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You searched for +publisher:"Georgia Tech" +contributor:("Henderson, Clifford L."). Showing records 1 – 17 of 17 total matches.

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1. Dennis, Karla Ann. Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor.

Degree: MS, Chemical Engineering, 2009, Georgia Tech

 This thesis will characterize the use of HFAPNB and PHOST as a sensing layer material for a fully integrated multi-mode interferometric evanescent waveguide. The compatibility… (more)

Subjects/Keywords: HFAPNB; PHOST; Polymer sensing layer; Evanescent wave sensor; Detectors; Chemical detectors; Benzene; Polymers

…the Georgia Tech Electrical Engineering Department. 2.1.4 Interferometric waveguide The… …Lillie also in the Electrical Engineering department at Georgia Tech. 2.1.5 Chemically… 

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APA (6th Edition):

Dennis, K. A. (2009). Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/29682

Chicago Manual of Style (16th Edition):

Dennis, Karla Ann. “Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor.” 2009. Masters Thesis, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/29682.

MLA Handbook (7th Edition):

Dennis, Karla Ann. “Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor.” 2009. Web. 17 Jun 2019.

Vancouver:

Dennis KA. Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor. [Internet] [Masters thesis]. Georgia Tech; 2009. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/29682.

Council of Science Editors:

Dennis KA. Characterization of HFAPNB and PHOST as a polymer sensing layer in an interferometric evanescent wave sensor. [Masters Thesis]. Georgia Tech; 2009. Available from: http://hdl.handle.net/1853/29682


Georgia Tech

2. Jarnagin, Nathan D. High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal.

Degree: PhD, Chemistry and Biochemistry, 2013, Georgia Tech

 Block copolymer (BCP) thin film patterns, generated using directed self-assembly (DSA) of diblock copolymers, have shown excellent promise as templates for semiconductor device manufacturing since… (more)

Subjects/Keywords: Block copolymer; Phase separation; Directed self-assembly; Poly(styrene)-b-poly(hydroxystyrene); Atomic layer deposition; Reactive ion etch; Poly(trimethylsilylstyrene)-block-poly(hydroxystyrene); Block copolymers; Diblock copolymers; Thin films; Self-assembly (Chemistry)

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APA (6th Edition):

Jarnagin, N. D. (2013). High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/50287

Chicago Manual of Style (16th Edition):

Jarnagin, Nathan D. “High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal.” 2013. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/50287.

MLA Handbook (7th Edition):

Jarnagin, Nathan D. “High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal.” 2013. Web. 17 Jun 2019.

Vancouver:

Jarnagin ND. High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/50287.

Council of Science Editors:

Jarnagin ND. High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/50287


Georgia Tech

3. Baltazar, Jose A. Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics.

Degree: PhD, Chemical and Biomolecular Engineering, 2013, Georgia Tech

 Graphene is a two-dimensional sp2 hybridized carbon lattice that is also the fundamental building block of graphite. Graphene has attracted significant interest recently due to… (more)

Subjects/Keywords: Graphene; Graphene doping; Graphene growth; Graphene exfoliation; Polycyclic aromatic hydrocarbons; Graphene; Self-assembly (Chemistry); Semiconductor doping

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APA (6th Edition):

Baltazar, J. A. (2013). Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/51787

Chicago Manual of Style (16th Edition):

Baltazar, Jose A. “Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics.” 2013. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/51787.

MLA Handbook (7th Edition):

Baltazar, Jose A. “Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics.” 2013. Web. 17 Jun 2019.

Vancouver:

Baltazar JA. Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/51787.

Council of Science Editors:

Baltazar JA. Polycyclic aromatic hydrocarbons: exploring new processes and materials for electronics. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/51787


Georgia Tech

4. Sivaram, Saujan Venkat. The impact of surface chemistry on stable semiconductor nanowire growth.

Degree: PhD, Chemical and Biomolecular Engineering, 2015, Georgia Tech

 The vapor-liquid-solid (VLS) mechanism – whereby a liquid eutectic “catalyst” droplet collects precursor molecules (or atoms) from the vapor and directs crystallization of the solid… (more)

Subjects/Keywords: Nanowire; Semiconductor; Synthesis; Spectroscopy

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APA (6th Edition):

Sivaram, S. V. (2015). The impact of surface chemistry on stable semiconductor nanowire growth. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/55509

Chicago Manual of Style (16th Edition):

Sivaram, Saujan Venkat. “The impact of surface chemistry on stable semiconductor nanowire growth.” 2015. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/55509.

