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You searched for +publisher:"Ohio University" +contributor:("Gulino, Daniel"). Showing records 1 – 15 of 15 total matches.

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Ohio University

1. Ju, Wentao. Experimental Investigation of the Epitaxial Lateral Overgrowth of Gallium Nitride and Simulation of Gallium Nitride Metalorganic Chemical Vapor Deposition Process.

Degree: PhD, Chemical Engineering (Engineering), 2003, Ohio University

  In this dissertation, the experimental investigation of the epitaxial lateral overgrowth of GaN and the simulation of the GaN MOCVD process are presented. The… (more)

Subjects/Keywords: Engineering, Chemical; GaN; gallium nitride; MOCVD modeling; Epitaxial lateral overgrowth; ELO; Numerical Simulation

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APA (6th Edition):

Ju, W. (2003). Experimental Investigation of the Epitaxial Lateral Overgrowth of Gallium Nitride and Simulation of Gallium Nitride Metalorganic Chemical Vapor Deposition Process. (Doctoral Dissertation). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1050589636

Chicago Manual of Style (16th Edition):

Ju, Wentao. “Experimental Investigation of the Epitaxial Lateral Overgrowth of Gallium Nitride and Simulation of Gallium Nitride Metalorganic Chemical Vapor Deposition Process.” 2003. Doctoral Dissertation, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1050589636.

MLA Handbook (7th Edition):

Ju, Wentao. “Experimental Investigation of the Epitaxial Lateral Overgrowth of Gallium Nitride and Simulation of Gallium Nitride Metalorganic Chemical Vapor Deposition Process.” 2003. Web. 21 Nov 2019.

Vancouver:

Ju W. Experimental Investigation of the Epitaxial Lateral Overgrowth of Gallium Nitride and Simulation of Gallium Nitride Metalorganic Chemical Vapor Deposition Process. [Internet] [Doctoral dissertation]. Ohio University; 2003. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1050589636.

Council of Science Editors:

Ju W. Experimental Investigation of the Epitaxial Lateral Overgrowth of Gallium Nitride and Simulation of Gallium Nitride Metalorganic Chemical Vapor Deposition Process. [Doctoral Dissertation]. Ohio University; 2003. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1050589636


Ohio University

2. Malka, Ramakrishna. Erosion Corrosion and Synergistic Effects in Disturbed Liquid-Particle Flow.

Degree: MS, Mechanical Engineering (Engineering), 2005, Ohio University

  The present study has been conducted to investigate the interaction between corrosion and erosion processes and quantify synergism in realistic flow environments, across sudden… (more)

Subjects/Keywords: Erosion-corrosion; Synergism; Sudden expansion; Liquid-particle flow; Disturbed flow; Synergistic effects

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APA (6th Edition):

Malka, R. (2005). Erosion Corrosion and Synergistic Effects in Disturbed Liquid-Particle Flow. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1125603562

Chicago Manual of Style (16th Edition):

Malka, Ramakrishna. “Erosion Corrosion and Synergistic Effects in Disturbed Liquid-Particle Flow.” 2005. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1125603562.

MLA Handbook (7th Edition):

Malka, Ramakrishna. “Erosion Corrosion and Synergistic Effects in Disturbed Liquid-Particle Flow.” 2005. Web. 21 Nov 2019.

Vancouver:

Malka R. Erosion Corrosion and Synergistic Effects in Disturbed Liquid-Particle Flow. [Internet] [Masters thesis]. Ohio University; 2005. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1125603562.

Council of Science Editors:

Malka R. Erosion Corrosion and Synergistic Effects in Disturbed Liquid-Particle Flow. [Masters Thesis]. Ohio University; 2005. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1125603562


Ohio University

3. Chen, Ying. RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION.

Degree: MS, Chemical Engineering (Engineering), 2000, Ohio University

Residual stress in Gallium Nitride films grown by metalorganic chemical vapor Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; residual stress; Gallium Nitride films; metalorganic vapor; chemical vapor

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APA (6th Edition):

Chen, Y. (2000). RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171567935

Chicago Manual of Style (16th Edition):

Chen, Ying. “RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION.” 2000. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171567935.

