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You searched for +publisher:"Rochester Institute of Technology" +contributor:("Fuller, Lynn"). Showing records 1 – 30 of 41 total matches.

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Rochester Institute of Technology

1. Kumar, Shaurya. Investigation of bolometric and resistive properties of nickel oxide.

Degree: Center for Materials Science and Engineering, 2012, Rochester Institute of Technology

 This work investigates the properties of nickel oxide for use in microbolometric and resistive memory applications. For the uncooled infrared radiation detector industry, the current… (more)

Subjects/Keywords: Microbolometer; Nickel oxide; Resistive memory

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APA (6th Edition):

Kumar, S. (2012). Investigation of bolometric and resistive properties of nickel oxide. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/2752

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kumar, Shaurya. “Investigation of bolometric and resistive properties of nickel oxide.” 2012. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/2752.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kumar, Shaurya. “Investigation of bolometric and resistive properties of nickel oxide.” 2012. Web. 17 Jul 2019.

Vancouver:

Kumar S. Investigation of bolometric and resistive properties of nickel oxide. [Internet] [Thesis]. Rochester Institute of Technology; 2012. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/2752.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kumar S. Investigation of bolometric and resistive properties of nickel oxide. [Thesis]. Rochester Institute of Technology; 2012. Available from: https://scholarworks.rit.edu/theses/2752

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

2. Puchades, Ivan. A Thermally actuated microelectromechanical (MEMS) device for measuring viscosity.

Degree: PhD, Microsystems Engineering, 2011, Rochester Institute of Technology

 A thermally actuated non-cantilever-beam micro-electro-mechanical viscosity sensor is presented. The proposed device is based on thermally induced vibrations of a silicon-based membrane and its damping… (more)

Subjects/Keywords: Fluids; MEMS; Semiconductor; Viscosity

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Puchades, I. (2011). A Thermally actuated microelectromechanical (MEMS) device for measuring viscosity. (Doctoral Dissertation). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/2

Chicago Manual of Style (16th Edition):

Puchades, Ivan. “A Thermally actuated microelectromechanical (MEMS) device for measuring viscosity.” 2011. Doctoral Dissertation, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/2.

MLA Handbook (7th Edition):

Puchades, Ivan. “A Thermally actuated microelectromechanical (MEMS) device for measuring viscosity.” 2011. Web. 17 Jul 2019.

Vancouver:

Puchades I. A Thermally actuated microelectromechanical (MEMS) device for measuring viscosity. [Internet] [Doctoral dissertation]. Rochester Institute of Technology; 2011. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/2.

Council of Science Editors:

Puchades I. A Thermally actuated microelectromechanical (MEMS) device for measuring viscosity. [Doctoral Dissertation]. Rochester Institute of Technology; 2011. Available from: https://scholarworks.rit.edu/theses/2


Rochester Institute of Technology

3. Baylav, Murat. Ion-sensitive field effect transistor (ISFET) for MEMS multisensory chips at RIT.

Degree: Microelectronic Engineering, 2010, Rochester Institute of Technology

 This study involves the design and fabrication of an Ion-Sensitive Field Effect Transistor (ISFET), which is aimed to be incorporated into the multisensory chips fabricated… (more)

Subjects/Keywords: Chloride; Ion; ISFET; MEMS; Ph; Sensor

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APA (6th Edition):

Baylav, M. (2010). Ion-sensitive field effect transistor (ISFET) for MEMS multisensory chips at RIT. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/7434

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Baylav, Murat. “Ion-sensitive field effect transistor (ISFET) for MEMS multisensory chips at RIT.” 2010. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/7434.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Baylav, Murat. “Ion-sensitive field effect transistor (ISFET) for MEMS multisensory chips at RIT.” 2010. Web. 17 Jul 2019.

Vancouver:

Baylav M. Ion-sensitive field effect transistor (ISFET) for MEMS multisensory chips at RIT. [Internet] [Thesis]. Rochester Institute of Technology; 2010. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/7434.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Baylav M. Ion-sensitive field effect transistor (ISFET) for MEMS multisensory chips at RIT. [Thesis]. Rochester Institute of Technology; 2010. Available from: https://scholarworks.rit.edu/theses/7434

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

4. Leveto, Jacob. Development of a three-axis MEMS accelerometer.

Degree: Microelectronic Engineering, 2010, Rochester Institute of Technology

 While originally developed to deploy air bags for the automotive industry, Microelectromechanical Systems (MEMS) based accelerometers have found their way into everything from video game… (more)

Subjects/Keywords: Accelerometer; MEMS; Microelectromechanical; Microelectronics; Piezoresistive; Three axis

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APA (6th Edition):

Leveto, J. (2010). Development of a three-axis MEMS accelerometer. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/7478

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Leveto, Jacob. “Development of a three-axis MEMS accelerometer.” 2010. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/7478.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Leveto, Jacob. “Development of a three-axis MEMS accelerometer.” 2010. Web. 17 Jul 2019.