MLA Handbook (7th Edition):

Sivaram, Saujan Venkat. “The impact of surface chemistry on stable semiconductor nanowire growth.” 2015. Web. 17 Jun 2019.

Vancouver:

Sivaram SV. The impact of surface chemistry on stable semiconductor nanowire growth. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/55509.

Council of Science Editors:

Sivaram SV. The impact of surface chemistry on stable semiconductor nanowire growth. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/55509


Georgia Tech

5. Breaux, Caleb Lamar. Investigation into obstacles to the implementation of the directed-self assembly of block copolymers.

Degree: PhD, Chemical and Biomolecular Engineering, 2018, Georgia Tech

 To meet the growing demands of the microelectronics industry and their desire to continue Moore’s Law, a variety of routes to extend or replace optical… (more)

Subjects/Keywords: Directed self-assembly; Block copolymers; Synthesis; Defects; SAXS; blends

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APA (6th Edition):

Breaux, C. L. (2018). Investigation into obstacles to the implementation of the directed-self assembly of block copolymers. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/59912

Chicago Manual of Style (16th Edition):

Breaux, Caleb Lamar. “Investigation into obstacles to the implementation of the directed-self assembly of block copolymers.” 2018. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/59912.

MLA Handbook (7th Edition):

Breaux, Caleb Lamar. “Investigation into obstacles to the implementation of the directed-self assembly of block copolymers.” 2018. Web. 17 Jun 2019.

Vancouver:

Breaux CL. Investigation into obstacles to the implementation of the directed-self assembly of block copolymers. [Internet] [Doctoral dissertation]. Georgia Tech; 2018. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/59912.

Council of Science Editors:

Breaux CL. Investigation into obstacles to the implementation of the directed-self assembly of block copolymers. [Doctoral Dissertation]. Georgia Tech; 2018. Available from: http://hdl.handle.net/1853/59912

6. Cheng, Jing. Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers.

Degree: PhD, Chemistry and Biochemistry, 2013, Georgia Tech

 It’s becoming more and more difficult to make smaller, denser, and faster computer chips. There’s an increasing demand to design new materials to be applied… (more)

Subjects/Keywords: Lithography; Molecular resists; Block copolymers; Directed self-assembly; Block copolymers; Self-assembly (Chemistry); Photoresists

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APA (6th Edition):

Cheng, J. (2013). Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/49113

Chicago Manual of Style (16th Edition):

Cheng, Jing. “Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers.” 2013. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/49113.

MLA Handbook (7th Edition):

Cheng, Jing. “Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers.” 2013. Web. 17 Jun 2019.

Vancouver:

Cheng J. Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/49113.

Council of Science Editors:

Cheng J. Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/49113


Georgia Tech

7. Peters, Andrew J. Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing.

Degree: PhD, Chemical and Biomolecular Engineering, 2015, Georgia Tech

 A molecular dynamics coarse-grained block copolymer (BCP) model was developed and used to studied directed self-assembly (DSA), especially in regards to applications for semiconductor manufacturing.… (more)

Subjects/Keywords: Block copolymer directed self-assembly; Mesoscale simulation; Coarse-grained simulation; Semiconductor manufacturing; Integrated circuit

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APA (6th Edition):

Peters, A. J. (2015). Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/53860

Chicago Manual of Style (16th Edition):

Peters, Andrew J. “Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing.” 2015. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/53860.

MLA Handbook (7th Edition):

Peters, Andrew J. “Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing.” 2015. Web. 17 Jun 2019.

Vancouver:

Peters AJ. Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/53860.