MLA Handbook (7th Edition):

Chen, Ying. “RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION.” 2000. Web. 21 Nov 2019.

Vancouver:

Chen Y. RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION. [Internet] [Masters thesis]. Ohio University; 2000. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171567935.

Council of Science Editors:

Chen Y. RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION. [Masters Thesis]. Ohio University; 2000. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171567935


Ohio University

4. Fu, Yankun. Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition.

Degree: MS, Chemical Engineering (Engineering), 2000, Ohio University

Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; Residual stress; gallium nitride films; silicon substrates; metalorganic deposition; chemical vapor deposition

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APA (6th Edition):

Fu, Y. (2000). Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171653515

Chicago Manual of Style (16th Edition):

Fu, Yankun. “Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition.” 2000. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171653515.

MLA Handbook (7th Edition):

Fu, Yankun. “Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition.” 2000. Web. 21 Nov 2019.

Vancouver:

Fu Y. Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition. [Internet] [Masters thesis]. Ohio University; 2000. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171653515.

Council of Science Editors:

Fu Y. Residual stress in gallium nitride films grown on silicon substrates by metalorganic chemical vapor deposition. [Masters Thesis]. Ohio University; 2000. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171653515


Ohio University

5. Gao, Yungeng. Effect of fluid dynamics and reactor design on the epitaxial growth of gallium nitride on silicon substrate by metalorganic chemical vapor deposition.

Degree: PhD, Chemical Engineering (Engineering), 2000, Ohio University

  MOCVD of GaN on silicon substrate is a very complicated process with the coupling of heteroepitaxy, fluid dynamics, and chemical mechanisms. This dissertation presents… (more)

Subjects/Keywords: Engineering, Chemical; fluid dynamics; reactor design; epitaxial growth; gallium nitride; silicon substrate; metalorganic chemical vapor deposition

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APA (6th Edition):

Gao, Y. (2000). Effect of fluid dynamics and reactor design on the epitaxial growth of gallium nitride on silicon substrate by metalorganic chemical vapor deposition. (Doctoral Dissertation). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179171265

Chicago Manual of Style (16th Edition):

Gao, Yungeng. “Effect of fluid dynamics and reactor design on the epitaxial growth of gallium nitride on silicon substrate by metalorganic chemical vapor deposition.” 2000. Doctoral Dissertation, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179171265.

MLA Handbook (7th Edition):

Gao, Yungeng. “Effect of fluid dynamics and reactor design on the epitaxial growth of gallium nitride on silicon substrate by metalorganic chemical vapor deposition.” 2000. Web. 21 Nov 2019.

Vancouver:

Gao Y. Effect of fluid dynamics and reactor design on the epitaxial growth of gallium nitride on silicon substrate by metalorganic chemical vapor deposition. [Internet] [Doctoral dissertation]. Ohio University; 2000. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179171265.

Council of Science Editors:

Gao Y. Effect of fluid dynamics and reactor design on the epitaxial growth of gallium nitride on silicon substrate by metalorganic chemical vapor deposition. [Doctoral Dissertation]. Ohio University; 2000. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179171265


Ohio University

6. Chakravarthy, Pramod. Silicon carbide coatings by plasma-enhanced chemical vapor deposition on silicon and polyimide substrates.

Degree: MS, Chemical Engineering (Engineering), 1995, Ohio University

Silicon carbide coatings by plasma-enhanced chemical vapor deposition on silicon and polyimide substrates Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; Silicon Carbide Coatings; Polyimide Substrates; Plasma-Enhanced Chemical

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APA (6th Edition):

Chakravarthy, P. (1995). Silicon carbide coatings by plasma-enhanced chemical vapor deposition on silicon and polyimide substrates. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179519920

Chicago Manual of Style (16th Edition):

Chakravarthy, Pramod. “Silicon carbide coatings by plasma-enhanced chemical vapor deposition on silicon and polyimide substrates.” 1995. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179519920.

MLA Handbook (7th Edition):

Chakravarthy, Pramod. “Silicon carbide coatings by plasma-enhanced chemical vapor deposition on silicon and polyimide substrates.” 1995. Web. 21 Nov 2019.