Vancouver:

Leveto J. Development of a three-axis MEMS accelerometer. [Internet] [Thesis]. Rochester Institute of Technology; 2010. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/7478.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Leveto J. Development of a three-axis MEMS accelerometer. [Thesis]. Rochester Institute of Technology; 2010. Available from: https://scholarworks.rit.edu/theses/7478

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

5. Purrington, Heidi. A Multi-sensor chip for monitoring the quality of drinking water.

Degree: Microelectronic Engineering, 2010, Rochester Institute of Technology

 A MEMS based multi-sensor chip has been developed for the purpose of monitoring turbidity, TDS, and temperature in a sample of drinking water. The benefits… (more)

Subjects/Keywords: Fabrication; MEMS; Microsystem; Multi-sensor chip; Sensors; Water quality

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APA (6th Edition):

Purrington, H. (2010). A Multi-sensor chip for monitoring the quality of drinking water. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/7118

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Purrington, Heidi. “A Multi-sensor chip for monitoring the quality of drinking water.” 2010. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/7118.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Purrington, Heidi. “A Multi-sensor chip for monitoring the quality of drinking water.” 2010. Web. 17 Jul 2019.

Vancouver:

Purrington H. A Multi-sensor chip for monitoring the quality of drinking water. [Internet] [Thesis]. Rochester Institute of Technology; 2010. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/7118.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Purrington H. A Multi-sensor chip for monitoring the quality of drinking water. [Thesis]. Rochester Institute of Technology; 2010. Available from: https://scholarworks.rit.edu/theses/7118

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

6. Saluja, Amandeep S. A Parametric study of gas sensing response of ZnO nanostructures and carbon nanotubes.

Degree: Microelectronic Engineering, 2009, Rochester Institute of Technology

 Solid state chemical sensors are gaining popularity and finding extensive use in process control, environmental monitoring and residential safety. ZnO, a semiconducting metal oxide, and… (more)

Subjects/Keywords: Aman Saluja; Carbon nanotubes; Gas sensing response; Parametric study; Seth Hubbard; ZnO nanostructures

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APA (6th Edition):

Saluja, A. S. (2009). A Parametric study of gas sensing response of ZnO nanostructures and carbon nanotubes. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/7286

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Saluja, Amandeep S. “A Parametric study of gas sensing response of ZnO nanostructures and carbon nanotubes.” 2009. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/7286.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Saluja, Amandeep S. “A Parametric study of gas sensing response of ZnO nanostructures and carbon nanotubes.” 2009. Web. 17 Jul 2019.

Vancouver:

Saluja AS. A Parametric study of gas sensing response of ZnO nanostructures and carbon nanotubes. [Internet] [Thesis]. Rochester Institute of Technology; 2009. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/7286.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Saluja AS. A Parametric study of gas sensing response of ZnO nanostructures and carbon nanotubes. [Thesis]. Rochester Institute of Technology; 2009. Available from: https://scholarworks.rit.edu/theses/7286

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

7. Gan Chau, Luis. A MEMS viscosity sensor for conductive fluids.

Degree: Microelectronic Engineering, 2012, Rochester Institute of Technology

 MEMS Viscosity sensors are widely used in different applications nowadays. MEMS sensors are created by making them small in size almost penny-like sized. With low… (more)

Subjects/Keywords: Conductive fluid; Mems; Parylene c; Viscosity sensor

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APA (6th Edition):

Gan Chau, L. (2012). A MEMS viscosity sensor for conductive fluids. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/238

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Gan Chau, Luis. “A MEMS viscosity sensor for conductive fluids.” 2012. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/238.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Gan Chau, Luis. “A MEMS viscosity sensor for conductive fluids.” 2012. Web. 17 Jul 2019.

