals and Application of Porous Media Filtration for the Removal of Nanoparticles from Industrial Wastewater . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/255157

Chicago Manual of Style (16th Edition):

Rottman, Jeffrey J. “Fundamentals and Application of Porous Media Filtration for the Removal of Nanoparticles from Industrial Wastewater .” 2012. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/255157.

MLA Handbook (7th Edition):

Rottman, Jeffrey J. “Fundamentals and Application of Porous Media Filtration for the Removal of Nanoparticles from Industrial Wastewater .” 2012. Web. 14 Apr 2021.

Vancouver:

Rottman JJ. Fundamentals and Application of Porous Media Filtration for the Removal of Nanoparticles from Industrial Wastewater . [Internet] [Doctoral dissertation]. University of Arizona; 2012. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/255157.

Council of Science Editors:

Rottman JJ. Fundamentals and Application of Porous Media Filtration for the Removal of Nanoparticles from Industrial Wastewater . [Doctoral Dissertation]. University of Arizona; 2012. Available from: http://hdl.handle.net/10150/255157


University of Arizona

4. Dittler, Roy Frank. Reducing Ultra-High-Purity (UHP) Gas Consumption by Characterization of Trace Contaminant Kinetic and Transport Behavior in UHP Fabrication Environments .

Degree: 2014, University of Arizona

 Trends show that the fraction of the world's population with electronic devices using modern integrated circuits is increasing at a rapid rate. To meet consumer… (more)

Subjects/Keywords: Back Diffusion; Contamination; Cyclic Purge; Dynamic Simulation; Ultra-pure Gas Systems; Chemical Engineering; Adsorption Desorption

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APA (6th Edition):

Dittler, R. F. (2014). Reducing Ultra-High-Purity (UHP) Gas Consumption by Characterization of Trace Contaminant Kinetic and Transport Behavior in UHP Fabrication Environments . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/321322

Chicago Manual of Style (16th Edition):

Dittler, Roy Frank. “Reducing Ultra-High-Purity (UHP) Gas Consumption by Characterization of Trace Contaminant Kinetic and Transport Behavior in UHP Fabrication Environments .” 2014. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/321322.

MLA Handbook (7th Edition):

Dittler, Roy Frank. “Reducing Ultra-High-Purity (UHP) Gas Consumption by Characterization of Trace Contaminant Kinetic and Transport Behavior in UHP Fabrication Environments .” 2014. Web. 14 Apr 2021.

Vancouver:

Dittler RF. Reducing Ultra-High-Purity (UHP) Gas Consumption by Characterization of Trace Contaminant Kinetic and Transport Behavior in UHP Fabrication Environments . [Internet] [Doctoral dissertation]. University of Arizona; 2014. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/321322.

Council of Science Editors:

Dittler RF. Reducing Ultra-High-Purity (UHP) Gas Consumption by Characterization of Trace Contaminant Kinetic and Transport Behavior in UHP Fabrication Environments . [Doctoral Dissertation]. University of Arizona; 2014. Available from: http://hdl.handle.net/10150/321322


University of Arizona

5. Frank, Christian Michael. Monitoring Wafer-Pad Interfacial Conditions Via Platen Motor Current in Copper, Cobalt, and Shallow Trench Isolation Chemical Mechanical Planarization .

Degree: 2020, University of Arizona

 The experimental analyses in this thesis are presented in two parts (see Chapters 5 and 6). The first study seeks to uncover the relationships that… (more)

Subjects/Keywords: Chemical Mechanical Planarization; CMP; Coefficient of friction; in-situ monitoring; Shear force

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APA (6th Edition):

Frank, C. M. (2020). Monitoring Wafer-Pad Interfacial Conditions Via Platen Motor Current in Copper, Cobalt, and Shallow Trench Isolation Chemical Mechanical Planarization . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/641666

Chicago Manual of Style (16th Edition):

Frank, Christian Michael. “Monitoring Wafer-Pad Interfacial Conditions Via Platen Motor Current in Copper, Cobalt, and Shallow Trench Isolation Chemical Mechanical Planarization .” 2020. Masters Thesis, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/641666.

MLA Handbook (7th Edition):

Frank, Christian Michael. “Monitoring Wafer-Pad Interfacial Conditions Via Platen Motor Current in Copper, Cobalt, and Shallow Trench Isolation Chemical Mechanical Planarization .” 2020. Web. 14 Apr 2021.

Vancouver:

Frank CM. Monitoring Wafer-Pad Interfacial Conditions Via Platen Motor Current in Copper, Cobalt, and Shallow Trench Isolation Chemical Mechanical Planarization . [Internet] [Masters thesis]. University of Arizona; 2020. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/641666.

Council of Science Editors:

Frank CM. Monitoring Wafer-Pad Interfacial Conditions Via Platen Motor Current in Copper, Cobalt, and Shallow Trench Isolation Chemical Mechanical Planarization . [Masters Thesis]. University of Arizona; 2020. Available from: http://hdl.handle.net/10150/641666


University of Arizona

6. Chang, YenHsun. Kinetics and Mechanism of Energetic Events in Deposition Reactor Systems for Semiconductor Fabrication .

Degree: 2018, University of Arizona

 The study of the thesis is about the energetic material that are used in semiconductor industries. A process model is developed to simulate the processes… (more)

Subjects/Keywords: Energetic events; energetic material; process stimulation model

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APA (6th Edition):

Chang, Y. (2018). Kinetics and Mechanism of Energetic Events in Deposition Reactor Systems for Semiconductor Fabrication . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/631923

Chicago Manual of Style (16th Edition):

Chang, YenHsun. “Kinetics and Mechanism of Energetic Events in Deposition Reactor Systems for Semiconductor Fabrication .” 2018. Masters Thesis, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/631923.