Vancouver:

Chakravarthy P. Silicon carbide coatings by plasma-enhanced chemical vapor deposition on silicon and polyimide substrates. [Internet] [Masters thesis]. Ohio University; 1995. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179519920.

Council of Science Editors:

Chakravarthy P. Silicon carbide coatings by plasma-enhanced chemical vapor deposition on silicon and polyimide substrates. [Masters Thesis]. Ohio University; 1995. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179519920


Ohio University

7. Rymer, Dawn Lee. The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates.

Degree: MS, Chemical Engineering (Engineering), 1995, Ohio University

The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; Atmospheric Chemical Vapor Deposition Titanium Nitride; Polyimide Substrates

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APA (6th Edition):

Rymer, D. L. (1995). The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179952065

Chicago Manual of Style (16th Edition):

Rymer, Dawn Lee. “The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates.” 1995. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179952065.

MLA Handbook (7th Edition):

Rymer, Dawn Lee. “The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates.” 1995. Web. 21 Nov 2019.

Vancouver:

Rymer DL. The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates. [Internet] [Masters thesis]. Ohio University; 1995. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179952065.

Council of Science Editors:

Rymer DL. The atmospheric chemical vapor deposition of titanium nitride on polyimide substrates. [Masters Thesis]. Ohio University; 1995. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1179952065


Ohio University

8. Gladysz, Gary M. Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si <inf>x</inf>N <inf>y</inf>) thin films.

Degree: MS, Chemical Engineering (Engineering), 1991, Ohio University

Subjects/Keywords: Engineering, Chemical; Remote Microwave-Enhanced Chemical; Vapor Deposition; Silicon-nitrogen (Si <; inf>; x<; /inf>; N <; inf>; y<; /inf>; ) Thin Films

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APA (6th Edition):

Gladysz, G. M. (1991). Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si <inf>x</inf>N <inf>y</inf>) thin films. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670

Chicago Manual of Style (16th Edition):

Gladysz, Gary M. “Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si <inf>x</inf>N <inf>y</inf>) thin films.” 1991. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670.

MLA Handbook (7th Edition):

Gladysz, Gary M. “Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si <inf>x</inf>N <inf>y</inf>) thin films.” 1991. Web. 21 Nov 2019.

Vancouver:

Gladysz GM. Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si <inf>x</inf>N <inf>y</inf>) thin films. [Internet] [Masters thesis]. Ohio University; 1991. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670.

Council of Science Editors:

Gladysz GM. Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si <inf>x</inf>N <inf>y</inf>) thin films. [Masters Thesis]. Ohio University; 1991. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670


Ohio University

9. Gopal, Madan. Microwave enhanced chemical vapor deposition of silicon compound thin films and their characterization.

Degree: MS, Chemical Engineering (Engineering), 1991, Ohio University

 This project involves the study of deposition of silicon compound films using 3 different liquid reactants, namely, tetramethyl silane (TMS), silicon tetrachloride (STC), and hexamethyl… (more)

Subjects/Keywords: Engineering, Chemical; Microwave Enhanced Chemical; Vapor Deposition; Silicon Compound Thin Films; Characterization

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APA (6th Edition):

Gopal, M. (1991). Microwave enhanced chemical vapor deposition of silicon compound thin films and their characterization. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183728633

Chicago Manual of Style (16th Edition):

Gopal, Madan. “Microwave enhanced chemical vapor deposition of silicon compound thin films and their characterization.” 1991. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183728633.

MLA Handbook (7th Edition):

Gopal, Madan. “Microwave enhanced chemical vapor deposition of silicon compound thin films and their characterization.” 1991. Web. 21 Nov 2019.

Vancouver:

Gopal M. Microwave enhanced chemical vapor deposition of silicon compound thin films and their characterization. [Internet] [Masters thesis]. Ohio University; 1991. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183728633.