Vancouver:

Gan Chau L. A MEMS viscosity sensor for conductive fluids. [Internet] [Thesis]. Rochester Institute of Technology; 2012. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/238.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Gan Chau L. A MEMS viscosity sensor for conductive fluids. [Thesis]. Rochester Institute of Technology; 2012. Available from: https://scholarworks.rit.edu/theses/238

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

8. Smith, Daniel. Multisensor MEMS for temperature, relative humidity, and high-g shock monitoring.

Degree: Electrical Engineering, 2012, Rochester Institute of Technology

 The use of MEMS (micro-electro-mechanical system) sensors in multiple applications of environmental monitoring help to fill the need of a small scale, low power monitoring… (more)

Subjects/Keywords: 3-axis accelerometer; Integration; MEMS; Multi-sensor; Relative humidity; Temperature

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APA (6th Edition):

Smith, D. (2012). Multisensor MEMS for temperature, relative humidity, and high-g shock monitoring. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/1248

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Smith, Daniel. “Multisensor MEMS for temperature, relative humidity, and high-g shock monitoring.” 2012. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/1248.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Smith, Daniel. “Multisensor MEMS for temperature, relative humidity, and high-g shock monitoring.” 2012. Web. 17 Jul 2019.

Vancouver:

Smith D. Multisensor MEMS for temperature, relative humidity, and high-g shock monitoring. [Internet] [Thesis]. Rochester Institute of Technology; 2012. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/1248.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Smith D. Multisensor MEMS for temperature, relative humidity, and high-g shock monitoring. [Thesis]. Rochester Institute of Technology; 2012. Available from: https://scholarworks.rit.edu/theses/1248

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

9. Oakley, Robert. The Electrical characterization of SiC JFETs in high temperature and neutron radiation environments.

Degree: Electrical Engineering, 1995, Rochester Institute of Technology

 During initial analysis of Silicon Carbide (SiC) based field effect devices, testing apparatus and methodologies were developed and implemented to characterize the effects of neutron… (more)

Subjects/Keywords: Electrical engineering

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APA (6th Edition):

Oakley, R. (1995). The Electrical characterization of SiC JFETs in high temperature and neutron radiation environments. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5576

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Oakley, Robert. “The Electrical characterization of SiC JFETs in high temperature and neutron radiation environments.” 1995. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5576.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Oakley, Robert. “The Electrical characterization of SiC JFETs in high temperature and neutron radiation environments.” 1995. Web. 17 Jul 2019.

Vancouver:

Oakley R. The Electrical characterization of SiC JFETs in high temperature and neutron radiation environments. [Internet] [Thesis]. Rochester Institute of Technology; 1995. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5576.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Oakley R. The Electrical characterization of SiC JFETs in high temperature and neutron radiation environments. [Thesis]. Rochester Institute of Technology; 1995. Available from: https://scholarworks.rit.edu/theses/5576

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

10. Philbrick, Robert H. Modeling of light absorption in solid state imagers.

Degree: Electrical Engineering, 1990, Rochester Institute of Technology

 In this paper, a model for predicting the quantum efficiency and responsivity of silicon based solid state photodiodes is presented. The model is first developed… (more)

Subjects/Keywords: Photodiodes; Optoelectronic devices; Computer modeling; Light absorption

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APA (6th Edition):

Philbrick, R. H. (1990). Modeling of light absorption in solid state imagers. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5566

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Philbrick, Robert H. “Modeling of light absorption in solid state imagers.” 1990. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5566.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Philbrick, Robert H. “Modeling of light absorption in solid state imagers.” 1990. Web. 17 Jul 2019.

Vancouver:

Philbrick RH. Modeling of light absorption in solid state imagers. [Internet] [Thesis]. Rochester Institute of Technology; 1990. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5566.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Philbrick RH. Modeling of light absorption in solid state imagers. [Thesis]. Rochester Institute of Technology; 1990. Available from: https://scholarworks.rit.edu/theses/5566

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

11. Marek, Mary J. PMOS CCD.

Degree: Electrical Engineering, 1989, Rochester Institute of Technology

 Charge Coupled Devices are being used in optical imaging devices, shift registers, digital logic and such signal processing components as variable delay lines, transversal filters… (more)

Subjects/Keywords: Thesis; Charge coupled devices; Shift registers

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APA (6th Edition):

Marek, M. J. (1989). PMOS CCD. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5565

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Marek, Mary J. “PMOS CCD.” 1989. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5565.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Marek, Mary J. “PMOS CCD.” 1989. Web. 17 Jul 2019.

