Advanced search options

Advanced Search Options 🞨

Browse by author name (“Author name starts with…”).

Find ETDs with:

in
/  
in
/  
in
/  
in

Written in Published in Earliest date Latest date

Sorted by

Results per page:

Sorted by: relevance · author · university · dateNew search

You searched for +publisher:"North Carolina State University" +contributor:("Angus Kingon, Committee Chair"). Showing records 1 – 5 of 5 total matches.

Search Limiters

Last 2 Years | English Only

No search limiters apply to these results.

▼ Search Limiters


North Carolina State University

1. Srinivasan, Sudarsan. Piezoelectric, Dielectric and Ferroelectric Thin Films on Metal Substrates for Microelectronic Applications.

Degree: PhD, Materials Science and Engineering, 2006, North Carolina State University

 The purpose of this research has been to demonstrate the possibility of integrating piezoelectric, dielectric and ferroelectric- lead and barium based oxide thin films and… (more)

Subjects/Keywords: microelectronics; oxygen; fatigue; PZT; copper; BZT; piezoelectric; actuators; dielectric; Ferroelectric

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Srinivasan, S. (2006). Piezoelectric, Dielectric and Ferroelectric Thin Films on Metal Substrates for Microelectronic Applications. (Doctoral Dissertation). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/3633

Chicago Manual of Style (16th Edition):

Srinivasan, Sudarsan. “Piezoelectric, Dielectric and Ferroelectric Thin Films on Metal Substrates for Microelectronic Applications.” 2006. Doctoral Dissertation, North Carolina State University. Accessed August 05, 2020. http://www.lib.ncsu.edu/resolver/1840.16/3633.

MLA Handbook (7th Edition):

Srinivasan, Sudarsan. “Piezoelectric, Dielectric and Ferroelectric Thin Films on Metal Substrates for Microelectronic Applications.” 2006. Web. 05 Aug 2020.

Vancouver:

Srinivasan S. Piezoelectric, Dielectric and Ferroelectric Thin Films on Metal Substrates for Microelectronic Applications. [Internet] [Doctoral dissertation]. North Carolina State University; 2006. [cited 2020 Aug 05]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/3633.

Council of Science Editors:

Srinivasan S. Piezoelectric, Dielectric and Ferroelectric Thin Films on Metal Substrates for Microelectronic Applications. [Doctoral Dissertation]. North Carolina State University; 2006. Available from: http://www.lib.ncsu.edu/resolver/1840.16/3633


North Carolina State University

2. Hydrick, Jennifer Marie. Epitaxial Oxide Growth on Si(001) for Floating Epitaxy, a Novel Process for Silicon-on-Insulator Wafer Production.

Degree: MS, Materials Science and Engineering, 2007, North Carolina State University

 As scaling continues in the semiconductor industry, silicon-on-insulator (SOI) wafers are increasingly becoming the substrate of choice, due to higher channel mobility, effective device isolation,… (more)

Subjects/Keywords: lattice parameter; scaling; stability; solid solution; germanium; barium oxide; Ba1-xSrxO; silicon; strontium titanate; strontium oxide; BaO; SrO; Ca1-xSrxTiO3; calcium titanate; molecular beam epitaxy; RHEED; reflection high energy electron diffraction; MBE; AFM; CaTiO3; SrTiO3; barium strontium oxide; HRTEM; TEM; Mg; template; silicon-on-insulator; Si; Ca; O; Sr; Ti; Ba; lattice match; insulator; (001); epitaxy; Floating Epitaxy; RBS; XRD; epitaxial; SOI; SIMS; titanium; in-situ; calcium strontium titanate; ITRS; solid phase epitaxy; growth; deposition; semiconductor; heteroepitaxy; strontium; barium; silicon on insulator

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Hydrick, J. M. (2007). Epitaxial Oxide Growth on Si(001) for Floating Epitaxy, a Novel Process for Silicon-on-Insulator Wafer Production. (Thesis). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/2307