Council of Science Editors:

Peters AJ. Mesoscale simulation of block copolymer phase separation and directed self-assembly processes: Applications for semiconductor manufacturing. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/53860


Georgia Tech

8. Setzler, Brian Patrick. Kinetic and transport modeling in proton exchange membrane fuel cells.

Degree: PhD, Chemical and Biomolecular Engineering, 2015, Georgia Tech

 The improvement of PEMFC performance and durability requires a quantitative understanding of the processes that cause performance losses. In this dissertation, two models are developed… (more)

Subjects/Keywords: Proton exchange membrane fuel cell; Oxygen reduction reaction; Physics-based model; Electrochemical impedance spectroscopy; Two-phase transport; Fuel cell

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APA (6th Edition):

Setzler, B. P. (2015). Kinetic and transport modeling in proton exchange membrane fuel cells. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/55507

Chicago Manual of Style (16th Edition):

Setzler, Brian Patrick. “Kinetic and transport modeling in proton exchange membrane fuel cells.” 2015. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/55507.

MLA Handbook (7th Edition):

Setzler, Brian Patrick. “Kinetic and transport modeling in proton exchange membrane fuel cells.” 2015. Web. 17 Jun 2019.

Vancouver:

Setzler BP. Kinetic and transport modeling in proton exchange membrane fuel cells. [Internet] [Doctoral dissertation]. Georgia Tech; 2015. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/55507.

Council of Science Editors:

Setzler BP. Kinetic and transport modeling in proton exchange membrane fuel cells. [Doctoral Dissertation]. Georgia Tech; 2015. Available from: http://hdl.handle.net/1853/55507

9. Nation, Benjamin. Directed self assembly of block copolymers.

Degree: PhD, Chemical and Biomolecular Engineering, 2017, Georgia Tech

 Block copolymer (BCP) directed self-assembly (DSA) is currently being explored as a potential method for producing smaller features in the integrated circuit fabrication industry. However,… (more)

Subjects/Keywords: Block copolymer; Directed self-assembly; Coarse-grained; Molecular dynamics; Simulation; Chemoepitaxy; Graphoepitaxy; Thermodynamic integration; Free energy; Dislocation; Defect

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APA (6th Edition):

Nation, B. (2017). Directed self assembly of block copolymers. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/58741

Chicago Manual of Style (16th Edition):

Nation, Benjamin. “Directed self assembly of block copolymers.” 2017. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/58741.

MLA Handbook (7th Edition):

Nation, Benjamin. “Directed self assembly of block copolymers.” 2017. Web. 17 Jun 2019.

Vancouver:

Nation B. Directed self assembly of block copolymers. [Internet] [Doctoral dissertation]. Georgia Tech; 2017. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/58741.

Council of Science Editors:

Nation B. Directed self assembly of block copolymers. [Doctoral Dissertation]. Georgia Tech; 2017. Available from: http://hdl.handle.net/1853/58741

10. Cheshmehkani, Ameneh. Design and synthesis of molecular resists for high resolution patterning performance.

Degree: MS, Chemistry and Biochemistry, 2013, Georgia Tech

 In this thesis, different approaches in synthesizing molecular resist are examined, and structure-property relations for the molecular resist properties are studied. This allows for design… (more)

Subjects/Keywords: Photoresist; Lithography; Calixarene; Oxetane; Epoxide; Acrylate; Photoresists; Masks (Electronics); Photolithography

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APA (6th Edition):

Cheshmehkani, A. (2013). Design and synthesis of molecular resists for high resolution patterning performance. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/50286

Chicago Manual of Style (16th Edition):

Cheshmehkani, Ameneh. “Design and synthesis of molecular resists for high resolution patterning performance.” 2013. Masters Thesis, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/50286.

MLA Handbook (7th Edition):

Cheshmehkani, Ameneh. “Design and synthesis of molecular resists for high resolution patterning performance.” 2013. Web. 17 Jun 2019.

Vancouver:

Cheshmehkani A. Design and synthesis of molecular resists for high resolution patterning performance. [Internet] [Masters thesis]. Georgia Tech; 2013. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/50286.