Vancouver:

Marek MJ. PMOS CCD. [Internet] [Thesis]. Rochester Institute of Technology; 1989. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5565.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Marek MJ. PMOS CCD. [Thesis]. Rochester Institute of Technology; 1989. Available from: https://scholarworks.rit.edu/theses/5565

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

12. Delaney, Larry Duane. A Computer program for the extraction of bipolar transistor SPICE models.

Degree: Electrical Engineering, 1992, Rochester Institute of Technology

 Each year semiconductor manufacturers spend millions of dollars in the development of new products. It can be very costly to create on silicon a newly… (more)

Subjects/Keywords: Bipolar transistor; Circuits; Semiconductor; SPICE model

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APA (6th Edition):

Delaney, L. D. (1992). A Computer program for the extraction of bipolar transistor SPICE models. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5573

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Delaney, Larry Duane. “A Computer program for the extraction of bipolar transistor SPICE models.” 1992. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5573.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Delaney, Larry Duane. “A Computer program for the extraction of bipolar transistor SPICE models.” 1992. Web. 17 Jul 2019.

Vancouver:

Delaney LD. A Computer program for the extraction of bipolar transistor SPICE models. [Internet] [Thesis]. Rochester Institute of Technology; 1992. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5573.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Delaney LD. A Computer program for the extraction of bipolar transistor SPICE models. [Thesis]. Rochester Institute of Technology; 1992. Available from: https://scholarworks.rit.edu/theses/5573

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

13. Erhardt, Herbert J. A Novel test structure for automated measurement of charge transfer efficiency in charge coupled imaging devices.

Degree: Electrical Engineering, 1991, Rochester Institute of Technology

None provided. Advisors/Committee Members: Fuller, Lynn.

Subjects/Keywords: Charge coupled device; Charge transfer efficiency

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APA (6th Edition):

Erhardt, H. J. (1991). A Novel test structure for automated measurement of charge transfer efficiency in charge coupled imaging devices. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5648

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Erhardt, Herbert J. “A Novel test structure for automated measurement of charge transfer efficiency in charge coupled imaging devices.” 1991. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5648.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Erhardt, Herbert J. “A Novel test structure for automated measurement of charge transfer efficiency in charge coupled imaging devices.” 1991. Web. 17 Jul 2019.

Vancouver:

Erhardt HJ. A Novel test structure for automated measurement of charge transfer efficiency in charge coupled imaging devices. [Internet] [Thesis]. Rochester Institute of Technology; 1991. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5648.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Erhardt HJ. A Novel test structure for automated measurement of charge transfer efficiency in charge coupled imaging devices. [Thesis]. Rochester Institute of Technology; 1991. Available from: https://scholarworks.rit.edu/theses/5648

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

14. Benamati, Brian. A Multipurpose Test Mask for Exposure Tool Characterization.

Degree: Microelectronic Engineering, 1987, Rochester Institute of Technology

 Of the many facets of integrated circuit fabrication, photolithography may very well be the most important due to the number of levels required for the… (more)

Subjects/Keywords: Circuit fabrication; Electrical engineering; Exposure tools; Photolithography; Resolution; Thesis

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APA (6th Edition):

Benamati, B. (1987). A Multipurpose Test Mask for Exposure Tool Characterization. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/7247

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Benamati, Brian. “A Multipurpose Test Mask for Exposure Tool Characterization.” 1987. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/7247.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Benamati, Brian. “A Multipurpose Test Mask for Exposure Tool Characterization.” 1987. Web. 17 Jul 2019.

Vancouver:

Benamati B. A Multipurpose Test Mask for Exposure Tool Characterization. [Internet] [Thesis]. Rochester Institute of Technology; 1987. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/7247.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Benamati B. A Multipurpose Test Mask for Exposure Tool Characterization. [Thesis]. Rochester Institute of Technology; 1987. Available from: https://scholarworks.rit.edu/theses/7247

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

15. Kim, Eui-Shin. Switching voltage of micro-beam actuators - Analysis, fabrication and test.

Degree: Mechanical Engineering, 2002, Rochester Institute of Technology

  This thesis introduces an analysis, fabrication and testing of a //-cantilever. First, the theoretical method used to analyze the deflection of a micro-beam with… (more)

Subjects/Keywords: Fabrication; Mechanical engineering

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APA (6th Edition):

Kim, E. (2002). Switching voltage of micro-beam actuators - Analysis, fabrication and test. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5828

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Kim, Eui-Shin. “Switching voltage of micro-beam actuators - Analysis, fabrication and test.” 2002. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5828.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Kim, Eui-Shin. “Switching voltage of micro-beam actuators - Analysis, fabrication and test.” 2002. Web. 17 Jul 2019.