MLA Handbook (7th Edition):

Chang, YenHsun. “Kinetics and Mechanism of Energetic Events in Deposition Reactor Systems for Semiconductor Fabrication .” 2018. Web. 14 Apr 2021.

Vancouver:

Chang Y. Kinetics and Mechanism of Energetic Events in Deposition Reactor Systems for Semiconductor Fabrication . [Internet] [Masters thesis]. University of Arizona; 2018. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/631923.

Council of Science Editors:

Chang Y. Kinetics and Mechanism of Energetic Events in Deposition Reactor Systems for Semiconductor Fabrication . [Masters Thesis]. University of Arizona; 2018. Available from: http://hdl.handle.net/10150/631923


University of Arizona

7. Peckler, Lauren Tiffany. Analysis of In-Situ Shear and Normal Forces During Metal Cmp, Electrical Interface States of Sulfur-Passivated Sige Moscaps, and Reaction Kinetics of Pyrite Nanocrystal Purity .

Degree: 2018, University of Arizona

 The first study presented in this dissertation concerns the synthesis of pyrite (FeS2) nanocrystals (NC). Since 1980s, pyrite has been studied as a potential replacement… (more)

Subjects/Keywords: CMP; MOSCAP; passivation; pyrite; SiGe; tribology

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APA (6th Edition):

Peckler, L. T. (2018). Analysis of In-Situ Shear and Normal Forces During Metal Cmp, Electrical Interface States of Sulfur-Passivated Sige Moscaps, and Reaction Kinetics of Pyrite Nanocrystal Purity . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/628181

Chicago Manual of Style (16th Edition):

Peckler, Lauren Tiffany. “Analysis of In-Situ Shear and Normal Forces During Metal Cmp, Electrical Interface States of Sulfur-Passivated Sige Moscaps, and Reaction Kinetics of Pyrite Nanocrystal Purity .” 2018. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/628181.

MLA Handbook (7th Edition):

Peckler, Lauren Tiffany. “Analysis of In-Situ Shear and Normal Forces During Metal Cmp, Electrical Interface States of Sulfur-Passivated Sige Moscaps, and Reaction Kinetics of Pyrite Nanocrystal Purity .” 2018. Web. 14 Apr 2021.

Vancouver:

Peckler LT. Analysis of In-Situ Shear and Normal Forces During Metal Cmp, Electrical Interface States of Sulfur-Passivated Sige Moscaps, and Reaction Kinetics of Pyrite Nanocrystal Purity . [Internet] [Doctoral dissertation]. University of Arizona; 2018. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/628181.

Council of Science Editors:

Peckler LT. Analysis of In-Situ Shear and Normal Forces During Metal Cmp, Electrical Interface States of Sulfur-Passivated Sige Moscaps, and Reaction Kinetics of Pyrite Nanocrystal Purity . [Doctoral Dissertation]. University of Arizona; 2018. Available from: http://hdl.handle.net/10150/628181


University of Arizona

8. Wu, Junsheng. Quality Control and Waste Reduction in Ultra-High-Purity Gas Delivery Systems .

Degree: 2019, University of Arizona

 Today is the data age; tremendous amount of data is generated, stored, transferred, and computed every second. As the consequence of the rapidly growing data… (more)

Subjects/Keywords: adsorption; cryogenic; high-purity gases; impurity drift; moisture

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APA (6th Edition):

Wu, J. (2019). Quality Control and Waste Reduction in Ultra-High-Purity Gas Delivery Systems . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/634293

Chicago Manual of Style (16th Edition):

Wu, Junsheng. “Quality Control and Waste Reduction in Ultra-High-Purity Gas Delivery Systems .” 2019. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/634293.

MLA Handbook (7th Edition):

Wu, Junsheng. “Quality Control and Waste Reduction in Ultra-High-Purity Gas Delivery Systems .” 2019. Web. 14 Apr 2021.

Vancouver:

Wu J. Quality Control and Waste Reduction in Ultra-High-Purity Gas Delivery Systems . [Internet] [Doctoral dissertation]. University of Arizona; 2019. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/634293.

Council of Science Editors:

Wu J. Quality Control and Waste Reduction in Ultra-High-Purity Gas Delivery Systems . [Doctoral Dissertation]. University of Arizona; 2019. Available from: http://hdl.handle.net/10150/634293


University of Arizona

9. Zeng, Chao. Potential Environmental and Health Risks from Nanoparticles and III-V Materials Used in Semiconductor Manufacturing .

Degree: 2017, University of Arizona

 Nanoparticles (NPs) have unique electronic, optical and chemical properties due to the extreme small size. Engineered nanoparticles (ENPs) are intentionally produced for desired applications, with… (more)

Subjects/Keywords: CMP; ecotoxicity; engineered nanoparticles; III-V semiconductor materials; arsenic

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APA (6th Edition):

Zeng, C. (2017). Potential Environmental and Health Risks from Nanoparticles and III-V Materials Used in Semiconductor Manufacturing . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/623067

Chicago Manual of Style (16th Edition):

Zeng, Chao. “Potential Environmental and Health Risks from Nanoparticles and III-V Materials Used in Semiconductor Manufacturing .” 2017. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/623067.

MLA Handbook (7th Edition):

Zeng, Chao. “Potential Environmental and Health Risks from Nanoparticles and III-V Materials Used in Semiconductor Manufacturing .” 2017. Web. 14 Apr 2021.

Vancouver:

Zeng C. Potential Environmental and Health Risks from Nanoparticles and III-V Materials Used in Semiconductor Manufacturing . [Internet] [Doctoral dissertation]. University of Arizona; 2017. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/623067.