Council of Science Editors:

Cheshmehkani A. Design and synthesis of molecular resists for high resolution patterning performance. [Masters Thesis]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/50286

11. Vargas Morales, Juan Manuel. Towards a low temperature synthesis of graphene with small organic molecule precursors.

Degree: PhD, Chemistry and Biochemistry, 2013, Georgia Tech

 Graphene, a 2D honeycomb lattice of sp² hybridized carbons, has attracted the attention of the scientific community not only for its interesting theoretical properties but… (more)

Subjects/Keywords: Graphene; Chemical vapor deposition; Nanotubes; Graphene nanoribbons; Graphene Synthesis

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APA (6th Edition):

Vargas Morales, J. M. (2013). Towards a low temperature synthesis of graphene with small organic molecule precursors. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/50278

Chicago Manual of Style (16th Edition):

Vargas Morales, Juan Manuel. “Towards a low temperature synthesis of graphene with small organic molecule precursors.” 2013. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/50278.

MLA Handbook (7th Edition):

Vargas Morales, Juan Manuel. “Towards a low temperature synthesis of graphene with small organic molecule precursors.” 2013. Web. 17 Jun 2019.

Vancouver:

Vargas Morales JM. Towards a low temperature synthesis of graphene with small organic molecule precursors. [Internet] [Doctoral dissertation]. Georgia Tech; 2013. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/50278.

Council of Science Editors:

Vargas Morales JM. Towards a low temperature synthesis of graphene with small organic molecule precursors. [Doctoral Dissertation]. Georgia Tech; 2013. Available from: http://hdl.handle.net/1853/50278


Georgia Tech

12. Saxena, Shubham. Nanolithography on thin films using heated atomic force microscope cantilevers.

Degree: MS, Mechanical Engineering, 2006, Georgia Tech

 Nanotechnology is expected to play a major role in many technology areas including electronics, materials, and defense. One of the most popular tools for nanoscale… (more)

Subjects/Keywords: Characterization; Deflection; Setpoint; Grain rearrangement; Array; Precise positioning; Metrology; Explosion; Explosives; Data storage; Material; Image processing; Slow scan disabled; Temperature; Tip; Local; In-situ; Nanoscale; Electrical circuit fabrication; Repair; Co-polycarbonate; Polymers; Polycarbonates; Energetic materials; PETN; Simulation; Interface; Nano-manufacturing; Experiment; Calibration; Raman; Frequency; Deflagration; Decomposition; Detonation; Build up; Pile-up; End capped; End capping; Cross linked; Cross-linked; Conductivity; Microscale; MEMS; Microcantilever; NEMS; DPN; tDPN; Silicon; Glass; Peak; InVOLS; Manipulation; AFM; Atomic force microscope; Defense; Nanoscale; Surface; Stiffness; Force; Scan size; Thermal cantilevers; Imaging; Lithography; Nanolithography; Thin films; Cantilevers; Heaters; Technology; Nanotechnology; Scan velocity; Scan rate; Bake; Anneal; Pentaerythritol tetranitrate; Thin films Thermal properties; Atomic force microscopy; Microlithography; Nanotechnology; Surfaces (Technology) Analysis

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APA (6th Edition):

Saxena, S. (2006). Nanolithography on thin films using heated atomic force microscope cantilevers. (Masters Thesis). Georgia Tech. Retrieved from http://hdl.handle.net/1853/14071

Chicago Manual of Style (16th Edition):

Saxena, Shubham. “Nanolithography on thin films using heated atomic force microscope cantilevers.” 2006. Masters Thesis, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/14071.

MLA Handbook (7th Edition):

Saxena, Shubham. “Nanolithography on thin films using heated atomic force microscope cantilevers.” 2006. Web. 17 Jun 2019.

Vancouver:

Saxena S. Nanolithography on thin films using heated atomic force microscope cantilevers. [Internet] [Masters thesis]. Georgia Tech; 2006. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/14071.

