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You searched for +publisher:"Georgia Tech" +contributor:("Henderson, Clifford"). Showing records 1 – 30 of 41 total matches.

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Georgia Tech

1. Sundaramoorthi, Annapoorani. Fundamental understanding of physicochemical properties of ultra-thin polymer films.

Degree: PhD, Chemical Engineering, 2011, Georgia Tech

 Diffusion behavior of spin cast polymer thin films was studied in detail as a function of film thickness. Diffusion coefficients of water molecules in poly(methyl… (more)

Subjects/Keywords: Diffusion coefficient; Free volume; PCND; Photolithography; Polymers; Thin films; Microelectronics

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APA (6th Edition):

Sundaramoorthi, A. (2011). Fundamental understanding of physicochemical properties of ultra-thin polymer films. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/43604

Chicago Manual of Style (16th Edition):

Sundaramoorthi, Annapoorani. “Fundamental understanding of physicochemical properties of ultra-thin polymer films.” 2011. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/43604.

MLA Handbook (7th Edition):

Sundaramoorthi, Annapoorani. “Fundamental understanding of physicochemical properties of ultra-thin polymer films.” 2011. Web. 19 Sep 2019.

Vancouver:

Sundaramoorthi A. Fundamental understanding of physicochemical properties of ultra-thin polymer films. [Internet] [Doctoral dissertation]. Georgia Tech; 2011. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/43604.

Council of Science Editors:

Sundaramoorthi A. Fundamental understanding of physicochemical properties of ultra-thin polymer films. [Doctoral Dissertation]. Georgia Tech; 2011. Available from: http://hdl.handle.net/1853/43604


Georgia Tech

2. Boddapati, Aparna. Modeling cure depth during photopolymerization of multifunctional acrylates.

Degree: MS, Chemical Engineering, 2010, Georgia Tech

 The photopolymerization of multifunctional acrylates leads to the formation of a complex and insoluble network due to cross-linking. This characteristic is a useful property for… (more)

Subjects/Keywords: Kinetic Monte Carlo; Degree of Cure; Acrylate kinetics; Stereolithography; Photopolymerization; Acrylates; Chemical kinetics; Differential equations

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APA (6th Edition):

Boddapati, A. (2010). Modeling cure depth during photopolymerization of multifunctional acrylates. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/33934

Chicago Manual of Style (16th Edition):

Boddapati, Aparna. “Modeling cure depth during photopolymerization of multifunctional acrylates.” 2010. Masters Thesis, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/33934.

MLA Handbook (7th Edition):

Boddapati, Aparna. “Modeling cure depth during photopolymerization of multifunctional acrylates.” 2010. Web. 19 Sep 2019.

Vancouver:

Boddapati A. Modeling cure depth during photopolymerization of multifunctional acrylates. [Internet] [Masters thesis]. Georgia Tech; 2010. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/33934.

Council of Science Editors:

Boddapati A. Modeling cure depth during photopolymerization of multifunctional acrylates. [Masters Thesis]. Georgia Tech; 2010. Available from: http://hdl.handle.net/1853/33934


Georgia Tech

3. Jarnagin, Nathan D. High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal.

Degree: PhD, Chemistry and Biochemistry, 2013, Georgia Tech

 Block copolymer (BCP) thin film patterns, generated using directed self-assembly (DSA) of diblock copolymers, have shown excellent promise as templates for semiconductor device manufacturing since… (more)

Subjects/Keywords: Block copolymer; Phase separation; Directed self-assembly; Poly(styrene)-b-poly(hydroxystyrene); Atomic layer deposition; Reactive ion etch; Poly(trimethylsilylstyrene)-block-poly(hydroxystyrene); Block copolymers; Diblock copolymers; Thin films; Self-assembly (Chemistry)

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APA (6th Edition):

Jarnagin, N. D. (2013). High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/50287

Chicago Manual of Style (16th Edition):

Jarnagin, Nathan D. “High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal.” 2013. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/50287.

MLA Handbook (7th Edition):

Jarnagin, Nathan D. “High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal.” 2013. Web. 19 Sep 2019.

Vancouver:

Jarnagin ND. High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/50287.

Council of Science Editors:

Jarnagin ND. High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/50287


Georgia Tech

4. Donado Morcillo, Carlos Alberto. Development of lightweight and low-cost microwave components for remote-sensing applications.

Degree: PhD, Electrical and Computer Engineering, 2012, Georgia Tech

 The objective of the proposed research is to design, implement, and characterize low-cost, lightweight front-end components and subsystems in the microwave domain through innovative packaging… (more)

Subjects/Keywords: Radio frequency (RF); SiGe; Cold land process; TaN; Microstrip model; Microstrip patch antenna; Flat-panel antenna; Thermal modeling; Thermal characterization of dielectric; Flip-chip bond; AlN; Microwave filter; Remote sensing; Integrated circuits; Microelectromechanical systems

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APA (6th Edition):

Donado Morcillo, C. A. (2012). Development of lightweight and low-cost microwave components for remote-sensing applications. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/51733

Chicago Manual of Style (16th Edition):

Donado Morcillo, Carlos Alberto. “Development of lightweight and low-cost microwave components for remote-sensing applications.” 2012. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/51733.

MLA Handbook (7th Edition):

Donado Morcillo, Carlos Alberto. “Development of lightweight and low-cost microwave components for remote-sensing applications.” 2012. Web. 19 Sep 2019.