Council of Science Editors:

Zeng C. Potential Environmental and Health Risks from Nanoparticles and III-V Materials Used in Semiconductor Manufacturing . [Doctoral Dissertation]. University of Arizona; 2017. Available from: http://hdl.handle.net/10150/623067


University of Arizona

10. Watson, Eric. Characterization and Control of Damaging Reactions in the Chemical Vapor Deposition Exhaust Systems .

Degree: 2020, University of Arizona

 The chemical reactions occurring in the exhaust systems of the deposition reactors can potentially lead to the formation of problematic reactive compounds on the exhaust… (more)

Subjects/Keywords: Chemical Vapor Deposition; Process Simulation; Run-Away Reaction

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APA (6th Edition):

Watson, E. (2020). Characterization and Control of Damaging Reactions in the Chemical Vapor Deposition Exhaust Systems . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/641674

Chicago Manual of Style (16th Edition):

Watson, Eric. “Characterization and Control of Damaging Reactions in the Chemical Vapor Deposition Exhaust Systems .” 2020. Masters Thesis, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/641674.

MLA Handbook (7th Edition):

Watson, Eric. “Characterization and Control of Damaging Reactions in the Chemical Vapor Deposition Exhaust Systems .” 2020. Web. 14 Apr 2021.

Vancouver:

Watson E. Characterization and Control of Damaging Reactions in the Chemical Vapor Deposition Exhaust Systems . [Internet] [Masters thesis]. University of Arizona; 2020. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/641674.

Council of Science Editors:

Watson E. Characterization and Control of Damaging Reactions in the Chemical Vapor Deposition Exhaust Systems . [Masters Thesis]. University of Arizona; 2020. Available from: http://hdl.handle.net/10150/641674


University of Arizona

11. Li, Mengling. Algae-Based Sorbents for Removal of Metallic Contaminants from Semiconductor Manufacturing Wastewater: Process Modeling and Reactor Design .

Degree: 2019, University of Arizona

 Removal of various soluble metallic impurities from wastewater in semiconductor fabrication plants (fabs) is a critical issue facing the microelectronics industry. Considering the large volume… (more)

Subjects/Keywords: Algae-based sorbents; Gallium removal; Semiconductor factories; Wastewater treatment

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APA (6th Edition):

Li, M. (2019). Algae-Based Sorbents for Removal of Metallic Contaminants from Semiconductor Manufacturing Wastewater: Process Modeling and Reactor Design . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/631880

Chicago Manual of Style (16th Edition):

Li, Mengling. “Algae-Based Sorbents for Removal of Metallic Contaminants from Semiconductor Manufacturing Wastewater: Process Modeling and Reactor Design .” 2019. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/631880.

MLA Handbook (7th Edition):

Li, Mengling. “Algae-Based Sorbents for Removal of Metallic Contaminants from Semiconductor Manufacturing Wastewater: Process Modeling and Reactor Design .” 2019. Web. 14 Apr 2021.

Vancouver:

Li M. Algae-Based Sorbents for Removal of Metallic Contaminants from Semiconductor Manufacturing Wastewater: Process Modeling and Reactor Design . [Internet] [Doctoral dissertation]. University of Arizona; 2019. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/631880.

Council of Science Editors:

Li M. Algae-Based Sorbents for Removal of Metallic Contaminants from Semiconductor Manufacturing Wastewater: Process Modeling and Reactor Design . [Doctoral Dissertation]. University of Arizona; 2019. Available from: http://hdl.handle.net/10150/631880


University of Arizona

12. Khaghani, Ali. Spatiotemporal Analysis of Aerosol Over A Major Salt Lake Region: Case Study of Lake Urmia In Iran .

Degree: 2017, University of Arizona

 Lake Urmia (LU), which once had been the second largest hypersaline lake in the world, and greatest in the Middle East, has undergone severe environmental… (more)

Subjects/Keywords: Aerosol; AOD; hypersaline; Lake Urmia; MODIS; terra

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APA (6th Edition):

Khaghani, A. (2017). Spatiotemporal Analysis of Aerosol Over A Major Salt Lake Region: Case Study of Lake Urmia In Iran . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/624115

Chicago Manual of Style (16th Edition):

Khaghani, Ali. “Spatiotemporal Analysis of Aerosol Over A Major Salt Lake Region: Case Study of Lake Urmia In Iran .” 2017. Masters Thesis, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/624115.

MLA Handbook (7th Edition):

Khaghani, Ali. “Spatiotemporal Analysis of Aerosol Over A Major Salt Lake Region: Case Study of Lake Urmia In Iran .” 2017. Web. 14 Apr 2021.

Vancouver:

Khaghani A. Spatiotemporal Analysis of Aerosol Over A Major Salt Lake Region: Case Study of Lake Urmia In Iran . [Internet] [Masters thesis]. University of Arizona; 2017. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/624115.

Council of Science Editors:

Khaghani A. Spatiotemporal Analysis of Aerosol Over A Major Salt Lake Region: Case Study of Lake Urmia In Iran . [Masters Thesis]. University of Arizona; 2017. Available from: http://hdl.handle.net/10150/624115


University of Arizona

13. Bahr, Matthew. Methods for Efficient Slurry Utilization and Tribological Stability Analysis in Chemical Mechanical Planarization .

Degree: 2017, University of Arizona

 This thesis presents a series of studies pertaining to tribological, thermal, kinetic and slurry utilization aspects of chemical mechanical planaraization processes. The purpose of this… (more)

Subjects/Keywords: Ceria; Chemical Mechanical Planarization; Slurry Utilization Efficiency; Tribology

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APA (6th Edition):

Bahr, M. (2017). Methods for Efficient Slurry Utilization and Tribological Stability Analysis in Chemical Mechanical Planarization . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/624109

Chicago Manual of Style (16th Edition):

Bahr, Matthew. “Methods for Efficient Slurry Utilization and Tribological Stability Analysis in Chemical Mechanical Planarization .” 2017. Masters Thesis, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/624109.