Council of Science Editors:

Gopal M. Microwave enhanced chemical vapor deposition of silicon compound thin films and their characterization. [Masters Thesis]. Ohio University; 1991. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183728633


Ohio University

10. Neogi, Sudarsan. Chemical vapor deposition of silicon dioxide thin films for composite thermo-oxidative durability.

Degree: PhD, Chemical Engineering (Engineering), 1992, Ohio University

Chemical vapor deposition of silicon dioxide thin films for composite thermo-oxidative durability Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; Chemical vapor deposition; silicon dioxide; composite thermo-oxidative

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APA (6th Edition):

Neogi, S. (1992). Chemical vapor deposition of silicon dioxide thin films for composite thermo-oxidative durability. (Doctoral Dissertation). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1173753842

Chicago Manual of Style (16th Edition):

Neogi, Sudarsan. “Chemical vapor deposition of silicon dioxide thin films for composite thermo-oxidative durability.” 1992. Doctoral Dissertation, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1173753842.

MLA Handbook (7th Edition):

Neogi, Sudarsan. “Chemical vapor deposition of silicon dioxide thin films for composite thermo-oxidative durability.” 1992. Web. 21 Nov 2019.

Vancouver:

Neogi S. Chemical vapor deposition of silicon dioxide thin films for composite thermo-oxidative durability. [Internet] [Doctoral dissertation]. Ohio University; 1992. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1173753842.

Council of Science Editors:

Neogi S. Chemical vapor deposition of silicon dioxide thin films for composite thermo-oxidative durability. [Doctoral Dissertation]. Ohio University; 1992. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1173753842


Ohio University

11. Miller, Larry M. A model for the prediction of thermo-oxidative mass loss of ceramic coated polyimide composites.

Degree: PhD, Chemical Engineering (Engineering), 1995, Ohio University

  The purpose of this work is to understand the mechanisms of high temperature decomposition for a ceramic coated polyimide (DP-29) composite by developing a… (more)

Subjects/Keywords: Engineering, Chemical; thermo-oxidative mass; ceramic coated polyimide composites; rate of decomposition; kinetic model

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APA (6th Edition):

Miller, L. M. (1995). A model for the prediction of thermo-oxidative mass loss of ceramic coated polyimide composites. (Doctoral Dissertation). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1174609538

Chicago Manual of Style (16th Edition):

Miller, Larry M. “A model for the prediction of thermo-oxidative mass loss of ceramic coated polyimide composites.” 1995. Doctoral Dissertation, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1174609538.

MLA Handbook (7th Edition):

Miller, Larry M. “A model for the prediction of thermo-oxidative mass loss of ceramic coated polyimide composites.” 1995. Web. 21 Nov 2019.

Vancouver:

Miller LM. A model for the prediction of thermo-oxidative mass loss of ceramic coated polyimide composites. [Internet] [Doctoral dissertation]. Ohio University; 1995. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1174609538.

Council of Science Editors:

Miller LM. A model for the prediction of thermo-oxidative mass loss of ceramic coated polyimide composites. [Doctoral Dissertation]. Ohio University; 1995. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1174609538


Ohio University

12. Zou, YuKai. Iron-catalyzed growth of carbon fibers from hydrocarbon procursors.

Degree: MS, Chemical Engineering (Engineering), 2002, Ohio University

Iron-catalyzed growth of carbon fibers from hydrocarbon procursors. Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; Iron-Catalyzed Growth; Carbon Fibers; Hydrocarbon Procursors

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APA (6th Edition):

Zou, Y. (2002). Iron-catalyzed growth of carbon fibers from hydrocarbon procursors. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175014254

Chicago Manual of Style (16th Edition):

Zou, YuKai. “Iron-catalyzed growth of carbon fibers from hydrocarbon procursors.” 2002. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175014254.

MLA Handbook (7th Edition):

Zou, YuKai. “Iron-catalyzed growth of carbon fibers from hydrocarbon procursors.” 2002. Web. 21 Nov 2019.

Vancouver:

Zou Y. Iron-catalyzed growth of carbon fibers from hydrocarbon procursors. [Internet] [Masters thesis]. Ohio University; 2002. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175014254.