Vancouver:

Donado Morcillo CA. Development of lightweight and low-cost microwave components for remote-sensing applications. [Internet] [Doctoral dissertation]. Georgia Tech; 2012. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/51733.

Council of Science Editors:

Donado Morcillo CA. Development of lightweight and low-cost microwave components for remote-sensing applications. [Doctoral Dissertation]. Georgia Tech; 2012. Available from: http://hdl.handle.net/1853/51733


Georgia Tech

5. Baltazar, Jose A. Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics.

Degree: PhD, Chemical and Biomolecular Engineering, 2013, Georgia Tech

 Graphene is a two-dimensional sp2 hybridized carbon lattice that is also the fundamental building block of graphite. Graphene has attracted significant interest recently due to… (more)

Subjects/Keywords: Graphene; Graphene doping; Graphene growth; Graphene exfoliation; Polycyclic aromatic hydrocarbons; Graphene; Self-assembly (Chemistry); Semiconductor doping

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APA (6th Edition):

Baltazar, J. A. (2013). Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/51787

Chicago Manual of Style (16th Edition):

Baltazar, Jose A. “Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics.” 2013. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/51787.

MLA Handbook (7th Edition):

Baltazar, Jose A. “Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics.” 2013. Web. 19 Sep 2019.

Vancouver:

Baltazar JA. Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/51787.

Council of Science Editors:

Baltazar JA. Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/51787


Georgia Tech

6. Sokolov, Denis A. Investigation of Graphene Formation from Graphite Oxide and Silicon Carbide.

Degree: PhD, Chemistry and Biochemistry, 2013, Georgia Tech

 Graphene is a novel two dimensional material that is revolutionizing many areas of science and it is no surprise that a significant amount of effort… (more)

Subjects/Keywords: SiC epitaxy; Raman; XPS; SEM; Ion reduction; QMS; Light sensor; Laser reduction; Graphite oxide; Graphene oxide

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APA (6th Edition):

Sokolov, D. A. (2013). Investigation of Graphene Formation from Graphite Oxide and Silicon Carbide. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/53642

Chicago Manual of Style (16th Edition):

Sokolov, Denis A. “Investigation of Graphene Formation from Graphite Oxide and Silicon Carbide.” 2013. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/53642.

MLA Handbook (7th Edition):

Sokolov, Denis A. “Investigation of Graphene Formation from Graphite Oxide and Silicon Carbide.” 2013. Web. 19 Sep 2019.

Vancouver:

Sokolov DA. Investigation of Graphene Formation from Graphite Oxide and Silicon Carbide. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/53642.

Council of Science Editors:

Sokolov DA. Investigation of Graphene Formation from Graphite Oxide and Silicon Carbide. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/53642


Georgia Tech

7. Abdallah, Jassem. Polycarbonate-silsesquioxane and polycarbonate-siloxane nanocomposites: synthesis, characterization, and application in the fabrication of porous inorganic films.

Degree: PhD, Chemical Engineering, 2009, Georgia Tech

 Three types of poly(norbornane carbonate) or PNC oligomers were synthesized and characterized via spectroscopic methods and elemental analyses to validate their chemical structures. Using the… (more)

Subjects/Keywords: Phase-segregation; Template; Direct-write; Hybrid; Nanocomposites; Low-k; Porous; Thin films; Porosity; Porous materials

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APA (6th Edition):

Abdallah, J. (2009). Polycarbonate-silsesquioxane and polycarbonate-siloxane nanocomposites: synthesis, characterization, and application in the fabrication of porous inorganic films. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/37271

Chicago Manual of Style (16th Edition):

Abdallah, Jassem. “Polycarbonate-silsesquioxane and polycarbonate-siloxane nanocomposites: synthesis, characterization, and application in the fabrication of porous inorganic films.” 2009. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/37271.

MLA Handbook (7th Edition):

Abdallah, Jassem. “Polycarbonate-silsesquioxane and polycarbonate-siloxane nanocomposites: synthesis, characterization, and application in the fabrication of porous inorganic films.” 2009. Web. 19 Sep 2019.

Vancouver:

Abdallah J. Polycarbonate-silsesquioxane and polycarbonate-siloxane nanocomposites: synthesis, characterization, and application in the fabrication of porous inorganic films. [Internet] [Doctoral dissertation]. Georgia Tech; 2009. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/37271.

Council of Science Editors:

Abdallah J. Polycarbonate-silsesquioxane and polycarbonate-siloxane nanocomposites: synthesis, characterization, and application in the fabrication of porous inorganic films. [Doctoral Dissertation]. Georgia Tech; 2009. Available from: http://hdl.handle.net/1853/37271


Georgia Tech

8. Pande, Ashish Arunkumar. Mechanism of fluoride-based etch and clean processes.

Degree: PhD, Chemical Engineering, 2011, Georgia Tech

 Fluoride-containing solutions are widely used to etch silicon dioxide-based films. A critical issue in integrated circuit (IC) and microelectromechanical systems (MEMS) fabrication is achievement of… (more)

Subjects/Keywords: Reflectometry; Reactor; State estimation; Modelling and simulation; CFD; Etch chemistry; Microelectronics; Integrated circuits; Microelectromechanical systems

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APA (6th Edition):

Pande, A. A. (2011). Mechanism of fluoride-based etch and clean processes. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/43600

Chicago Manual of Style (16th Edition):

Pande, Ashish Arunkumar. “Mechanism of fluoride-based etch and clean processes.” 2011. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/43600.