Council of Science Editors:

Saxena S. Nanolithography on thin films using heated atomic force microscope cantilevers. [Masters Thesis]. Georgia Tech; 2006. Available from: http://hdl.handle.net/1853/14071


Georgia Tech

13. Sinha, Ashwini K. Design and Characterization of Materials and Processes for Area Selective Atomic Layer Deposition.

Degree: PhD, Chemical Engineering, 2006, Georgia Tech

 Area selective atomic layer deposition (ASALD) is demonstrated to be a promising route to perform direct patterned deposition. In particular, methods to modify (or mask)… (more)

Subjects/Keywords: Atomic layer deposition; Polymer thin films; Top surface imaging; Titanium dioxide; Quartz crystal microbalance; Thin films; Monomolecular films; Masks (Electronics)

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APA (6th Edition):

Sinha, A. K. (2006). Design and Characterization of Materials and Processes for Area Selective Atomic Layer Deposition. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/19736

Chicago Manual of Style (16th Edition):

Sinha, Ashwini K. “Design and Characterization of Materials and Processes for Area Selective Atomic Layer Deposition.” 2006. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/19736.

MLA Handbook (7th Edition):

Sinha, Ashwini K. “Design and Characterization of Materials and Processes for Area Selective Atomic Layer Deposition.” 2006. Web. 17 Jun 2019.

Vancouver:

Sinha AK. Design and Characterization of Materials and Processes for Area Selective Atomic Layer Deposition. [Internet] [Doctoral dissertation]. Georgia Tech; 2006. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/19736.

Council of Science Editors:

Sinha AK. Design and Characterization of Materials and Processes for Area Selective Atomic Layer Deposition. [Doctoral Dissertation]. Georgia Tech; 2006. Available from: http://hdl.handle.net/1853/19736


Georgia Tech

14. Tang, Yanyan. Stereolithography Cure Process Modeling.

Degree: PhD, Chemical Engineering, 2005, Georgia Tech

 Although stereolithography (SL) is a remarkable improvement over conventional prototyping production, it is being pushed aggressively for improvements in both speed and resolution. However, it… (more)

Subjects/Keywords: Kinetics; Photopolymerization; Stereolithography; Process simulation; Parameter effect significance; Parameter optimization

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APA (6th Edition):

Tang, Y. (2005). Stereolithography Cure Process Modeling. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/7235

Chicago Manual of Style (16th Edition):

Tang, Yanyan. “Stereolithography Cure Process Modeling.” 2005. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/7235.

MLA Handbook (7th Edition):

Tang, Yanyan. “Stereolithography Cure Process Modeling.” 2005. Web. 17 Jun 2019.

Vancouver:

Tang Y. Stereolithography Cure Process Modeling. [Internet] [Doctoral dissertation]. Georgia Tech; 2005. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/7235.

Council of Science Editors:

Tang Y. Stereolithography Cure Process Modeling. [Doctoral Dissertation]. Georgia Tech; 2005. Available from: http://hdl.handle.net/1853/7235


Georgia Tech

15. Lillie, Jeffrey J. A Highly Sensitive, Integrable, Multimode, Evanescent-Wave Chem/bio Sensor.

Degree: PhD, Electrical and Computer Engineering, 2005, Georgia Tech

 A fully integrated optical chem/bio sensor complete with integrated source, chemically sensitive waveguide, detector arrays, and associated signal processing electronics on a Si-CMOS chip is… (more)

Subjects/Keywords: Thermo-optic; Chemo-optic; Interferometric; Multimode; Chem/bio sensor; Si CMOS-compatible

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APA (6th Edition):

Lillie, J. J. (2005). A Highly Sensitive, Integrable, Multimode, Evanescent-Wave Chem/bio Sensor. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/7450

Chicago Manual of Style (16th Edition):

Lillie, Jeffrey J. “A Highly Sensitive, Integrable, Multimode, Evanescent-Wave Chem/bio Sensor.” 2005. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/7450.

MLA Handbook (7th Edition):

Lillie, Jeffrey J. “A Highly Sensitive, Integrable, Multimode, Evanescent-Wave Chem/bio Sensor.” 2005. Web. 17 Jun 2019.