MLA Handbook (7th Edition):

Bahr, Matthew. “Methods for Efficient Slurry Utilization and Tribological Stability Analysis in Chemical Mechanical Planarization .” 2017. Web. 14 Apr 2021.

Vancouver:

Bahr M. Methods for Efficient Slurry Utilization and Tribological Stability Analysis in Chemical Mechanical Planarization . [Internet] [Masters thesis]. University of Arizona; 2017. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/624109.

Council of Science Editors:

Bahr M. Methods for Efficient Slurry Utilization and Tribological Stability Analysis in Chemical Mechanical Planarization . [Masters Thesis]. University of Arizona; 2017. Available from: http://hdl.handle.net/10150/624109


University of Arizona

14. Udeozor, Jude Onyeka. Application of Industrial Wastewater Effluent in Growth of Algae  – Effects of Heavy Metals on the Growth Rate, Fatty Acid and Lipid Content of Chlorella Sorokiniana and Scenedesmus Obliquus .

Degree: 2017, University of Arizona

 Growing interest in biofuel production from non-fossil fuel sources has resulted in several studies exploring different raw material sources as feedstock, including many algae species,… (more)

Subjects/Keywords: CHLORELLA SOROKINIANA; HEAVY METALS; Microalgae; SCENEDESMUS OBLIQUUS; Wastewater

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APA (6th Edition):

Udeozor, J. O. (2017). Application of Industrial Wastewater Effluent in Growth of Algae  – Effects of Heavy Metals on the Growth Rate, Fatty Acid and Lipid Content of Chlorella Sorokiniana and Scenedesmus Obliquus . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/626388

Chicago Manual of Style (16th Edition):

Udeozor, Jude Onyeka. “Application of Industrial Wastewater Effluent in Growth of Algae  – Effects of Heavy Metals on the Growth Rate, Fatty Acid and Lipid Content of Chlorella Sorokiniana and Scenedesmus Obliquus .” 2017. Masters Thesis, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/626388.

MLA Handbook (7th Edition):

Udeozor, Jude Onyeka. “Application of Industrial Wastewater Effluent in Growth of Algae  – Effects of Heavy Metals on the Growth Rate, Fatty Acid and Lipid Content of Chlorella Sorokiniana and Scenedesmus Obliquus .” 2017. Web. 14 Apr 2021.

Vancouver:

Udeozor JO. Application of Industrial Wastewater Effluent in Growth of Algae  – Effects of Heavy Metals on the Growth Rate, Fatty Acid and Lipid Content of Chlorella Sorokiniana and Scenedesmus Obliquus . [Internet] [Masters thesis]. University of Arizona; 2017. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/626388.

Council of Science Editors:

Udeozor JO. Application of Industrial Wastewater Effluent in Growth of Algae  – Effects of Heavy Metals on the Growth Rate, Fatty Acid and Lipid Content of Chlorella Sorokiniana and Scenedesmus Obliquus . [Masters Thesis]. University of Arizona; 2017. Available from: http://hdl.handle.net/10150/626388


University of Arizona

15. Wu, Changhong. Control Of Slurry Flow, Temperature And Aggressive Diamonds In Chemical Mechanical Planarization .

Degree: 2015, University of Arizona

 This dissertation presents a series of studies related to the study and control of slurry flow, process temperature, and aggressive diamonds in Chemical Mechanical Planarization… (more)

Subjects/Keywords: diamond; pad surface thermal management; slurry flow; slurry injection system; temperature; Chemical Engineering; chemical mechanical planarization

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APA (6th Edition):

Wu, C. (2015). Control Of Slurry Flow, Temperature And Aggressive Diamonds In Chemical Mechanical Planarization . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/556601

Chicago Manual of Style (16th Edition):

Wu, Changhong. “Control Of Slurry Flow, Temperature And Aggressive Diamonds In Chemical Mechanical Planarization .” 2015. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/556601.

MLA Handbook (7th Edition):

Wu, Changhong. “Control Of Slurry Flow, Temperature And Aggressive Diamonds In Chemical Mechanical Planarization .” 2015. Web. 14 Apr 2021.

Vancouver:

Wu C. Control Of Slurry Flow, Temperature And Aggressive Diamonds In Chemical Mechanical Planarization . [Internet] [Doctoral dissertation]. University of Arizona; 2015. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/556601.

Council of Science Editors:

Wu C. Control Of Slurry Flow, Temperature And Aggressive Diamonds In Chemical Mechanical Planarization . [Doctoral Dissertation]. University of Arizona; 2015. Available from: http://hdl.handle.net/10150/556601


University of Arizona

16. Chiang, Chieh-Chun. Rinsing Of Wafers After Wet Processing: Simulation And Experiments .

Degree: 2015, University of Arizona

 In semiconductor manufacturing, a large amount (50 billion gallons for US semiconductor fabrication plants in 2006) of ultrapure water (UPW) is used to rinse wafers… (more)

Subjects/Keywords: Materials Science & Engineering

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APA (6th Edition):

Chiang, C. (2015). Rinsing Of Wafers After Wet Processing: Simulation And Experiments . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/578724

Chicago Manual of Style (16th Edition):

Chiang, Chieh-Chun. “Rinsing Of Wafers After Wet Processing: Simulation And Experiments .” 2015. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/578724.

MLA Handbook (7th Edition):

Chiang, Chieh-Chun. “Rinsing Of Wafers After Wet Processing: Simulation And Experiments .” 2015. Web. 14 Apr 2021.

Vancouver:

Chiang C. Rinsing Of Wafers After Wet Processing: Simulation And Experiments . [Internet] [Doctoral dissertation]. University of Arizona; 2015. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/578724.