Vancouver:

Kim E. Switching voltage of micro-beam actuators - Analysis, fabrication and test. [Internet] [Thesis]. Rochester Institute of Technology; 2002. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5828.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Kim E. Switching voltage of micro-beam actuators - Analysis, fabrication and test. [Thesis]. Rochester Institute of Technology; 2002. Available from: https://scholarworks.rit.edu/theses/5828

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

16. Price, David T. N-Well CMOS process integration.

Degree: Electrical Engineering, 1992, Rochester Institute of Technology

 The predominant integrated circuit fabrication technologies used for VLSI devices are CMOS, and BiCMOS. The goal of this work was to develop a CMOS process… (more)

Subjects/Keywords: Integrated circuits

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Price, D. T. (1992). N-Well CMOS process integration. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5574

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Price, David T. “N-Well CMOS process integration.” 1992. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5574.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Price, David T. “N-Well CMOS process integration.” 1992. Web. 17 Jul 2019.

Vancouver:

Price DT. N-Well CMOS process integration. [Internet] [Thesis]. Rochester Institute of Technology; 1992. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5574.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Price DT. N-Well CMOS process integration. [Thesis]. Rochester Institute of Technology; 1992. Available from: https://scholarworks.rit.edu/theses/5574

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

17. Sieger, Todd C. A field emission transistor array for writing applications.

Degree: Electrical Engineering, 1992, Rochester Institute of Technology

 This work involved the development of a unique imaging device utilizing vacuum microelectronic field emitter tip arrays (FEAs) and CCDs. The device offers the potential… (more)

Subjects/Keywords: Electrical engineering; Charge coupled devices; Field emitter tip arrays; Transistors

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APA (6th Edition):

Sieger, T. C. (1992). A field emission transistor array for writing applications. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5572

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Sieger, Todd C. “A field emission transistor array for writing applications.” 1992. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5572.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Sieger, Todd C. “A field emission transistor array for writing applications.” 1992. Web. 17 Jul 2019.

Vancouver:

Sieger TC. A field emission transistor array for writing applications. [Internet] [Thesis]. Rochester Institute of Technology; 1992. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5572.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Sieger TC. A field emission transistor array for writing applications. [Thesis]. Rochester Institute of Technology; 1992. Available from: https://scholarworks.rit.edu/theses/5572

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

18. Ting, Goodwin. An Integrated BiCMOS driver chip for medium power applications.

Degree: Electrical Engineering, 1991, Rochester Institute of Technology

 The development of an integrated driver circuit intended for medium power switching applications is presented. The device contains, on one chip, CMOS digital control logic… (more)

Subjects/Keywords: Integrated circuits

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APA (6th Edition):

Ting, G. (1991). An Integrated BiCMOS driver chip for medium power applications. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5569

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Ting, Goodwin. “An Integrated BiCMOS driver chip for medium power applications.” 1991. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5569.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Ting, Goodwin. “An Integrated BiCMOS driver chip for medium power applications.” 1991. Web. 17 Jul 2019.

Vancouver:

Ting G. An Integrated BiCMOS driver chip for medium power applications. [Internet] [Thesis]. Rochester Institute of Technology; 1991. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5569.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Ting G. An Integrated BiCMOS driver chip for medium power applications. [Thesis]. Rochester Institute of Technology; 1991. Available from: https://scholarworks.rit.edu/theses/5569

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

19. La Pietra, Andrew. Establishing a bipolar fabrication service for analog circuit realization at the Rochester Institute of Technology.

Degree: Electrical Engineering, 1991, Rochester Institute of Technology

 A bipolar fabrication service has been developed at the Rochester Institute of Technology to service students and faculty from the Microelectronic, Electrical and Computer Engineering… (more)

Subjects/Keywords: Analog circuit realization

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APA (6th Edition):

La Pietra, A. (1991). Establishing a bipolar fabrication service for analog circuit realization at the Rochester Institute of Technology. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5568

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

La Pietra, Andrew. “Establishing a bipolar fabrication service for analog circuit realization at the Rochester Institute of Technology.” 1991. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5568.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

La Pietra, Andrew. “Establishing a bipolar fabrication service for analog circuit realization at the Rochester Institute of Technology.” 1991. Web. 17 Jul 2019.