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Hydrick, Jennifer Marie. “Epitaxial Oxide Growth on Si(001) for Floating Epitaxy, a Novel Process for Silicon-on-Insulator Wafer Production.” 2007. Thesis, North Carolina State University. Accessed August 05, 2020. http://www.lib.ncsu.edu/resolver/1840.16/2307.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Hydrick, Jennifer Marie. “Epitaxial Oxide Growth on Si(001) for Floating Epitaxy, a Novel Process for Silicon-on-Insulator Wafer Production.” 2007. Web. 05 Aug 2020.

Vancouver:

Hydrick JM. Epitaxial Oxide Growth on Si(001) for Floating Epitaxy, a Novel Process for Silicon-on-Insulator Wafer Production. [Internet] [Thesis]. North Carolina State University; 2007. [cited 2020 Aug 05]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/2307.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Hydrick JM. Epitaxial Oxide Growth on Si(001) for Floating Epitaxy, a Novel Process for Silicon-on-Insulator Wafer Production. [Thesis]. North Carolina State University; 2007. Available from: http://www.lib.ncsu.edu/resolver/1840.16/2307

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


North Carolina State University

3. Hydrick, Aaron Eugene. Thin Film Shape Sensing: The Development of an Integrated Flexible Thin Film Temperature-Compensated Strain Sensing Array.

Degree: MS, Materials Science and Engineering, 2006, North Carolina State University

 The purpose of the Thin Film Shape Sensing project was to develop an array of temperature-compensated strain sensors to be used as a shape sensing… (more)

Subjects/Keywords: strain rosette; strain gage; kapton; thin film; magnetron; photolithography; sputtering; RTD; temperature sensor; strain sensor; shape sensing; flexible

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Hydrick, A. E. (2006). Thin Film Shape Sensing: The Development of an Integrated Flexible Thin Film Temperature-Compensated Strain Sensing Array. (Thesis). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/809

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Chicago Manual of Style (16th Edition):

Hydrick, Aaron Eugene. “Thin Film Shape Sensing: The Development of an Integrated Flexible Thin Film Temperature-Compensated Strain Sensing Array.” 2006. Thesis, North Carolina State University. Accessed August 05, 2020. http://www.lib.ncsu.edu/resolver/1840.16/809.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

MLA Handbook (7th Edition):

Hydrick, Aaron Eugene. “Thin Film Shape Sensing: The Development of an Integrated Flexible Thin Film Temperature-Compensated Strain Sensing Array.” 2006. Web. 05 Aug 2020.

Vancouver:

Hydrick AE. Thin Film Shape Sensing: The Development of an Integrated Flexible Thin Film Temperature-Compensated Strain Sensing Array. [Internet] [Thesis]. North Carolina State University; 2006. [cited 2020 Aug 05]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/809.

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation

Council of Science Editors:

Hydrick AE. Thin Film Shape Sensing: The Development of an Integrated Flexible Thin Film Temperature-Compensated Strain Sensing Array. [Thesis]. North Carolina State University; 2006. Available from: http://www.lib.ncsu.edu/resolver/1840.16/809

Note: this citation may be lacking information needed for this citation format:
Not specified: Masters Thesis or Doctoral Dissertation


North Carolina State University

4. Kim, Taeyun. Lead Zirconate Titanate (PZT) Based Thin Film Capacitors For Embedded Passive Applications.

Degree: PhD, Materials Science and Engineering, 2003, North Carolina State University

 Investigations on the key processing parameters and properties relationship for lead zirconate titanate (PZT, 52/48) based thin film capacitors for embedded passive capacitor application were… (more)

Subjects/Keywords: capacitor; PZT; embedded passives; foil; polymer board

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Kim, T. (2003). Lead Zirconate Titanate (PZT) Based Thin Film Capacitors For Embedded Passive Applications. (Doctoral Dissertation). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/3213

Chicago Manual of Style (16th Edition):

Kim, Taeyun. “Lead Zirconate Titanate (PZT) Based Thin Film Capacitors For Embedded Passive Applications.” 2003. Doctoral Dissertation, North Carolina State University. Accessed August 05, 2020. http://www.lib.ncsu.edu/resolver/1840.16/3213.