Council of Science Editors:

Chiang C. Rinsing Of Wafers After Wet Processing: Simulation And Experiments . [Doctoral Dissertation]. University of Arizona; 2015. Available from: http://hdl.handle.net/10150/578724


University of Arizona

17. Mu, Yan. Slurry Mean Residence Time Analysis and Pad-Wafer Contact Characterization in Chemical Mechanical Planarization .

Degree: 2016, University of Arizona

 This dissertation presents a series of studies related to the slurry mean residence time analysis and the pad-wafer contact characterization in Chemical Mechanical Planarization (CMP).… (more)

Subjects/Keywords: mean residence time; pad-wafer contact; Chemical Engineering; CMP

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APA (6th Edition):

Mu, Y. (2016). Slurry Mean Residence Time Analysis and Pad-Wafer Contact Characterization in Chemical Mechanical Planarization . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/621459

Chicago Manual of Style (16th Edition):

Mu, Yan. “Slurry Mean Residence Time Analysis and Pad-Wafer Contact Characterization in Chemical Mechanical Planarization .” 2016. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/621459.

MLA Handbook (7th Edition):

Mu, Yan. “Slurry Mean Residence Time Analysis and Pad-Wafer Contact Characterization in Chemical Mechanical Planarization .” 2016. Web. 14 Apr 2021.

Vancouver:

Mu Y. Slurry Mean Residence Time Analysis and Pad-Wafer Contact Characterization in Chemical Mechanical Planarization . [Internet] [Doctoral dissertation]. University of Arizona; 2016. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/621459.

Council of Science Editors:

Mu Y. Slurry Mean Residence Time Analysis and Pad-Wafer Contact Characterization in Chemical Mechanical Planarization . [Doctoral Dissertation]. University of Arizona; 2016. Available from: http://hdl.handle.net/10150/621459


University of Arizona

18. Zhu, Tao. Smart Platform Development with Biomolecules for Biotechnological and Biomedical Applications .

Degree: 2016, University of Arizona

 The main objective of this dissertation is the synthesis and study of modified surface systems for the development of bioactive platforms and their use in… (more)

Subjects/Keywords: Functional; Ligand; Platform; Chemical Engineering; BIOMOLECULES

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APA (6th Edition):

Zhu, T. (2016). Smart Platform Development with Biomolecules for Biotechnological and Biomedical Applications . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/621757

Chicago Manual of Style (16th Edition):

Zhu, Tao. “Smart Platform Development with Biomolecules for Biotechnological and Biomedical Applications .” 2016. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/621757.

MLA Handbook (7th Edition):

Zhu, Tao. “Smart Platform Development with Biomolecules for Biotechnological and Biomedical Applications .” 2016. Web. 14 Apr 2021.

Vancouver:

Zhu T. Smart Platform Development with Biomolecules for Biotechnological and Biomedical Applications . [Internet] [Doctoral dissertation]. University of Arizona; 2016. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/621757.

Council of Science Editors:

Zhu T. Smart Platform Development with Biomolecules for Biotechnological and Biomedical Applications . [Doctoral Dissertation]. University of Arizona; 2016. Available from: http://hdl.handle.net/10150/621757

19. Han, Ruochen. Fundamental Characterization of Chemical Mechanical Planarization Relating to Slurry Dispensing and Conditioning Method .

Degree: 2017, University of Arizona

 The first part of our study introduces a new method for rapidly generating an "improved" Stribeck curve (i.e. Stribeck+ curve) that, compared to traditional Stribeck… (more)

Subjects/Keywords: Ceria slurry; Chemical Mechanical Planarization; Conditioning; Semiconductor; Slurry dispensing; Stribeck+

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APA (6th Edition):

Han, R. (2017). Fundamental Characterization of Chemical Mechanical Planarization Relating to Slurry Dispensing and Conditioning Method . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/625663

Chicago Manual of Style (16th Edition):

Han, Ruochen. “Fundamental Characterization of Chemical Mechanical Planarization Relating to Slurry Dispensing and Conditioning Method .” 2017. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/625663.

MLA Handbook (7th Edition):

Han, Ruochen. “Fundamental Characterization of Chemical Mechanical Planarization Relating to Slurry Dispensing and Conditioning Method .” 2017. Web. 14 Apr 2021.

Vancouver:

Han R. Fundamental Characterization of Chemical Mechanical Planarization Relating to Slurry Dispensing and Conditioning Method . [Internet] [Doctoral dissertation]. University of Arizona; 2017. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/625663.

Council of Science Editors:

Han R. Fundamental Characterization of Chemical Mechanical Planarization Relating to Slurry Dispensing and Conditioning Method . [Doctoral Dissertation]. University of Arizona; 2017. Available from: http://hdl.handle.net/10150/625663


University of Arizona

20. Wu, Bing. Use of a Quartz Crystal Microbalance with Dissipation Monitoring to Study Adsorption Phenomena Relevant to Semiconductor Wet Processing .

Degree: 2017, University of Arizona

 In silicon processing, contamination control is very important in each of the processing steps to ensure device reliability and enhance yield. There are many different… (more)

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APA (6th Edition):

Wu, B. (2017). Use of a Quartz Crystal Microbalance with Dissipation Monitoring to Study Adsorption Phenomena Relevant to Semiconductor Wet Processing . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/626160

Chicago Manual of Style (16th Edition):

Wu, Bing. “Use of a Quartz Crystal Microbalance with Dissipation Monitoring to Study Adsorption Phenomena Relevant to Semiconductor Wet Processing .” 2017. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/626160.

MLA Handbook (7th Edition):

Wu, Bing. “Use of a Quartz Crystal Microbalance with Dissipation Monitoring to Study Adsorption Phenomena Relevant to Semiconductor Wet Processing .” 2017. Web. 14 Apr 2021.