MLA Handbook (7th Edition):

Pande, Ashish Arunkumar. “Mechanism of fluoride-based etch and clean processes.” 2011. Web. 19 Sep 2019.

Vancouver:

Pande AA. Mechanism of fluoride-based etch and clean processes. [Internet] [Doctoral dissertation]. Georgia Tech; 2011. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/43600.

Council of Science Editors:

Pande AA. Mechanism of fluoride-based etch and clean processes. [Doctoral Dissertation]. Georgia Tech; 2011. Available from: http://hdl.handle.net/1853/43600


Georgia Tech

9. Sivaram, Saujan Venkat. The impact of surface chemistry on stable semiconductor nanowire growth.

Degree: PhD, Chemical and Biomolecular Engineering, 2015, Georgia Tech

 The vapor-liquid-solid (VLS) mechanism – whereby a liquid eutectic “catalyst” droplet collects precursor molecules (or atoms) from the vapor and directs crystallization of the solid… (more)

Subjects/Keywords: Nanowire; Semiconductor; Synthesis; Spectroscopy

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APA (6th Edition):

Sivaram, S. V. (2015). The impact of surface chemistry on stable semiconductor nanowire growth. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/55509

Chicago Manual of Style (16th Edition):

Sivaram, Saujan Venkat. “The impact of surface chemistry on stable semiconductor nanowire growth.” 2015. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/55509.

MLA Handbook (7th Edition):

Sivaram, Saujan Venkat. “The impact of surface chemistry on stable semiconductor nanowire growth.” 2015. Web. 19 Sep 2019.

Vancouver:

Sivaram SV. The impact of surface chemistry on stable semiconductor nanowire growth. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/55509.

Council of Science Editors:

Sivaram SV. The impact of surface chemistry on stable semiconductor nanowire growth. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/55509


Georgia Tech

10. He, Christine Yi. Viscous solvents as an environment for nucleic acid replication.

Degree: PhD, Chemical and Biomolecular Engineering, 2017, Georgia Tech

 Many hypotheses concerning the nature of early life assume that genetic information was once transferred through the template-directed synthesis of RNA, prior to the evolution… (more)

Subjects/Keywords: Viscosity; Nucleic acid replication; RNA world; Prebiotic chemistry; Chemical evolution; Origins of life

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APA (6th Edition):

He, C. Y. (2017). Viscous solvents as an environment for nucleic acid replication. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/59762

Chicago Manual of Style (16th Edition):

He, Christine Yi. “Viscous solvents as an environment for nucleic acid replication.” 2017. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/59762.

MLA Handbook (7th Edition):

He, Christine Yi. “Viscous solvents as an environment for nucleic acid replication.” 2017. Web. 19 Sep 2019.

Vancouver:

He CY. Viscous solvents as an environment for nucleic acid replication. [Internet] [Doctoral dissertation]. Georgia Tech; 2017. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/59762.

Council of Science Editors:

He CY. Viscous solvents as an environment for nucleic acid replication. [Doctoral Dissertation]. Georgia Tech; 2017. Available from: http://hdl.handle.net/1853/59762


Georgia Tech

11. Breaux, Caleb Lamar. Investigation into obstacles to the implementation of the directed-self assembly of block copolymers.

Degree: PhD, Chemical and Biomolecular Engineering, 2018, Georgia Tech

 To meet the growing demands of the microelectronics industry and their desire to continue Moore’s Law, a variety of routes to extend or replace optical… (more)

Subjects/Keywords: Directed self-assembly; Block copolymers; Synthesis; Defects; SAXS; blends

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APA (6th Edition):

Breaux, C. L. (2018). Investigation into obstacles to the implementation of the directed-self assembly of block copolymers. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/59912

Chicago Manual of Style (16th Edition):

Breaux, Caleb Lamar. “Investigation into obstacles to the implementation of the directed-self assembly of block copolymers.” 2018. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/59912.

MLA Handbook (7th Edition):

Breaux, Caleb Lamar. “Investigation into obstacles to the implementation of the directed-self assembly of block copolymers.” 2018. Web. 19 Sep 2019.

Vancouver:

Breaux CL. Investigation into obstacles to the implementation of the directed-self assembly of block copolymers. [Internet] [Doctoral dissertation]. Georgia Tech; 2018. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/59912.

Council of Science Editors:

Breaux CL. Investigation into obstacles to the implementation of the directed-self assembly of block copolymers. [Doctoral Dissertation]. Georgia Tech; 2018. Available from: http://hdl.handle.net/1853/59912


Georgia Tech

12. Peters, Andrew J. Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing.

Degree: PhD, Chemical and Biomolecular Engineering, 2015, Georgia Tech

 A molecular dynamics coarse-grained block copolymer (BCP) model was developed and used to studied directed self-assembly (DSA), especially in regards to applications for semiconductor manufacturing.… (more)

Subjects/Keywords: Block copolymer directed self-assembly; Mesoscale simulation; Coarse-grained simulation; Semiconductor manufacturing; Integrated circuit

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APA (6th Edition):

Peters, A. J. (2015). Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/53860

Chicago Manual of Style (16th Edition):

Peters, Andrew J. “Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing.” 2015. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/53860.