Council of Science Editors:

Zou Y. Iron-catalyzed growth of carbon fibers from hydrocarbon procursors. [Masters Thesis]. Ohio University; 2002. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175014254


Ohio University

13. Maldei, Michael. A study of the suitability of amorphous, hydrogenated carbon (a-C:H) for photovoltaic devices.

Degree: PhD, Chemical Engineering (Engineering), 1997, Ohio University

  Amorphous, hydrogenated carbon (a-C:H) is a prospective material for photovoltaic energy conversion because its electronic bandgap can be varied over an unusually wide range… (more)

Subjects/Keywords: Engineering, Chemical; amorphous; hydrogenated carbon (a-C:H); photovoltaic devices; elastic recoil spectroscopy; optical bandgap energy

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APA (6th Edition):

Maldei, M. (1997). A study of the suitability of amorphous, hydrogenated carbon (a-C:H) for photovoltaic devices. (Doctoral Dissertation). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175022667

Chicago Manual of Style (16th Edition):

Maldei, Michael. “A study of the suitability of amorphous, hydrogenated carbon (a-C:H) for photovoltaic devices.” 1997. Doctoral Dissertation, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175022667.

MLA Handbook (7th Edition):

Maldei, Michael. “A study of the suitability of amorphous, hydrogenated carbon (a-C:H) for photovoltaic devices.” 1997. Web. 21 Nov 2019.

Vancouver:

Maldei M. A study of the suitability of amorphous, hydrogenated carbon (a-C:H) for photovoltaic devices. [Internet] [Doctoral dissertation]. Ohio University; 1997. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175022667.

Council of Science Editors:

Maldei M. A study of the suitability of amorphous, hydrogenated carbon (a-C:H) for photovoltaic devices. [Doctoral Dissertation]. Ohio University; 1997. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175022667


Ohio University

14. Willis, Jim. Dependence of piezoelectric response in gallium nitride films on silicon substrate type.

Degree: MS, Chemical Engineering (Engineering), 1999, Ohio University

Dependence of piezoelectric response in gallium nitride films on silicon substrate type Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; piezoelectric; gallium nitride; silicon substrate

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APA (6th Edition):

Willis, J. (1999). Dependence of piezoelectric response in gallium nitride films on silicon substrate type. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175274577

Chicago Manual of Style (16th Edition):

Willis, Jim. “Dependence of piezoelectric response in gallium nitride films on silicon substrate type.” 1999. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175274577.

MLA Handbook (7th Edition):

Willis, Jim. “Dependence of piezoelectric response in gallium nitride films on silicon substrate type.” 1999. Web. 21 Nov 2019.

Vancouver:

Willis J. Dependence of piezoelectric response in gallium nitride films on silicon substrate type. [Internet] [Masters thesis]. Ohio University; 1999. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175274577.

Council of Science Editors:

Willis J. Dependence of piezoelectric response in gallium nitride films on silicon substrate type. [Masters Thesis]. Ohio University; 1999. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175274577


Ohio University

15. Dangarwala, Gaurav A. A model of the change in viscosity of polyimide PMR-15 during cure.

Degree: MS, Chemical Engineering (Engineering), 1993, Ohio University

A model of the change in viscosity of polyimide PMR-15 during cure Advisors/Committee Members: Gulino, Daniel (Advisor).

Subjects/Keywords: Engineering, Chemical; viscosity; polyimide PMR-15; Diels-Alder Rection; non-linear parameters

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APA (6th Edition):

Dangarwala, G. A. (1993). A model of the change in viscosity of polyimide PMR-15 during cure. (Masters Thesis). Ohio University. Retrieved from http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175284832

Chicago Manual of Style (16th Edition):

Dangarwala, Gaurav A. “A model of the change in viscosity of polyimide PMR-15 during cure.” 1993. Masters Thesis, Ohio University. Accessed November 21, 2019. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175284832.

MLA Handbook (7th Edition):

Dangarwala, Gaurav A. “A model of the change in viscosity of polyimide PMR-15 during cure.” 1993. Web. 21 Nov 2019.

Vancouver:

Dangarwala GA. A model of the change in viscosity of polyimide PMR-15 during cure. [Internet] [Masters thesis]. Ohio University; 1993. [cited 2019 Nov 21]. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175284832.

Council of Science Editors:

Dangarwala GA. A model of the change in viscosity of polyimide PMR-15 during cure. [Masters Thesis]. Ohio University; 1993. Available from: http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175284832

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