Vancouver:

Wu B. Use of a Quartz Crystal Microbalance with Dissipation Monitoring to Study Adsorption Phenomena Relevant to Semiconductor Wet Processing . [Internet] [Doctoral dissertation]. University of Arizona; 2017. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/626160.

Council of Science Editors:

Wu B. Use of a Quartz Crystal Microbalance with Dissipation Monitoring to Study Adsorption Phenomena Relevant to Semiconductor Wet Processing . [Doctoral Dissertation]. University of Arizona; 2017. Available from: http://hdl.handle.net/10150/626160


University of Arizona

21. Diaz, Gabriela. Synthesis and Characterization of Nanostructured Materials And Tribological Studies Of CMP Retaining Rings .

Degree: 2018, University of Arizona

 The first project contained within this script refers to the controllable synthesis and characterization of novel thermally-stable silver-based particles. The experimental approach involves the design… (more)

Subjects/Keywords: Chemical Mechanical Planarization; Materials Deposition; Retaining Rings; Silver Nanostructures; Synthesis and Characterization; Tribological Studies

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APA (6th Edition):

Diaz, G. (2018). Synthesis and Characterization of Nanostructured Materials And Tribological Studies Of CMP Retaining Rings . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/631463

Chicago Manual of Style (16th Edition):

Diaz, Gabriela. “Synthesis and Characterization of Nanostructured Materials And Tribological Studies Of CMP Retaining Rings .” 2018. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/631463.

MLA Handbook (7th Edition):

Diaz, Gabriela. “Synthesis and Characterization of Nanostructured Materials And Tribological Studies Of CMP Retaining Rings .” 2018. Web. 14 Apr 2021.

Vancouver:

Diaz G. Synthesis and Characterization of Nanostructured Materials And Tribological Studies Of CMP Retaining Rings . [Internet] [Doctoral dissertation]. University of Arizona; 2018. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/631463.

Council of Science Editors:

Diaz G. Synthesis and Characterization of Nanostructured Materials And Tribological Studies Of CMP Retaining Rings . [Doctoral Dissertation]. University of Arizona; 2018. Available from: http://hdl.handle.net/10150/631463


University of Arizona

22. Ma, Lin. On The Chemical Nature of Aerosol, Clouds, and Precipitation along the US West Coast .

Degree: 2019, University of Arizona

 Particulate matter (PM) in ambient air affects visibility, climate, human health, and the hydrological cycle. The water-soluble fraction of PM is relevant to nucleation efficiency,… (more)

Subjects/Keywords: Atmospheric Aerosol; Chemical Composition; Morphology; Pollution Sources; Public Health; US West Coast

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APA (6th Edition):

Ma, L. (2019). On The Chemical Nature of Aerosol, Clouds, and Precipitation along the US West Coast . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/633133

Chicago Manual of Style (16th Edition):

Ma, Lin. “On The Chemical Nature of Aerosol, Clouds, and Precipitation along the US West Coast .” 2019. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/633133.

MLA Handbook (7th Edition):

Ma, Lin. “On The Chemical Nature of Aerosol, Clouds, and Precipitation along the US West Coast .” 2019. Web. 14 Apr 2021.

Vancouver:

Ma L. On The Chemical Nature of Aerosol, Clouds, and Precipitation along the US West Coast . [Internet] [Doctoral dissertation]. University of Arizona; 2019. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/633133.

Council of Science Editors:

Ma L. On The Chemical Nature of Aerosol, Clouds, and Precipitation along the US West Coast . [Doctoral Dissertation]. University of Arizona; 2019. Available from: http://hdl.handle.net/10150/633133


University of Arizona

23. McAllister, Jeffrey Connor. Novel Studies in Silicon Dioxide, Copper and Tungsten Chemical Mechanical Planarization Processes Relating to Pad Conditioning and Micro-Texture, Slurry Nanoparticles, Tribology and Kinetics .

Degree: 2019, University of Arizona

 The first part of this study explored the effect of conditioning downforce during pad break-in, and its impact on the evolution of pad surface micro-texture.… (more)

Subjects/Keywords: CMP; Conditioner; Nanoparticle; Pad; Slurry; Tungsten

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APA (6th Edition):

McAllister, J. C. (2019). Novel Studies in Silicon Dioxide, Copper and Tungsten Chemical Mechanical Planarization Processes Relating to Pad Conditioning and Micro-Texture, Slurry Nanoparticles, Tribology and Kinetics . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/636531

Chicago Manual of Style (16th Edition):

McAllister, Jeffrey Connor. “Novel Studies in Silicon Dioxide, Copper and Tungsten Chemical Mechanical Planarization Processes Relating to Pad Conditioning and Micro-Texture, Slurry Nanoparticles, Tribology and Kinetics .” 2019. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/636531.

MLA Handbook (7th Edition):

McAllister, Jeffrey Connor. “Novel Studies in Silicon Dioxide, Copper and Tungsten Chemical Mechanical Planarization Processes Relating to Pad Conditioning and Micro-Texture, Slurry Nanoparticles, Tribology and Kinetics .” 2019. Web. 14 Apr 2021.

Vancouver:

McAllister JC. Novel Studies in Silicon Dioxide, Copper and Tungsten Chemical Mechanical Planarization Processes Relating to Pad Conditioning and Micro-Texture, Slurry Nanoparticles, Tribology and Kinetics . [Internet] [Doctoral dissertation]. University of Arizona; 2019. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/636531.