MLA Handbook (7th Edition):

Peters, Andrew J. “Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing.” 2015. Web. 19 Sep 2019.

Vancouver:

Peters AJ. Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/53860.

Council of Science Editors:

Peters AJ. Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/53860


Georgia Tech

13. Li, Yuan. Development of micromachined millimeter wave modules for wireless communication systems.

Degree: PhD, Electrical and Computer Engineering, 2010, Georgia Tech

 This research discusses the design, fabrication, integration, and characterization of micromachined millimeter-wave components and a signal source for THz multiplier source using the deep reactive… (more)

Subjects/Keywords: Millimeter-wave; Signal source; Wireless front-end; Micromachining; Wireless communication systems; Millimeter wave communication systems; Millimeter wave devices; Plasma etching

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APA (6th Edition):

Li, Y. (2010). Development of micromachined millimeter wave modules for wireless communication systems. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/34782

Chicago Manual of Style (16th Edition):

Li, Yuan. “Development of micromachined millimeter wave modules for wireless communication systems.” 2010. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/34782.

MLA Handbook (7th Edition):

Li, Yuan. “Development of micromachined millimeter wave modules for wireless communication systems.” 2010. Web. 19 Sep 2019.

Vancouver:

Li Y. Development of micromachined millimeter wave modules for wireless communication systems. [Internet] [Doctoral dissertation]. Georgia Tech; 2010. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/34782.

Council of Science Editors:

Li Y. Development of micromachined millimeter wave modules for wireless communication systems. [Doctoral Dissertation]. Georgia Tech; 2010. Available from: http://hdl.handle.net/1853/34782


Georgia Tech

14. Setzler, Brian Patrick. Kinetic and transport modeling in proton exchange membrane fuel cells.

Degree: PhD, Chemical and Biomolecular Engineering, 2015, Georgia Tech

 The improvement of PEMFC performance and durability requires a quantitative understanding of the processes that cause performance losses. In this dissertation, two models are developed… (more)

Subjects/Keywords: Proton exchange membrane fuel cell; Oxygen reduction reaction; Physics-based model; Electrochemical impedance spectroscopy; Two-phase transport; Fuel cell

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APA (6th Edition):

Setzler, B. P. (2015). Kinetic and transport modeling in proton exchange membrane fuel cells. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/55507

Chicago Manual of Style (16th Edition):

Setzler, Brian Patrick. “Kinetic and transport modeling in proton exchange membrane fuel cells.” 2015. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/55507.

MLA Handbook (7th Edition):

Setzler, Brian Patrick. “Kinetic and transport modeling in proton exchange membrane fuel cells.” 2015. Web. 19 Sep 2019.

Vancouver:

Setzler BP. Kinetic and transport modeling in proton exchange membrane fuel cells. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/55507.

Council of Science Editors:

Setzler BP. Kinetic and transport modeling in proton exchange membrane fuel cells. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/55507


Georgia Tech

15. Jariwala, Amit Shashikant. Modeling and process planning for exposure controlled projection lithography.

Degree: PhD, Mechanical Engineering, 2013, Georgia Tech

 A novel approach to microfabrication based on stereolithography was presented. This fabrication process is referred to as, ‘Exposure Controlled Projection Lithography’ (ECPL). In the ECPL… (more)

Subjects/Keywords: Stereolithography; Oxygen inhibition; Microlenses; Process planning; Microfabrication; Microlithography; Microstructure; Rapid prototyping

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APA (6th Edition):

Jariwala, A. S. (2013). Modeling and process planning for exposure controlled projection lithography. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/51929

Chicago Manual of Style (16th Edition):

Jariwala, Amit Shashikant. “Modeling and process planning for exposure controlled projection lithography.” 2013. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/51929.

MLA Handbook (7th Edition):

Jariwala, Amit Shashikant. “Modeling and process planning for exposure controlled projection lithography.” 2013. Web. 19 Sep 2019.

Vancouver:

Jariwala AS. Modeling and process planning for exposure controlled projection lithography. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/51929.

Council of Science Editors:

Jariwala AS. Modeling and process planning for exposure controlled projection lithography. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/51929


Georgia Tech

16. Narcross, Hannah. Negative Tone Epoxide Molecular Resists and Materials for Next Generation Lithography.

Degree: PhD, Chemistry and Biochemistry, 2019, Georgia Tech

 The ability to quickly and accurately form nanoscale two-dimensional structures is critical for the high-volume manufacturing of semiconductors and microelectronic devices. Significant progress has been… (more)

Subjects/Keywords: Lithography; Photoresists; Molecular Resists; Negative Tone; E-beam Lithography; EUV Lithography

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APA (6th Edition):

Narcross, H. (2019). Negative Tone Epoxide Molecular Resists and Materials for Next Generation Lithography. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/61699

Chicago Manual of Style (16th Edition):

Narcross, Hannah. “Negative Tone Epoxide Molecular Resists and Materials for Next Generation Lithography.” 2019. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/61699.

MLA Handbook (7th Edition):

Narcross, Hannah. “Negative Tone Epoxide Molecular Resists and Materials for Next Generation Lithography.” 2019. Web. 19 Sep 2019.

