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You searched for +publisher:"Universidade Estadual de Campinas" +contributor:("Pudenzi, M?rcio Alberto Ara?jo"). One record found.

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Universidade Estadual de Campinas

1. Diniz, Jos? Alexandre, 1964-. Forma??o de filmes finos de oxinitreto de silicio (SiOxNy) por implanta??o de ions de nitrogenio (N2+) e de oxido nitrico (NO+) .

Degree: 1996, Universidade Estadual de Campinas

Resumo: Este trabalho descreve a obten??o e a caracteriza??o de filmes finos e ultra-finos de oxinitreto de sil?cio (SiOxNy)atrav?s da implanta??o de ?ons moleculares de nitrog?nio (N2) e de ?xido n?trico (NO+) com baixa energia em ?xidos de sil?cio crescidos termicamente sobre substratos de sil?cio ou em substratos de sil?cio com posterior oxida??o t?rmica... Observa??o: O resumo na integra, poder? ser visualizado no texto completo da tese digital; Abstract: This work describes the formation and the characterization of ultra-thin and thin silicon oxynitride (SiOxNy) films by low-energy molecular nitrogen (N/) or nitric oxide (NO+) ion implantation in thermal silicon oxide (SiO2) grown on silicon substrate or into silicon substrate prior to thermal oxidation... Note: The complete abstract is available with the full electronic digital thesis or dissertations Advisors/Committee Members: Tatsch, Peter J?rgen, 1949- (advisor), Swart, Jacobus Willibrordus (committee member), Damiani, Furio (committee member), Pudenzi, M?rcio Alberto Ara?jo (committee member), Morimoto, Nilton Itiro (committee member).

Subjects/Keywords: Implanta??o i?nica; Filmes finos; Nitrog?nio

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Diniz, Jos? Alexandre, 1. (1996). Forma??o de filmes finos de oxinitreto de silicio (SiOxNy) por implanta??o de ions de nitrogenio (N2+) e de oxido nitrico (NO+) . (Thesis). Universidade Estadual de Campinas. Retrieved from http://repositorio.unicamp.br/jspui/handle/REPOSIP/260463

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Diniz, Jos? Alexandre, 1964-. “Forma??o de filmes finos de oxinitreto de silicio (SiOxNy) por implanta??o de ions de nitrogenio (N2+) e de oxido nitrico (NO+) .” 1996. Thesis, Universidade Estadual de Campinas. Accessed August 10, 2020. http://repositorio.unicamp.br/jspui/handle/REPOSIP/260463.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Diniz, Jos? Alexandre, 1964-. “Forma??o de filmes finos de oxinitreto de silicio (SiOxNy) por implanta??o de ions de nitrogenio (N2+) e de oxido nitrico (NO+) .” 1996. Web. 10 Aug 2020.

Vancouver:

Diniz, Jos? Alexandre 1. Forma??o de filmes finos de oxinitreto de silicio (SiOxNy) por implanta??o de ions de nitrogenio (N2+) e de oxido nitrico (NO+) . [Internet] [Thesis]. Universidade Estadual de Campinas; 1996. [cited 2020 Aug 10]. Available from: http://repositorio.unicamp.br/jspui/handle/REPOSIP/260463.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Diniz, Jos? Alexandre 1. Forma??o de filmes finos de oxinitreto de silicio (SiOxNy) por implanta??o de ions de nitrogenio (N2+) e de oxido nitrico (NO+) . [Thesis]. Universidade Estadual de Campinas; 1996. Available from: http://repositorio.unicamp.br/jspui/handle/REPOSIP/260463

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

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