Council of Science Editors:

McAllister JC. Novel Studies in Silicon Dioxide, Copper and Tungsten Chemical Mechanical Planarization Processes Relating to Pad Conditioning and Micro-Texture, Slurry Nanoparticles, Tribology and Kinetics . [Doctoral Dissertation]. University of Arizona; 2019. Available from: http://hdl.handle.net/10150/636531


University of Arizona

24. Hinckley, Adam. Activation and Deactivation of Semiconductor Surfaces .

Degree: 2019, University of Arizona

 The development of surface modification techniques is an integral part of advancing semiconductor device fabrication beyond subtractive methods. Chemically altering surfaces to be more or… (more)

Subjects/Keywords: atomic layer deposition; defect detection; organosilane; Surface deactivation

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APA (6th Edition):

Hinckley, A. (2019). Activation and Deactivation of Semiconductor Surfaces . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/636688

Chicago Manual of Style (16th Edition):

Hinckley, Adam. “Activation and Deactivation of Semiconductor Surfaces .” 2019. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/636688.

MLA Handbook (7th Edition):

Hinckley, Adam. “Activation and Deactivation of Semiconductor Surfaces .” 2019. Web. 14 Apr 2021.

Vancouver:

Hinckley A. Activation and Deactivation of Semiconductor Surfaces . [Internet] [Doctoral dissertation]. University of Arizona; 2019. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/636688.

Council of Science Editors:

Hinckley A. Activation and Deactivation of Semiconductor Surfaces . [Doctoral Dissertation]. University of Arizona; 2019. Available from: http://hdl.handle.net/10150/636688


University of Arizona

25. Chichique Martinez, Violeta Alejandra. Photosensitizing Activity of Effluent Organic Matter and its Effects on Removal of Trace Organic Compounds .

Degree: 2020, University of Arizona

 The continuous growth of global population is increasing the demand for potable water as well as the volume of wastewater generated worldwide, thus threatening water… (more)

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APA (6th Edition):

Chichique Martinez, V. A. (2020). Photosensitizing Activity of Effluent Organic Matter and its Effects on Removal of Trace Organic Compounds . (Masters Thesis). University of Arizona. Retrieved from http://hdl.handle.net/10150/645803

Chicago Manual of Style (16th Edition):

Chichique Martinez, Violeta Alejandra. “Photosensitizing Activity of Effluent Organic Matter and its Effects on Removal of Trace Organic Compounds .” 2020. Masters Thesis, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/645803.

MLA Handbook (7th Edition):

Chichique Martinez, Violeta Alejandra. “Photosensitizing Activity of Effluent Organic Matter and its Effects on Removal of Trace Organic Compounds .” 2020. Web. 14 Apr 2021.

Vancouver:

Chichique Martinez VA. Photosensitizing Activity of Effluent Organic Matter and its Effects on Removal of Trace Organic Compounds . [Internet] [Masters thesis]. University of Arizona; 2020. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/645803.

Council of Science Editors:

Chichique Martinez VA. Photosensitizing Activity of Effluent Organic Matter and its Effects on Removal of Trace Organic Compounds . [Masters Thesis]. University of Arizona; 2020. Available from: http://hdl.handle.net/10150/645803


University of Arizona

26. Mancheno Posso, Pablo Leonardo. Liquid-Phase Etching and Chemical Passivation of III-V Semiconductors .

Degree: 2016, University of Arizona

 The development of metal-oxide-semiconductor field effect transistor (MOSFET) technology relies on new channel materials with higher carrier mobilities that allow faster switching but at lower… (more)

Subjects/Keywords: Gallium arsenide; Self assembled monolayer; Semiconductor; Chemical Engineering; Diffusion

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APA (6th Edition):

Mancheno Posso, P. L. (2016). Liquid-Phase Etching and Chemical Passivation of III-V Semiconductors . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/612461

Chicago Manual of Style (16th Edition):

Mancheno Posso, Pablo Leonardo. “Liquid-Phase Etching and Chemical Passivation of III-V Semiconductors .” 2016. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/612461.

MLA Handbook (7th Edition):

Mancheno Posso, Pablo Leonardo. “Liquid-Phase Etching and Chemical Passivation of III-V Semiconductors .” 2016. Web. 14 Apr 2021.

Vancouver:

Mancheno Posso PL. Liquid-Phase Etching and Chemical Passivation of III-V Semiconductors . [Internet] [Doctoral dissertation]. University of Arizona; 2016. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/612461.

Council of Science Editors:

Mancheno Posso PL. Liquid-Phase Etching and Chemical Passivation of III-V Semiconductors . [Doctoral Dissertation]. University of Arizona; 2016. Available from: http://hdl.handle.net/10150/612461


University of Arizona

27. Jones, Lisa A. Bioadsorption of Copper (II) By Chlorella Sp. Biomass: Continuous Process with Cost Analysis and Comsol Model Simulations .

Degree: 2013, University of Arizona

 With the continuous improvement in knowledge and health risks associated with heavy metal expulsion, government environmental agencies are continuously reducing the legal disposal limits. However,… (more)

Subjects/Keywords: bioadsorption; COMSOL; copper (II); Lipid Extracted Algae; waste water; Chemical Engineering; Algal biomass

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APA (6th Edition):

Jones, L. A. (2013). Bioadsorption of Copper (II) By Chlorella Sp. Biomass: Continuous Process with Cost Analysis and Comsol Model Simulations . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/307004

Chicago Manual of Style (16th Edition):

Jones, Lisa A. “Bioadsorption of Copper (II) By Chlorella Sp. Biomass: Continuous Process with Cost Analysis and Comsol Model Simulations .” 2013. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/307004.

MLA Handbook (7th Edition):

Jones, Lisa A. “Bioadsorption of Copper (II) By Chlorella Sp. Biomass: Continuous Process with Cost Analysis and Comsol Model Simulations .” 2013. Web. 14 Apr 2021.

Vancouver:

Jones LA. Bioadsorption of Copper (II) By Chlorella Sp. Biomass: Continuous Process with Cost Analysis and Comsol Model Simulations . [Internet] [Doctoral dissertation]. University of Arizona; 2013. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/307004.