Vancouver:

Narcross H. Negative Tone Epoxide Molecular Resists and Materials for Next Generation Lithography. [Internet] [Doctoral dissertation]. Georgia Tech; 2019. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/61699.

Council of Science Editors:

Narcross H. Negative Tone Epoxide Molecular Resists and Materials for Next Generation Lithography. [Doctoral Dissertation]. Georgia Tech; 2019. Available from: http://hdl.handle.net/1853/61699

17. Kambly, Kiran. Characterization of curing kinetics and polymerization shrinkage in ceramic-loaded photocurable resins for large area maskless photopolymerization (LAMP).

Degree: MS, Mechanical Engineering, 2009, Georgia Tech

 Large Area Maskless Photopolymerization (LAMP) is a direct digital manufacturing technology being developed at Georgia Tech to produce ceramic molds for investment casting of turbine… (more)

Subjects/Keywords: Ceramic-filled resin; Photocurable; Fourier transform infrared spectroscopy (FTIR); Large area maskless photopolymerization (LAMP); Polymerization shrinkage; Photopolymerization; Gums and resins Curing; Aerofoils

…is a direct digital manufacturing technology being developed at Georgia Tech to produce… …developed by the direct digital manufacturing (DDM) laboratory at Georgia tech is shown… 

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APA (6th Edition):

Kambly, K. (2009). Characterization of curing kinetics and polymerization shrinkage in ceramic-loaded photocurable resins for large area maskless photopolymerization (LAMP). (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/31740

Chicago Manual of Style (16th Edition):

Kambly, Kiran. “Characterization of curing kinetics and polymerization shrinkage in ceramic-loaded photocurable resins for large area maskless photopolymerization (LAMP).” 2009. Masters Thesis, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/31740.

MLA Handbook (7th Edition):

Kambly, Kiran. “Characterization of curing kinetics and polymerization shrinkage in ceramic-loaded photocurable resins for large area maskless photopolymerization (LAMP).” 2009. Web. 19 Sep 2019.

Vancouver:

Kambly K. Characterization of curing kinetics and polymerization shrinkage in ceramic-loaded photocurable resins for large area maskless photopolymerization (LAMP). [Internet] [Masters thesis]. Georgia Tech; 2009. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/31740.

Council of Science Editors:

Kambly K. Characterization of curing kinetics and polymerization shrinkage in ceramic-loaded photocurable resins for large area maskless photopolymerization (LAMP). [Masters Thesis]. Georgia Tech; 2009. Available from: http://hdl.handle.net/1853/31740

18. Dennis, Karla Ann. Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor.

Degree: MS, Chemical Engineering, 2009, Georgia Tech

 This thesis will characterize the use of HFAPNB and PHOST as a sensing layer material for a fully integrated multi-mode interferometric evanescent waveguide. The compatibility… (more)

Subjects/Keywords: HFAPNB; PHOST; Polymer sensing layer; Evanescent wave sensor; Detectors; Chemical detectors; Benzene; Polymers

…the Georgia Tech Electrical Engineering Department. 2.1.4 Interferometric waveguide The… …Lillie also in the Electrical Engineering department at Georgia Tech. 2.1.5 Chemically… 

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APA (6th Edition):

Dennis, K. A. (2009). Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/29682

Chicago Manual of Style (16th Edition):

Dennis, Karla Ann. “Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor.” 2009. Masters Thesis, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/29682.

MLA Handbook (7th Edition):

Dennis, Karla Ann. “Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor.” 2009. Web. 19 Sep 2019.

Vancouver:

Dennis KA. Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor. [Internet] [Masters thesis]. Georgia Tech; 2009. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/29682.

Council of Science Editors:

Dennis KA. Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor. [Masters Thesis]. Georgia Tech; 2009. Available from: http://hdl.handle.net/1853/29682

19. Hernandez Moreno, Andres Felipe. A metamodeling approach for approximation of multivariate, stochastic and dynamic simulations.

Degree: PhD, Chemical Engineering, 2012, Georgia Tech

 This thesis describes the implementation of metamodeling approaches as a solution to approximate multivariate, stochastic and dynamic simulations. In the area of statistics, metamodeling (or… (more)

Subjects/Keywords: Metamodeling; Gaussian process model; System dynamics; System identification; Error estimation; Simulation methods; Gaussian processes

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APA (6th Edition):

Hernandez Moreno, A. F. (2012). A metamodeling approach for approximation of multivariate, stochastic and dynamic simulations. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/43690

Chicago Manual of Style (16th Edition):

Hernandez Moreno, Andres Felipe. “A metamodeling approach for approximation of multivariate, stochastic and dynamic simulations.” 2012. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/43690.

MLA Handbook (7th Edition):

Hernandez Moreno, Andres Felipe. “A metamodeling approach for approximation of multivariate, stochastic and dynamic simulations.” 2012. Web. 19 Sep 2019.

Vancouver:

Hernandez Moreno AF. A metamodeling approach for approximation of multivariate, stochastic and dynamic simulations. [Internet] [Doctoral dissertation]. Georgia Tech; 2012. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/43690.