MLA Handbook (7th Edition):

Kim, Taeyun. “Lead Zirconate Titanate (PZT) Based Thin Film Capacitors For Embedded Passive Applications.” 2003. Web. 05 Aug 2020.

Vancouver:

Kim T. Lead Zirconate Titanate (PZT) Based Thin Film Capacitors For Embedded Passive Applications. [Internet] [Doctoral dissertation]. North Carolina State University; 2003. [cited 2020 Aug 05]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/3213.

Council of Science Editors:

Kim T. Lead Zirconate Titanate (PZT) Based Thin Film Capacitors For Embedded Passive Applications. [Doctoral Dissertation]. North Carolina State University; 2003. Available from: http://www.lib.ncsu.edu/resolver/1840.16/3213


North Carolina State University

5. Jur, Jesse Stephen. Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications.

Degree: PhD, Materials Science and Engineering, 2007, North Carolina State University

 The ability to improve performance of the high-end metal oxide semiconductor field effect transistor (MOSFET) is highly reliant on the dimensional scaling of such a… (more)

Subjects/Keywords: dc magnetron sputtering; physical vapor deposition; tungsten oxide; tungsten; W; tantalum nitride; TaN; lanthanum; lanthanum oxide; La; La2O3; La2SiO5; lanthanum silicate; La2Si2O7; Ho; holmium; holmium oxide; cation diffusion; back-side SIMS; secondary ion mass spectroscopy; SIMS; XRD; x-ray diffraction; molecular beam deposition; PMA; XPS; x-ray photoemission spectroscopy; post metallization anneal; RCA; chemical oxide; metal oxide semiconductor field effect transistor; MBE; silica; SiO2; interfacial layer; gate dielectric; dielectric; silicate; oxide; high-kappa; EOT; equivalent oxide thickness; high-k; band diagram; valance band offset; conduction band offset; band gap energy; effective work function; work function; voltage shift; threshold voltage; flat band voltage; leakage current; capacitance; mobility; electronic materials; scaling; Moore?s Law; MIS; MOS; MOSFET; high resolution transmission electron microscopy; HRTEM; RTA; rapid thermal anneal; PVD; tantalum; Ta; gate electrode; metal electrode; hafnium silicate; hafnium oxide; hafnium; ytterbium; ytterbium oxide; Yb; dysprosium oxide; dysprosium; Dy; E-beam evaporation; thermal evaporation; forming gas anneal; ozone; ammonia anneal; FGA

Record DetailsSimilar RecordsGoogle PlusoneFacebookTwitterCiteULikeMendeleyreddit

APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

Jur, J. S. (2007). Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications. (Doctoral Dissertation). North Carolina State University. Retrieved from http://www.lib.ncsu.edu/resolver/1840.16/5447

Chicago Manual of Style (16th Edition):

Jur, Jesse Stephen. “Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications.” 2007. Doctoral Dissertation, North Carolina State University. Accessed August 05, 2020. http://www.lib.ncsu.edu/resolver/1840.16/5447.

MLA Handbook (7th Edition):

Jur, Jesse Stephen. “Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications.” 2007. Web. 05 Aug 2020.

Vancouver:

Jur JS. Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications. [Internet] [Doctoral dissertation]. North Carolina State University; 2007. [cited 2020 Aug 05]. Available from: http://www.lib.ncsu.edu/resolver/1840.16/5447.

Council of Science Editors:

Jur JS. Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications. [Doctoral Dissertation]. North Carolina State University; 2007. Available from: http://www.lib.ncsu.edu/resolver/1840.16/5447

.