Vancouver:

La Pietra A. Establishing a bipolar fabrication service for analog circuit realization at the Rochester Institute of Technology. [Internet] [Thesis]. Rochester Institute of Technology; 1991. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5568.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

La Pietra A. Establishing a bipolar fabrication service for analog circuit realization at the Rochester Institute of Technology. [Thesis]. Rochester Institute of Technology; 1991. Available from: https://scholarworks.rit.edu/theses/5568

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

20. Dinse, Brian. Silicon-on-insulator MOSFETS: Material, process and device characteristics.

Degree: Electrical Engineering, 1994, Rochester Institute of Technology

 NMOS and PMOS Single-crystal-silicon-on-insulator (SOI) MOSFETs have been fabricated at RIT using a Bonded and Etched-back process for substrate formation. A test chip, containing inverters,… (more)

Subjects/Keywords: Electrical engineering

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APA (6th Edition):

Dinse, B. (1994). Silicon-on-insulator MOSFETS: Material, process and device characteristics. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5585

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Dinse, Brian. “Silicon-on-insulator MOSFETS: Material, process and device characteristics.” 1994. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5585.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Dinse, Brian. “Silicon-on-insulator MOSFETS: Material, process and device characteristics.” 1994. Web. 17 Jul 2019.

Vancouver:

Dinse B. Silicon-on-insulator MOSFETS: Material, process and device characteristics. [Internet] [Thesis]. Rochester Institute of Technology; 1994. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5585.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Dinse B. Silicon-on-insulator MOSFETS: Material, process and device characteristics. [Thesis]. Rochester Institute of Technology; 1994. Available from: https://scholarworks.rit.edu/theses/5585

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

21. Aquilino, Michael. Development of deep submicron CMOS process for fabrication of high performance 0.25 nm transistors.

Degree: Microelectronic Engineering, 2006, Rochester Institute of Technology

  An advanced process for fabrication of 0.25 μm CMOS transistors has been demonstrated. This process is designed for transistors with Lpoly = 0.25 μm… (more)

Subjects/Keywords: Metal oxide semiconductors; Complementary; Design and construction; Transistors; Microelectronics

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APA (6th Edition):

Aquilino, M. (2006). Development of deep submicron CMOS process for fabrication of high performance 0.25 nm transistors. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/239

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Aquilino, Michael. “Development of deep submicron CMOS process for fabrication of high performance 0.25 nm transistors.” 2006. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/239.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Aquilino, Michael. “Development of deep submicron CMOS process for fabrication of high performance 0.25 nm transistors.” 2006. Web. 17 Jul 2019.

Vancouver:

Aquilino M. Development of deep submicron CMOS process for fabrication of high performance 0.25 nm transistors. [Internet] [Thesis]. Rochester Institute of Technology; 2006. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/239.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Aquilino M. Development of deep submicron CMOS process for fabrication of high performance 0.25 nm transistors. [Thesis]. Rochester Institute of Technology; 2006. Available from: https://scholarworks.rit.edu/theses/239

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

22. Guidash, R. Michael. Development of a modular 2-micron BiCMOS process from an existing 2-micron n-well CMOS process.

Degree: Electrical Engineering, 1991, Rochester Institute of Technology

 A modular 2-micron BiCMOS process was developed from an existing 2-micron N-Well CMOS process. The process maintains compatibility with the existing 2- micron CMOS design… (more)

Subjects/Keywords: CMOS processes

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APA (6th Edition):

Guidash, R. M. (1991). Development of a modular 2-micron BiCMOS process from an existing 2-micron n-well CMOS process. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5645

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Guidash, R Michael. “Development of a modular 2-micron BiCMOS process from an existing 2-micron n-well CMOS process.” 1991. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5645.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Guidash, R Michael. “Development of a modular 2-micron BiCMOS process from an existing 2-micron n-well CMOS process.” 1991. Web. 17 Jul 2019.

Vancouver:

Guidash RM. Development of a modular 2-micron BiCMOS process from an existing 2-micron n-well CMOS process. [Internet] [Thesis]. Rochester Institute of Technology; 1991. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5645.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Guidash RM. Development of a modular 2-micron BiCMOS process from an existing 2-micron n-well CMOS process. [Thesis]. Rochester Institute of Technology; 1991. Available from: https://scholarworks.rit.edu/theses/5645

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

23. Hirschman, Karl D. Process development of an analog/digital mixed-mode BiCMOS system at RIT.

Degree: Electrical Engineering, 1992, Rochester Institute of Technology

 The development of an analog/digital mixed-mode BiCMOS process is presented. The process uses the RIT factory n-well CMOS process as its baseline process. The process… (more)

Subjects/Keywords: Electrical systems; Integrated circuits

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APA (6th Edition):

Hirschman, K. D. (1992). Process development of an analog/digital mixed-mode BiCMOS system at RIT. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5571

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Hirschman, Karl D. “Process development of an analog/digital mixed-mode BiCMOS system at RIT.” 1992. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5571.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Hirschman, Karl D. “Process development of an analog/digital mixed-mode BiCMOS system at RIT.” 1992. Web. 17 Jul 2019.