Council of Science Editors:

Hernandez Moreno AF. A metamodeling approach for approximation of multivariate, stochastic and dynamic simulations. [Doctoral Dissertation]. Georgia Tech; 2012. Available from: http://hdl.handle.net/1853/43690

20. Cheng, Jing. Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers.

Degree: PhD, Chemistry and Biochemistry, 2013, Georgia Tech

 It’s becoming more and more difficult to make smaller, denser, and faster computer chips. There’s an increasing demand to design new materials to be applied… (more)

Subjects/Keywords: Lithography; Molecular resists; Block copolymers; Directed self-assembly; Block copolymers; Self-assembly (Chemistry); Photoresists

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APA (6th Edition):

Cheng, J. (2013). Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/49113

Chicago Manual of Style (16th Edition):

Cheng, Jing. “Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers.” 2013. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/49113.

MLA Handbook (7th Edition):

Cheng, Jing. “Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers.” 2013. Web. 19 Sep 2019.

Vancouver:

Cheng J. Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/49113.

Council of Science Editors:

Cheng J. Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/49113

21. Nation, Benjamin. Directed self assembly of block copolymers.

Degree: PhD, Chemical and Biomolecular Engineering, 2017, Georgia Tech

 Block copolymer (BCP) directed self-assembly (DSA) is currently being explored as a potential method for producing smaller features in the integrated circuit fabrication industry. However,… (more)

Subjects/Keywords: Block copolymer; Directed self-assembly; Coarse-grained; Molecular dynamics; Simulation; Chemoepitaxy; Graphoepitaxy; Thermodynamic integration; Free energy; Dislocation; Defect

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APA (6th Edition):

Nation, B. (2017). Directed self assembly of block copolymers. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/58741

Chicago Manual of Style (16th Edition):

Nation, Benjamin. “Directed self assembly of block copolymers.” 2017. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/58741.

MLA Handbook (7th Edition):

Nation, Benjamin. “Directed self assembly of block copolymers.” 2017. Web. 19 Sep 2019.

Vancouver:

Nation B. Directed self assembly of block copolymers. [Internet] [Doctoral dissertation]. Georgia Tech; 2017. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/58741.

Council of Science Editors:

Nation B. Directed self assembly of block copolymers. [Doctoral Dissertation]. Georgia Tech; 2017. Available from: http://hdl.handle.net/1853/58741

22. Yeh, Wei-Ming. Pattern collapse in lithographic nanostructures: quantifying photoresist nanostructure behavior and novel methods for collapse mitigation.

Degree: PhD, Chemical and Biomolecular Engineering, 2013, Georgia Tech

 The Microelectronics industry has continuously pushed the limit of critical dimensions to sub-20 nm. One of the challenges is pattern collapse, caused by unbalanced capillary… (more)

Subjects/Keywords: Photoresists; Pattern collapse; Polymers; Nanolithography; Nanotechnology; Nanostructured materials

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APA (6th Edition):

Yeh, W. (2013). Pattern collapse in lithographic nanostructures: quantifying photoresist nanostructure behavior and novel methods for collapse mitigation. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/47696

Chicago Manual of Style (16th Edition):

Yeh, Wei-Ming. “Pattern collapse in lithographic nanostructures: quantifying photoresist nanostructure behavior and novel methods for collapse mitigation.” 2013. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/47696.

MLA Handbook (7th Edition):

Yeh, Wei-Ming. “Pattern collapse in lithographic nanostructures: quantifying photoresist nanostructure behavior and novel methods for collapse mitigation.” 2013. Web. 19 Sep 2019.

Vancouver:

Yeh W. Pattern collapse in lithographic nanostructures: quantifying photoresist nanostructure behavior and novel methods for collapse mitigation. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/47696.

Council of Science Editors:

Yeh W. Pattern collapse in lithographic nanostructures: quantifying photoresist nanostructure behavior and novel methods for collapse mitigation. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/47696

23. Cheshmehkani, Ameneh. Design and synthesis of molecular resists for high resolution patterning performance.

Degree: MS, Chemistry and Biochemistry, 2013, Georgia Tech

 In this thesis, different approaches in synthesizing molecular resist are examined, and structure-property relations for the molecular resist properties are studied. This allows for design… (more)

Subjects/Keywords: Photoresist; Lithography; Calixarene; Oxetane; Epoxide; Acrylate; Photoresists; Masks (Electronics); Photolithography

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APA (6th Edition):

Cheshmehkani, A. (2013). Design and synthesis of molecular resists for high resolution patterning performance. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/50286

Chicago Manual of Style (16th Edition):

Cheshmehkani, Ameneh. “Design and synthesis of molecular resists for high resolution patterning performance.” 2013. Masters Thesis, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/50286.

MLA Handbook (7th Edition):

Cheshmehkani, Ameneh. “Design and synthesis of molecular resists for high resolution patterning performance.” 2013. Web. 19 Sep 2019.

Vancouver:

Cheshmehkani A. Design and synthesis of molecular resists for high resolution patterning performance. [Internet] [Masters thesis]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/50286.

Council of Science Editors:

Cheshmehkani A. Design and synthesis of molecular resists for high resolution patterning performance. [Masters Thesis]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/50286

24. Vargas Morales, Juan Manuel. Towards a low temperature synthesis of graphene with small organic molecule precursors.

Degree: PhD, Chemistry and Biochemistry, 2013, Georgia Tech

 Graphene, a 2D honeycomb lattice of sp² hybridized carbons, has attracted the attention of the scientific community not only for its interesting theoretical properties but… (more)

Subjects/Keywords: Graphene; Chemical vapor deposition; Nanotubes; Graphene nanoribbons; Graphene Synthesis

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APA (6th Edition):

Vargas Morales, J. M. (2013). Towards a low temperature synthesis of graphene with small organic molecule precursors. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/50278

Chicago Manual of Style (16th Edition):

Vargas Morales, Juan Manuel. “Towards a low temperature synthesis of graphene with small organic molecule precursors.” 2013. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/50278.