Vancouver:

Lillie JJ. A Highly Sensitive, Integrable, Multimode, Evanescent-Wave Chem/bio Sensor. [Internet] [Doctoral dissertation]. Georgia Tech; 2005. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/7450.

Council of Science Editors:

Lillie JJ. A Highly Sensitive, Integrable, Multimode, Evanescent-Wave Chem/bio Sensor. [Doctoral Dissertation]. Georgia Tech; 2005. Available from: http://hdl.handle.net/1853/7450


Georgia Tech

16. Diao, Jie. Development of Techniques to Quantify Chemical and Mechanical Modifications of Polymer Surfaces: Application to Chemical Mechanical Polishing.

Degree: PhD, Chemical Engineering, 2004, Georgia Tech

 This thesis is devoted to development of techniques to quantify chemical and mechanical influences during chemical mechanical polishing (CMP) near the surface of a polymer… (more)

Subjects/Keywords: Chemical mechanical polishing; Depth profile; Polymers; Optical properties; Angle resolved XPS

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APA (6th Edition):

Diao, J. (2004). Development of Techniques to Quantify Chemical and Mechanical Modifications of Polymer Surfaces: Application to Chemical Mechanical Polishing. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/7628

Chicago Manual of Style (16th Edition):

Diao, Jie. “Development of Techniques to Quantify Chemical and Mechanical Modifications of Polymer Surfaces: Application to Chemical Mechanical Polishing.” 2004. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/7628.

MLA Handbook (7th Edition):

Diao, Jie. “Development of Techniques to Quantify Chemical and Mechanical Modifications of Polymer Surfaces: Application to Chemical Mechanical Polishing.” 2004. Web. 17 Jun 2019.

Vancouver:

Diao J. Development of Techniques to Quantify Chemical and Mechanical Modifications of Polymer Surfaces: Application to Chemical Mechanical Polishing. [Internet] [Doctoral dissertation]. Georgia Tech; 2004. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/7628.

Council of Science Editors:

Diao J. Development of Techniques to Quantify Chemical and Mechanical Modifications of Polymer Surfaces: Application to Chemical Mechanical Polishing. [Doctoral Dissertation]. Georgia Tech; 2004. Available from: http://hdl.handle.net/1853/7628


Georgia Tech

17. White, Celesta E. Advanced Methods, Materials, and Devices for Microfluidics.

Degree: PhD, Chemical Engineering, 2003, Georgia Tech

 Advanced Methods, Materials, and Devices for Microfluidics Celesta E. White 217 Pages Directed by Dr. Clifford L. Henderson Microfluidics is a rapidly growing research area… (more)

Subjects/Keywords: Polycarbonates; Sacrificial materials; Microfluidics; Poly(propylene carbonate); Photosensitive polycarbonates; Microelectromechanical systems; Polycarbonates; Photosensitive polyimides; Microelectromechanical systems

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APA · Chicago · MLA · Vancouver · CSE | Export to Zotero / EndNote / Reference Manager

APA (6th Edition):

White, C. E. (2003). Advanced Methods, Materials, and Devices for Microfluidics. (Doctoral Dissertation). Georgia Tech. Retrieved from http://hdl.handle.net/1853/5287

Chicago Manual of Style (16th Edition):

White, Celesta E. “Advanced Methods, Materials, and Devices for Microfluidics.” 2003. Doctoral Dissertation, Georgia Tech. Accessed June 17, 2019. http://hdl.handle.net/1853/5287.

MLA Handbook (7th Edition):

White, Celesta E. “Advanced Methods, Materials, and Devices for Microfluidics.” 2003. Web. 17 Jun 2019.

Vancouver:

White CE. Advanced Methods, Materials, and Devices for Microfluidics. [Internet] [Doctoral dissertation]. Georgia Tech; 2003. [cited 2019 Jun 17]. Available from: http://hdl.handle.net/1853/5287.

Council of Science Editors:

White CE. Advanced Methods, Materials, and Devices for Microfluidics. [Doctoral Dissertation]. Georgia Tech; 2003. Available from: http://hdl.handle.net/1853/5287

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