Vancouver:

Hirschman KD. Process development of an analog/digital mixed-mode BiCMOS system at RIT. [Internet] [Thesis]. Rochester Institute of Technology; 1992. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5571.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Hirschman KD. Process development of an analog/digital mixed-mode BiCMOS system at RIT. [Thesis]. Rochester Institute of Technology; 1992. Available from: https://scholarworks.rit.edu/theses/5571

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

24. Klare, Mark. Sub-micron PMOS transistor using electron beam lithography.

Degree: Electrical Engineering, 1996, Rochester Institute of Technology

 The design, simulation, fabrication and testing of .75um PMOS transistors is studied in this work. The process uses Direct Write Electron Beam Lithography for all… (more)

Subjects/Keywords: Electrical engineering

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APA (6th Edition):

Klare, M. (1996). Sub-micron PMOS transistor using electron beam lithography. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5577

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Klare, Mark. “Sub-micron PMOS transistor using electron beam lithography.” 1996. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5577.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Klare, Mark. “Sub-micron PMOS transistor using electron beam lithography.” 1996. Web. 17 Jul 2019.

Vancouver:

Klare M. Sub-micron PMOS transistor using electron beam lithography. [Internet] [Thesis]. Rochester Institute of Technology; 1996. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5577.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Klare M. Sub-micron PMOS transistor using electron beam lithography. [Thesis]. Rochester Institute of Technology; 1996. Available from: https://scholarworks.rit.edu/theses/5577

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

25. Espinosa de los Monteros, J. Ignacio. Design for manufacturing: Performance characterization of digital VLSI systems using a statistical analysis/inference methodology.

Degree: Computer Engineering, 1993, Rochester Institute of Technology

 Design For Manufacturing (DFM) is a TQM methodology by which inherently producible products can be manufactured with high yields, short turnaround time and great flexibility.… (more)

Subjects/Keywords: Computer engineering

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APA (6th Edition):

Espinosa de los Monteros, J. I. (1993). Design for manufacturing: Performance characterization of digital VLSI systems using a statistical analysis/inference methodology. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/4612

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Espinosa de los Monteros, J Ignacio. “Design for manufacturing: Performance characterization of digital VLSI systems using a statistical analysis/inference methodology.” 1993. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/4612.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Espinosa de los Monteros, J Ignacio. “Design for manufacturing: Performance characterization of digital VLSI systems using a statistical analysis/inference methodology.” 1993. Web. 17 Jul 2019.

Vancouver:

Espinosa de los Monteros JI. Design for manufacturing: Performance characterization of digital VLSI systems using a statistical analysis/inference methodology. [Internet] [Thesis]. Rochester Institute of Technology; 1993. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/4612.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Espinosa de los Monteros JI. Design for manufacturing: Performance characterization of digital VLSI systems using a statistical analysis/inference methodology. [Thesis]. Rochester Institute of Technology; 1993. Available from: https://scholarworks.rit.edu/theses/4612

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

26. Connor, John. The RIT IEEE-488 buffer design.

Degree: Electrical Engineering, 1992, Rochester Institute of Technology

 This document describes the design of an NMOS ASIC used to control an RIT IEEE-488 Buffer previously designed by the author. Past designs used discrete… (more)

Subjects/Keywords: Buffer design

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APA (6th Edition):

Connor, J. (1992). The RIT IEEE-488 buffer design. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5570

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Connor, John. “The RIT IEEE-488 buffer design.” 1992. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5570.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Connor, John. “The RIT IEEE-488 buffer design.” 1992. Web. 17 Jul 2019.