MLA Handbook (7th Edition):

Vargas Morales, Juan Manuel. “Towards a low temperature synthesis of graphene with small organic molecule precursors.” 2013. Web. 19 Sep 2019.

Vancouver:

Vargas Morales JM. Towards a low temperature synthesis of graphene with small organic molecule precursors. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/50278.

Council of Science Editors:

Vargas Morales JM. Towards a low temperature synthesis of graphene with small organic molecule precursors. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/50278

25. Thomas, Mikkel Andrey. Integrated optical interferometric sensors on silicon and silicon cmos.

Degree: PhD, Electrical and Computer Engineering, 2008, Georgia Tech

 The main objective of this research is to fabricate and characterize an optically integrated interferometric sensor on standard silicon and silicon CMOS circuitry. An optical… (more)

Subjects/Keywords: GaAs/AlGaAs; Multiple quantum well laser; Sensor; Mach-Zehnder interferometer; Interferometry; Detectors; Dielectric wave guides; Semiconductor films; Thin films

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APA (6th Edition):

Thomas, M. A. (2008). Integrated optical interferometric sensors on silicon and silicon cmos. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/26674

Chicago Manual of Style (16th Edition):

Thomas, Mikkel Andrey. “Integrated optical interferometric sensors on silicon and silicon cmos.” 2008. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/26674.

MLA Handbook (7th Edition):

Thomas, Mikkel Andrey. “Integrated optical interferometric sensors on silicon and silicon cmos.” 2008. Web. 19 Sep 2019.

Vancouver:

Thomas MA. Integrated optical interferometric sensors on silicon and silicon cmos. [Internet] [Doctoral dissertation]. Georgia Tech; 2008. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/26674.

Council of Science Editors:

Thomas MA. Integrated optical interferometric sensors on silicon and silicon cmos. [Doctoral Dissertation]. Georgia Tech; 2008. Available from: http://hdl.handle.net/1853/26674


Georgia Tech

26. Saxena, Shubham. Nanolithography on thin films using heated atomic force microscope cantilevers.

Degree: MS, Mechanical Engineering, 2006, Georgia Tech

 Nanotechnology is expected to play a major role in many technology areas including electronics, materials, and defense. One of the most popular tools for nanoscale… (more)

Subjects/Keywords: Characterization; Deflection; Setpoint; Grain rearrangement; Array; Precise positioning; Metrology; Explosion; Explosives; Data storage; Material; Image processing; Slow scan disabled; Temperature; Tip; Local; In-situ; Nanoscale; Electrical circuit fabrication; Repair; Co-polycarbonate; Polymers; Polycarbonates; Energetic materials; PETN; Simulation; Interface; Nano-manufacturing; Experiment; Calibration; Raman; Frequency; Deflagration; Decomposition; Detonation; Build up; Pile-up; End capped; End capping; Cross linked; Cross-linked; Conductivity; Microscale; MEMS; Microcantilever; NEMS; DPN; tDPN; Silicon; Glass; Peak; InVOLS; Manipulation; AFM; Atomic force microscope; Defense; Nanoscale; Surface; Stiffness; Force; Scan size; Thermal cantilevers; Imaging; Lithography; Nanolithography; Thin films; Cantilevers; Heaters; Technology; Nanotechnology; Scan velocity; Scan rate; Bake; Anneal; Pentaerythritol tetranitrate; Thin films Thermal properties; Atomic force microscopy; Microlithography; Nanotechnology; Surfaces (Technology) Analysis

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APA (6th Edition):

Saxena, S. (2006). Nanolithography on thin films using heated atomic force microscope cantilevers. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/14071

Chicago Manual of Style (16th Edition):

Saxena, Shubham. “Nanolithography on thin films using heated atomic force microscope cantilevers.” 2006. Masters Thesis, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/14071.

MLA Handbook (7th Edition):

Saxena, Shubham. “Nanolithography on thin films using heated atomic force microscope cantilevers.” 2006. Web. 19 Sep 2019.

Vancouver:

Saxena S. Nanolithography on thin films using heated atomic force microscope cantilevers. [Internet] [Masters thesis]. Georgia Tech; 2006. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/14071.

Council of Science Editors:

Saxena S. Nanolithography on thin films using heated atomic force microscope cantilevers. [Masters Thesis]. Georgia Tech; 2006. Available from: http://hdl.handle.net/1853/14071


Georgia Tech

27. Cannon, Andrew Hampton. Unconventional Microfabrication Using Polymers.

Degree: MS, Mechanical Engineering, 2006, Georgia Tech

 Current microfabrication materials include silicon, a wide variety of metals, dielectrics, and some polymers. Because of the low cost and high processing flexibility that polymers… (more)

Subjects/Keywords: Carbon nanotubes; Ceramic; Self-assembly; Polymers; Microfabrication; Microfabrication; Polymers

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APA (6th Edition):

Cannon, A. H. (2006). Unconventional Microfabrication Using Polymers. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/19845

Chicago Manual of Style (16th Edition):

Cannon, Andrew Hampton. “Unconventional Microfabrication Using Polymers.” 2006. Masters Thesis, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/19845.