Council of Science Editors:

Jones LA. Bioadsorption of Copper (II) By Chlorella Sp. Biomass: Continuous Process with Cost Analysis and Comsol Model Simulations . [Doctoral Dissertation]. University of Arizona; 2013. Available from: http://hdl.handle.net/10150/307004

28. Wang, Hao. Characterization and Control of Molecular Contaminants on Oxide Nanoparticles and in Ultra High Purity Gas Delivery Systems for Semiconductor Manufacturing .

Degree: 2013, University of Arizona

 Molecular contaminants on the surface of nanoparticles (NPs) are critical in determining the environmental safety and health (ESH) impacts of NPs. In order to characterize… (more)

Subjects/Keywords: Cycle purge; Desorption; Dynamic simulation; Nanoparticle; Process modeling; Chemical Engineering; Adsorption

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APA (6th Edition):

Wang, H. (2013). Characterization and Control of Molecular Contaminants on Oxide Nanoparticles and in Ultra High Purity Gas Delivery Systems for Semiconductor Manufacturing . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/293417

Chicago Manual of Style (16th Edition):

Wang, Hao. “Characterization and Control of Molecular Contaminants on Oxide Nanoparticles and in Ultra High Purity Gas Delivery Systems for Semiconductor Manufacturing .” 2013. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/293417.

MLA Handbook (7th Edition):

Wang, Hao. “Characterization and Control of Molecular Contaminants on Oxide Nanoparticles and in Ultra High Purity Gas Delivery Systems for Semiconductor Manufacturing .” 2013. Web. 14 Apr 2021.

Vancouver:

Wang H. Characterization and Control of Molecular Contaminants on Oxide Nanoparticles and in Ultra High Purity Gas Delivery Systems for Semiconductor Manufacturing . [Internet] [Doctoral dissertation]. University of Arizona; 2013. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/293417.

Council of Science Editors:

Wang H. Characterization and Control of Molecular Contaminants on Oxide Nanoparticles and in Ultra High Purity Gas Delivery Systems for Semiconductor Manufacturing . [Doctoral Dissertation]. University of Arizona; 2013. Available from: http://hdl.handle.net/10150/293417


University of Arizona

29. Gonzalez-Estrella, Jorge Gonzalez. Toxicity of Engineered Nanoparticles to Anaerobic Wastewater Treatment Processes .

Degree: 2014, University of Arizona

 Nanotechnology is an increasing market. Engineered nanoparticles (NPs), materials with at least one dimension between 1 and 100 nm, are produced on a large scale.… (more)

Subjects/Keywords: Attenuation; Engineered Nanomaterials; Inhibition constants; Sulfide; Toxicity; Environmental Engineering; Anaerobic digestion

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APA (6th Edition):

Gonzalez-Estrella, J. G. (2014). Toxicity of Engineered Nanoparticles to Anaerobic Wastewater Treatment Processes . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/347117

Chicago Manual of Style (16th Edition):

Gonzalez-Estrella, Jorge Gonzalez. “Toxicity of Engineered Nanoparticles to Anaerobic Wastewater Treatment Processes .” 2014. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/347117.

MLA Handbook (7th Edition):

Gonzalez-Estrella, Jorge Gonzalez. “Toxicity of Engineered Nanoparticles to Anaerobic Wastewater Treatment Processes .” 2014. Web. 14 Apr 2021.

Vancouver:

Gonzalez-Estrella JG. Toxicity of Engineered Nanoparticles to Anaerobic Wastewater Treatment Processes . [Internet] [Doctoral dissertation]. University of Arizona; 2014. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/347117.

Council of Science Editors:

Gonzalez-Estrella JG. Toxicity of Engineered Nanoparticles to Anaerobic Wastewater Treatment Processes . [Doctoral Dissertation]. University of Arizona; 2014. Available from: http://hdl.handle.net/10150/347117

30. Jiao, Yubo. Wear and Contact Phenomena in Existing and Future Large-Scale Chemical Mechanical Planarization Processes .

Degree: 2012, University of Arizona

 This dissertation presents a series of studies with regards to wear and contact phenomena in existing and future large-scale chemical mechanical planarization (CMP). They are… (more)

Subjects/Keywords: wear; Chemical Engineering; chemical mechanical planarization; contact

…typical IC cross-section (Prof. Philipossian, University of Arizona, CHEE 515 Class Notes… …x29; multi-layer metallization structure (Prof. Philipossian, University of Arizona… 

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APA (6th Edition):

Jiao, Y. (2012). Wear and Contact Phenomena in Existing and Future Large-Scale Chemical Mechanical Planarization Processes . (Doctoral Dissertation). University of Arizona. Retrieved from http://hdl.handle.net/10150/223313

Chicago Manual of Style (16th Edition):

Jiao, Yubo. “Wear and Contact Phenomena in Existing and Future Large-Scale Chemical Mechanical Planarization Processes .” 2012. Doctoral Dissertation, University of Arizona. Accessed April 14, 2021. http://hdl.handle.net/10150/223313.

MLA Handbook (7th Edition):

Jiao, Yubo. “Wear and Contact Phenomena in Existing and Future Large-Scale Chemical Mechanical Planarization Processes .” 2012. Web. 14 Apr 2021.

Vancouver:

Jiao Y. Wear and Contact Phenomena in Existing and Future Large-Scale Chemical Mechanical Planarization Processes . [Internet] [Doctoral dissertation]. University of Arizona; 2012. [cited 2021 Apr 14]. Available from: http://hdl.handle.net/10150/223313.

Council of Science Editors:

Jiao Y. Wear and Contact Phenomena in Existing and Future Large-Scale Chemical Mechanical Planarization Processes . [Doctoral Dissertation]. University of Arizona; 2012. Available from: http://hdl.handle.net/10150/223313

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