Vancouver:

Connor J. The RIT IEEE-488 buffer design. [Internet] [Thesis]. Rochester Institute of Technology; 1992. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5570.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Connor J. The RIT IEEE-488 buffer design. [Thesis]. Rochester Institute of Technology; 1992. Available from: https://scholarworks.rit.edu/theses/5570

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

27. Pyles, Randall C. A Procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods.

Degree: Chester F. Carlson Center for Imaging Science (COS), 1992, Rochester Institute of Technology

 A procedure is established which will enable the study of contrast and sensitivity characteristics of electron-beam resist materials. The imaging system includes an electron beam-sensitive… (more)

Subjects/Keywords: Electron-beam resist; Photoresists

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APA (6th Edition):

Pyles, R. C. (1992). A Procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/2829

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Pyles, Randall C. “A Procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods.” 1992. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/2829.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Pyles, Randall C. “A Procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods.” 1992. Web. 17 Jul 2019.

Vancouver:

Pyles RC. A Procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods. [Internet] [Thesis]. Rochester Institute of Technology; 1992. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/2829.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Pyles RC. A Procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods. [Thesis]. Rochester Institute of Technology; 1992. Available from: https://scholarworks.rit.edu/theses/2829

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

28. Hadgis, George Anthony. A CMOS monolithic analog multiplier with wide input dynamic range.

Degree: Electrical Engineering, 1995, Rochester Institute of Technology

 A novel CMOS monolithic analog multiplier capable of operating in two quadrants is described in this thesis. The multiplier incorporates a voltage-controlled variable linear resistor… (more)

Subjects/Keywords: Electrical engineering

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APA (6th Edition):

Hadgis, G. A. (1995). A CMOS monolithic analog multiplier with wide input dynamic range. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5597

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Hadgis, George Anthony. “A CMOS monolithic analog multiplier with wide input dynamic range.” 1995. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5597.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Hadgis, George Anthony. “A CMOS monolithic analog multiplier with wide input dynamic range.” 1995. Web. 17 Jul 2019.

Vancouver:

Hadgis GA. A CMOS monolithic analog multiplier with wide input dynamic range. [Internet] [Thesis]. Rochester Institute of Technology; 1995. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5597.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Hadgis GA. A CMOS monolithic analog multiplier with wide input dynamic range. [Thesis]. Rochester Institute of Technology; 1995. Available from: https://scholarworks.rit.edu/theses/5597

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

29. Lungu, George. A New electronic image array: The Active pixel charge injection device.

Degree: Chester F. Carlson Center for Imaging Science (COS), 2002, Rochester Institute of Technology

 This is a Ph.D. thesis dissertation in which a new type of image sensor is investigated as possible successor to the charge coupled device (CCD)… (more)

Subjects/Keywords: Image capture; Imaging science

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APA (6th Edition):

Lungu, G. (2002). A New electronic image array: The Active pixel charge injection device. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/2929

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Lungu, George. “A New electronic image array: The Active pixel charge injection device.” 2002. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/2929.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Lungu, George. “A New electronic image array: The Active pixel charge injection device.” 2002. Web. 17 Jul 2019.

Vancouver:

Lungu G. A New electronic image array: The Active pixel charge injection device. [Internet] [Thesis]. Rochester Institute of Technology; 2002. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/2929.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Lungu G. A New electronic image array: The Active pixel charge injection device. [Thesis]. Rochester Institute of Technology; 2002. Available from: https://scholarworks.rit.edu/theses/2929

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


Rochester Institute of Technology

30. Meisenzahl, Eric J. A Test chip approach to routine process control.

Degree: Electrical Engineering, 1988, Rochester Institute of Technology

 A procedure for determining process control and yield prediction is presented which primarily serves to evaluate the quality and repeatability of critical fabrication steps, but… (more)

Subjects/Keywords: Process control; Integrated circuits; Test chips

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Meisenzahl, E. J. (1988). A Test chip approach to routine process control. (Thesis). Rochester Institute of Technology. Retrieved from https://scholarworks.rit.edu/theses/5564

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Meisenzahl, Eric J. “A Test chip approach to routine process control.” 1988. Thesis, Rochester Institute of Technology. Accessed July 17, 2019. https://scholarworks.rit.edu/theses/5564.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Meisenzahl, Eric J. “A Test chip approach to routine process control.” 1988. Web. 17 Jul 2019.

Vancouver:

Meisenzahl EJ. A Test chip approach to routine process control. [Internet] [Thesis]. Rochester Institute of Technology; 1988. [cited 2019 Jul 17]. Available from: https://scholarworks.rit.edu/theses/5564.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Meisenzahl EJ. A Test chip approach to routine process control. [Thesis]. Rochester Institute of Technology; 1988. Available from: https://scholarworks.rit.edu/theses/5564

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

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