MLA Handbook (7th Edition):

Cannon, Andrew Hampton. “Unconventional Microfabrication Using Polymers.” 2006. Web. 19 Sep 2019.

Vancouver:

Cannon AH. Unconventional Microfabrication Using Polymers. [Internet] [Masters thesis]. Georgia Tech; 2006. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/19845.

Council of Science Editors:

Cannon AH. Unconventional Microfabrication Using Polymers. [Masters Thesis]. Georgia Tech; 2006. Available from: http://hdl.handle.net/1853/19845


Georgia Tech

28. Remmert, Jessica Lynn. Nano Thermal and Contact Potential Analysis with Heated Probe Tips.

Degree: MS, Mechanical Engineering, 2007, Georgia Tech

 This work describes two closed-loop atomic force microscopy methods that utilize the heated silicon probe to interrogate surfaces. The first method identifies the softening temperatures… (more)

Subjects/Keywords: Atomic force microscopy; Heated silicon cantilever; Local thermal analysis; Contact potential analysis; Kelvin probe; Atomic force microscopy; Probes (Electronic instruments)

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APA (6th Edition):

Remmert, J. L. (2007). Nano Thermal and Contact Potential Analysis with Heated Probe Tips. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/14585

Chicago Manual of Style (16th Edition):

Remmert, Jessica Lynn. “Nano Thermal and Contact Potential Analysis with Heated Probe Tips.” 2007. Masters Thesis, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/14585.

MLA Handbook (7th Edition):

Remmert, Jessica Lynn. “Nano Thermal and Contact Potential Analysis with Heated Probe Tips.” 2007. Web. 19 Sep 2019.

Vancouver:

Remmert JL. Nano Thermal and Contact Potential Analysis with Heated Probe Tips. [Internet] [Masters thesis]. Georgia Tech; 2007. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/14585.

Council of Science Editors:

Remmert JL. Nano Thermal and Contact Potential Analysis with Heated Probe Tips. [Masters Thesis]. Georgia Tech; 2007. Available from: http://hdl.handle.net/1853/14585


Georgia Tech

29. Hua, Yueming. Materials and methods for nanolithography using scanning thermal cantilever probes.

Degree: PhD, Chemical and Biomolecular Engineering, 2008, Georgia Tech

 This work presents the novel applications of heated AFM tip in nanolithography. Different strategies were investigated for patterning materials using heated AFM tip. New materials… (more)

Subjects/Keywords: Atomic force microscope; Heated cantilever; Lithography; Microlithography; Nanotechnology; Probes (Electronic instruments); Thermal analysis

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APA (6th Edition):

Hua, Y. (2008). Materials and methods for nanolithography using scanning thermal cantilever probes. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/22536

Chicago Manual of Style (16th Edition):

Hua, Yueming. “Materials and methods for nanolithography using scanning thermal cantilever probes.” 2008. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/22536.

MLA Handbook (7th Edition):

Hua, Yueming. “Materials and methods for nanolithography using scanning thermal cantilever probes.” 2008. Web. 19 Sep 2019.

Vancouver:

Hua Y. Materials and methods for nanolithography using scanning thermal cantilever probes. [Internet] [Doctoral dissertation]. Georgia Tech; 2008. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/22536.

Council of Science Editors:

Hua Y. Materials and methods for nanolithography using scanning thermal cantilever probes. [Doctoral Dissertation]. Georgia Tech; 2008. Available from: http://hdl.handle.net/1853/22536


Georgia Tech

30. Berger, Cody Michael. Measuring Acid Generation Kinetics in Photoresist Films via Capacitance Techniques.

Degree: PhD, Chemical Engineering, 2004, Georgia Tech

 In this thesis, a novel technique for measuring photoacid generation kinetics in chemically amplified photoresists was developed that utilizes capacitance measurements from interdigitated electrodes. In… (more)

Subjects/Keywords: Interdigitated electrodes; Capacitance; Dill C; Photoresists

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APA (6th Edition):

Berger, C. M. (2004). Measuring Acid Generation Kinetics in Photoresist Films via Capacitance Techniques. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/7598

Chicago Manual of Style (16th Edition):

Berger, Cody Michael. “Measuring Acid Generation Kinetics in Photoresist Films via Capacitance Techniques.” 2004. Doctoral Dissertation, Georgia Tech. Accessed September 19, 2019. http://hdl.handle.net/1853/7598.

MLA Handbook (7th Edition):

Berger, Cody Michael. “Measuring Acid Generation Kinetics in Photoresist Films via Capacitance Techniques.” 2004. Web. 19 Sep 2019.

Vancouver:

Berger CM. Measuring Acid Generation Kinetics in Photoresist Films via Capacitance Techniques. [Internet] [Doctoral dissertation]. Georgia Tech; 2004. [cited 2019 Sep 19]. Available from: http://hdl.handle.net/1853/7598.

Council of Science Editors:

Berger CM. Measuring Acid Generation Kinetics in Photoresist Films via Capacitance Techniques. [Doctoral Dissertation]. Georgia Tech; 2004. Available from: http://hdl.handle.net/1853/7598

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